JPS57156318A - Production of trichlorosilane - Google Patents

Production of trichlorosilane

Info

Publication number
JPS57156318A
JPS57156318A JP3749181A JP3749181A JPS57156318A JP S57156318 A JPS57156318 A JP S57156318A JP 3749181 A JP3749181 A JP 3749181A JP 3749181 A JP3749181 A JP 3749181A JP S57156318 A JPS57156318 A JP S57156318A
Authority
JP
Japan
Prior art keywords
gas
sihcl
hcl
mixture
sicl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3749181A
Other languages
Japanese (ja)
Other versions
JPH0222004B2 (en
Inventor
Hideo Ito
Mitsutoshi Ubukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KOUJIYUNDO SILICON KK
KOUJIYUNDO SILICONE KK
Original Assignee
KOUJIYUNDO SILICON KK
KOUJIYUNDO SILICONE KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KOUJIYUNDO SILICON KK, KOUJIYUNDO SILICONE KK filed Critical KOUJIYUNDO SILICON KK
Priority to JP3749181A priority Critical patent/JPS57156318A/en
Publication of JPS57156318A publication Critical patent/JPS57156318A/en
Publication of JPH0222004B2 publication Critical patent/JPH0222004B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)

Abstract

PURPOSE: The starting gas, a mixture of SiCl4 and H2 at a specific ratio, is allowed to react at a certain temperature and HCl gas, as a by-product, is made to react with metallic silicon at a prescribed temperature to make the gas after the reaction free from HCl and increase the yield of SiHCl3.
CONSTITUTION: The starting gas mixture of 4/1W1/40 SiCl4:H2 in moles is introduced into the first reactor where the reaction is effected at 500W1,300°C. Then, SiHCl3, HCl, and remaining SiCl4 and H2 mixture gas is introduced into the second furnace where the gas is heated 200W700°C in the presence of metallic Si to convert HCl into SiHCl3. Finally, SiHCl3 is separated from the reaction mixture gas.
COPYRIGHT: (C)1982,JPO&Japio
JP3749181A 1981-03-16 1981-03-16 Production of trichlorosilane Granted JPS57156318A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3749181A JPS57156318A (en) 1981-03-16 1981-03-16 Production of trichlorosilane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3749181A JPS57156318A (en) 1981-03-16 1981-03-16 Production of trichlorosilane

Publications (2)

Publication Number Publication Date
JPS57156318A true JPS57156318A (en) 1982-09-27
JPH0222004B2 JPH0222004B2 (en) 1990-05-17

Family

ID=12498986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3749181A Granted JPS57156318A (en) 1981-03-16 1981-03-16 Production of trichlorosilane

Country Status (1)

Country Link
JP (1) JPS57156318A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
US4836997A (en) * 1982-07-26 1989-06-06 Rhone-Poulenc Specialites Chimiques Plasma production of trichorosilane, SiHCl3
US4980143A (en) * 1988-08-20 1990-12-25 Huels Aktiengesellschaft Process for increasing the percentage of silicon tetrachloride
US6932954B2 (en) 2001-10-19 2005-08-23 Tokuyama Corporation Method for producing silicon
WO2008053750A1 (en) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Trichlorosilane production apparatus
WO2008053760A1 (en) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Trichlorosilane production apparatus
WO2008053786A1 (en) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Trichlorosilane production apparatus
WO2008053759A1 (en) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Trichlorosilane production apparatus
WO2008056550A1 (en) * 2006-11-07 2008-05-15 Mitsubishi Materials Corporation Process for producing trichlorosilane and trichlorosilane producing apparatus
WO2008146741A1 (en) * 2007-05-25 2008-12-04 Mitsubishi Materials Corporation Process and apparatus for producing trichlorosilane and process for producing polycrystalline silicon
WO2010050241A1 (en) * 2008-10-30 2010-05-06 三菱マテリアル株式会社 Process for production of trichlorosilane and method for use thereof
JP2010105865A (en) * 2008-10-30 2010-05-13 Mitsubishi Materials Corp Method for producing trichlorosilane and method for using thereof
JP2013500928A (en) * 2009-08-04 2013-01-10 シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング Equipment and method for producing trichlorosilane

