CN202297154U - Wet process dust removal device in trichlorosilane production - Google Patents
Wet process dust removal device in trichlorosilane production Download PDFInfo
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- CN202297154U CN202297154U CN2011203914783U CN201120391478U CN202297154U CN 202297154 U CN202297154 U CN 202297154U CN 2011203914783 U CN2011203914783 U CN 2011203914783U CN 201120391478 U CN201120391478 U CN 201120391478U CN 202297154 U CN202297154 U CN 202297154U
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- dust removal
- trichlorosilane
- wash tower
- wet process
- gas wash
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Abstract
The utility model relates to a wet process dust removal device in trichlorosilane production, belongs to the technical field of chemical production equipment and is used for realizing the dust removal on synthetic gas in the trichlorosilane production. The technical scheme of the wet process dust removal device is that the wet process dust removal device consists of a dust removal tower, a condenser, a flow return tank, a flow return pump and a stirring tank, wherein an input pipeline arranged at the lower part of the dust removal tower is connected with a bag type dust remover, an output pipeline arranged at the upper part of the dust removal tower is sequentially connected with the condenser and the flow return tank, the condenser is connected with a water cooler, the flow return tank is connected with the upper part of the dust removal tower, liquid trichlorosilane and liquid silicon tetrachloride are filled in a spraying pipe of the dust removal tower, an output pipe arranged at the bottom of the dust removal tower is connected with the stirring tank, and the bottom of the stirring tank is provided with an impurity output pipeline. The wet process dust removal device uses the richlorosilane and the silicon tetrachloride as washing liquid, synthetic gas impurities can be effectively removed, the equipment and pipeline blockage is reduced, the production period is prolonged, the safety and the continuity of the production are improved, the wet process dust removal device has the advantages of safety, environment friendliness and high efficiency, and good economic and social benefits are realized.
Description
Technical field
The utility model relates to a kind of cleaning apparatus that in trichlorosilane is produced, uses, and belongs to the chemical production equipment technical field.
Background technology
Trichlorosilane is the important source material of producing polysilicon; Along with polysilicon extensive applications such as science and technology, national defence, industry in modern times; The production of trichlorosilane has also obtained fast development, improves the quality of products, reduces cost consumption, expanding production capacity becomes the target that each manufacturer competitively chases.But find aborning; The synthesis gas components that synthetic furnace comes out is very complicated; Except the major product trichlorosilane produced and silicon tetrachloride cause having a lot of by products and supervene owing to bring the impurity that comes in the feed metal silicon into, the synthesizer that mixes through cyclonic separation and bag filter filtration after; These are referred to as the by product of metal chloride; Because boiling point is higher than the boiling point of trichlorosilane and silicon tetrachloride, do not understand before trichlorosilane and silicon tetrachloride have condensation and just begin to be flocked in a large number in production unit and the pipeline, directly influenced production.The method for cleaning of employing is that water or manual work are directly cleared up at present, meets reasons such as water vigorous reaction and a large amount of hydrogenchloride of generation owing to muriate, and scale removal process is dangerous greatly, environmental pollution is big, operator's poor working environment, is difficult to clean out.If can not remove these muriates effectively, can cause subsequent handling to stop up, need parking maintenance, make the production cycle shorten, influence output.Therefore; The impurity such as metal waste that generate in white residue that has in the synthesis gas of discharging in the trichlorosilane synthetic furnace and the reaction are removed; Reduce follow-up material causes equipment and pipeline in condensation process chocking-up degree; Be safety and the successional effective measure that extend manufacture cycle, improve plant factor, improve production, be necessary to implement energetically.
The utility model content
The utility model technical problem to be solved provides a kind of chocking-up degree that can reduce equipment that the follow-up material of trichlorosilane synthetic furnace causes and pipeline to greatest extent in the main condenser condensation process, prolongs the stable operation cycle, has improved security and the successional Wet-way dust-collector produced.
The technical scheme that solves the problems of the technologies described above is:
Wet-way dust-collector during a kind of trichlorosilane is produced; It is made up of gas wash tower, condensing surface, return tank, reflux pump, stirred pot; The bottom of gas wash tower has input channel to be connected with sack cleaner, and the top of gas wash tower has output channel to be connected successively with condensing surface, return tank, and the output channel of condensing surface is connected with water cooler; Return tank has output channel to pass through reflux pump to be connected with the top of gas wash tower; Shower is arranged in the gas wash tower, the trichlorosilane and the silicon tetrachloride of low temperature liquid arranged in the shower, the bottom of gas wash tower has output channel to be connected with stirred pot; The top of stirred pot has output channel to be connected with gas wash tower, and the bottom of stirred pot has the impurity output channel to be connected with hydrolysis workshop section.
