CN104310406A - Recovery device and recovery method for trichlorosilane synthetic tail gas - Google Patents
Recovery device and recovery method for trichlorosilane synthetic tail gas Download PDFInfo
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Abstract
The invention relates to a recovery device for trichlorosilane synthetic tail gas. The device comprises a dedustor, a buffer tank, a compressor, a cooler, a heater, a reactor, a slag storage tank and a recovery tank which are sequentially connected by virtue of a pipeline, wherein trichlorosilane synthetic tail gas enters into the dedustor to be dedusted so as to obtain trichlorosilane mixed gas which enters into the buffer tank to buffer the pressure, then the tail gas enters into a compressor to be compressed and then enters into the cooler to obtain a trichlorosilane liquid and hydrogen mixed gas, and the hydrogen mixed gas enters into the heater to be heated and then enters into the reactor to react to obtain a trichlorosilane mixture, and the mixture enters into the slag storage tank and after impurities are settled, the impurities enter into the recovery tank to be recovered. According to the recovery device for trichlorosilane synthetic tail gas provided by the invention, by arranging the cooler and the reactor, the chlorosilane component and the hydrogen mixed gas in the trichlorosilane synthetic tail gas are cooled and separated and enter into the reactor for chemical reaction to obtain trichlorosilane, so that the trichlorosilane synthetic tail gas which is used as a raw material can be re-used for process production, so that the energy sources are saved, the production cost is lowered, and the environment is protected.
Description
Technical field
The present invention relates to production technique tail gas recycle field, particularly relate to a kind of retrieving arrangement and recovery method thereof of technique of trichlorosilane synthetic tail gas.
Background technology
In polysilicon production process, improved Siemens is most widely used one.The principle of improved Siemens reduces high-purity trichlorosilane by High Purity Hydrogen on the HIGH-PURITY SILICON core of about 1100 DEG C, generates polysilicon deposition on silicon core.Improvement Siemens process is on the basis of traditional Siemens process, possesses energy-conservation, consumption reduction simultaneously, recycles in production process the process matched therewith of the by products such as a large amount of H2, HCI, SiCI4 of supervening and a large amount of by-product heat energy.
But the exhaust gas treating method of existing improved Siemens is directly adopt alkali lye hydrolysis, after synthesis tail gas is hydrolyzed by alkali lye, directly by exhaust emissions in air.This measure can bring increases alkali lye consumption, wastes the active substance in tail gas and the problem of contaminate environment.Although more existing exhaust gas treating methods are improved improved Siemens, carry out comprehensive utilization to synthesis tail gas and reclaim, its retrieving arrangement is more complicated, and recovery process is longer thus cause tail gas recycle cost to increase.
Therefore, design a structure simple, reclaim easy, tail gas can be utilized further thus reduce cost recovery and the retrieving arrangement of the technique of trichlorosilane synthetic tail gas of protection of the environment and recovery method thereof are people endeavours the problem of research always.
Summary of the invention
The object of the present invention is to provide a kind of structure simple, synthesis tail gas can be carried out second stage employ, thus save cost and the retrieving arrangement of the technique of trichlorosilane synthetic tail gas of protection of the environment and recovery method thereof.
In order to solve the problems of the technologies described above, the invention provides a kind of retrieving arrangement of technique of trichlorosilane synthetic tail gas, it comprises the fly-ash separator that pipeline successively connects, surge tank, compressor, water cooler, well heater, reactor, deposit slag ladle and withdrawing can, described technique of trichlorosilane synthetic tail gas carries out obtaining trichlorosilane mixed gas body after dedusting through described fly-ash separator, after described trichlorosilane mixed gas body enters described surge tank compensator or trimmer pressure, enter after described compressor pressurizes and enter described water cooler, obtain chlorosilane liquid produced and hydrogen gas mixture, after described hydrogen gas mixture enters and heats in described well heater, trichlorosilane mixture is obtained after the silica flour entered in described reactor and reactor reacts, deposit after carrying out contamination precipitation in slag ladle described in described trichlorosilane mixture enters, enter in described withdrawing can and reclaim.
Wherein, the retrieving arrangement of described technique of trichlorosilane synthetic tail gas also comprises preheater, deposits between water cooler and described well heater described in described preheater tubes is connected to, for the described hydrogen gas mixture cooled through described water cooler is carried out preheating.
