AU2001263809A1 - Method and facility for producing silane - Google Patents

Method and facility for producing silane

Info

Publication number
AU2001263809A1
AU2001263809A1 AU2001263809A AU6380901A AU2001263809A1 AU 2001263809 A1 AU2001263809 A1 AU 2001263809A1 AU 2001263809 A AU2001263809 A AU 2001263809A AU 6380901 A AU6380901 A AU 6380901A AU 2001263809 A1 AU2001263809 A1 AU 2001263809A1
Authority
AU
Australia
Prior art keywords
sih4
reaction
product mixture
facility
mixture containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001263809A
Inventor
Dr. Hans-Dieter Block
Hans-Joachim Leimkuhler
Dirk Muller
Georg Ronge
Johannes-Peter Schafer
Ulrike Strauss
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SolarWorld AG
Original Assignee
Bayer AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer AG filed Critical Bayer AG
Publication of AU2001263809A1 publication Critical patent/AU2001263809A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/04—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds
    • B01J8/0496—Heating or cooling the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/04—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds
    • B01J8/0446—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical
    • B01J8/0449—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical beds
    • B01J8/0453—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical beds the beds being superimposed one above the other
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C01B33/043—Monosilane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00168—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles
    • B01J2208/00203—Coils
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00168—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles
    • B01J2208/00256—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles in a heat exchanger for the heat exchange medium separate from the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00265—Part of all of the reactants being heated or cooled outside the reactor while recycling
    • B01J2208/00274—Part of all of the reactants being heated or cooled outside the reactor while recycling involving reactant vapours
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00002—Chemical plants
    • B01J2219/00004—Scale aspects
    • B01J2219/00006—Large-scale industrial plants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

In the continuous production of silane SiH4 by catalytic disproportionation of trichlorosilane SiHCl3 to SiH4 and silicon tetrachloride SiCl4, disproportionation is carried out in not less than 2 reaction/distillation zones containing solid catalyst at 500 mbar to 50 bar; the lighter product mixture containing SiH4 produced in the first zone is condensed at -40 to 50[deg]C; and the uncondensed product mixture containing SiH4 is passed into other reaction/distillation zone(s). An independent claim is also included for the plant used in this process.
AU2001263809A 2000-04-07 2001-03-26 Method and facility for producing silane Abandoned AU2001263809A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10017168A DE10017168A1 (en) 2000-04-07 2000-04-07 Continuous production of silane, useful in production of silicon for semiconductors, involves catalytic disproportionation of trichlorosilane over solid catalyst in 2 or more zones with intermediate condensation
DE10017168 2000-04-07
PCT/EP2001/003393 WO2001077017A1 (en) 2000-04-07 2001-03-26 Method and facility for producing silane

Publications (1)

Publication Number Publication Date
AU2001263809A1 true AU2001263809A1 (en) 2001-10-23

Family

ID=7637815

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001263809A Abandoned AU2001263809A1 (en) 2000-04-07 2001-03-26 Method and facility for producing silane

Country Status (8)

