CN101628720A - Production process for pressuring and condensing trichlorosilane synthesized product - Google Patents

Production process for pressuring and condensing trichlorosilane synthesized product Download PDF

Info

Publication number
CN101628720A
CN101628720A CN200910065895A CN200910065895A CN101628720A CN 101628720 A CN101628720 A CN 101628720A CN 200910065895 A CN200910065895 A CN 200910065895A CN 200910065895 A CN200910065895 A CN 200910065895A CN 101628720 A CN101628720 A CN 101628720A
Authority
CN
China
Prior art keywords
compression
water cooler
synthetic product
tail gas
hydrogen pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200910065895A
Other languages
Chinese (zh)
Inventor
严大洲
肖荣晖
毋克力
杜俊平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LUOYANG ZHONGGUI HIGH-TECH Co Ltd
Original Assignee
LUOYANG ZHONGGUI HIGH-TECH Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LUOYANG ZHONGGUI HIGH-TECH Co Ltd filed Critical LUOYANG ZHONGGUI HIGH-TECH Co Ltd
Priority to CN200910065895A priority Critical patent/CN101628720A/en
Publication of CN101628720A publication Critical patent/CN101628720A/en
Pending legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)

Abstract

The invention discloses a production process for pressuring and condensing trichlorosilane synthesized products, which is implemented in a before-compression water cooler, a before-compression copious cooler, a hydrogen compressor, an after-compression copious cooler, a synthetic product storage tank and a tail gas dry-method recovery system. The production process comprises five processes of before-compression water cooling, before-compression copious cooling, hydrogen compressor pressuring, after-compression copious cooling and tail gas dry-method recovery. The invention effectively improves the condensation efficiency of the trichlorosilane synthesized product; after one-time pressuring and condensation, the recovery of chlorosilane is more than 90%; and then after being processed by the tail gas dry-method recovery system, the product is pressured and condensated once again, the condensation recovery of chlorosilane is more than 99%. The production process can reduce refrigerant consumption and extend the service cycle of hydrogen compressors.

