CN106276919B - For the dust pelletizing system and dust removal method in production of polysilicon - Google Patents
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Abstract
The present invention provides a kind of dust pelletizing system in production of polysilicon, including cooling unit and filter element, cooling unit is used to carry out condensation process to generation material, and uncooled gas is expelled directly out, and the liquid-phase chlorosilane containing silicon powder that condensation is formed is exported to filter element；Filter element is for being filtered processing to the liquid-phase chlorosilane containing silicon powder, to obtain the liquid-phase chlorosilane of not silicon powder-containing, and it exports as clean material to cooling unit, cooling unit is also used to clean material and generates the mixture progress condensation process of material, and uncooled gas is expelled directly out, the liquid-phase chlorosilane containing silicon powder that condensation is formed is exported to filter element, is looped back and forth like this to remove the silicon powder generated in material.Correspondingly, a kind of dust removal method in production of polysilicon is provided.Dust pelletizing system and dust removal method of the present invention can effectively remove the silicon powder in silicon tetrachloride high temperature hydrogenation reaction product material, and not silicon powder-containing in deslagging material.
Description
Technical field
The present invention relates to technical field of polysilicon production, and in particular to a kind of dust pelletizing system in production of polysilicon and
A kind of dust removal method in production of polysilicon.
Background technique
Polysilicon is the basic material of photovoltaic industry, in production of polysilicon, no matter using traditional Siemens
Reduction method still uses silane thermal decomposition process, can generate a large amount of silicon tetrachloride, make silicon tetrachloride high temperature hydrogenation generate trichlorosilane from
And make silicon tetrachloride as the by-product and intermediate product in production of polysilicon, environmental pollution can be not only reduced, can also be made
Production of polysilicon forms closed loop, so that production cost be greatly reduced.
In existing silicon tetrachloride high temperature hydrogenation technology, make silicon tetrachloride, hydrogen, silicon powder or make silicon tetrachloride, hydrogen,
Hydrogen chloride, silicon powder react in a fluidized bed, and to generate the high temperature hydrogenation technology of trichlorosilane, because having, low energy consumption, four chlorinations
The advantages that silicon conversion per pass is high, and become one of existing silicon tetrachloride high temperature hydrogenation technology optimization technique.
In above-mentioned optimization technique, contain a large amount of fine silicon powder in the tail gas that the outlet of fluidized bed is sent out, if be not subject to
Processing, which will lead in subsequent technique, often there is pumping unit and pipeline valve abrasion, the blocking of instrument impulse pipeline, cooling and stripping
The problems such as equipment tower tray blocks.The presence of these problems can not only bring security risk to site operation personnel, also will affect and be
The stable operation of system increases the maintenance frequency and operating cost.
Containing a large amount of silicon powders in tail gas in order to solve the problems, such as fluidized bed outlet submitting, currently, mainly being removed using wet process
Dirt technique removes the silicon powder in silicon tetrachloride high temperature hydrogenation reaction product material, specifically: make silicon powder in the equipment such as stripper
Deslagging processing is carried out together with liquid-phase chlorosilane again after carrying out liquid phase enrichment.But once in tapping process in liquid-phase chlorosilane
Solid contents such as silicon powder when being more than 10wt% or more, easily Residue extraction pipeline is caused to block, to make to production of polysilicon
At very big influence；Moreover, 90% chlorosilane will drain into downstream work in slurry when arranging liquid-phase chlorosilane (slurry) of silicon powder-containing every time
Sequence is recycled, and the treating capacity so as to cause subsequent slurry treatment process is big, and the energy consumptions such as steam, electricity are high, moreover, also unfavorable
In the recycling of chlorosilane material, and chlorosilane is caused to waste；In addition, stripping apparatus needs to strip energy using a large amount of thermal material
It consumes larger.
Summary of the invention
The technical problem to be solved by the present invention is to provide one kind and be used for for the drawbacks described above in the presence of the prior art
Dust pelletizing system and a kind of dust removal method in production of polysilicon in production of polysilicon, for effectively removing silicon tetrachloride height
Warm hydrogenation generates the silicon powder in material, and not silicon powder-containing in deslagging material.
