JP2013500928A5 - - Google Patents
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- Publication number
- JP2013500928A5 JP2013500928A5 JP2012523311A JP2012523311A JP2013500928A5 JP 2013500928 A5 JP2013500928 A5 JP 2013500928A5 JP 2012523311 A JP2012523311 A JP 2012523311A JP 2012523311 A JP2012523311 A JP 2012523311A JP 2013500928 A5 JP2013500928 A5 JP 2013500928A5
- Authority
- JP
- Japan
- Prior art keywords
- silicon particles
- further outlet
- particle size
- reactor
- discharged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 description 3
- 239000011856 silicon-based particle Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009037155.9 | 2009-08-04 | ||
| DE102009037155A DE102009037155B3 (de) | 2009-08-04 | 2009-08-04 | Verfahren und Anlage zur Herstellung von Trichlorsilan |
| PCT/EP2010/061224 WO2011015560A1 (de) | 2009-08-04 | 2010-08-02 | Verfahren und anlage zur herstellung von trichlorsilan |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013500928A JP2013500928A (ja) | 2013-01-10 |
| JP2013500928A5 true JP2013500928A5 (enExample) | 2015-06-25 |
| JP5788877B2 JP5788877B2 (ja) | 2015-10-07 |
Family
ID=42813912
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012523311A Expired - Fee Related JP5788877B2 (ja) | 2009-08-04 | 2010-08-02 | トリクロロシランを製造するための設備および方法 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US20120189526A1 (enExample) |
| EP (1) | EP2462058B1 (enExample) |
| JP (1) | JP5788877B2 (enExample) |
| KR (1) | KR20120041234A (enExample) |
| CN (1) | CN102639440B (enExample) |
| CA (1) | CA2769759A1 (enExample) |
| DE (1) | DE102009037155B3 (enExample) |
| MY (1) | MY162486A (enExample) |
| RU (1) | RU2547269C2 (enExample) |
| TW (1) | TWI507359B (enExample) |
| WO (1) | WO2011015560A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010044108A1 (de) * | 2010-11-18 | 2012-05-24 | Evonik Degussa Gmbh | Herstellung von Chlorsilanen aus kleinstteiligem Reinstsilicium |
| CN104024159B (zh) | 2011-10-18 | 2015-11-25 | 东亚合成株式会社 | 氯代聚硅烷的制造方法及流化床反应装置 |
| DE102012224182A1 (de) | 2012-12-21 | 2014-07-10 | Evonik Degussa Gmbh | Verfahren zur Aufbereitung feinteiliger Feststoffe bei der Herstellung von Chlorsilanen |
| DE102013201742A1 (de) | 2012-12-21 | 2014-06-26 | Evonik Industries Ag | Verfahren zur Aufbereitung von Silizium-haltigem feinkörnigen Material bei der Herstellung von Chlorsilanen |
| EP2969948A1 (en) * | 2013-03-13 | 2016-01-20 | SiTec GmbH | Temperature management in chlorination processes and systems related thereto |
| DE102013212908A1 (de) | 2013-07-02 | 2015-01-08 | Wacker Chemie Ag | Analyse der Zusammensetzung eines Gases oder eines Gasstromes in einem chemischen Reaktor und ein Verfahren zur Herstellung von Chlorsilanen in einem Wirbelschichtreaktor |
| EP3053882B1 (en) * | 2013-09-30 | 2018-12-05 | LG Chem, Ltd. | Method for producing trichlorosilane |
| WO2015089214A1 (en) * | 2013-12-10 | 2015-06-18 | Summit Process Design, Inc. | Process for producing trichlorosilane |
| EP3088358A1 (de) | 2015-04-28 | 2016-11-02 | Evonik Degussa GmbH | Verfahren zur aufbereitung feinteiliger feststoffe bei der herstellung von chlorsilanen |
| EP3100978A1 (de) | 2015-06-02 | 2016-12-07 | Evonik Degussa GmbH | Aufbereitung feinteiliger feststoffe bei der herstellung von chlorsilanen durch agglomerieren und kompaktierung |
| EP3100979A1 (de) | 2015-06-02 | 2016-12-07 | Evonik Degussa GmbH | Aufbereitung feinteiliger feststoffe bei der herstellung von chlorsilanen durch sintern bei niedrigen temperaturen |
| KR101987129B1 (ko) * | 2016-09-19 | 2019-06-10 | 한화케미칼 주식회사 | 3염화 실란 합성용 유동층 반응기 |
