TWI552832B - 包含相分離聚合物摻合物之拋光墊及其製造及使用方法 - Google Patents

包含相分離聚合物摻合物之拋光墊及其製造及使用方法 Download PDF

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Publication number
TWI552832B
TWI552832B TW099146701A TW99146701A TWI552832B TW I552832 B TWI552832 B TW I552832B TW 099146701 A TW099146701 A TW 099146701A TW 99146701 A TW99146701 A TW 99146701A TW I552832 B TWI552832 B TW I552832B
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TW
Taiwan
Prior art keywords
polishing
elements
polishing pad
major side
polymer
Prior art date
Application number
TW099146701A
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English (en)
Chinese (zh)
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TW201136710A (en
Inventor
威廉 戴爾 喬瑟夫
史戴芬 克萊格 洛派
蓋瑞 馬爾文 潘格林
克里斯多夫 尼可拉斯 洛奇
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３Ｍ新設資產公司
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Publication of TW201136710A publication Critical patent/TW201136710A/zh
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Publication of TWI552832B publication Critical patent/TWI552832B/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • H10P52/00—

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW099146701A 2009-12-30 2010-12-29 包含相分離聚合物摻合物之拋光墊及其製造及使用方法 TWI552832B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29117609P 2009-12-30 2009-12-30

Publications (2)

Publication Number Publication Date
TW201136710A TW201136710A (en) 2011-11-01
TWI552832B true TWI552832B (zh) 2016-10-11

Family

ID=44227135

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099146701A TWI552832B (zh) 2009-12-30 2010-12-29 包含相分離聚合物摻合物之拋光墊及其製造及使用方法

Country Status (7)

Country Link
US (1) US9162340B2 (enExample)
JP (1) JP6004941B2 (enExample)
KR (1) KR20120125612A (enExample)
CN (1) CN102686362A (enExample)
SG (1) SG181678A1 (enExample)
TW (1) TWI552832B (enExample)
WO (1) WO2011082155A2 (enExample)

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KR20200140931A (ko) 2018-05-07 2020-12-16 어플라이드 머티어리얼스, 인코포레이티드 친수성 및 제타 전위 조정가능한 화학적 기계적 연마 패드들
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Also Published As

Publication number Publication date
US20120315830A1 (en) 2012-12-13
JP6004941B2 (ja) 2016-10-12
CN102686362A (zh) 2012-09-19
SG181678A1 (en) 2012-07-30
TW201136710A (en) 2011-11-01
US9162340B2 (en) 2015-10-20
WO2011082155A2 (en) 2011-07-07
JP2013516768A (ja) 2013-05-13
WO2011082155A3 (en) 2011-11-17
KR20120125612A (ko) 2012-11-16

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