Solving technical solution used by present invention problem is:
The present invention provides a kind of dust pelletizing system in production of polysilicon, for removing the reaction life of silicon tetrachloride high temperature hydrogenation
It is described to generate the mixture that material includes chlorosilane gas, hydrogen, micro hydrogen chloride gas and silicon powder at the silicon powder in material,
Wherein the dust pelletizing system includes cooling unit and filter element, and the cooling unit is for condensing the generation material
Processing, to be respectively formed the liquid-phase chlorosilane containing silicon powder and uncooled gas, the uncooled gas bag includes hydrogen and micro chlorination
The gaseous mixture of hydrogen, and the uncooled gas is expelled directly out, the liquid-phase chlorosilane containing silicon powder is exported to the filtering
Unit；The filter element is for being filtered processing to the liquid-phase chlorosilane containing silicon powder, to obtain the liquid phase of not silicon powder-containing
Chlorosilane, and export as clean material to the cooling unit, so that the clean material and the generation material exist
Mixing in the cooling unit, the cooling unit are also used to carry out the clean material and the mixture for generating material
Condensation process to be respectively formed the liquid-phase chlorosilane containing silicon powder and the uncooled gas, and the uncooled gas is directly arranged
Out, the liquid-phase chlorosilane containing silicon powder is exported to the filter element, is looped back and forth like this to remove in the generation material
Silicon powder.
Preferably, the cooling unit further includes spray subelement, and the inside of the cooling unit, the spray is arranged in
It drenches subelement to be used to spray cold liquid to the material entered inside the cooling unit, to be respectively formed the liquid phase containing silicon powder
The gaseous mixture of cold liquid after chlorosilane, the uncooled gas and vaporization, and the cold liquid after the uncooled gas and vaporization
Gaseous mixture is expelled directly out.
Preferably, the filter element is also used to carry out deslagging processing when its inlet outlet pressure differential reaches pre-set limit, from
And the clean material is drained into downstream recovery process.
Preferably, the dust pelletizing system further includes compress cell, is arranged in the cooling unit and the filter element
Between, the liquid-phase chlorosilane containing silicon powder for exporting the cooling unit carries out pressurized treatment to form pressurized contain
The liquid-phase chlorosilane of silicon powder, and export to the filter element.
Preferably, the pressure limit of the liquid-phase chlorosilane of the pressurized silicon powder-containing of the compress cell output is 2.5-
3.5MPa。
It is anti-for removing silicon tetrachloride high temperature hydrogenation the present invention also provides a kind of dust removal method in production of polysilicon
The silicon powder in material should be generated, it is described to generate the mixing that material includes chlorosilane gas, hydrogen, micro hydrogen chloride gas and silicon powder
Object, wherein the dust removal method includes the following steps:
1) condensation process is carried out to the generation material, to be respectively formed the liquid-phase chlorosilane containing silicon powder and uncooled
Gas, the uncooled gas bag includes the gaseous mixture of hydrogen and micro hydrogen chloride gas, and the uncooled gas is expelled directly out；
2) processing is filtered to the liquid-phase chlorosilane containing silicon powder, to obtain the liquid-phase chlorosilane of not silicon powder-containing, by it
It is mixed as clean material and with the generation material；
3) condensation process is carried out to the mixture of the generation material and the clean material, to be respectively formed containing silicon powder
Liquid-phase chlorosilane and the uncooled gas, and the uncooled gas is expelled directly out；
4) step 2) and step 3) are repeated, to remove the silicon powder in the generation material.
Preferably, in step 1), condensation process is carried out to the generation material specifically: spray to the generation material
Cold liquid, thus the gaseous mixture for the cold liquid being respectively formed after the liquid-phase chlorosilane containing silicon powder, the uncooled gas and vaporization,
And the gaseous mixture of the cold liquid after the uncooled gas and vaporization is expelled directly out；
In step 3), condensation process is carried out to the mixture of the generation material and the clean material specifically: to
The cold liquid of mixture injection for generating material and the clean material, to be respectively formed the liquid phase chlorine silicon containing silicon powder
The gaseous mixture of cold liquid after alkane, the uncooled gas and vaporization, and the mixing of the cold liquid after the uncooled gas and vaporization
Gas is expelled directly out.