Country Link
US (1) US6942844B2 (en)
EP (1) EP1268343B1 (en)
JP (1) JP2003530290A (en)
AT (1) ATE285377T1 (en)
AU (1) AU2001263809A1 (en)
DE (2) DE10017168A1 (en)
UA (1) UA72597C2 (en)
WO (1) WO2001077017A1 (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10153795A1 (en) * 2001-10-31 2003-05-22 Degussa Production of 3-functionalized organosilanes, e.g. trichloro(3-chloropropyl)silane, from allyl compound and (un)substituted silane in presence of heterogeneous platinum catalyst, is carried out in reaction column
US20050054211A1 (en) * 2003-09-04 2005-03-10 Mindi Xu Purification of silicon-containing materials
DE102004045245B4 (en) * 2004-09-17 2007-11-15 Degussa Gmbh Apparatus and process for the production of silanes
DE102005046105B3 (en) 2005-09-27 2007-04-26 Degussa Gmbh Process for the preparation of monosilane
JP5419456B2 (en) * 2006-09-27 2014-02-19 電気化学工業株式会社 Continuous production method of monosilane
DE102007059170A1 (en) * 2007-12-06 2009-06-10 Evonik Degussa Gmbh Catalyst and process for dismutating hydrogen halosilanes
JP5316290B2 (en) 2008-08-05 2013-10-16 三菱マテリアル株式会社 Trichlorosilane production apparatus and production method
ES2350559B1 (en) * 2009-05-28 2011-11-18 Centro De Tecnologia Del Silicio Solar, S.L. (Centesil) PROCEDURE FOR THE USE OF LIGHT WASTE IN A HIGH PURITY SILICON PRODUCTION PLANT.
DE102009032833A1 (en) 2009-07-08 2011-01-13 Schmid Silicon Technology Gmbh Process and plant for the production of monosilane
DE102009037154B3 (en) * 2009-08-04 2010-12-09 Schmid Silicon Technology Gmbh Process for the preparation of monosilane
US8298490B2 (en) * 2009-11-06 2012-10-30 Gtat Corporation Systems and methods of producing trichlorosilane
EP2426088A1 (en) * 2010-09-03 2012-03-07 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process for producing monosilane from dichlorosilane
US8524044B2 (en) * 2010-10-05 2013-09-03 Memc Electronic Materials, Inc. Systems for recovering silane from heavy-ends separation operations
US8524048B2 (en) * 2010-10-05 2013-09-03 Memc Electronic Materials, Inc. Processes for recovering silane from heavy-ends separation operations
US8524045B2 (en) * 2010-10-05 2013-09-03 Memc Electronic Materials, Inc. Systems for purifying silane
DE102010043649A1 (en) 2010-11-09 2012-05-10 Evonik Degussa Gmbh Process for cleaving higher silanes
DE102010043648A1 (en) 2010-11-09 2012-05-10 Evonik Degussa Gmbh Process for the selective cleavage of higher silanes
US8715597B2 (en) 2010-12-20 2014-05-06 Memc Electronic Materials, Inc. Production of polycrystalline silicon in substantially closed-loop systems that involve disproportionation operations
RU2457178C1 (en) * 2011-01-11 2012-07-27 ФГУП "Российский научный центр "Прикладная химия" Method of producing high-purity monosilane and silicon tetrachloride
DE102011004058A1 (en) 2011-02-14 2012-08-16 Evonik Degussa Gmbh Monochlorosilane, process and apparatus for its preparation
CN103648980B (en) * 2011-06-28 2017-10-13 Memc电子材料有限公司 The method that silane is prepared in bubble column
WO2013101431A1 (en) 2011-12-30 2013-07-04 Memc Electronic Materials, Inc. Processes and systems for purifying silane
CN102951646A (en) * 2012-11-22 2013-03-06 覃攀 Production method of silane
CN103172071B (en) * 2013-03-27 2015-06-03 天津大学 Device and method for preparing high-purity silane through disproportionation reactive distillation of trichlorosilane
CN103214508B (en) * 2013-03-28 2015-09-23 青岛科技大学 The dechlorination method of hydrolyzate in organochlorosilane Concentrated acid hydrolysis process
US9352971B2 (en) 2013-06-14 2016-05-31 Rec Silicon Inc Method and apparatus for production of silane and hydrohalosilanes
CN103979544B (en) * 2013-12-13 2017-10-17 江苏中能硅业科技发展有限公司 The method that silane and trichlorosilane are produced using reactive distillation
DE102015203618A1 (en) 2015-02-27 2016-09-01 Schmid Silicon Technology Gmbh Column and process for the disproportionation of chlorosilanes to monosilane and tetrachlorosilane and plant for the production of monosilane
CN104925813B (en) * 2015-05-18 2017-12-01 中国化学赛鼎宁波工程有限公司 A kind of device and method thereof of preparing silane with trichlorosilane
CN107311183A (en) * 2017-08-31 2017-11-03 许文 A kind of method and device of hydrogen plasma method synthesizing silane
CN110694293A (en) * 2019-10-30 2020-01-17 新疆东方希望新能源有限公司 Reaction rectifying tower for recovering DCS through side line extraction
CN113797568B (en) * 2021-08-20 2022-12-23 洛阳中硅高科技有限公司 Synthesis device and synthesis method of electronic grade tri (dimethylamino) silane

