JPS57118017A - Manufacture of trichlorosilane - Google Patents

Manufacture of trichlorosilane

Info

Publication number
JPS57118017A
JPS57118017A JP569181A JP569181A JPS57118017A JP S57118017 A JPS57118017 A JP S57118017A JP 569181 A JP569181 A JP 569181A JP 569181 A JP569181 A JP 569181A JP S57118017 A JPS57118017 A JP S57118017A
Authority
JP
Japan
Prior art keywords
sihcl
hcl
sicl
metallic
mixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP569181A
Other languages
Japanese (ja)
Inventor
Hideo Ito
Mitsutoshi Ubukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KOUJIYUNDO SILICON KK
KOUJIYUNDO SILICONE KK
Original Assignee
KOUJIYUNDO SILICON KK
KOUJIYUNDO SILICONE KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KOUJIYUNDO SILICON KK, KOUJIYUNDO SILICONE KK filed Critical KOUJIYUNDO SILICON KK
Priority to JP569181A priority Critical patent/JPS57118017A/en
Publication of JPS57118017A publication Critical patent/JPS57118017A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To manufacture SiHCl3 in a high yield of starting materials by passing a mixed reactive gas through a metallic Si layer to convert contained harmful HCl into SiHCl3 when SiHCl3 is manufactured by using SiCl4 and H2.
CONSTITUTION: SiCl4 is mixed with H2 in 4:1W1:10 molar ratio and introduced into the 1st reactor B, and by electrifying a graphite resistance 1, the interior of the reactor B is heated to 500W1,300°C to produce SiHCl3 as well as to produce HCl as a by-product in the presence of catalyst 9. This mixed gas contg. the residual unreacted SiCl4 and H2 is introduced into the 2nd reactorI, and while cooling the gas to 200W700°C with a cooling pipe 10 and passing it through a fixed metallic Si bed 6, the HCl is converted into SiHCl3 by a reaction with the metallic Si. The resulting mixed gas of H2, SiCl4 and SiHCl3 is taken out of the exhaust port 7, and the SiHCl3 is separated and collected. Since HCl is not contained, an HCl separator is unnecessary, and HCl is converted into SiHCl3 by a reaction with Si to increase the production of SiHCl3.
COPYRIGHT: (C)1982,JPO&Japio
JP569181A 1981-01-16 1981-01-16 Manufacture of trichlorosilane Pending JPS57118017A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP569181A JPS57118017A (en) 1981-01-16 1981-01-16 Manufacture of trichlorosilane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP569181A JPS57118017A (en) 1981-01-16 1981-01-16 Manufacture of trichlorosilane

Publications (1)

Publication Number Publication Date
JPS57118017A true JPS57118017A (en) 1982-07-22

Family

ID=11618118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP569181A Pending JPS57118017A (en) 1981-01-16 1981-01-16 Manufacture of trichlorosilane

Country Status (1)

Country Link
JP (1) JPS57118017A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57156318A (en) * 1981-03-16 1982-09-27 Koujiyundo Silicon Kk Production of trichlorosilane
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
WO2005102928A1 (en) * 2004-04-23 2005-11-03 Degussa Ag METHOD FOR THE PRODUCTION OF HSiCl3 BY CATALYTIC HYDRODEHALOGENATION OF SiCl4
EP2233195A1 (en) * 2009-03-27 2010-09-29 Meridionale Impianti S.p.A. System and method for recovering hydrogen from exhausted gas of epitaxial processes and other industrial processes
JP2013500928A (en) * 2009-08-04 2013-01-10 シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング Equipment and method for producing trichlorosilane
CN104310406A (en) * 2014-10-11 2015-01-28 江西赛维Ldk太阳能多晶硅有限公司 Recovery device and recovery method for trichlorosilane synthetic tail gas

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57156318A (en) * 1981-03-16 1982-09-27 Koujiyundo Silicon Kk Production of trichlorosilane
JPH0222004B2 (en) * 1981-03-16 1990-05-17 Kojundo Shirikon Kk
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
WO2005102928A1 (en) * 2004-04-23 2005-11-03 Degussa Ag METHOD FOR THE PRODUCTION OF HSiCl3 BY CATALYTIC HYDRODEHALOGENATION OF SiCl4
JP2007533585A (en) * 2004-04-23 2007-11-22 デグサ ゲーエムベーハー Method for producing HSiCl3 by catalytic dehydrohalogenation of SiCl4
US8697021B2 (en) 2004-04-23 2014-04-15 Evonik Degussa Gmbh Method for the production of HSiCl3 by catalytic hydrodehalogenation of SiCl4
EP2233195A1 (en) * 2009-03-27 2010-09-29 Meridionale Impianti S.p.A. System and method for recovering hydrogen from exhausted gas of epitaxial processes and other industrial processes
JP2013500928A (en) * 2009-08-04 2013-01-10 シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング Equipment and method for producing trichlorosilane
CN104310406A (en) * 2014-10-11 2015-01-28 江西赛维Ldk太阳能多晶硅有限公司 Recovery device and recovery method for trichlorosilane synthetic tail gas

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