JP2013072131A5 - - Google Patents
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- Publication number
- JP2013072131A5 JP2013072131A5 JP2011214301A JP2011214301A JP2013072131A5 JP 2013072131 A5 JP2013072131 A5 JP 2013072131A5 JP 2011214301 A JP2011214301 A JP 2011214301A JP 2011214301 A JP2011214301 A JP 2011214301A JP 2013072131 A5 JP2013072131 A5 JP 2013072131A5
- Authority
- JP
- Japan
- Prior art keywords
- anode electrodes
- divided anode
- workpiece
- workpieces
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011214301A JP5795514B2 (ja) | 2011-09-29 | 2011-09-29 | 連続メッキ装置 |
DE102012018393.3A DE102012018393B4 (de) | 2011-09-29 | 2012-09-18 | Serielles Galvanisierungssystem |
TW101134938A TWI564431B (zh) | 2011-09-29 | 2012-09-24 | 連續電鍍裝置 |
KR1020120105600A KR101475396B1 (ko) | 2011-09-29 | 2012-09-24 | 연속 도금 장치 |
US13/626,791 US20130081939A1 (en) | 2011-09-29 | 2012-09-25 | Serial plating system |
CN201210367382.2A CN103031588B (zh) | 2011-09-29 | 2012-09-28 | 连续电镀装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011214301A JP5795514B2 (ja) | 2011-09-29 | 2011-09-29 | 連続メッキ装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013072131A JP2013072131A (ja) | 2013-04-22 |
JP2013072131A5 true JP2013072131A5 (ru) | 2014-11-13 |
JP5795514B2 JP5795514B2 (ja) | 2015-10-14 |
Family
ID=47878724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011214301A Active JP5795514B2 (ja) | 2011-09-29 | 2011-09-29 | 連続メッキ装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20130081939A1 (ru) |
JP (1) | JP5795514B2 (ru) |
KR (1) | KR101475396B1 (ru) |
CN (1) | CN103031588B (ru) |
DE (1) | DE102012018393B4 (ru) |
TW (1) | TWI564431B (ru) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6115309B2 (ja) * | 2013-05-22 | 2017-04-19 | 住友金属鉱山株式会社 | 化学処理装置 |
EP2907900A1 (en) * | 2014-02-18 | 2015-08-19 | Italfimet S.R.L. | Electroplating process and apparatus, particularly for plating or forming parts made of electrically conducting materials by electrodeposition |
TWI530593B (zh) * | 2014-08-11 | 2016-04-21 | 亞智科技股份有限公司 | 多陽極控制裝置及具有該裝置的電鍍設備 |
CN104313657A (zh) * | 2014-11-10 | 2015-01-28 | 临安振有电子有限公司 | Hdi印制线路板通孔的电沉积装置 |
CN106149039B (zh) * | 2015-04-08 | 2017-11-24 | 亚硕企业股份有限公司 | 电镀设备 |
CN104862768B (zh) * | 2015-05-27 | 2017-09-22 | 广州杰赛科技股份有限公司 | 一种电路板的电镀方法及装置 |
TWI698554B (zh) * | 2015-10-20 | 2020-07-11 | 香港商亞洲電鍍器材有限公司 | 電鍍機器及電鍍方法 |
CN105350062B (zh) * | 2015-12-07 | 2018-01-19 | 依力柏电能有限公司 | 一种电镀装置 |
DE102016205417A1 (de) | 2016-04-01 | 2017-10-05 | Schaeffler Technologies AG & Co. KG | Oberflächenbehandlungsanlage zur elektrochemischen Oberflächenbehandlung von Wälzkörpern |
KR101880601B1 (ko) * | 2016-12-16 | 2018-08-17 | (주)포인텍 | 양극 이동형 전해도금 장치 |
KR20200075843A (ko) * | 2017-10-20 | 2020-06-26 | 아루멕쿠스 피이 가부시키가이샤 | 표면처리 장치 |
CN111247274A (zh) * | 2017-10-20 | 2020-06-05 | Almex Pe 株式会社 | 表面处理装置 |
JP6737527B2 (ja) * | 2017-10-20 | 2020-08-12 | アルメックスPe株式会社 | 表面処理装置 |
CN110699738A (zh) * | 2019-11-07 | 2020-01-17 | 俊杰机械(深圳)有限公司 | 一种五金工件独立电镀装置及工艺 |
KR102343926B1 (ko) * | 2020-04-03 | 2021-12-24 | (주)포인텍 | 분사압 조절형 노즐이 장착된 도금장치 |
KR102164884B1 (ko) * | 2020-06-30 | 2020-10-14 | (주)네오피엠씨 | 개별 지그의 전류를 제어하는 도금장치 |
KR102206395B1 (ko) * | 2020-06-30 | 2021-01-25 | (주)네오피엠씨 | 개별파티션을 구비한 도금장치 |
CN112760701B (zh) * | 2020-12-16 | 2022-04-12 | 景旺电子科技(珠海)有限公司 | 垂直连续电镀设备 |
CN114808057B (zh) * | 2021-01-29 | 2024-06-21 | 泰科电子(上海)有限公司 | 电镀装置和电镀系统 |
KR102306782B1 (ko) * | 2021-03-04 | 2021-09-30 | (주)네오피엠씨 | 기판 개별 전류량 제어 시스템 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3276983A (en) * | 1962-07-25 | 1966-10-04 | Gen Motors Corp | Method and apparatus for movement of workpieces in a plating machine |