Wherein, the retrieving arrangement of described technique of trichlorosilane synthetic tail gas also comprises strainer, and described filter pipes is connected between described fly-ash separator and described surge tank, and described strainer is for filtering the impurity in described trichlorosilane mixed gas body.
Wherein, described water cooler also connects a rectification and purification device, described rectification and purification device is used for be separated through overcooled described chlorosilane liquid produced.
Accordingly, present invention also offers a kind of recovery method of technique of trichlorosilane synthetic tail gas, it comprises
Technique of trichlorosilane synthetic tail gas is provided;
One fly-ash separator is provided, described technique of trichlorosilane synthetic tail gas is passed in described fly-ash separator and carries out dedusting, and obtain trichlorosilane mixed gas body;
One surge tank is provided, is connected with described pipeline of dust collector, described trichlorosilane mixed gas body is passed in described surge tank and carries out pressure buffer;
One compressor is provided, is connected with described surge tank pipeline, by described trichlorosilane mixed gas body by carrying out in described compressor being forced into a preset pressure;
One water cooler is provided, is connected with described Compressor Pipes, described trichlorosilane mixed gas body is passed in described water cooler and cools, and obtain chlorosilane liquid produced and hydrogen gas mixture;
One well heater is provided, is connected with described water cooler pipeline, described hydrogen gas mixture is passed in described well heater and carry out being heated to one first preset temp;
One reactor is provided, inside stores silica flour, the described hydrogen gas mixture after heating is passed in described reactor, and adds catalyzer, carry out chemical reaction, obtain trichlorosilane mixture;
There is provided one to deposit slag ladle, be connected with described pipe reactor, deposit in slag ladle described in described trichlorosilane mixture is passed into and carry out precipitated impurities;
One withdrawing can is provided, is connected with described slag ladle pipeline of depositing, described trichlorosilane is passed in described withdrawing can and reclaims.
Wherein, a water cooler is being provided, is being connected with described Compressor Pipes, described trichlorosilane mixed gas body is being passed in described water cooler and cools, and after obtaining the step of chlorosilane liquid produced and hydrogen gas mixture, further comprising the steps of:
There is provided a rectification and purification device, pipeline is connected on described water cooler, and described chlorosilane liquid produced is entered in described rectification and purification device by pipeline and is separated.
Wherein, provide a fly-ash separator in step, described technique of trichlorosilane synthetic tail gas is passed in described fly-ash separator and carries out dedusting, and further comprising the steps of after obtaining trichlorosilane mixed gas body:
There is provided a strainer, pipeline is connected between described fly-ash separator and described surge tank, is passed in described strainer by described trichlorosilane mixed gas body and carries out contaminant filter.
Wherein, provide a well heater in step, be connected with described water cooler pipeline, described hydrogen gas mixture is passed in described well heater before carrying out being heated to a preset temp further comprising the steps of:
There is provided a preheater, pipeline is connected between described water cooler and described well heater, and described hydrogen gas mixture enters in described preheater and carries out being preheated to one second preset temp.
Wherein, described preset pressure is 2Mpa, and described first preset temp is 550 DEG C, and described second preset temp is 150 DEG C.
Wherein, provide a reactor in step, inside store silica flour, described hydrogen gas mixture after heating is passed in described reactor, and adds catalyzer, carry out chemical reaction, obtain in trichlorosilane mixture, described catalyzer is nickel, and the reaction equation of described chemical reaction is:
The retrieving arrangement of technique of trichlorosilane synthetic tail gas provided by the invention is by arranging water cooler and reactor; chlorosilane composition in described technique of trichlorosilane synthetic tail gas and hydrogen gas mixture are passed through refrigerated separation; again the hydrogen gas mixture after separation is passed in reactor and carry out chemical reaction with silica flour; thus obtain trichlorosilane; make technique of trichlorosilane synthetic tail gas can be further used for explained hereafter as raw material; thus save energy; also prevent this synthesis tail gas to be disposed in air while reducing production cost, protect environment further.In addition, this apparatus structure is simple, easy and simple to handle, and operating process is short, thus greatly increases production efficiency.
