JPS5673617A - Manufacture of trichlorosilane - Google Patents
Manufacture of trichlorosilaneInfo
- Publication number
- JPS5673617A JPS5673617A JP14923879A JP14923879A JPS5673617A JP S5673617 A JPS5673617 A JP S5673617A JP 14923879 A JP14923879 A JP 14923879A JP 14923879 A JP14923879 A JP 14923879A JP S5673617 A JPS5673617 A JP S5673617A
- Authority
- JP
- Japan
- Prior art keywords
- trichlorosilane
- furnace
- hydrogen
- fed
- hydrogen chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Silicon Compounds (AREA)
Abstract
PURPOSE: To efficiently manufacture trichlorosilane by simultaneously carrying out the synthesis of trichlorosilane and the conversion of by-product silicon tetrachloride into trichlorosilane by hydrogenation in the same reactor.
CONSTITUTION: Metallic silicon contg. copper dust is filled into trichlorosilane manufacturing furnace 1 and heated to about 500°C, and it is supplied by a predetermined amount each time. Hydrogen chloride, hydrogen and silicon tetrachloride are fed into furnace 1 through evaporator 7 in a predetermined ratio to cause continuous reaction. The gaseous reaction product is passed through condensation separator 2 of about -70W-80°C to condense SiHCl3 and SiCl4, and they enter distillation purifying process 4. The uncondensed gas is fed to condensation separator 3 of about -150W-180°C to liquefy hydrogen chloride, and hydrogen gas passes through separator 3. The recovered hydrogen chloride, hydrogen gas and SiCl4 are used in furnace 1 again. On the other hand, the SiHCl3 is fed to polycrystalline silicon depositing furnace 9 through evaporator 8 together with hydrogen gas to manufacture polycrystalline silicon.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14923879A JPS5673617A (en) | 1979-11-17 | 1979-11-17 | Manufacture of trichlorosilane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14923879A JPS5673617A (en) | 1979-11-17 | 1979-11-17 | Manufacture of trichlorosilane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5673617A true JPS5673617A (en) | 1981-06-18 |
JPS6259051B2 JPS6259051B2 (en) | 1987-12-09 |
Family
ID=15470895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14923879A Granted JPS5673617A (en) | 1979-11-17 | 1979-11-17 | Manufacture of trichlorosilane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5673617A (en) |
Cited By (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
WO2002048034A1 (en) * | 2000-12-11 | 2002-06-20 | Solarworld Aktiengesellschaft | Method for the production of high purity silicon |
WO2002048024A3 (en) * | 2000-12-14 | 2003-03-27 | Solarworld Ag | Method for producing trichlorosilane |
JP2008303142A (en) * | 2001-06-08 | 2008-12-18 | Hemlock Semiconductor Corp | Process for producing polycrystalline silicon |
WO2010116500A1 (en) * | 2009-04-08 | 2010-10-14 | 電気化学工業株式会社 | Trichlorosilane cooling tower and trichlorosilane manufacturing method using the same |
WO2011102265A1 (en) | 2010-02-18 | 2011-08-25 | 株式会社トクヤマ | Production method for trichlorosilane |
WO2011111335A1 (en) | 2010-03-10 | 2011-09-15 | 信越化学工業株式会社 | Method for producing trichlorosilane |
JP2012144427A (en) * | 2011-01-07 | 2012-08-02 | Mitsubishi Materials Corp | Apparatus and method for producing polycrystalline silicon having reduced amount of boron compound by venting system with inert gas |
JP2013535399A (en) * | 2010-08-13 | 2013-09-12 | エルケム アクシエセルスカプ | Method for producing trichlorosilane and silicon for the production of trichlorosilane |
JP2013193941A (en) * | 2012-03-22 | 2013-09-30 | Osaka Titanium Technologies Co Ltd | Method and apparatus for manufacturing chlorosilanes |
WO2013187070A1 (en) | 2012-06-14 | 2013-12-19 | 信越化学工業株式会社 | Method for producing high-purity polycrystalline silicon |
WO2014125762A1 (en) | 2013-02-13 | 2014-08-21 | 信越化学工業株式会社 | Method for producing trichlorosilane |
WO2015047043A1 (en) | 2013-09-30 | 2015-04-02 | 주식회사 엘지화학 | Method for producing trichlorosilane |
KR20150037681A (en) | 2013-09-30 | 2015-04-08 | 주식회사 엘지화학 | Process for producing trichlorosilane |