Preferably, step 2) further include: when being filtered processing to the liquid-phase chlorosilane containing silicon powder, if before filtering
The pressure difference of the liquid-phase chlorosilane of liquid-phase chlorosilane containing silicon powder and filtered not silicon powder-containing reaches pre-set limit, then is arranged
Slag treatment, so that the clean material is drained into downstream recovery process.
Preferably, step 2) further include: pressurized treatment first is carried out to the liquid-phase chlorosilane containing silicon powder, after forming pressurization
Silicon powder-containing liquid-phase chlorosilane, then processing is filtered to the pressurized liquid-phase chlorosilane containing silicon powder.
Preferably, make the pressure limit 2.5-3.5MPa of the liquid-phase chlorosilane of pressurized silicon powder-containing.
The utility model has the advantages that
Dust pelletizing system and dust removal method of the present invention and existing others first pass through after chilling by stripping, deslagging etc.
Dust collecting process is compared, and is had the advantages that
1) silicon powder that can be effectively removed in high temperature hydrogenation reaction product material mitigates pipeline and valve in subsequent technique
Abrasion.
2) it due to not needing using stripping apparatus, thus while reducing equipment investment, is further without needed for introducing stripping
Hot logistics, reduce dedusting energy consumption.
3) due to not needing, because of the problem of blocking without stripper tower tray, to extend system using stripping apparatus
The cycle of operation.
4) due to not silicon powder-containing in deslagging material, thus the waste of chlorosilane material can be greatly decreased, mitigates slurry process
Processing load.
Detailed description of the invention
Fig. 1 is the schematic diagram for the dust pelletizing system in production of polysilicon that the embodiment of the present invention 1 provides；
Fig. 2 is the schematic diagram for the dust removal method in production of polysilicon that the embodiment of the present invention 2 provides.
In figure: 1- chilling tower；11- spray head；2- filter；3- circulating pump；A- generates material；The cold liquid of b-；
The gaseous mixture of cold liquid after the uncooled gas of c- and vaporization；The liquid-phase chlorosilane of d- silicon powder-containing；The pressurized silicon powder-containing of e-
Liquid-phase chlorosilane；The clean material of f-；G- deslagging material.
Specific embodiment
Technical solution in order to enable those skilled in the art to better understand the present invention, with reference to the accompanying drawings and examples to this
Invention is described in further detail.
Embodiment 1:
It is anti-for removing silicon tetrachloride high temperature hydrogenation the present embodiment provides a kind of dust pelletizing system in production of polysilicon
The silicon powder in material (hereinafter referred to as generation material) should be generated, generating material includes chlorosilane gas, hydrogen, micro hydrogen chloride gas
The gas-solid mixture of body and silicon powder, wherein chlorosilane gas includes dichlorosilane (SiH2Cl2), trichlorosilane (SiHCl3) and
Silicon tetrachloride (SiCl4) gaseous mixture.
The dust pelletizing system includes cooling unit and filter element.Wherein cooling unit is used to condense generation material
Processing, to be respectively formed the liquid-phase chlorosilane containing silicon powder and the (mixing including hydrogen and micro hydrogen chloride gas of uncooled gas
Gas), and uncooled gas is expelled directly out, the liquid-phase chlorosilane made of condensation containing silicon powder is exported to filter element；Filtering
Unit is for being filtered processing to the liquid-phase chlorosilane containing silicon powder, to obtain the liquid-phase chlorosilane of not silicon powder-containing, and by its
It exports as clean material to cooling unit, so that clean material mixes in cooling unit with material is generated；Cooling unit is also
For to clean material and generate material mixture carry out condensation process, be respectively formed the liquid-phase chlorosilane containing silicon powder and
Uncooled gas, and uncooled gas is expelled directly out, the liquid-phase chlorosilane containing silicon powder is exported to filter element, is so recycled past
The multiple silicon powder generated with removal in material.