Accompanying drawing explanation
In order to be illustrated more clearly in technical scheme of the present invention, be briefly described to the accompanying drawing used required in embodiment below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the schematic diagram of the retrieving arrangement of the technique of trichlorosilane synthetic tail gas that embodiment of the present invention provides;
Fig. 2 is the schema that embodiment of the present invention provides the recovery method of technique of trichlorosilane synthetic tail gas.
Embodiment
Below in conjunction with the accompanying drawing in embodiment of the present invention, the technical scheme in embodiment of the present invention is clearly and completely described.
Refer to Fig. 1, the retrieving arrangement 100 of a kind of technique of trichlorosilane synthetic tail gas that embodiment of the present invention provides, comprise fly-ash separator 1, surge tank 2, compressor 3, water cooler 4, well heater 5, the reactor 6 of pipeline connection successively, deposit slag ladle 7 and withdrawing can 8.Described technique of trichlorosilane synthetic tail gas, after the dedusting of described fly-ash separator 1, obtains trichlorosilane mixed gas body.Described trichlorosilane mixed gas body to enter in described surge tank 2 after compensator or trimmer pressure, enters after pressurizeing in described compressor 3, enters in described water cooler 4 and cool, obtain chlorosilane liquid produced and hydrogen gas mixture.Described hydrogen gas mixture enters in described reactor 6 and carries out chemical reaction, obtain trichlorosilane mixture after entering and heating in described well heater 5.Deposit described in described trichlorosilane mixture enters after carrying out contamination precipitation in slag ladle 7, enter in described withdrawing can 8 and reclaim.
In the present embodiment, in order to ensure the effect of dedusting, described fly-ash separator 1 is cyclonic separator.Described fly-ash separator 1 is provided with exhaust pipe (not shown), and described technique of trichlorosilane synthetic tail gas is entered in described fly-ash separator 1 by described exhaust pipe and carries out dedusting.Concrete, owing to containing silica flour in described technique of trichlorosilane synthetic tail gas, therefore, described silica flour is separated by described fly-ash separator 1, thus obtains trichlorosilane mixed gas body, prevents in follow-up equipment, because described silica flour is particulate state, make follow-up equipment blocking, thus affect the operation of whole system, and then affect recovering effect.
In the present embodiment, the retrieving arrangement 100 of described technique of trichlorosilane synthetic tail gas also comprises strainer 9, described strainer 9 pipeline is connected between described fly-ash separator 1 and described surge tank 2, for filtering the impurity in described trichlorosilane gas, thus ensures recovering effect further.Concrete, described trichlorosilane mixed gas body, via after described fly-ash separator 1 separating impurity, enters in described strainer 9, removes the silica flour in described trichlorosilane mixed gas body further, so that the safe operation of follow-up equipment.
In the present embodiment, described surge tank 2, for cushioning the pressure of described trichlorosilane mixed gas body, prevents it from affecting the operation of follow-up equipment because of insufficient pressure or pressure inequality.Certainly, in other embodiments, described surge tank 2 also can arrange control valve, thus control described trichlorosilane mixed gas body pass into speed.
Described compressor 3 for described trichlorosilane mixed gas body is forced into a preset pressure, thus makes this mixed gas can be used in the reaction in later stage.In the present embodiment, described preset pressure is 2Mpa.
In the present embodiment, described water cooler 4 is for cooling described trichlorosilane mixed gas body.Because the boiling point of the trichlorosilane that contains in described trichlorosilane mixed gas body and silicon tetrachloride is lower, therefore, when adopting described water cooler 4 to cool, described trichlorosilane gas and silicon tetrachloride gas are liquefied, thus obtain chlorosilane liquid produced.And due to the boiling point of the hydrogen in mixed gas and hydrogen chloride gas higher, be not therefore liquefied.Thus when described trichlorosilane mixed gas body is after described water cooler 4, what obtain is chlorosilane liquid produced and hydrogen gas mixture, and then described trichlorosilane and the gas delivery such as silicon tetrachloride and hydrogen is come.
In order to further recycling, the retrieving arrangement 100 of described technique of trichlorosilane synthetic tail gas also can comprise rectification and purification device 10, described rectification and purification device 10 pipeline is connected on described water cooler 4, because the boiling point of described chlorosilane liquid produced is different, thus described rectification and purification device 10 will be for being separated further through overcooled described chlorosilane liquid produced, thus obtain trichlorosilane liquid and silicon tetrachloride liquid.The described silicon tetrachloride liquid obtained is important industrial raw material, thus described silicon tetrachloride liquid can be heated into gas further, then continues to pass in reactor and continues reaction, thus with this recycle.
