JP2013515379A5 - - Google Patents

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Publication number
JP2013515379A5
JP2013515379A5 JP2012546101A JP2012546101A JP2013515379A5 JP 2013515379 A5 JP2013515379 A5 JP 2013515379A5 JP 2012546101 A JP2012546101 A JP 2012546101A JP 2012546101 A JP2012546101 A JP 2012546101A JP 2013515379 A5 JP2013515379 A5 JP 2013515379A5
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Japan
Prior art keywords
layer
composition
polishing
porous
radiation curable
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JP2012546101A
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English (en)
Japanese (ja)
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JP2013515379A (ja
JP5728026B2 (ja
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Priority claimed from PCT/US2010/061199 external-priority patent/WO2011087737A2/en
Publication of JP2013515379A publication Critical patent/JP2013515379A/ja
Publication of JP2013515379A5 publication Critical patent/JP2013515379A5/ja
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Publication of JP5728026B2 publication Critical patent/JP5728026B2/ja
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JP2012546101A 2009-12-22 2010-12-20 研磨パッド及びこれの製造方法 Active JP5728026B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US28898209P 2009-12-22 2009-12-22
US61/288,982 2009-12-22
US42244210P 2010-12-13 2010-12-13
US61/422,442 2010-12-13
PCT/US2010/061199 WO2011087737A2 (en) 2009-12-22 2010-12-20 Polishing pad and method of making the same

Publications (3)

Publication Number Publication Date
JP2013515379A JP2013515379A (ja) 2013-05-02
JP2013515379A5 true JP2013515379A5 (enExample) 2014-02-13
JP5728026B2 JP5728026B2 (ja) 2015-06-03

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Family Applications (1)

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JP2012546101A Active JP5728026B2 (ja) 2009-12-22 2010-12-20 研磨パッド及びこれの製造方法

Country Status (6)

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US (1) US20130012108A1 (enExample)
JP (1) JP5728026B2 (enExample)
KR (1) KR101855073B1 (enExample)
SG (1) SG181890A1 (enExample)
TW (1) TWI517975B (enExample)
WO (1) WO2011087737A2 (enExample)

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