JPS57118017A - Manufacture of trichlorosilane - Google Patents
Manufacture of trichlorosilaneInfo
- Publication number
- JPS57118017A JPS57118017A JP569181A JP569181A JPS57118017A JP S57118017 A JPS57118017 A JP S57118017A JP 569181 A JP569181 A JP 569181A JP 569181 A JP569181 A JP 569181A JP S57118017 A JPS57118017 A JP S57118017A
- Authority
- JP
- Japan
- Prior art keywords
- sihcl
- hcl
- sicl
- metallic
- mixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To manufacture SiHCl3 in a high yield of starting materials by passing a mixed reactive gas through a metallic Si layer to convert contained harmful HCl into SiHCl3 when SiHCl3 is manufactured by using SiCl4 and H2.
CONSTITUTION: SiCl4 is mixed with H2 in 4:1W1:10 molar ratio and introduced into the 1st reactor B, and by electrifying a graphite resistance 1, the interior of the reactor B is heated to 500W1,300°C to produce SiHCl3 as well as to produce HCl as a by-product in the presence of catalyst 9. This mixed gas contg. the residual unreacted SiCl4 and H2 is introduced into the 2nd reactorI, and while cooling the gas to 200W700°C with a cooling pipe 10 and passing it through a fixed metallic Si bed 6, the HCl is converted into SiHCl3 by a reaction with the metallic Si. The resulting mixed gas of H2, SiCl4 and SiHCl3 is taken out of the exhaust port 7, and the SiHCl3 is separated and collected. Since HCl is not contained, an HCl separator is unnecessary, and HCl is converted into SiHCl3 by a reaction with Si to increase the production of SiHCl3.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP569181A JPS57118017A (en) | 1981-01-16 | 1981-01-16 | Manufacture of trichlorosilane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP569181A JPS57118017A (en) | 1981-01-16 | 1981-01-16 | Manufacture of trichlorosilane |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57118017A true JPS57118017A (en) | 1982-07-22 |
Family
ID=11618118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP569181A Pending JPS57118017A (en) | 1981-01-16 | 1981-01-16 | Manufacture of trichlorosilane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57118017A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57156318A (en) * | 1981-03-16 | 1982-09-27 | Koujiyundo Silicon Kk | Production of trichlorosilane |
US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
WO2005102928A1 (en) * | 2004-04-23 | 2005-11-03 | Degussa Ag | METHOD FOR THE PRODUCTION OF HSiCl3 BY CATALYTIC HYDRODEHALOGENATION OF SiCl4 |
EP2233195A1 (en) * | 2009-03-27 | 2010-09-29 | Meridionale Impianti S.p.A. | System and method for recovering hydrogen from exhausted gas of epitaxial processes and other industrial processes |
JP2013500928A (en) * | 2009-08-04 | 2013-01-10 | シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Equipment and method for producing trichlorosilane |
CN104310406A (en) * | 2014-10-11 | 2015-01-28 | 江西赛维Ldk太阳能多晶硅有限公司 | Recovery device and recovery method for trichlorosilane synthetic tail gas |
-
1981
- 1981-01-16 JP JP569181A patent/JPS57118017A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57156318A (en) * | 1981-03-16 | 1982-09-27 | Koujiyundo Silicon Kk | Production of trichlorosilane |
JPH0222004B2 (en) * | 1981-03-16 | 1990-05-17 | Kojundo Shirikon Kk | |
US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
WO2005102928A1 (en) * | 2004-04-23 | 2005-11-03 | Degussa Ag | METHOD FOR THE PRODUCTION OF HSiCl3 BY CATALYTIC HYDRODEHALOGENATION OF SiCl4 |
JP2007533585A (en) * | 2004-04-23 | 2007-11-22 | デグサ ゲーエムベーハー | Method for producing HSiCl3 by catalytic dehydrohalogenation of SiCl4 |
US8697021B2 (en) | 2004-04-23 | 2014-04-15 | Evonik Degussa Gmbh | Method for the production of HSiCl3 by catalytic hydrodehalogenation of SiCl4 |
EP2233195A1 (en) * | 2009-03-27 | 2010-09-29 | Meridionale Impianti S.p.A. | System and method for recovering hydrogen from exhausted gas of epitaxial processes and other industrial processes |
JP2013500928A (en) * | 2009-08-04 | 2013-01-10 | シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Equipment and method for producing trichlorosilane |
CN104310406A (en) * | 2014-10-11 | 2015-01-28 | 江西赛维Ldk太阳能多晶硅有限公司 | Recovery device and recovery method for trichlorosilane synthetic tail gas |
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