Described well heater 5 for described hydrogen gas mixture is heated to one first preset temp, thus can have enough temperature condition to carry out follow-up reaction.In the present embodiment, described first preset temp is 550 DEG C.In order to cost-saving further, the retrieving arrangement 100 of described technique of trichlorosilane synthetic tail gas also comprises default device (not shown), described preheater tubes is connected between described water cooler 4 and described well heater 5, for described hydrogen gas mixture is preheated to one second preset temp, and described second preset temp is 150 DEG C, thus when the described well heater 5 of follow-up use is heated, the time of heating can be reduced, thus save the material of heating.Certainly, in other embodiments, described first preset temp and the second preset temp also can adjust according to practical condition.
Storing silica flour in described reactor 6, for reacting with hydrogen gas mixture, obtaining trichlorosilane mixture.In the present embodiment, in described reactor 6, add catalyzer silica flour and nickel etc., thus make hydrogen gas mixture generation chemical reaction, the reaction equation of its correspondence is respectively: Si+3HCl=SiHCl
3+ H
2; H
2+ SiCl
4=SiHCl
3+ HCl.Therefore, the general equation of its reaction is:
thus hydrogen gas mixture is changed into trichlorosilane mixture, thus industrial production can be applied to further, thus save energy.
Described slag ladle 7 of depositing is for precipitating the impurity in described trichlorosilane mixture further, thus described trichlorosilane mixture of purifying.In the present embodiment, described impurity is nickel and silica flour, thus described trichlorosilane can be purified, thus is convenient to recycle.In order to save equipment further, described in deposit slag ladle 7 and be connected with described water cooler 4 pipeline simultaneously, thus described trichlorosilane to be liquefied further, is convenient to recovery.
In order to further recovery, deposit described in described withdrawing can 8 pipeline is connected between slag ladle and described water cooler, the described described trichlorosilane precipitating impurity of depositing in slag ladle 7 passes into described water cooler further and carries out cooling liquid, thus enter in described withdrawing can 8 carry out collection reclaim, described trichlorosilane is made to can be used in other industrial production, further save energy.
In order to further separation, described withdrawing can 8 also can connect described rectification and purification device 10 by pipeline further, for the described trichlorosilane liquid through liquefaction is carried out separating-purifying, thus makes the raw material separated to continue on for industrial production.
In addition, the retrieving arrangement of technique of trichlorosilane synthetic tail gas provided by the invention is not only applicable to the production of polysilicon, can also be applied to the explained hereafter that silicon tetrachloride, organosilicon, trichlorosilane etc. be made up of similar tail gas simultaneously and carry out tail gas recycle.
The retrieving arrangement of technique of trichlorosilane synthetic tail gas provided by the invention is by arranging water cooler and reactor; chlorosilane composition in described technique of trichlorosilane synthetic tail gas and hydrogen gas mixture are passed through refrigerated separation; again the hydrogen gas mixture after separation is passed in reactor and carry out chemical reaction with silica flour; thus obtain trichlorosilane; make technique of trichlorosilane synthetic tail gas can be further used for explained hereafter as raw material; thus save energy; also prevent this synthesis tail gas to be disposed in air while reducing production cost, protect environment further.In addition, this apparatus structure is simple, easy and simple to handle, and operating process is short, thus greatly increases production efficiency.
Refer to Fig. 2, present invention also offers a kind of recovery method of technique of trichlorosilane synthetic tail gas, concrete steps are as follows:
S1: technique of trichlorosilane synthetic tail gas is provided.In the present embodiment, described technique of trichlorosilane synthetic tail gas is a large amount of SiCl produced in polysilicon production process
4, SiHCl
3, SiH
2cl
2, H
2and the gas such as HCl.
S2: provide a fly-ash separator, passes into described technique of trichlorosilane synthetic tail gas in described fly-ash separator and carries out dedusting, and obtain trichlorosilane mixed gas body.In the present embodiment, described fly-ash separator is cyclonic separator, and described technique of trichlorosilane synthetic tail gas is passed in described fly-ash separator by pipeline.The object of this step is the silica flour in order to remove in described technique of trichlorosilane synthetic tail gas, thus prevents described silica flour from blocking follow-up equipment, affects the carrying out of subsequent step.