Description

The production technique of pressuring and condensing trichlorosilane synthesized product
Technical field
The invention belongs to chemical production technical field, specially refer to a kind of production technique of pressuring and condensing trichlorosilane synthesized product.
Background technology
Trichlorosilane is an important intermediate of making silane coupling agent and other organosilicon product, still as the important raw and processed materials for preparing semiconductor grade polysilicon and solar-grade polysilicon.Along with international and domestic increase day by day to the polysilicon demand at present, the stable supply of high quality and large batch of trichlorosilane seems particularly important.
The synthetic normal pressure synthesis technology that adopts mostly of trichlorosilane, single device production capacity, raw material availability are lower, the system configuration imperfection, as do not have special-purpose liquid chlorine carburetion system, no liquid chlorine or hydrogenchloride dewatering unit, waste gas vent gas treatment recovery system imperfection etc.
The trichlorosilane synthetic product is meant the mixed gas that adopts after industrial silica fume and HCl synthesize, and this mixed gas is removed dust and comprised H outward 2, HCl, SiHCl 3, SiH 2Cl 2Or SiCl 4Deng, trichlorosilane synthetic product as referred to herein also can refer to this mixed gas.
After condensation separation, still have an appointment 10% chlorosilane (SiHCl of synthetic product 3+ SiCl 4) and a large amount of H 2Enter tail gas with HCl, efflux tail gas and adopt wet processing, not only consume alkali lye and water, and have new waste water and waste residue generation, environment is polluted, and cause the supplies consumption height such as chlorine, hydrogen and silica flour of unit product, product cost increases.Along with production-scale expansion, these problems will be more outstanding, even become the technical bottleneck of restriction enterprise development growth.
Patent CN101279734A discloses a kind of method of synthesizing trichlorosilane, and synthetic product is through water-cooled, pressurization and-40 ℃ of refrigerant deep coolings.Some chlorosilanes is not condensed though this patent has also adopted the mode of pressurization condensation.
Summary of the invention
For addressing the above problem, the invention provides a kind of production technique of pressuring and condensing trichlorosilane synthesized product, it is not high that this production technique efficiently solves the synthetic product condensation efficiency, and the problem that refrigerant consumption is too big has prolonged the turnaround of total system.
For achieving the above object, the present invention adopts following technical scheme:
The production technique of described pressuring and condensing trichlorosilane synthesized product is that water cooler, hydrogen pressure machine, the dark water cooler in compression back, sintetics storage tank and tail gas dry process recovery system are implemented deeply before watercooler, the compression before compression, production technique comprises deep cooling, hydrogen pressure machine pressurization before water-cooled before the compression, the compression, compression back deep cooling and tail gas dry process and reclaims five processes, and the five processes division is as follows:
Water-cooled before I, the compression
After trichlorosilane synthetic product watercooler bottom before compress enters from it portion come out to enter dark water cooler before the compression, watercooler adopts the ordinary cycle water cooling before the compression;
Deep cooling before II, the compression
The trichlorosilane synthetic product that watercooler comes out before compress enters the dark water cooler in compression back, the dark water cooler in compression back adopts-55~-30 ℃ of refrigerants to make refrigerant, the dark water cooler gas outlet temperature in control compression back is at-40~0 ℃, in the trichlorosilane synthetic product that is condensed as SiHCl 3, SiCl 4Be transported to the sintetics storage tank, the trichlorosilane synthetic product such as the H that are not condensed 2, HCl or part Si HCl 3, SiH 2Cl 2, SiCl 4Enter the hydrogen pressure machine;
III, the pressurization of hydrogen pressure machine
The trichlorosilane synthetic product that is not condensed that comes out from dark water cooler enters the compression of hydrogen pressure machine, and this moment, the intake pressure of hydrogen pressure machine was controlled at 0.01~0.1Mpa, is controlled at 0.3~0.8Mpa through the top hole pressure after the pressurization of hydrogen pressure machine;
IV, compression back deep cooling
Enter the dark water cooler in compression back and adopt-55~-30 ℃ of refrigerants to make refrigerant through the trichlorosilane synthetic product after the pressurization of hydrogen pressure machine, in the trichlorosilane synthetic product as SiHCl 3, SiCl 4Be condensed and enter the sintetics storage tank; A large amount of H in the trichlorosilane synthetic product 2, HCl or a spot of SiHCl 3, SiH 2Cl 2, SiCl 4The mixed gas that is not condensed enters the tail gas dry process recovery system;
V, tail gas dry process reclaim
Through containing SiHCl after the processing of tail gas dry process recovery system 3, SiH 2Cl 2, SiCl 4Mixed gas enter compression once more before dark water cooler carry out circular treatment, the H that contains after simultaneously the tail gas dry process recovery system being handled 2, HCl implements to reclaim.
Because adopt aforesaid technical scheme, the present invention has following superiority:
1, the present invention has effectively improved the condensation efficiency of trichlorosilane synthetic product, and after the condensation of once pressurizeing, the chlorosilane rate of recovery is more than 90%, and through the condensation of pressurizeing once more after the processing of tail gas dry process recovery system, the chlorosilane condensation rate of recovery reaches more than 99% again.
2, the present invention can reduce refrigerant consumption, prolongs hydrogen pressure machine life cycle.
Description of drawings
Fig. 1 is a production technique synoptic diagram of the present invention.
Embodiment
Explanation once more: trichlorosilane synthetic product of the present invention is meant the mixed gas that adopts after industrial silica fume and HCl synthesize, and this mixed gas is removed dust and comprised H outward 2, HCl, SiHCl 3, SiH 2Cl 2Or SiCl 4Deng.The trichlorosilane synthetic product of indication also can refer to this mixed gas in the literary composition.
In conjunction with Fig. 1, the production technique of pressuring and condensing trichlorosilane synthesized product of the present invention is that water cooler, hydrogen pressure machine, the dark water cooler in compression back, sintetics storage tank and tail gas dry process recovery system are implemented deeply before watercooler, the compression before compression, production technique comprises deep cooling, hydrogen pressure machine pressurization before water-cooled before the compression, the compression, compression back deep cooling and tail gas dry process and reclaims five processes, and the five processes division is as follows:
Water-cooled before the compression: after trichlorosilane synthetic product watercooler bottom before compress enters from it portion come out to enter dark water cooler before the compression, watercooler adopts the ordinary cycle water cooling before the compression.Water cooling has significantly reduced the mixed gas temperature through ordinary cycle, reduces back technology refrigerant consumption.
Deep cooling before the compression: the trichlorosilane synthetic product that watercooler comes out before compress enters the dark water cooler in compression back, the dark water cooler in compression back adopts-55~-30 ℃ of refrigerants to make refrigerant, refrigerant adopts freonll-11, the dark water cooler gas outlet temperature in control compression back is at-40~0 ℃, in the trichlorosilane synthetic product that is condensed as SiHCl 3, SiCl 4Be transported to the sintetics storage tank, the trichlorosilane synthetic product such as the H that are not condensed 2, HCl or part Si HCl 3, SiH 2Cl 2, SiCl 4Enter the hydrogen pressure machine.
The pressurization of hydrogen pressure machine: the trichlorosilane synthetic product that is not condensed that comes out from dark water cooler enters the compression of hydrogen pressure machine, and this moment, the intake pressure of hydrogen pressure machine was controlled at 0.01~0.1Mpa, is controlled at 0.3~0.8Mpa through the top hole pressure after the pressurization of hydrogen pressure machine;
Compression back deep cooling: enter the dark water cooler in compression back and adopt-55~-30 ℃ of refrigerants to make refrigerant through the trichlorosilane synthetic product after the pressurization of hydrogen pressure machine, in the trichlorosilane synthetic product as SiHCl 3, SiCl 4Be condensed and enter the sintetics storage tank; A large amount of H in the trichlorosilane synthetic product 2, HCl or a spot of SiHCl 3, SiH 2Cl 2, SiCl 4The mixed gas that is not condensed enters the tail gas dry process recovery system;
Tail gas dry process reclaims: will contain SiHCl after handling through the tail gas dry process recovery system 3, SiH 2Cl 2, SiCl 4Mixed gas enter compression once more before dark water cooler carry out circular treatment, through the condensation of pressurizeing once more, SiHCl 3, SiCl 4Get off Deng condensation.
Add for the first time after the condensation and still have a spot of chlorosilane not have condensation to get off in the mixed gas,, not only reduced the chlorosilane rate of recovery of synthetic product, and efflux drip washing and increased burden to environment if can not recycle.The mixed gas that contains small amounts of chlorine silane enters the preceding dark water cooler of compression through the condensation of pressurizeing once more, mixes the back condensation of pressurizeing with gas that watercooler before compress comes out, improved the chlorosilane organic efficiency greatly, it is reached more than 99%, thereby effectively reduced the refrigerant consumption, prolonged the total system turnaround.
The H that contains after simultaneously the tail gas dry process recovery system being handled 2, HCl implements to recycle.
The employed tail gas dry process recovery system of production technique of the present invention mainly is made of three activated carbon adsorbers of parallel connection, wherein the activated carbon adsorber of one deck layout is made adsorption treatment, the activated carbon adsorber that one deck is arranged is done cooling and is handled, the activated carbon adsorber that one deck is arranged is made manipulation of regeneration, sorbent material in each layer activated carbon adsorber state of living in can carry out periodicity automatically by time controller to be adjusted by turns, and other repeats no more.