Wet-way dust-collector during above-mentioned trichlorosilane is produced, the upper and lower ends of said condensing surface have water coolant input and water return pipeline respectively.
Wet-way dust-collector during above-mentioned trichlorosilane is produced, the upper and lower ends of said stirred pot has steam input pipe road and water return pipeline respectively, and stirred pot also is connected with the silicon tetrachloride input channel.
The usefulness of the utility model is:
The utility model utilizes trichlorosilane fully to contact with the dust-laden synthesis gas as washings with the liquid phase material of silicon tetrachloride; Can be effectively with the high refuse of metal that generates in white residue that has in the synthesis gas and the reaction; Remove like impurity such as iron trichloride, aluminum chloride, boron, phosphorus; Adopt trichlorosilane and silicon tetrachloride to make washing composition, both can recycle trichlorosilane and silicon tetrachloride, meet environmental protection requirement; Can solve the difficult problem of metal chloride occluding device pipeline again; And can reduce the equipment that follow-up material causes and the chocking-up degree of pipeline to greatest extent in the main condenser condensation process, and prolong the stable operation cycle, improved security, the continuity of producing greatly.The utlity model has safety, environmental protection, efficient, energy-saving advantages, good economic benefits and social benefit are arranged.
Description of drawings
Fig. 1 is the structural representation of the utility model.
Mark is following among the figure: sack cleaner 1, gas wash tower 2, condensing surface 3, return tank 4, reflux pump 5, stirred pot 6, water cooler 7, water coolant 8, vapour source 9, silicon tetrachloride pipeline 10, hydrolysis workshop section 11.
Embodiment
The synthesis gas that in trichlorosilane synthetic furnace, comes out earlier through settling vessel, revolve equipment such as branch separator, sack cleaner 1 with the gas with white residue capture; Realize gas-solid separation; And the synthesis gas after the capture dedusting gets into the wet dedusting tower again; Utilize the method for liquid drip washing synthesis gas, realize the solution-air separation, the gas after the wet dedusting cools off through cooling system again.
Show among the figure that the utility model is made up of gas wash tower 2, condensing surface 3, return tank 4, reflux pump 5, stirred pot 6.
The bottom of gas wash tower 2 has input channel to be connected with sack cleaner 1, and synthesis gas gets into gas wash tower 2 by sack cleaner 1.
The top of gas wash tower 2 has output channel to be connected successively with condensing surface 3, return tank 4.The output channel of condensing surface 3 is connected with water cooler 7, and purified gas gets into water cooler 7 to subsequent technique.Return tank 4 has output channel to pass through reflux pump 5 to be connected with the top of gas wash tower 2, the liquid phase trichlorosilane and the silicon tetrachloride of condensation after the dedusting are failed back gas wash tower 2 as washing composition,
In the gas wash tower 2 shower is arranged, the trichlorosilane and the silicon tetrachloride of low temperature liquid arranged in the shower, as the dedusting washing composition, the input channel that gets into gas wash tower 2 tops from reflux pump 5 is connected with shower.
Show among the figure; The bottom of gas wash tower 2 has output channel to be connected with stirred pot 6; The top of stirred pot 6 has output channel to be connected with gas wash tower 2, and the upper and lower ends of stirred pot 6 has steam input pipe road and water return pipeline respectively, and the impurity output channel is arranged at the bottom of stirred pot 6; Stirred pot 6 also is connected with the silicon tetrachloride input channel, and 6 pairs of sedimentary impurity of stirred pot are handled.
Show among the figure that the upper and lower ends of condensing surface has water coolant input and water return pipeline respectively, and condensing surface is cooled off.
The working process of the utility model is following:
The bottom of gas wash tower is provided with the synthesis gas inlet pipe; Top is provided with synthesis gas and goes out pipe, and the synthetic gas that comes out in the synthetic furnace gets into gas wash tower 2 dedustings again after through sack cleaner 1 dedusting; Gas wash tower 2 adopts spray technology; Use cryogenic trichlorosilane and silicon tetrachloride to make washing composition, metal chloride is because the low reverse and cryogenic trichlorosilane of boiling point, silicon tetrachloride become solid form after contacting, together collect in gas wash tower 2 towers with washing composition at the bottom of.Synthesis gas after the purification gets into condensing surface 3 from gas wash tower 2 cats head; Liquid phase trichlorosilane in condensing surface 3 under the condensation and silicon tetrachloride are failed back gas wash tower 2 as washing composition through return tank 4 and reflux pump 5, and most of purified gas gets into water cooler 7 to subsequent technique through condensing surface 3.Constantly get into stirred pot 6 through the impurity after the washing at the tired liquid-solid mixture of gas wash tower 2 tower prodelta clay for muddy state; Evaporation through steam with trichlorosilane, silicon tetrachloride with gas phase send gas wash tower 2 back to, metal chloride that washs and dust are sent to hydrolysis workshop section 11 again and are hydrolyzed to absorb and handle.