JPS5243700Y2 (ru) * | 1971-06-30 | 1977-10-04 | ||
FR2396102A1 (fr) * | 1977-06-29 | 1979-01-26 | Trefimetaux | Procede de depot electrolytique en continu, a grande vitesse, sur un substrat metallique en mouvement |
US4378281A (en) | 1981-06-25 | 1983-03-29 | Napco, Inc. | High speed plating of flat planar workpieces |
DE3205969A1 (de) | 1982-02-19 | 1983-09-01 | Frisch Kabel- Und Verseilmaschinenbau Gmbh, 4030 Ratingen | Stromversorgung fuer elektrolyseanlagen |
US4492621A (en) * | 1982-09-29 | 1985-01-08 | Stubb Paul R | Method and apparatus for electrodeposition of materials |
JPS60128295A (ja) | 1983-12-16 | 1985-07-09 | Nippon Steel Corp | メツキ電流自動補償制御装置 |
JPS61133400A (ja) | 1984-12-03 | 1986-06-20 | Kosaku:Kk | 電気めつき装置 |
JPH01177400A (ja) * | 1988-01-06 | 1989-07-13 | Kosaku:Kk | めっき電流を自動調節するめっき装置 |
DD273653A1 (de) | 1988-07-04 | 1989-11-22 | Mikroelektronik Bruno Baum Zeh | Vorrichtung zum gleichmaessigen galvanischen beschichten mehrerer parallel in einem bad zu veredelnder bandfoermiger substrate |
DE3939681A1 (de) * | 1989-12-01 | 1991-06-06 | Schering Ag | Verfahren zur steuerung des ablaufes von galvanischen anlagen, sowie zur durchfuehrung des verfahrens dienender anordnung |
JP3178164B2 (ja) * | 1993-05-12 | 2001-06-18 | ソニー株式会社 | 電解めっき装置 |
DE19717512C3 (de) * | 1997-04-25 | 2003-06-18 | Atotech Deutschland Gmbh | Vorrichtung zum Galvanisieren von Leiterplatten unter konstanten Bedingungen in Durchlaufanlagen |
JP3299725B2 (ja) | 1998-12-11 | 2002-07-08 | 株式会社ケミトロン | メッキ方法とその装置 |
JP3715846B2 (ja) * | 1999-09-06 | 2005-11-16 | 大日本スクリーン製造株式会社 | 基板メッキ装置 |
JP3285572B2 (ja) * | 2000-06-09 | 2002-05-27 | 栄電子工業株式会社 | 分割電極部分を有する給電ローラを用いた連続めっき方法並びに装置 |
DE10153171B4 (de) * | 2001-10-27 | 2004-09-16 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum elektrolytischen Behandeln von Teilen in Durchlaufanlagen |
US7368043B2 (en) * | 2003-04-10 | 2008-05-06 | Applied Intellectual Capital | Configurations and methods of electrochemical lead recovery from contaminated soil |
KR100539239B1 (ko) * | 2003-06-25 | 2005-12-27 | 삼성전자주식회사 | 도금 중단에 의해 불량이 발생되는 것을 방지하는 도금방법 및 이에 이용되는 도금 장비 |
CN100523309C (zh) * | 2003-12-25 | 2009-08-05 | 亚洲电镀器材有限公司 | 电镀设备液体输送系统,有该系统的电镀设备及其操作方法 |
DE102005005095A1 (de) | 2005-02-04 | 2006-08-10 | Höllmüller Maschinenbau GmbH | Verfahren und Vorrichtung zur elektrochemischen Behandlung von Bauteilen in Durchlaufanlagen |
US8177945B2 (en) * | 2007-01-26 | 2012-05-15 | International Business Machines Corporation | Multi-anode system for uniform plating of alloys |
JP5457010B2 (ja) | 2007-11-01 | 2014-04-02 | アルメックスPe株式会社 | 連続めっき処理装置 |
JP2010020296A (ja) * | 2008-07-14 | 2010-01-28 | Toshiba Corp | 画像形成装置及びクリーナ装置 |
KR20100115955A (ko) * | 2009-04-21 | 2010-10-29 | 주식회사 티케이씨 | 수직연속도금 장치의 개별 급전장치 시스템 |
JP5650899B2 (ja) * | 2009-09-08 | 2015-01-07 | 上村工業株式会社 | 電気めっき装置 |
TWM400483U (en) * | 2010-04-06 | 2011-03-21 | Foxconn Advanced Tech Inc | Plating apparatus and method |
-
2011
- 2011-09-29 JP JP2011214301A patent/JP5795514B2/ja active Active
-
2012
- 2012-09-18 DE DE102012018393.3A patent/DE102012018393B4/de not_active Expired - Fee Related
- 2012-09-24 KR KR1020120105600A patent/KR101475396B1/ko active IP Right Grant
- 2012-09-24 TW TW101134938A patent/TWI564431B/zh active
- 2012-09-25 US US13/626,791 patent/US20130081939A1/en not_active Abandoned
- 2012-09-28 CN CN201210367382.2A patent/CN103031588B/zh active Active
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