In the present embodiment, in order to further dedusting, improve impurity-eliminating effect, a strainer can be connected by pipeline after described fly-ash separator, the described trichlorosilane mixed gas body after described fly-ash separator dedusting be passed in described strainer and carries out contaminant filter.Its objective is a small amount of silica flour in order to remove further in described trichlorosilane mixed gas body, thus prevent granular silica flour occluding device, and then be convenient to the carrying out of subsequent step.
S3: provide a surge tank, is connected with described pipeline of dust collector, is passed in surge tank by described trichlorosilane mixed gas body and carries out pressure buffer.The object of this step is to prevent the uneven or insufficient pressure of the pressure due to described trichlorosilane mixed gas body, giving the effect that described trichlorosilane mixed gas body carries out compensator or trimmer pressure.
S4: provide a compressor, is connected with described surge tank pipeline, by described trichlorosilane mixed gas body by carrying out in described compressor being forced into a preset pressure.In the present embodiment, carrying out smoothly for the ease of subsequent reactions, described preset pressure is 2Mpa.Certainly, in other embodiments, described preset pressure also can adjust according to practical condition.
S5: provide a water cooler, pipeline is connected to described compressor, is passed in described water cooler by described trichlorosilane mixed gas body and cools, and obtain chlorosilane liquid produced and hydrogen gas mixture.The object of this step is to trichlorosilane lower for boiling point and silicon tetrachloride and the higher hydrogen of boiling point and hydrogen chloride gas be separated, thus is convenient to purify and be separated.
In the present embodiment, in order to further purification & isolation, can connect a rectification and purification device by pipeline after described water cooler, described chlorosilane liquid produced is entered in described rectification and purification device by pipeline and is separated.Described rectification and purification device utilizes the trichlorosilane in described chlorosilane liquid produced different with the boiling point of silicon tetrachloride, thus described trichlorosilane liquid and silicon tetrachloride liquid is separated further, thus is convenient to collect respectively.The described silicon tetrachloride that rectification and purification obtains can also heat further, continues to pass in described reactor react as raw material, thus recycle, obtain the utilization ratio of the energy.
Further, in order to further collection, described rectification and purification device also can connect a holding tank by pipeline, be entered in described holding tank by the liquid after described rectification and purification device separation and collect.Its objective is in order to described liquid is collected, so that be subsequently applied to other explained hereafter as raw material, thus economize on resources.
S6: provide a well heater, is connected with described water cooler pipeline, is passed into by described hydrogen gas mixture in described well heater and carries out being heated to one first preset temp.The object of this step is to be heated by described hydrogen gas mixture, thus provides condition, so that follow-up reaction.In the present embodiment, described first preset temp is 550 DEG C.Concrete, during heating, one preheater is provided, pipeline is connected between described water cooler and described well heater, and described hydrogen gas mixture enters in described preheater and carries out being preheated to one second preset temp, and described second preset temp is 150 DEG C, thus described hydrogen gas mixture was first preheated before entering described well heater, thus the time when entering well heater without the need to overspending heat, thus save the material of heating, and then cost-saving.Certainly, in other embodiments, described first preset temp and the second preset temp all can adjust according to actual production.
S7: provide a reactor, inside store silica flour, passes into the described hydrogen gas mixture after heating in described reactor, and adds catalyzer, carry out chemical reaction, obtain trichlorosilane mixture.The object of this step is to be applied in explained hereafter by hydrogen gas mixture, generates trichlorosilane, using as other explained hereafter raw material.In the present embodiment, described catalyzer is nickel.The reaction equation of described chemical reaction is:
S8: provide one to deposit slag ladle, is connected with described pipe reactor, deposits in slag ladle and carry out precipitated impurities described in being passed into by described trichlorosilane mixture.The object of this step is the unreacted mixture such as silica flour and nickel completely in order to remove further in described trichlorosilane mixture, thus described trichlorosilane of purifying further.
Further, in order to reduce equipment, thus cost-saving further, described in deposit slag ladle and also can connect described water cooler by pipeline simultaneously, described trichlorosilane mixture is liquefied further, thus is convenient to follow-up separation and collection.