It should be noted that the cooling unit referred in the present embodiment, spray subelement, filter element and compress cell are equal
The existing device with corresponding function or module can be used to realize.For example, cooling unit can be used existing chilling tower or
The multiple spray heads arranged according to predetermined way can be used in other fast cooling devices, spray subelement, and filter element can be used existing
Filter, existing circulating pump can be used in compress cell.However, structure, material of the present invention to said units (subelement)
With no restrictions with size, as long as being able to achieve corresponding function.
In the present embodiment, cooling unit is chilling tower, then makes filtered clean material (the not solid particles such as silicon powder-containing)
It is back to chilling tower, and is mixed to form mixture with the generation material (containing the solid particles such as silicon powder) for entering chilling tower, so
Chilling tower carries out condensation process to the mixture again afterwards, so that the content of the solid particles such as silicon powder in chilling tower is reduced, thus
Can prevent because solid content it is excessively high caused by chilling tower block.
In addition, filter element can also be arranged when its inlet outlet pressure differential reaches pre-set limit in above-mentioned cyclic process
Slag treatment, so that clean material is drained into downstream recovery process.Since filter element is when carrying out continuous filtration treatment, silicon powder meeting
It is gradually accumulated in its cartridge surface to form increasingly thicker filtering layer, since filtering layer is thicker, the resistance generated is bigger, therefore mistake
The inlet outlet pressure differential for filtering unit is bigger, and when the thickness of filtering layer seriously affects the filter effect of filter element, pressure difference at this time reaches
To pre-set limit, the filtering layer for being deposited in cartridge surface can be removed by back blowing process.Wherein the pre-set limit is preferably 0.2-
0.3MPa。
Further, cooling unit may also include spray subelement, and spray subelement is arranged in the inside of cooling unit, uses
In to material (i.e. generation material/clean material and generate the mixture of material) the cold liquid of injection entered inside cooling unit,
The cold liquid may include the mixed liquor of silicon tetrachloride, trichlorosilane and a small amount of dichlorosilane, to be respectively formed containing silicon
Cold liquid after the liquid-phase chlorosilane of powder, uncooled gas (gaseous mixture including hydrogen and micro hydrogen chloride gas) and vaporization it is mixed
Close gas, wherein cold liquid by high temperature hydrogenation reaction product material high-temperature chlorine silane heating cause to vaporize, and uncooled gas and
The gaseous mixture of cold liquid after vaporization is expelled directly out.
In addition, dust pelletizing system may also include compress cell in order to enable liquid-phase chlorosilane forced refluence, it is arranged cold
But between unit and filter element, the liquid-phase chlorosilane containing silicon powder for exporting cooling unit carries out pressurized treatment with shape
It at the liquid-phase chlorosilane of pressurized silicon powder-containing, and exports to filter element, filter element is again to the liquid of pressurized silicon powder-containing
Phase chlorosilane is filtered processing, to form pressurized liquid-phase chlorosilane and export as clean material to cooling single
Member.Wherein the pressure limit of the liquid-phase chlorosilane of the pressurized silicon powder-containing of compress cell output is preferably 2.5-3.5MPa.
It can be seen from the above description that the present invention uses new dust collecting process, it can first make the reaction end gas containing silicon powder
(i.e. generation material) enters fast cooling device from fluidized bed outlet, carries out condensation process to reaction end gas in fast cooling device, simultaneously
Under the action of spraying cold liquid, so that the silicon powder in reaction end gas is entered liquid phase and be transferred to fast cooling device bottom, makes to react tail
Uncooled gas in gas is discharged at the top of fast cooling device, then the circulating pump by the way that fast cooling device bottom is arranged in, and makes containing there is silicon
Enter filter after the liquid phase pressurization of powder, and filtered clean liquid phase is back to fast cooling device, loops back and forth like this to remove
Silicon powder in reaction end gas.
