JP2013072131A5

JP2013072131A5 -

Info

Publication number: JP2013072131A5
Application number: JP2011214301A
Authority: JP
Filing date: 2011-09-29
Publication date: 2014-11-13
Anticipated expiration: 2031-09-29

Description

本願出願人による特許文献１に、共通陽極電極と、分割陰極レールを用いた電流制御方法が開示されている。この方法は、特許文献１の図１に示すように、例えば５つのユニットが、対応する５つの分割陰極レール（陰極中継部材）を介して、メッキ槽ユニット内を連続搬送される最大５個のワークに一定の電流密度（Ａ／ｄｍ ^２）となるように給電する。５つの電源ユニットは、ワーク全面が共通陽極電極と対向している全部浸漬状態では、設定電流値（Ａ／ｄｍ^２）にて定電流制御する。さらに、最上流の電源ユニットは、メッキ槽内に搬入される部分浸漬状態のワークと共通陽極電極とが対向する電解面積に基づいて、電流を漸増制御する。最下流の電源ユニットは、メッキ槽ユニット内より搬出される部分浸漬状態のワークと共通陽極電極とが対向する電解面積に基づいて、電流を漸減制御する。 Patent Document 1 by the present applicant discloses a current control method using a common anode electrode and a divided cathode rail. In this method, as shown in FIG. 1 of Patent Document 1, for example, five units are continuously conveyed through the plating tank unit through five corresponding divided cathode rails (cathode relay members). Power is supplied to the workpiece so as to have a constant current density (A / dm ² ) . The five power supply units perform constant current control at a set current value (A / dm ² ) in a fully immersed state where the entire work surface faces the common anode electrode. Furthermore, the most upstream power supply unit gradually increases the current based on the electrolytic area where the partially immersed workpiece and the common anode electrode carried into the plating tank face each other. The most downstream power supply unit gradually reduces the current based on the electrolytic area where the partially immersed workpiece and the common anode electrode that are carried out of the plating tank unit face each other.

分割陽極電極４０（４０−１〜４０−４）の各一つと共通陰極電極３０とに接続され、分割陽極電極４０（４０−１〜４０−４）に供給される電流をそれぞれ独立して制御する複数の電源５０（５０−１〜５０−４）が設けられている。第１電極４０Ａ（４０Ａ−１〜４０Ａ−４）に接続される電源を第１電源５０Ａ（５０Ａ−１〜５０Ａ−４）と称し、第２電極４０Ｂ（４０Ｂ−１〜４０Ｂ−４）に接続される電源を第２電源５０Ｂ（５０Ｂ−１〜５０Ｂ−４）と称する。第１電源５０Ａ（５０Ａ−１〜５０Ａ−４）と第２電源５０Ｂ（５０Ｂ−１〜５０Ｂ−４）の各々が、独立して電流値を設定することができる。 Each of the divided anode electrodes 40 (40-1 to 40-4) is connected to the common cathode electrode 30 and the current supplied to the divided anode electrodes 40 (40-1 to 40-4) is independently controlled. A plurality of power supplies 50 (50-1 to 50-4) are provided. A power source connected to the first electrode 40A (40A-1 to 40A-4) is referred to as a first power source 50A (50A-1 to 50A-4) and connected to the second electrode 40B (40B-1 to 40B-4). The power source to be used is referred to as a second power source 50B (50B-1 to 50B-4). Each of the first power supply 50A (50A-1 to 50A-4) and the second power supply 50B (50B-1 to 50B-4) can independently set a current value.

