JPS57129817A - Manufacture of trichlorosilane - Google Patents
Manufacture of trichlorosilaneInfo
- Publication number
- JPS57129817A JPS57129817A JP1314281A JP1314281A JPS57129817A JP S57129817 A JPS57129817 A JP S57129817A JP 1314281 A JP1314281 A JP 1314281A JP 1314281 A JP1314281 A JP 1314281A JP S57129817 A JPS57129817 A JP S57129817A
- Authority
- JP
- Japan
- Prior art keywords
- gaseous
- reactor
- trichlorosilane
- fed
- separated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To increase the conversion rate of trichlorosilane by packing a fluidized bed reactor with formed wire net bodies and silicon particles, feeding reactive gases to form a fluidized bed, and maintaining the bed at a prescribed temp. to improve the particle-gas contact efficiency.
CONSTITUTION: A fluidized bed reactor 1 is packed with formed wire net bodies 3 as packing and a mixture 4 of metallic silicon particles with catalyst particles. The internal air of the reactor 1 is replaced with gaseous Ar, and the interior of the reactor 1 is maintained at 350W900°C with a heater 2. A gaseous mixture consisting of silicon tetrachloride and hydrogen or of the components and hydrogen chloride is fed into the reactor 1 from the bottom under atmospheric pressure or high pressure to cause a fluidized reaction. The gaseous product is taken out of an upper part of the reactor 1 and fed to a condenser C through a dust collector S. In the condenser C trichlorosilane is separated from gaseous H2 and gaseous HCl by condensation. The condensate is then fed to a rectifier R and separated in to trichlorosilane and silicon tetrachloride. The separated silicon tetrachloride, gaseous H2 and gaseous HCl are utilized in said reaction again.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1314281A JPS57129817A (en) | 1981-01-30 | 1981-01-30 | Manufacture of trichlorosilane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1314281A JPS57129817A (en) | 1981-01-30 | 1981-01-30 | Manufacture of trichlorosilane |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57129817A true JPS57129817A (en) | 1982-08-12 |
Family
ID=11824902
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1314281A Pending JPS57129817A (en) | 1981-01-30 | 1981-01-30 | Manufacture of trichlorosilane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57129817A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4861574A (en) * | 1987-03-23 | 1989-08-29 | Mitsubishi Kinzoku Kabushiki Kaisha | Process for preparing chloropolysilanes |
JP2012507469A (en) * | 2008-11-05 | 2012-03-29 | ロード・リミテッド・エルピー | Apparatus and process for hydrogenation of silicon tetrahalides and silicon to trihalosilanes |
JP2013517207A (en) * | 2010-01-18 | 2013-05-16 | エボニック デグサ ゲーエムベーハー | Flow tube reactor for reacting silicon tetrachloride to obtain trichlorosilane |
EP2825506A4 (en) * | 2012-03-14 | 2015-12-02 | Sitec Gmbh | Trichlorosilane production |
WO2016031362A1 (en) * | 2014-08-28 | 2016-03-03 | 東亞合成株式会社 | Trichlorosilane production method |
CN105435788A (en) * | 2014-06-16 | 2016-03-30 | 新特能源股份有限公司 | Silicon tetrachloride reduction method of dechlorination hydrogenation technology and preparation method of copper-silicon alloy catalyst containing Cu-Si metallic bond |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4847500A (en) * | 1971-10-21 | 1973-07-05 | ||
JPS5060496A (en) * | 1973-09-29 | 1975-05-24 | ||
JPS5273837A (en) * | 1975-12-16 | 1977-06-21 | Mitsubishi Gas Chem Co Inc | Production of aromatic nitriles |
-
1981
- 1981-01-30 JP JP1314281A patent/JPS57129817A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4847500A (en) * | 1971-10-21 | 1973-07-05 | ||
JPS5060496A (en) * | 1973-09-29 | 1975-05-24 | ||
JPS5273837A (en) * | 1975-12-16 | 1977-06-21 | Mitsubishi Gas Chem Co Inc | Production of aromatic nitriles |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4861574A (en) * | 1987-03-23 | 1989-08-29 | Mitsubishi Kinzoku Kabushiki Kaisha | Process for preparing chloropolysilanes |
JP2012507469A (en) * | 2008-11-05 | 2012-03-29 | ロード・リミテッド・エルピー | Apparatus and process for hydrogenation of silicon tetrahalides and silicon to trihalosilanes |
JP2013517207A (en) * | 2010-01-18 | 2013-05-16 | エボニック デグサ ゲーエムベーハー | Flow tube reactor for reacting silicon tetrachloride to obtain trichlorosilane |
EP2825506A4 (en) * | 2012-03-14 | 2015-12-02 | Sitec Gmbh | Trichlorosilane production |
CN105435788A (en) * | 2014-06-16 | 2016-03-30 | 新特能源股份有限公司 | Silicon tetrachloride reduction method of dechlorination hydrogenation technology and preparation method of copper-silicon alloy catalyst containing Cu-Si metallic bond |
WO2016031362A1 (en) * | 2014-08-28 | 2016-03-03 | 東亞合成株式会社 | Trichlorosilane production method |
JPWO2016031362A1 (en) * | 2014-08-28 | 2017-07-13 | 東亞合成株式会社 | Method for producing trichlorosilane |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101143723B (en) | Modified method and device for preparing trichlorosilane and multicrystal silicon | |
JPS5673617A (en) | Manufacture of trichlorosilane | |
JP5632362B2 (en) | Method and system for producing pure silicon | |
US2642339A (en) | Process for oxidizing iron halides to produce iron oxide and chlorine | |
JPS57129817A (en) | Manufacture of trichlorosilane | |
US4981668A (en) | Silicon carbide as a raw material for silicon production | |
JPS57156318A (en) | Production of trichlorosilane | |
CN102390836B (en) | Trichlorosilane synthesis process and equipment | |
CN103449445A (en) | Production device of silicon tetrachloride by use of direct method | |
CN203568858U (en) | Production system for synthesis of silicon tetrachloride | |
US4490344A (en) | Production process of silicon tetrachloride | |
US3979505A (en) | Method for making hydrogen | |
US3928550A (en) | Process for making hydrogen | |
JPS57140312A (en) | Manufacture of trichlorosilane | |
JPS57140311A (en) | Manufacture of trichlorosilane | |
CN203529947U (en) | Silicon powder recovery device for producing silicon tetrachloride by adopting direct method | |
CN202246098U (en) | Trichlorosilane synthesizing equipment | |
JPS5665830A (en) | Removal of ethylene and vinyl chloride from gas flow | |
US4719093A (en) | Process for the cleavage of chlorosiloxanes | |
JPS57118017A (en) | Manufacture of trichlorosilane | |
CN103420382A (en) | Synthetic method and manufacturing system for silicon tetrachloride | |
CN104628005B (en) | A kind of vaporizer, the apparatus and method for producing white carbon | |
CN203451228U (en) | Production device for producing silicon tetrachloride by virtue of direct method | |
JPH02172811A (en) | Production of trichlorosilane | |
JPS5651420A (en) | Hydrogenation of acetylene contained in hydrogen chloride gas, and preparation of 1,2-dichloroethane |