Claims (1)

1, a kind of production technique of pressuring and condensing trichlorosilane synthesized product, it is characterized in that: this production technique is that water cooler, hydrogen pressure machine, the dark water cooler in compression back, sintetics storage tank and tail gas dry process recovery system are implemented deeply before watercooler, the compression before compression, production technique comprises deep cooling, hydrogen pressure machine pressurization before water-cooled before the compression, the compression, compression back deep cooling and tail gas dry process and reclaims five processes, and the five processes division is as follows:
Water-cooled before I, the compression
After trichlorosilane synthetic product watercooler bottom before compress enters from it portion come out to enter dark water cooler before the compression, watercooler adopts the ordinary cycle water cooling before the compression;
Deep cooling before II, the compression
The trichlorosilane synthetic product that watercooler comes out before compress enters the dark water cooler in compression back, the dark water cooler in compression back adopts-55~-30 ℃ of refrigerants to make refrigerant, the dark water cooler gas outlet temperature in control compression back is at-40~0 ℃, in the trichlorosilane synthetic product that is condensed as SiHCl 3, SiCl 4Be transported to the sintetics storage tank, the trichlorosilane synthetic product such as the H that are not condensed 2, HCl or part Si HCl 3, SiH 2Cl 2, SiCl 4Enter the hydrogen pressure machine;
III, the pressurization of hydrogen pressure machine
The trichlorosilane synthetic product that is not condensed that comes out from dark water cooler enters the compression of hydrogen pressure machine, and this moment, the intake pressure of hydrogen pressure machine was controlled at 0.01~0.1Mpa, is controlled at 0.3~0.8Mpa through the top hole pressure after the pressurization of hydrogen pressure machine;
IV, compression back deep cooling
Enter the dark water cooler in compression back and adopt-55~-30 ℃ of refrigerants to make refrigerant through the trichlorosilane synthetic product after the pressurization of hydrogen pressure machine, in the trichlorosilane synthetic product as SiHCl 3, SiCl 4Be condensed and enter the sintetics storage tank; A large amount of H in the trichlorosilane synthetic product 2, HCl or a spot of SiHCl 3, SiH 2Cl 2, SiCl 4The mixed gas that is not condensed enters the tail gas dry process recovery system;
V, tail gas dry process reclaim
Through containing SiHCl after the processing of tail gas dry process recovery system 3, SiH 2Cl 2, SiCl 4Mixed gas enter compression once more before dark water cooler carry out circular treatment, the H that contains after simultaneously the tail gas dry process recovery system being handled 2, HCl implements to reclaim.
CN200910065895A 2009-08-24 2009-08-24 Production process for pressuring and condensing trichlorosilane synthesized product Pending CN101628720A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200910065895A CN101628720A (en) 2009-08-24 2009-08-24 Production process for pressuring and condensing trichlorosilane synthesized product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200910065895A CN101628720A (en) 2009-08-24 2009-08-24 Production process for pressuring and condensing trichlorosilane synthesized product

