JP2013516768A5 - - Google Patents

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Publication number
JP2013516768A5
JP2013516768A5 JP2012547231A JP2012547231A JP2013516768A5 JP 2013516768 A5 JP2013516768 A5 JP 2013516768A5 JP 2012547231 A JP2012547231 A JP 2012547231A JP 2012547231 A JP2012547231 A JP 2012547231A JP 2013516768 A5 JP2013516768 A5 JP 2013516768A5
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JP
Japan
Prior art keywords
main surface
polishing
polishing pad
polymer phase
polymer
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JP2012547231A
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English (en)
Japanese (ja)
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JP6004941B2 (ja
JP2013516768A (ja
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Priority claimed from PCT/US2010/062204 external-priority patent/WO2011082155A2/en
Publication of JP2013516768A publication Critical patent/JP2013516768A/ja
Publication of JP2013516768A5 publication Critical patent/JP2013516768A5/ja
Application granted granted Critical
Publication of JP6004941B2 publication Critical patent/JP6004941B2/ja
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JP2012547231A 2009-12-30 2010-12-28 相分離したポリマーブレンドを含む研磨パッド並びにその製造及び使用方法 Active JP6004941B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US29117609P 2009-12-30 2009-12-30
US61/291,176 2009-12-30
PCT/US2010/062204 WO2011082155A2 (en) 2009-12-30 2010-12-28 Polishing pads including phase-separated polymer blend and method of making and using the same

Publications (3)

Publication Number Publication Date
JP2013516768A JP2013516768A (ja) 2013-05-13
JP2013516768A5 true JP2013516768A5 (enExample) 2014-02-06
JP6004941B2 JP6004941B2 (ja) 2016-10-12

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012547231A Active JP6004941B2 (ja) 2009-12-30 2010-12-28 相分離したポリマーブレンドを含む研磨パッド並びにその製造及び使用方法

Country Status (7)

Country Link
US (1) US9162340B2 (enExample)
JP (1) JP6004941B2 (enExample)
KR (1) KR20120125612A (enExample)
CN (1) CN102686362A (enExample)
SG (1) SG181678A1 (enExample)
TW (1) TWI552832B (enExample)
WO (1) WO2011082155A2 (enExample)

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US11072050B2 (en) 2017-08-04 2021-07-27 Applied Materials, Inc. Polishing pad with window and manufacturing methods thereof
KR102608124B1 (ko) * 2017-08-04 2023-11-29 쓰리엠 이노베이티브 프로퍼티즈 컴파니 향상된 동일 평면성을 갖는 미세복제된 폴리싱 표면
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US11331767B2 (en) 2019-02-01 2022-05-17 Micron Technology, Inc. Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods
US11851570B2 (en) 2019-04-12 2023-12-26 Applied Materials, Inc. Anionic polishing pads formed by printing processes
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