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA988275A (en) 1970-12-17 1976-05-04 Carl J. Litteral Disproportionation of chlorosilicon hydrides
US3968199A (en) 1974-02-25 1976-07-06 Union Carbide Corporation Process for making silane
US4676967A (en) 1978-08-23 1987-06-30 Union Carbide Corporation High purity silane and silicon production
US4340574A (en) * 1980-08-28 1982-07-20 Union Carbide Corporation Process for the production of ultrahigh purity silane with recycle from separation columns
FR2503125A1 (en) 1981-04-03 1982-10-08 Rhone Poulenc Spec Chim PROCESS FOR PRODUCING SILANE
FR2526003A1 (en) 1982-05-03 1983-11-04 Rhone Poulenc Spec Chim PROCESS FOR PRODUCING SILANE FROM TRICHLOROSILANE
JPS60145907A (en) 1984-01-11 1985-08-01 Denki Kagaku Kogyo Kk Continuous production of silane compound
US4701430A (en) * 1984-05-17 1987-10-20 Korea Advance Institute Of Science & Technology Hydrogenation catalyst and methods for its preparation and use to convert silicon tetrachloride to chlorosilane and silane
JPS61191513A (en) * 1985-02-19 1986-08-26 Denki Kagaku Kogyo Kk Continuous production of silane compounds
DE3711444A1 (en) * 1987-04-04 1988-10-13 Huels Troisdorf METHOD AND DEVICE FOR PRODUCING DICHLORSILANE
JP2648615B2 (en) 1988-06-14 1997-09-03 三井東圧化学株式会社 Simple production method of monosilane

Also Published As

Publication number Publication date
ATE285377T1 (en) 2005-01-15
US20040091412A1 (en) 2004-05-13
UA72597C2 (en) 2005-03-15
DE50104884D1 (en) 2005-01-27
US6942844B2 (en) 2005-09-13
WO2001077017A1 (en) 2001-10-18
EP1268343B1 (en) 2004-12-22
JP2003530290A (en) 2003-10-14
EP1268343A1 (en) 2003-01-02
DE10017168A1 (en) 2001-10-11

Similar Documents

Publication Publication Date Title
AU2001263809A1 (en) Method and facility for producing silane
JP5374091B2 (en) Method for producing polycrystalline silicon
US7033561B2 (en) Process for preparation of polycrystalline silicon
AU2002215050A1 (en) Method for the production of high purity silicon
JP5337749B2 (en) Method for producing trichlorosilane
US4117094A (en) Process for silicon and trichlorosilane production
AU3038600A (en) Method and system for producing silane
EP2070871B1 (en) Process for production of multicrystal silicon and facility for production of multicrystal silicon
JP2002533293A5 (en)
CA2316180A1 (en) Production process and apparatus for high purity silicon
US4321246A (en) Polycrystalline silicon production
EP2036859B1 (en) Method for producing polycrystalline silicon
JP3241695B2 (en) Method for producing hydromethylpolysiloxane having trimethylsilyl end groups
WO2002048024A3 (en) Method for producing trichlorosilane
MY117301A (en) One-step process for converting high-boiling residue from direct process to monosilanes
US3704104A (en) Process for the production of trichlorosilane
US10207932B2 (en) Trichlorosilane purification system and method for producing polycrystalline silicon
AU4084001A (en) Process for the preparation of propane-1,3-diol by vapor phase hydrogenation of 3-hydroxypropanal, beta-propiolactone, oligomers of beta-propiolactone, esters of 3-hydroxypropanoic acid or mixtures thereof
US3346349A (en) Disproportionation of siliconhalides
WO1985004389A1 (en) Process for the hydrogenation of silicon tetrachloride
US5869017A (en) Method of producing trichlorosilane having a reduced content of dichlorosilane
JP2795086B2 (en) Method for producing dimethylchlorosilane
CN113912066A (en) Method for preparing chlorosilane
JPH10101320A (en) Production of silicon trichloride
JPS6483504A (en) Production of ultrafine silicon nitride powder