S9: provide a withdrawing can, is connected with described slag ladle pipeline of depositing, is passed in described withdrawing can by described trichlorosilane and reclaim.The object of this step is to collect trichlorosilane, so that it can be used as raw materials for production to be applied in other explained hereafter afterwards.During recovery, in order to further separating-purifying, described withdrawing can also can connect rectification and purification device by pipeline simultaneously, thus by trichlorosilane mixing liquid by after rectifying separation, then reclaim through described withdrawing can, be convenient to it and collect.
The recovery method of technique of trichlorosilane synthetic tail gas provided by the invention, by the mode of dedusting, filtration, buffering, pressurization, cooling, technique of trichlorosilane synthetic tail gas is separated step by step, purify, and reacted by reactor, it is made to convert other raw materials for production to by chemical reaction, carry out purifying, collecting again, other explained hereafter can be applied to further, economize on resources and while cost, also prevent because synthesis tail gas is directly disposed to the atmospheric pollution and environmental pollution brought in air.
This recovery method not only can be used for the tail gas recycle of polysilicon production process, the explained hereafter that silicon tetrachloride, organosilicon, trichlorosilane etc. be made up of similar tail gas can also be applied to simultaneously and carry out tail gas recycle, thus saved resource greatly, and further increase the technique suitability of this recovery method.
The above is the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications are also considered as protection scope of the present invention.
Claims (10)
1. the retrieving arrangement of a technique of trichlorosilane synthetic tail gas, it is characterized in that, comprise the fly-ash separator that pipeline successively connects, surge tank, compressor, water cooler, well heater, reactor, deposit slag ladle and withdrawing can, described technique of trichlorosilane synthetic tail gas carries out obtaining trichlorosilane mixed gas body after dedusting through described fly-ash separator, after described trichlorosilane mixed gas body enters described surge tank compensator or trimmer pressure, enter after described compressor pressurizes and enter described water cooler, obtain chlorosilane liquid produced and hydrogen gas mixture, after described hydrogen gas mixture enters and heats in described well heater, trichlorosilane mixture is obtained after the silica flour entered in described reactor and reactor reacts, deposit after carrying out contamination precipitation in slag ladle described in described trichlorosilane mixture enters, enter in described withdrawing can and reclaim.
2. the retrieving arrangement of technique of trichlorosilane synthetic tail gas according to claim 1, it is characterized in that, the retrieving arrangement of described technique of trichlorosilane synthetic tail gas also comprises preheater, deposit between water cooler and described well heater described in described preheater tubes is connected to, for the described hydrogen gas mixture cooled through described water cooler is carried out preheating.
3. the retrieving arrangement of technique of trichlorosilane synthetic tail gas according to claim 1, it is characterized in that, the retrieving arrangement of described technique of trichlorosilane synthetic tail gas also comprises strainer, described filter pipes is connected between described fly-ash separator and described surge tank, and described strainer is for filtering the impurity in described trichlorosilane mixed gas body.
4. the retrieving arrangement of technique of trichlorosilane synthetic tail gas according to claim 1, is characterized in that, described water cooler also connects rectification and purification device, and described rectification and purification device is used for be separated through overcooled described chlorosilane liquid produced.
5. a recovery method for technique of trichlorosilane synthetic tail gas, is characterized in that,
Technique of trichlorosilane synthetic tail gas is provided;
One fly-ash separator is provided, described technique of trichlorosilane synthetic tail gas is passed in described fly-ash separator and carries out dedusting, and obtain trichlorosilane mixed gas body;
One surge tank is provided, is connected with described pipeline of dust collector, described trichlorosilane mixed gas body is passed in described surge tank and carries out pressure buffer;
One compressor is provided, is connected with described surge tank pipeline, by described trichlorosilane mixed gas body by carrying out in described compressor being forced into a preset pressure;
One water cooler is provided, is connected with described Compressor Pipes, described trichlorosilane mixed gas body is passed in described water cooler and cools, and obtain chlorosilane liquid produced and hydrogen gas mixture;
One well heater is provided, is connected with described water cooler pipeline, described hydrogen gas mixture is passed in described well heater and carry out being heated to one first preset temp;
One reactor is provided, inside stores silica flour, the described hydrogen gas mixture after heating is passed in described reactor, and adds catalyzer, carry out chemical reaction, obtain trichlorosilane mixture;
There is provided one to deposit slag ladle, be connected with described pipe reactor, deposit in slag ladle described in described trichlorosilane mixture is passed into and carry out precipitated impurities;
One withdrawing can is provided, is connected with described slag ladle pipeline of depositing, described trichlorosilane is passed in described withdrawing can and reclaims.