WO2015111885A1 (en) | 2014-01-23 | 2015-07-30 | 한국화학연구원 | Method for surface-modifying metal silicide, and method and apparatus for preparing trichlorosilane using surface-modified metal silicide |
KR20160069380A (en) | 2014-12-08 | 2016-06-16 | 주식회사 엘지화학 | Dispersion of silicon metal powder and process for producing chlorosilane using same |
KR20160069371A (en) | 2014-12-08 | 2016-06-16 | 주식회사 엘지화학 | Dispersion of silicon metal powder and process for producing chlorosilane using same |
KR20160102807A (en) | 2015-02-23 | 2016-08-31 | 주식회사 엘지화학 | Dispersion of silicon metal powder and process for producing chlorosilane using same |
KR20160144609A (en) | 2015-06-09 | 2016-12-19 | 주식회사 엘지화학 | Dispersion of silicon metal powder and process for producing chlorosilane using same |
KR20170001411A (en) | 2015-06-26 | 2017-01-04 | 주식회사 엘지화학 | Apparatus and process for producing trichlorosilane |
KR20170001465A (en) | 2015-06-26 | 2017-01-04 | 주식회사 엘지화학 | Apparatus and process for producing trichlorosilane |
CN106470943A (en) * | 2014-05-13 | 2017-03-01 | 株式会社Lg化学 | The method preparing chlorosilane gas using continuous tubular reactor |
KR20170027824A (en) | 2014-07-10 | 2017-03-10 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Method for purifying chlorosilane |
KR20170031878A (en) | 2015-09-14 | 2017-03-22 | 주식회사 엘지화학 | Apparatus and process for producing trichlorosilane |
KR20170032553A (en) | 2015-09-15 | 2017-03-23 | 주식회사 엘지화학 | Process for producing trichlorosilane |
US10065864B2 (en) | 2014-07-22 | 2018-09-04 | Hanwha Chemical Corporation | Method of preparing trichlorosilan |
DE112022004239T5 (en) | 2021-11-01 | 2024-06-27 | Tokuyama Corporation | Process for producing trichlorosilane and process for producing polycrystalline silicon rod |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101143723B (en) * | 2007-08-08 | 2010-09-01 | 徐州东南多晶硅材料研发有限公司 | Modified method and device for preparing trichlorosilane and multicrystal silicon |
CN103723734B (en) * | 2012-10-10 | 2015-09-09 | 浙江昱辉阳光能源有限公司 | A kind of technique preparing trichlorosilane |
CN110655086A (en) * | 2019-11-12 | 2020-01-07 | 唐山三孚硅业股份有限公司 | Method for improving silicon tetrachloride conversion rate in trichlorosilane production process |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3148035A (en) * | 1960-03-10 | 1964-09-08 | Wacker Chemie Gmbh | Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride |
JPS52133022A (en) * | 1976-04-30 | 1977-11-08 | Mitsubishi Metal Corp | Production of high purity silicon |
JPS5433896A (en) * | 1977-06-13 | 1979-03-12 | Texas Instruments Inc | Conversion of silicon tetrahalide into triholosilane |
-
1979
- 1979-11-17 JP JP14923879A patent/JPS5673617A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3148035A (en) * | 1960-03-10 | 1964-09-08 | Wacker Chemie Gmbh | Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride |
JPS52133022A (en) * | 1976-04-30 | 1977-11-08 | Mitsubishi Metal Corp | Production of high purity silicon |
JPS5433896A (en) * | 1977-06-13 | 1979-03-12 | Texas Instruments Inc | Conversion of silicon tetrahalide into triholosilane |
Cited By (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
WO2002048034A1 (en) * | 2000-12-11 | 2002-06-20 | Solarworld Aktiengesellschaft | Method for the production of high purity silicon |
DE10061682A1 (en) * | 2000-12-11 | 2002-07-04 | Solarworld Ag | Process for the production of high-purity silicon |
US6887448B2 (en) | 2000-12-11 | 2005-05-03 | Solarworld Ag | Method for production of high purity silicon |
WO2002048024A3 (en) * | 2000-12-14 | 2003-03-27 | Solarworld Ag | Method for producing trichlorosilane |
JP2008303142A (en) * | 2001-06-08 | 2008-12-18 | Hemlock Semiconductor Corp | Process for producing polycrystalline silicon |
WO2010116500A1 (en) * | 2009-04-08 | 2010-10-14 | 電気化学工業株式会社 | Trichlorosilane cooling tower and trichlorosilane manufacturing method using the same |
JPWO2010116500A1 (en) * | 2009-04-08 | 2012-10-11 | 電気化学工業株式会社 | Trichlorosilane cooling tower and method for producing trichlorosilane using the same |