本実施形態では、メッキ槽１０には、ロット単位で複数のワークＷ１〜ＷＮが供給される。図５（Ａ）に示すように、同一ロットの最先のワークＷ１が分割陽極電極４０Ａ−１〜４０Ａ−４の各一つと対向する時には、ワークＷ１の下流にはメッキ対象の他のワークが存在しない。あるいは、ワークＷ１の下流に上述した隙間Ｇを設けてワーク端部への電界集中を避けるためだけのダミーワークを設けても良い。この場合、分割陽極電極４０Ａと最先のワークＷ１とが対向する電解面積（図５（Ａ）のＬ３×ワーク高さ）に基づいて、分割陽極電極４０Ａ−１〜４０Ａ−４の各一つを電源５０Ａ−１〜５０Ａ−４の対応する各一つが電流値を漸増制御する（図５（Ｂ）参照）。 In the present embodiment, a plurality of workpieces W1 to WN are supplied to the plating tank 10 in lot units. As shown in FIG. 5A, when the first workpiece W1 in the same lot faces each one of the divided anode electrodes 40A-1 to 40A-4, another workpiece to be plated is downstream of the workpiece W1. not exist. Alternatively, the above-described gap G may be provided downstream of the workpiece W1, and a dummy workpiece only for avoiding electric field concentration on the workpiece end may be provided. In this case, each one of the divided anode electrodes 40A-1 to 40A-4 based on the electrolytic area (L3 × work height in FIG. 5A) where the divided anode electrode 40A and the foremost work W1 face each other. Each of the corresponding ones of the power supplies 50A-1 to 50A-4 controls the current value gradually increasing (see FIG. 5B).

同様に、図６（Ａ）に示すように、同一ロットの最後のワークＷＮが分割陽極電極４０Ａ−１〜４０Ａ−４の各一つと対向する時には、ワークＷＮの上流にはメッキ対象の他のワークが存在しない。あるいは、ワークＷＮの上流に上述した隙間Ｇを設けてワーク端部への電界集中を避けるためだけのダミーワークを設けても良い。この場合、分割陽極電極４０Ａと最後のワークＷＮとが対向する電解面積（図６（Ａ）のＬ４×ワーク高さ）に基づいて、分割陽極電極４０Ａ−１〜４０Ａ−４の各一つを電源５０Ａ−１〜５０Ａ−４の対応する各一つが電流値を漸減制御する（図６（Ｂ）参照）。 Similarly, as shown in FIG. 6A, when the last workpiece WN of the same lot faces each one of the divided anode electrodes 40A-1 to 40A-4, other workpieces to be plated are placed upstream of the workpiece WN. There is no work. Alternatively, the above-described gap G may be provided upstream of the workpiece WN to provide a dummy workpiece only for avoiding electric field concentration at the workpiece end. In this case, based on the electrolytic area (L4 × work height in FIG. 6A) where the divided anode electrode 40A and the last workpiece WN face each other, each one of the divided anode electrodes 40A-1 to 40A-4 is used. Each corresponding one of the power supplies 50A-1 to 50A-4 gradually controls the current value (see FIG. 6B).

図７（Ａ）〜図７（Ｃ）は、各々が長さＬ２の分割陽極電極４０−１，４０−２，４０−３，４０−４，…を有するメッキ槽１０にて、異なる長さＬ１Ａ，Ｌ１Ｂ，Ｌ１ＣのワークＷ_Ａ，Ｗ_Ｂ，Ｗ_Ｃを搬送した状態を示している。図７（Ａ）ではｎ＝３でＬ２＜Ｌ１Ａ／３が成立し、図７（Ｂ）ではｎ＝４でＬ２＜Ｌ１Ｂ／４が成立し、図７（Ａ）ではｎ＝２でＬ２＜Ｌ１Ｃ／２が成立する。 7 (A) to 7 (C) show different lengths in the plating tank 10 having divided anode electrodes 40-1, 40-2, 40-3, 40-4,... Each having a length L2. L1A, L1B, workpiece _W a of _L1C, W B, shows a state in which transported the _{W C.} In FIG. 7A, L2 <L1A / 3 is established when n = 3, FIG. 7B is established where n = 4 and L2 < L1B / 4 , and in FIG. 7A, n = 2 and L2 < L1C / 2 is established.