Claims (3)
1. the Wet-way dust-collector during a trichlorosilane is produced; It is characterized in that: it is made up of gas wash tower (2), condensing surface (3), return tank (4), reflux pump (5), stirred pot (6); The bottom of gas wash tower (2) has input channel to be connected with sack cleaner (1); The top of gas wash tower (2) has output channel to be connected successively with condensing surface (3), return tank (4); The output channel of condensing surface (3) is connected with water cooler (7), and return tank (4) has output channel to pass through reflux pump (5) to be connected with the top of gas wash tower (2), and gas wash tower has shower in (2); Trichlorosilane and silicon tetrachloride that low temperature liquid is arranged in the shower; The bottom of gas wash tower (2) has output channel to be connected with stirred pot (6), and the top of stirred pot (6) has output channel to be connected with gas wash tower (2), and the bottom of stirred pot (6) has the impurity output channel to be connected with hydrolysis workshop section (11).
2. the Wet-way dust-collector during trichlorosilane according to claim 1 is produced is characterized in that: the upper and lower ends of said condensing surface (3) has water coolant input and water return pipeline respectively.
3. the Wet-way dust-collector during trichlorosilane according to claim 2 is produced, it is characterized in that: the upper and lower ends of said stirred pot (6) has steam input pipe road and water return pipeline respectively, and stirred pot (6) also is connected with the silicon tetrachloride input channel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203914783U CN202297154U (en) | 2011-10-14 | 2011-10-14 | Wet process dust removal device in trichlorosilane production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203914783U CN202297154U (en) | 2011-10-14 | 2011-10-14 | Wet process dust removal device in trichlorosilane production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202297154U true CN202297154U (en) | 2012-07-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203914783U Expired - Fee Related CN202297154U (en) | 2011-10-14 | 2011-10-14 | Wet process dust removal device in trichlorosilane production |
Country Status (1)
| Country | Link |
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| CN (1) | CN202297154U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102849745A (en) * | 2012-09-24 | 2013-01-02 | 华陆工程科技有限责任公司 | Dust removal process and system for trichlorosilane production |
| CN102908795A (en) * | 2012-09-17 | 2013-02-06 | 中国恩菲工程技术有限公司 | Processing method and processing system for trichlorosilane synthesis tail gas |
| CN103693649A (en) * | 2013-11-25 | 2014-04-02 | 新特能源股份有限公司 | Impurity-removal and waste chlorosilane liquid-recovery method of synthetic gas production technology |
| CN104524904A (en) * | 2014-12-31 | 2015-04-22 | 内蒙古神舟硅业有限责任公司 | Method for filtering tail gas impurities in polycrystalline silicon production process |
| CN115804992A (en) * | 2023-02-10 | 2023-03-17 | 山东东岳有机硅材料股份有限公司 | Device and process for purifying methyl chlorosilane synthesis gas |
-
2011
- 2011-10-14 CN CN2011203914783U patent/CN202297154U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102908795A (en) * | 2012-09-17 | 2013-02-06 | 中国恩菲工程技术有限公司 | Processing method and processing system for trichlorosilane synthesis tail gas |
| CN102908795B (en) * | 2012-09-17 | 2015-08-05 | 中国恩菲工程技术有限公司 | A kind of processing method of technique of trichlorosilane synthetic tail gas and system |
| CN102849745A (en) * | 2012-09-24 | 2013-01-02 | 华陆工程科技有限责任公司 | Dust removal process and system for trichlorosilane production |
| CN102849745B (en) * | 2012-09-24 | 2014-08-06 | 华陆工程科技有限责任公司 | Dust removal process and system for trichlorosilane production |
| CN103693649A (en) * | 2013-11-25 | 2014-04-02 | 新特能源股份有限公司 | Impurity-removal and waste chlorosilane liquid-recovery method of synthetic gas production technology |
| CN104524904A (en) * | 2014-12-31 | 2015-04-22 | 内蒙古神舟硅业有限责任公司 | Method for filtering tail gas impurities in polycrystalline silicon production process |
| CN115804992A (en) * | 2023-02-10 | 2023-03-17 | 山东东岳有机硅材料股份有限公司 | Device and process for purifying methyl chlorosilane synthesis gas |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120704 Termination date: 20141014 |
|
| EXPY | Termination of patent right or utility model |