EP2537803A4 (en) * | 2010-02-18 | 2016-10-19 | Tokuyama Corp | Production method for trichlorosilane |
US9321653B2 (en) | 2010-02-18 | 2016-04-26 | Tokuyama Corporation | Process for producing trichlorosilane |
WO2011102265A1 (en) | 2010-02-18 | 2011-08-25 | 株式会社トクヤマ | Production method for trichlorosilane |
KR20130008529A (en) | 2010-02-18 | 2013-01-22 | 가부시끼가이샤 도꾸야마 | Production method for trichlorosilane |
US9266742B2 (en) | 2010-03-10 | 2016-02-23 | Shin-Etsu Chemical Co., Ltd. | Method for producing trichlorosilane |
WO2011111335A1 (en) | 2010-03-10 | 2011-09-15 | 信越化学工業株式会社 | Method for producing trichlorosilane |
JP2013535399A (en) * | 2010-08-13 | 2013-09-12 | エルケム アクシエセルスカプ | Method for producing trichlorosilane and silicon for the production of trichlorosilane |
JP2012144427A (en) * | 2011-01-07 | 2012-08-02 | Mitsubishi Materials Corp | Apparatus and method for producing polycrystalline silicon having reduced amount of boron compound by venting system with inert gas |
JP2013193941A (en) * | 2012-03-22 | 2013-09-30 | Osaka Titanium Technologies Co Ltd | Method and apparatus for manufacturing chlorosilanes |
WO2013187070A1 (en) | 2012-06-14 | 2013-12-19 | 信越化学工業株式会社 | Method for producing high-purity polycrystalline silicon |
US9355918B2 (en) | 2012-06-14 | 2016-05-31 | Shin-Etsu Chemical Co., Ltd. | Method for producing high-purity polycrystalline silicon |
EP3170791A1 (en) | 2012-06-14 | 2017-05-24 | Shin-Etsu Chemical Co., Ltd. | Method for producing high-purity polycrystalline silicon |
WO2014125762A1 (en) | 2013-02-13 | 2014-08-21 | 信越化学工業株式会社 | Method for producing trichlorosilane |
WO2015047043A1 (en) | 2013-09-30 | 2015-04-02 | 주식회사 엘지화학 | Method for producing trichlorosilane |
KR20150037681A (en) | 2013-09-30 | 2015-04-08 | 주식회사 엘지화학 | Process for producing trichlorosilane |
US9643851B2 (en) | 2013-09-30 | 2017-05-09 | Lg Chem, Ltd. | Method for producing trichlorosilane |
WO2015111885A1 (en) | 2014-01-23 | 2015-07-30 | 한국화학연구원 | Method for surface-modifying metal silicide, and method and apparatus for preparing trichlorosilane using surface-modified metal silicide |
US10301182B2 (en) | 2014-05-13 | 2019-05-28 | Lg Chem, Ltd. | Method for producing chlorosilane gas using continuous tubular reactor |
CN106470943A (en) * | 2014-05-13 | 2017-03-01 | 株式会社Lg化学 | The method preparing chlorosilane gas using continuous tubular reactor |
KR20170027824A (en) | 2014-07-10 | 2017-03-10 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Method for purifying chlorosilane |
US10065864B2 (en) | 2014-07-22 | 2018-09-04 | Hanwha Chemical Corporation | Method of preparing trichlorosilan |
KR20160069371A (en) | 2014-12-08 | 2016-06-16 | 주식회사 엘지화학 | Dispersion of silicon metal powder and process for producing chlorosilane using same |
KR20160069380A (en) | 2014-12-08 | 2016-06-16 | 주식회사 엘지화학 | Dispersion of silicon metal powder and process for producing chlorosilane using same |
KR20160102807A (en) | 2015-02-23 | 2016-08-31 | 주식회사 엘지화학 | Dispersion of silicon metal powder and process for producing chlorosilane using same |
KR20160144609A (en) | 2015-06-09 | 2016-12-19 | 주식회사 엘지화학 | Dispersion of silicon metal powder and process for producing chlorosilane using same |
KR20170001465A (en) | 2015-06-26 | 2017-01-04 | 주식회사 엘지화학 | Apparatus and process for producing trichlorosilane |
KR20170001411A (en) | 2015-06-26 | 2017-01-04 | 주식회사 엘지화학 | Apparatus and process for producing trichlorosilane |
KR20170031878A (en) | 2015-09-14 | 2017-03-22 | 주식회사 엘지화학 | Apparatus and process for producing trichlorosilane |
KR20170032553A (en) | 2015-09-15 | 2017-03-23 | 주식회사 엘지화학 | Process for producing trichlorosilane |
DE112022004239T5 (en) | 2021-11-01 | 2024-06-27 | Tokuyama Corporation | Process for producing trichlorosilane and process for producing polycrystalline silicon rod |
Also Published As
Publication number | Publication date |
---|---|
JPS6259051B2 (en) | 1987-12-09 |
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