In the following, a kind of preferred embodiment of the dust pelletizing system in conjunction with described in Fig. 1 the present invention is described in detail.
As shown in Figure 1, dust pelletizing system includes chilling tower 1, filter 2 and circulating pump 3, wherein the top in chilling tower 1 is set
The multiple spray heads 11 arranged according to predetermined way are equipped with, including chlorosilane gas, hydrogen, micro hydrogen chloride gas and silicon powder
It is therein under the cooling effect for the cold liquid b that spray head 11 sprays after the generation material a of gas-solid mixture enters chilling tower 1
Silicon powder enters liquid phase and is down to the bottom of chilling tower 1, to be respectively formed uncooled gas (including hydrogen and micro hydrogen chloride gas
Gaseous mixture) and vaporization after cold liquid gaseous mixture c and silicon powder-containing liquid-phase chlorosilane d, wherein gaseous mixture c is from chilling tower 1
Top exit discharge, and the liquid-phase chlorosilane d of silicon powder-containing exported from the bottom of chilling tower 1 after by circulating pump 3, form pressurization
The liquid-phase chlorosilane e of silicon powder-containing afterwards simultaneously enters filter 2, under the filtration of filter 2, forms the liquid phase of not silicon powder-containing
Chlorosilane as clean material f and is back to chilling tower 1, loops back and forth like this to remove the silicon powder generated in material a,
Deslagging processing is wherein carried out when the inlet outlet pressure differential of filter 2 reaches pre-set limit, and deslagging material g (i.e. clean material) is arranged
Filter 2 is set to restore filtering function to downstream recovery process, and by back blowing process.
Dust pelletizing system described in the embodiment of the present invention is applied in production of polysilicon, silicon tetrachloride high temperature can be effectively removed
Hydrogenation generates the silicon powder in material, so as to prevent from generating pumping unit of the silicon powder to subsequent technique of high rigidity in material
It causes to wear with pipeline valve, extends the cycle of operation of system, reduce the maintenance frequency and production run cost；Moreover, because row
Not silicon powder-containing in slag material, therefore be conducive to the recycling of chlorosilane material, avoid the waste of chlorosilane.
Embodiment 2:
As shown in Fig. 2, the present embodiment provides a kind of dust removal methods in production of polysilicon, for removing silicon tetrachloride
Silicon powder in high temperature hydrogenation reaction product material (hereinafter referred to as generation material), generate material include chlorosilane gas, it is hydrogen, micro-
The gas-solid mixture of hydrogen chloride gas and silicon powder is measured, wherein chlorosilane gas includes dichlorosilane (SiH2Cl2), trichlorosilane
(SiHCl3) and silicon tetrachloride (SiCl4)。
The dust removal method includes the following steps:
S101. to material progress condensation process is generated, to be respectively formed the liquid-phase chlorosilane containing silicon powder and uncooled gas,
Uncooled gas bag includes the gaseous mixture of hydrogen and micro hydrogen chloride gas, and uncooled gas is expelled directly out.
In step s101, condensation process is carried out to generation material specifically: Xiang Shengcheng material sprays cold liquid, described cold
Liquid may include the mixed liquor of silicon tetrachloride, trichlorosilane and a small amount of dichlorosilane, to be respectively formed the liquid containing silicon powder
The gaseous mixture of cold liquid after phase chlorosilane, uncooled gas and vaporization, and the gaseous mixture of the cold liquid after uncooled gas and vaporization
It is expelled directly out.Wherein cold liquid is caused to vaporize by the high-temperature chlorine silane heating in high temperature hydrogenation reaction product material.
S102. processing is filtered to the liquid-phase chlorosilane containing silicon powder, it, will to obtain the liquid-phase chlorosilane of not silicon powder-containing
It is mixed as clean material and with material is generated.
In order to enable liquid-phase chlorosilane forced refluence, step S102 further include: first to the liquid-phase chlorosilane containing silicon powder
Pressurized treatment is carried out, to form the liquid-phase chlorosilane of pressurized silicon powder-containing, then to the pressurized liquid phase chlorine silicon containing silicon powder
Alkane is filtered processing, to form pressurized liquid-phase chlorosilane and as clean material.Preferably, make pressurized contain
The pressure limit of the liquid-phase chlorosilane of silicon powder is 2.5-3.5MPa.