6. the recovery method of technique of trichlorosilane synthetic tail gas according to claim 5, it is characterized in that, one water cooler is being provided, be connected with described Compressor Pipes, described trichlorosilane mixed gas body is passed in described water cooler and cools, and after obtaining the step of chlorosilane liquid produced and hydrogen gas mixture, further comprising the steps of:
There is provided a rectification and purification device, pipeline is connected on described water cooler, and described chlorosilane liquid produced is entered in described rectification and purification device by pipeline and is separated;
There is provided a holding tank, pipeline is connected on described rectification and purification device, is entered in described holding tank collect by the liquid after described rectification and purification device separation.
7. the recovery method of technique of trichlorosilane synthetic tail gas according to claim 5, it is characterized in that, there is provided a fly-ash separator in step, described technique of trichlorosilane synthetic tail gas is passed in described fly-ash separator and carries out dedusting, and further comprising the steps of after obtaining trichlorosilane mixed gas body:
There is provided a strainer, pipeline is connected between described fly-ash separator and described surge tank, is passed in described strainer by described trichlorosilane mixed gas body and carries out contaminant filter.
8. the recovery method of technique of trichlorosilane synthetic tail gas according to claim 5, it is characterized in that, there is provided a well heater in step, be connected with described water cooler pipeline, described hydrogen gas mixture is passed in described well heater before carrying out being heated to a preset temp further comprising the steps of:
There is provided a preheater, pipeline is connected between described water cooler and described well heater, and described hydrogen gas mixture enters in described preheater and carries out being preheated to one second preset temp.
9. the recovery method of technique of trichlorosilane synthetic tail gas according to claim 8, is characterized in that, described preset pressure is 2Mpa, and described first preset temp is 550 DEG C, and described second preset temp is 150 DEG C.
10. the recovery method of technique of trichlorosilane synthetic tail gas according to claim 5, it is characterized in that, a reactor is provided in step, inside store silica flour, the described hydrogen gas mixture after heating is passed in described reactor, and adds catalyzer, carry out chemical reaction, obtain in trichlorosilane mixture, described catalyzer is nickel, and the reaction equation of described chemical reaction is:
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| CN106276919A (en) * | 2015-06-26 | 2017-01-04 | 新特能源股份有限公司 | Dust pelletizing system in production of polysilicon and dust collection method |
| CN106829863A (en) * | 2015-12-04 | 2017-06-13 | 新特能源股份有限公司 | The recovery system of hydrogen in a kind of polysilicon production process |
| CN113117442A (en) * | 2020-01-10 | 2021-07-16 | 新疆新特晶体硅高科技有限公司 | Tail gas treatment method and system in polycrystalline silicon production |
| CN114620731A (en) * | 2020-12-14 | 2022-06-14 | 新疆新特晶体硅高科技有限公司 | Recovery method and recovery device for reduction tail gas of polycrystalline silicon |
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| CN106276919A (en) * | 2015-06-26 | 2017-01-04 | 新特能源股份有限公司 | Dust pelletizing system in production of polysilicon and dust collection method |
| CN106276919B (en) * | 2015-06-26 | 2019-10-15 | 新特能源股份有限公司 | For the dust pelletizing system and dust removal method in production of polysilicon |
| CN106829863A (en) * | 2015-12-04 | 2017-06-13 | 新特能源股份有限公司 | The recovery system of hydrogen in a kind of polysilicon production process |
| CN106829863B (en) * | 2015-12-04 | 2019-03-22 | 新特能源股份有限公司 | The recovery system of hydrogen in a kind of polysilicon production process |
| CN113117442A (en) * | 2020-01-10 | 2021-07-16 | 新疆新特晶体硅高科技有限公司 | Tail gas treatment method and system in polycrystalline silicon production |
| CN114620731A (en) * | 2020-12-14 | 2022-06-14 | 新疆新特晶体硅高科技有限公司 | Recovery method and recovery device for reduction tail gas of polycrystalline silicon |
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