| CN107433055B (zh) * | 2017-08-30 | 2019-10-08 | 上海华畅环保设备发展有限公司 | 沸腾床分离器中沸腾颗粒再生方法及装置 |
| CN109395675B (zh) * | 2018-09-14 | 2021-07-20 | 四川永祥多晶硅有限公司 | 一种固定流化工艺 |
| MY206228A (en) * | 2019-04-29 | 2024-12-05 | Wacker Chemie Ag | Process for producing trichlorosilane with structure-optimised silicon particles |
| CN116639699B (zh) * | 2023-07-12 | 2024-02-02 | 江苏中圣高科技产业有限公司 | 一种制备三氯氢硅的生产工艺及系统 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2028289B (en) * | 1978-08-18 | 1982-09-02 | Schumacher Co J C | Producing silicon |
| US4676967A (en) * | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
| DE3024319C2 (de) * | 1980-06-27 | 1983-07-21 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Kontinuierliches Verfahren zur Herstellung von Trichlorsilan |
| JPS57118017A (en) * | 1981-01-16 | 1982-07-22 | Koujiyundo Silicon Kk | Manufacture of trichlorosilane |
| JPS57156318A (en) * | 1981-03-16 | 1982-09-27 | Koujiyundo Silicon Kk | Production of trichlorosilane |
| FR2530638A1 (fr) * | 1982-07-26 | 1984-01-27 | Rhone Poulenc Spec Chim | Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete |
| FR2533906A1 (fr) * | 1982-09-30 | 1984-04-06 | Rhone Poulenc Spec Chim | Procede et dispositif pour la preparation de silane pur par reaction de chlorosilanes avec l'hydrure de lithium |
| US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
| CN85107465A (zh) * | 1985-10-12 | 1987-04-15 | 北京有色冶金设计研究总院 | 四氯化硅氢化新工艺 |
| JP2519094B2 (ja) * | 1988-11-29 | 1996-07-31 | 高純度シリコン株式会社 | トリクロロシラン製造用流動反応装置 |
| US5776416A (en) * | 1995-11-14 | 1998-07-07 | Tokuyama Corporation | Cyclone and fluidized bed reactor having same |
| JP3778631B2 (ja) * | 1995-11-14 | 2006-05-24 | 株式会社トクヤマ | サイクロン及びこれを備えた流動層反応装置 |
| JP3708648B2 (ja) * | 1995-12-25 | 2005-10-19 | 株式会社トクヤマ | トリクロロシランの製造方法 |
| DE19654154A1 (de) * | 1995-12-25 | 1997-06-26 | Tokuyama Corp | Verfahren zur Herstellung von Trichlorsilan |
| JP3708649B2 (ja) * | 1995-12-25 | 2005-10-19 | 株式会社トクヤマ | 銅シリサイドを有する金属珪素粒子の製造方法 |
| DE10062413A1 (de) * | 2000-12-14 | 2002-07-04 | Solarworld Ag | Verfahren zur Herstellung von Trichlorsilan |
| RU2274602C1 (ru) * | 2004-08-16 | 2006-04-20 | Федеральное государственное унитарное предприятие "Государственный научно-исследовательский и проектный институт редкометаллической промышленности "Гиредмет" | Способ получения трихлорсилана |
| DE102004045245B4 (de) * | 2004-09-17 | 2007-11-15 | Degussa Gmbh | Vorrichtung und Verfahren zur Herstellung von Silanen |
| JP5397580B2 (ja) * | 2007-05-25 | 2014-01-22 | 三菱マテリアル株式会社 | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
| CN101125654A (zh) * | 2007-09-04 | 2008-02-20 | 浙江开化合成材料有限公司 | 一种用于三氯氢硅生产的大型流化床反应器 |
| CN101279735A (zh) * | 2008-05-30 | 2008-10-08 | 中蓝晨光化工研究院有限公司 | 三氯氢硅的生产方法及其设备 |
-
2009
- 2009-08-04 DE DE102009037155A patent/DE102009037155B3/de active Active
-
2010
- 2010-08-02 MY MYPI2012000491A patent/MY162486A/en unknown
- 2010-08-02 EP EP10739921.4A patent/EP2462058B1/de active Active
- 2010-08-02 US US13/388,692 patent/US20120189526A1/en not_active Abandoned
- 2010-08-02 KR KR1020127005460A patent/KR20120041234A/ko not_active Withdrawn
- 2010-08-02 JP JP2012523311A patent/JP5788877B2/ja not_active Expired - Fee Related
- 2010-08-02 CA CA2769759A patent/CA2769759A1/en not_active Abandoned
- 2010-08-02 RU RU2012106750/04A patent/RU2547269C2/ru active
- 2010-08-02 WO PCT/EP2010/061224 patent/WO2011015560A1/de not_active Ceased
- 2010-08-02 CN CN201080043459.XA patent/CN102639440B/zh active Active
- 2010-08-04 TW TW099125977A patent/TWI507359B/zh not_active IP Right Cessation
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