S103. condensation process is carried out to the mixture for generating material and clean material, to be respectively formed the liquid containing silicon powder
Phase chlorosilane and uncooled gas, and uncooled gas is expelled directly out.
In step s 103, condensation process is carried out to the mixture for generating material and clean material specifically: to product
The mixture of material and clean material sprays cold liquid, to be respectively formed the liquid-phase chlorosilane containing silicon powder, uncooled gas and vapour
The gaseous mixture of cold liquid after change, and the gaseous mixture of the cold liquid after uncooled gas and vaporization is expelled directly out.Wherein cold liquid
Caused to vaporize by the high-temperature chlorine silane heating in high temperature hydrogenation reaction product material.
S104. the liquid-phase chlorosilane containing silicon powder and the liquid-phase chlorosilane of filtered not silicon powder-containing before judgement filtering
Whether pressure difference reaches pre-set limit, if not, return step S102, with circular treatment to remove the silicon powder generated in material,
If so, thening follow the steps S105.Wherein the pre-set limit is preferably 0.2-0.3MPa.
S105. deslagging processing is carried out, so that clean material is drained into downstream recovery process.
Dust removal method described in the embodiment of the present invention is applied in production of polysilicon, silicon tetrachloride high temperature can be effectively removed
Hydrogenation generates the silicon powder in material, so as to prevent from generating pumping unit of the silicon powder to subsequent technique of high rigidity in material
It causes to wear with pipeline valve, extends the cycle of operation of system, reduce the maintenance frequency and production run cost；Moreover, because row
Not silicon powder-containing in slag material, therefore be conducive to the recycling of chlorosilane material, avoid the waste of chlorosilane.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, essence of the invention is not being departed from
In the case where mind and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (6)
1. a kind of dust pelletizing system in production of polysilicon, for removing in silicon tetrachloride high temperature hydrogenation reaction product material
Silicon powder, it is described to generate the mixture that material includes chlorosilane gas, hydrogen, micro hydrogen chloride gas and silicon powder, which is characterized in that
The dust pelletizing system includes cooling unit and filter element, and the cooling unit is for carrying out at condensation the generation material
Reason, to be respectively formed the liquid-phase chlorosilane containing silicon powder and uncooled gas, the uncooled gas bag includes hydrogen and micro hydrogen chloride
The gaseous mixture of gas, and the uncooled gas is expelled directly out, the liquid-phase chlorosilane containing silicon powder is exported single to the filtering
Member；The filter element is for being filtered processing to the liquid-phase chlorosilane containing silicon powder, to obtain the liquid phase chlorine of not silicon powder-containing
Silane, and export as clean material to the cooling unit, so that the clean material and the generation material are in institute
Mixing in cooling unit is stated, the cooling unit is also used to carry out the clean material with the mixture for generating material cold
Solidifying processing, to be respectively formed the liquid-phase chlorosilane containing silicon powder and the uncooled gas, and the uncooled gas is expelled directly out,
Liquid-phase chlorosilane containing silicon powder is exported and is looped back and forth like this to the filter element to remove the silicon in the generation material
Powder；
The cooling unit is chilling tower, and spray subelement is arranged inside, and the spray subelement is used for entrance chilling tower
Internal material sprays cold liquid, thus after being respectively formed the liquid-phase chlorosilane containing silicon powder, the uncooled gas and vaporization
The gaseous mixture of cold liquid, and the gaseous mixture of the cold liquid after the uncooled gas and vaporization is expelled directly out；
The dust pelletizing system further includes compress cell, is arranged between the cooling unit and the filter element, and being used for will
The liquid-phase chlorosilane containing silicon powder of the cooling unit output carries out pressurized treatment to form the liquid phase of pressurized silicon powder-containing
Chlorosilane, and export to the filter element；The compress cell uses circulating pump.