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118017A (en) * 1981-01-16 1982-07-22 Koujiyundo Silicon Kk Manufacture of trichlorosilane

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118017A (en) * 1981-01-16 1982-07-22 Koujiyundo Silicon Kk Manufacture of trichlorosilane

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4836997A (en) * 1982-07-26 1989-06-06 Rhone-Poulenc Specialites Chimiques Plasma production of trichorosilane, SiHCl3
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
US4980143A (en) * 1988-08-20 1990-12-25 Huels Aktiengesellschaft Process for increasing the percentage of silicon tetrachloride
CN100436315C (en) * 2001-10-19 2008-11-26 株式会社德山 Silicon production process
US6932954B2 (en) 2001-10-19 2005-08-23 Tokuyama Corporation Method for producing silicon
US9416014B2 (en) 2006-10-31 2016-08-16 Mitsubishi Materials Corporation Method for producing trichlorosilane
US9493359B2 (en) 2006-10-31 2016-11-15 Mitsubishi Materials Corporation Apparatus for producing trichlorosilane
WO2008053759A1 (en) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Trichlorosilane production apparatus
US7964155B2 (en) 2006-10-31 2011-06-21 Mitsubishi Materials Corporation Apparatus for producing trichlorosilane
JP2008133170A (en) * 2006-10-31 2008-06-12 Mitsubishi Materials Corp Trichlorosilane production apparatus
EP2000434A4 (en) * 2006-10-31 2011-02-16 Mitsubishi Materials Corp Trichlorosilane production apparatus
WO2008053760A1 (en) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Trichlorosilane production apparatus
WO2008053786A1 (en) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Trichlorosilane production apparatus
EP2000434A2 (en) * 2006-10-31 2008-12-10 Mitsubishi Materials Corporation Trichlorosilane production apparatus
WO2008053750A1 (en) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Trichlorosilane production apparatus
US7998428B2 (en) 2006-10-31 2011-08-16 Mitsubishi Materials Corporation Apparatus for producing trichlorosilane
KR101388323B1 (en) * 2006-11-07 2014-04-22 미쓰비시 마테리알 가부시키가이샤 Process for producing trichlorosilane and trichlorosilane producing apparatus
JP2008137885A (en) * 2006-11-07 2008-06-19 Mitsubishi Materials Corp Method and apparatus for producing trichlorosilane
EP2085359A4 (en) * 2006-11-07 2011-02-23 Mitsubishi Materials Corp Process for producing trichlorosilane and trichlorosilane producing apparatus
WO2008056550A1 (en) * 2006-11-07 2008-05-15 Mitsubishi Materials Corporation Process for producing trichlorosilane and trichlorosilane producing apparatus
JP2009007240A (en) * 2007-05-25 2009-01-15 Mitsubishi Materials Corp Method and apparatus for preparing trichlorosilane and method for preparing polycrystal silicon
EP2154110A4 (en) * 2007-05-25 2015-07-15 Mitsubishi Materials Corp Process and apparatus for producing trichlorosilane and process for producing polycrystalline silicon
WO2008146741A1 (en) * 2007-05-25 2008-12-04 Mitsubishi Materials Corporation Process and apparatus for producing trichlorosilane and process for producing polycrystalline silicon
US9994455B2 (en) 2007-05-25 2018-06-12 Mitsubishi Materials Corporation Apparatus and method for manufacturing trichlorosilane and method for manufacturing polycrystalline silicon
US8168152B2 (en) 2008-10-30 2012-05-01 Mitsubishi Materials Corporation Method for producing trichlorosilane and method for utilizing trichlorosilane
JP2010105865A (en) * 2008-10-30 2010-05-13 Mitsubishi Materials Corp Method for producing trichlorosilane and method for using thereof
WO2010050241A1 (en) * 2008-10-30 2010-05-06 三菱マテリアル株式会社 Process for production of trichlorosilane and method for use thereof
JP2013500928A (en) * 2009-08-04 2013-01-10 シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング Equipment and method for producing trichlorosilane

Also Published As

Publication number Publication date
JPH0222004B2 (en) 1990-05-17

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