メッキ液１１の逃げ場が確保されることで、ワーク１を常にフレッシュなメッキ液と接触させることができる。また、ワークＷと、ノズル１００及び陽極電極４０との間の領域にてメッキ液の流動が足りないと、高速ノズル流の周囲に生ずる負圧領域にメッキ液が行き渡らず、特に柔軟なワークＷはノズル１００側に吸着される現象が観察された。そのため、ノズル１００から噴出されたメッキ液の逃げ場を確保することは、ワークＷが負圧領域側に吸着される現象を防止する観点からも重要である。 Since the escape place of the plating solution 11 is ensured, the workpiece 1 can always be brought into contact with the fresh plating solution. Further, if the plating solution does not flow sufficiently in the region between the workpiece W and the nozzle 100 and the anode electrode 40, the plating solution does not reach the negative pressure region generated around the high-speed nozzle flow, and the flexible workpiece W is particularly flexible. Was observed to be adsorbed on the nozzle 100 side. Therefore, it is important from the viewpoint of preventing a phenomenon that the workpiece W is attracted to the negative pressure region side to secure a escape place for the plating solution ejected from the nozzle 100 .

Claims

A plating tank for containing a plating solution and simultaneously plating a plurality of workpieces continuously conveyed along a conveyance path ;
A common cathode electrode that is electrically connected to the plurality of workpieces via a plurality of conveyance jigs that respectively hold the plurality of workpieces;
A plurality of divided anode electrodes disposed opposite to the transport path in the plating tank;
A plurality of power supplies connected to each one of the plurality of divided anode electrodes and the common cathode electrode, each independently controlling a current supplied to the plurality of divided anode electrodes;
A continuous plating apparatus comprising:

In claim 1,
Each of the plurality of divided anode electrodes includes a first electrode facing the first surface of each of the plurality of workpieces and a second electrode facing the second surface of each of the plurality of workpieces. Continuous plating equipment.

In claim 2,
Each of the plurality of power sources includes a first power source for energizing the first electrode and a second power source for energizing the second electrode, wherein the first power source and the second power source are each independently currents A continuous plating apparatus characterized by setting a value.

In any one of Claims 1 thru | or 3,
When the length of the workpiece along the transport path is L1 and the length of each of the plurality of divided anode electrodes along the transport path is L2, L1 = L2 is substantially satisfied. Continuous plating equipment.

In claim 4,
The plating tank is supplied with the plurality of workpieces in units of lots, and when the earliest workpiece of the same lot faces each one of the plurality of divided anode electrodes, Based on the electrolysis area facing the earliest workpiece, each one of the plurality of divided anode electrodes is controlled so that the corresponding one of the plurality of power sources gradually increases the current value, and the last workpiece of the same lot is Based on the electrolysis area where each one of the plurality of divided anode electrodes and the last workpiece are opposed to each one of the plurality of divided anode electrodes, each one of the plurality of divided anode electrodes is replaced with the plurality of divided anode electrodes. A continuous plating apparatus characterized in that each corresponding one of the power supplies of the power supply gradually controls the current value.

In any one of Claims 1 thru | or 3,
When the length of the workpiece along the transfer path is L1, the length of each of the plurality of divided anode electrodes along the transfer path is L2, and n is an integer of 2 or more, L2 <L1 / A continuous plating apparatus satisfying n.

In claim 6,
The plating tank is supplied with the plurality of workpieces in lot units,
Each of the plurality of power supplies performs constant current control on each of the plurality of divided anode electrodes from the beginning to the end of the lot unit.

In claim 6 or 7,
The plating tank is provided with a plurality of nozzles for injecting the plating solution toward the workpiece at positions facing each one of the plurality of workpieces along the conveyance path ,
Each of the plurality of divided anode electrodes is disposed between two adjacent nozzles in the plurality of nozzles .

In claim 8,
Each of the plurality of divided anode electrodes has a circular cross-sectional outline, and is a continuous plating apparatus.