Publications (1)

Publication Number Publication Date
CN101628720A true CN101628720A (en) 2010-01-20

Family

ID=41574026

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200910065895A Pending CN101628720A (en) 2009-08-24 2009-08-24 Production process for pressuring and condensing trichlorosilane synthesized product

Country Status (1)

Country Link
CN (1) CN101628720A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103599672A (en) * 2013-11-08 2014-02-26 中国恩菲工程技术有限公司 Method and system for treating polycrystalline silicon reducing tail gas
CN104310406A (en) * 2014-10-11 2015-01-28 江西赛维Ldk太阳能多晶硅有限公司 Recovery device and recovery method for trichlorosilane synthetic tail gas
US11612869B2 (en) 2017-11-20 2023-03-28 Tokuyama Corporation Production method for trichlorosilane, and pipe

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103599672A (en) * 2013-11-08 2014-02-26 中国恩菲工程技术有限公司 Method and system for treating polycrystalline silicon reducing tail gas
CN103599672B (en) * 2013-11-08 2015-08-05 中国恩菲工程技术有限公司 The processing method of polycrystalline silicon reduction exhaust and system
CN104310406A (en) * 2014-10-11 2015-01-28 江西赛维Ldk太阳能多晶硅有限公司 Recovery device and recovery method for trichlorosilane synthetic tail gas
CN104310406B (en) * 2014-10-11 2016-06-22 江西赛维Ldk太阳能多晶硅有限公司 The retracting device of technique of trichlorosilane synthetic tail gas and recovery method thereof
US11612869B2 (en) 2017-11-20 2023-03-28 Tokuyama Corporation Production method for trichlorosilane, and pipe

Similar Documents

Publication Publication Date Title
CN101357764B (en) Polysilicon preparation method of recovering hydrogen chloride in circulating exhaust
CN101327912B (en) Method for reclaiming hydrogen from tail gas from polysilicon production
CN101791487B (en) Method for recycling hydrogen chloride in tail gas of polysilicon production
CN101357292B (en) Method for recovering tail-gas generated during producing polycrystalline silicon using silicon tetrachloride
CN101638233B (en) Dry method recovery technique of trichlorosilane synthetic tail gas
CN101377376B (en) Method for recovering tail gas generated by polycrystalline silicon production
CN103553048B (en) The method and system that in polysilicon production process, Matter Transfer utilizes
CN103058140B (en) Recovery system and recovery method of by-product in polycrystalline silicon production
CN103111157A (en) Method for purifying and recovering discharge tail gas of regeneration process of adsorption tower in polycrystalline silicon production
CN101357288B (en) Hydrogen chloride circulation recovering method from off-gas generated from the production of polycrystalline silicon
CN101628710B (en) Method for producing high-purity concentrated hydrochloric acid by adopting hydrogen chloride gas containing chlorosilane
CN101254387A (en) Voltage transformation adsorption method for separating mixture gas containing hydrogen and chloro-silicane and/or hydrogenchloride mixture gas
CN101376499B (en) Method for preparing polysilicon
CN101357286B (en) Method for recovering dichloro-dihydro silicon from off-gas generated from the production of polycrystalline silicon
CN101628720A (en) Production process for pressuring and condensing trichlorosilane synthesized product
CN101372336B (en) Method for preparing polysilicon
CN202246098U (en) Trichlorosilane synthesizing equipment
CN102390836A (en) Trichlorosilane synthesis process and equipment
CN101376078B (en) Method for recovering and processing tail gas produced from production of polycrystalline silicon
CN101372335B (en) Method for preparing polysilicon
CN104555925A (en) Method for recycling tail gas in trichlorosilane production process
CN111268682B (en) Composition for preparing polycrystalline silicon, preparation method and preparation system
CN209554785U (en) Hydrolyzing chlorosilane prepares the device of hydrogen chloride
CN104261412B (en) Process the method and system of thick trichlorosilane
CN101357287B (en) Method for recovering hydrogen chloride from off-gas generated from the production of polycrystalline silicon

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C12 Rejection of a patent application after its publication
RJ01 Rejection of invention patent application after publication

Open date: 20100120