2. dust pelletizing system according to claim 1, which is characterized in that the filter element is also used in its inlet outlet pressure differential
Deslagging processing is carried out when reaching pre-set limit, so that the clean material is drained into downstream recovery process.
3. dust pelletizing system according to claim 1, which is characterized in that the pressurized silicon powder-containing of the compress cell output
Liquid-phase chlorosilane pressure limit be 2.5-3.5MPa.
4. a kind of dust removal method in production of polysilicon, for removing in silicon tetrachloride high temperature hydrogenation reaction product material
Silicon powder, it is described to generate the mixture that material includes chlorosilane gas, hydrogen, micro hydrogen chloride gas and silicon powder, which is characterized in that
The dust removal method includes the following steps:
1) condensation process is carried out to the generation material, to be respectively formed the liquid-phase chlorosilane containing silicon powder and uncooled gas, institute
The gaseous mixture that uncooled gas bag includes hydrogen and micro hydrogen chloride gas is stated, and the uncooled gas is expelled directly out；
In step 1), condensation process is carried out to the generation material specifically: utilize spray subelement to institute in chilling tower
It states and generates the cold liquid of material injection, thus after being respectively formed the liquid-phase chlorosilane containing silicon powder, the uncooled gas and vaporization
The gaseous mixture of cold liquid, and the gaseous mixture of the cold liquid after the uncooled gas and vaporization is expelled directly out；
2) processing is filtered to the liquid-phase chlorosilane containing silicon powder using filter element, to obtain the liquid phase chlorine silicon of not silicon powder-containing
Alkane is returned in chilling tower as clean material and is mixed with the generation material；
Step 2) further include: pressurized treatment first is carried out to the liquid-phase chlorosilane containing silicon powder, to form pressurized silicon powder-containing
Liquid-phase chlorosilane, then processing is filtered to the pressurized liquid-phase chlorosilane containing silicon powder；
3) condensation process is carried out to the mixture of the generation material and the clean material, to be respectively formed the liquid containing silicon powder
Phase chlorosilane and the uncooled gas, and the uncooled gas is expelled directly out；
In step 3), condensation process is carried out to the mixture of the generation material and the clean material specifically: in chilling
Cold liquid is sprayed to the mixture of the generation material and the clean material using spray subelement in tower, to be respectively formed
The gaseous mixture of cold liquid after liquid-phase chlorosilane containing silicon powder, the uncooled gas and vaporization, and the uncooled gas and vapour
The gaseous mixture of cold liquid after change is expelled directly out；
4) step 2) and step 3) are repeated, to remove the silicon powder in the generation material.
5. dust removal method according to claim 4, which is characterized in that step 2) further include: to the liquid phase containing silicon powder
When chlorosilane is filtered processing, if the liquid phase chlorine of the liquid-phase chlorosilane containing silicon powder and filtered not silicon powder-containing before filtering
The pressure difference of silane reaches pre-set limit, then carries out deslagging processing, so that the clean material is drained into downstream recovery process.
6. dust removal method according to claim 4, which is characterized in that make the pressure of the liquid-phase chlorosilane of pressurized silicon powder-containing
Power range is 2.5-3.5MPa.
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| WO2019098344A1 (en) * | 2017-11-20 | 2019-05-23 | 株式会社トクヤマ | Method for producing trichlorosilane and device for producing trichlorosilane |
| CN113117442B (en) * | 2020-01-10 | 2023-05-02 | 新疆新特晶体硅高科技有限公司 | Tail gas treatment method and system in polysilicon production |
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| CN202808382U (en) * | 2012-08-28 | 2013-03-20 | 四川瑞能硅材料有限公司 | Trichlorosilane synthesis gas wet dust collection device |
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Application publication date: 20170104 Assignee: Xinte silicon based new materials Co.,Ltd. Assignor: XINTE ENERGY Co.,Ltd. Contract record no.: X2023990000586 Denomination of invention: Dust removal system and method used in polycrystalline silicon production Granted publication date: 20191015 License type: Common License Record date: 20230605 |
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