TWI530593B - Multi-anode control device and electroplating equipment having the same - Google Patents

Multi-anode control device and electroplating equipment having the same Download PDF

Info

Publication number
TWI530593B
TWI530593B TW103127528A TW103127528A TWI530593B TW I530593 B TWI530593 B TW I530593B TW 103127528 A TW103127528 A TW 103127528A TW 103127528 A TW103127528 A TW 103127528A TW I530593 B TWI530593 B TW I530593B
Authority
TW
Taiwan
Prior art keywords
anode
module
control device
item
substrate
Prior art date
Application number
TW103127528A
Other languages
Chinese (zh)
Other versions
TW201606141A (en
Inventor
李玟澄
郭富強
欒濤
陳良
韓小風
周慶松
Original Assignee
亞智科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 亞智科技股份有限公司 filed Critical 亞智科技股份有限公司
Priority to TW103127528A priority Critical patent/TWI530593B/en
Priority to CN201510485222.1A priority patent/CN105369337A/en
Publication of TW201606141A publication Critical patent/TW201606141A/en
Application granted granted Critical
Publication of TWI530593B publication Critical patent/TWI530593B/en

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)

Description

多陽極控制裝置及具有該裝置的電鍍設備Multi-anode control device and electroplating equipment therewith 【0001】【0001】

本發明關於一種電鍍用陽極網,特別是指一種多陽極控制裝置及具有該裝置的電鍍設備。 The present invention relates to an anode mesh for electroplating, and more particularly to a multi-anode control device and an electroplating apparatus having the same.

【0002】【0002】

關於基板的電鍍,主要將陰極電經由夾具電性連接於基板的一側邊,再於基板的正面和背面分別配設有陽極網,以利用帶有陽極電的陽極網對已帶有陰極電的基板進行電鍍。 Regarding the electroplating of the substrate, the cathode electricity is mainly electrically connected to one side of the substrate via the jig, and then the anode mesh is respectively disposed on the front and the back of the substrate to utilize the anode with the anode. The substrate is plated.

【0003】[0003]

惟,由於陰極電僅電性連接於基板的一側邊,導致基板愈遠離夾具所夾的位置,所獲得的陰極電愈小。因此而在電鍍時,讓基板的電鍍厚度不均勻,也就是:基板愈遠離夾具所夾位置的電鍍厚度愈薄,影響基板的導電性,早為人所垢病已久。 However, since the cathode electricity is electrically connected only to one side of the substrate, the closer the substrate is to the position sandwiched by the jig, the smaller the cathode power obtained. Therefore, in the electroplating, the plating thickness of the substrate is not uniform, that is, the thinner the plating thickness of the substrate from the position where the jig is clamped, which affects the conductivity of the substrate, which has long been a disease for a long time.

【0004】[0004]

因此,如何改善上述缺失,乃為本案發明人所亟欲解決的一大課題。 Therefore, how to improve the above-mentioned defects is a major issue that the inventors of the present invention are trying to solve.

【0005】[0005]

本發明的目的在於提供一種具有多陽極控制裝置及具有該裝置的電鍍設備,能使各陽極網所分別獲得的電流密度,與基板不同位置所分別獲得的陰極電彼此互補,從而對基板進行均勻電鍍。 An object of the present invention is to provide a multi-anode control device and an electroplating apparatus having the same, which can make the current density obtained by each anode net and the cathode electric power respectively obtained at different positions of the substrate complementary to each other, thereby uniformizing the substrate. plating.

【0006】[0006]

為了達成上述目的,本發明提供一種多陽極控制裝置,搭配一陰極連接件使用,所述陰極連接件電性連接於基板的一邊,該多陽極控制裝置包括:一陽極模組,包含彼此並排且之間相隔一間距的多數陽極網;以及一供電控制模組,分別電性連接於各該陽極網,該供電控制模組對各該陽極網分別供電,以在各該陽極網分別產生所需的電流密度。 In order to achieve the above object, the present invention provides a multi-anode control device for use with a cathode connector electrically connected to one side of a substrate, the multi-anode control device comprising: an anode module including side by side and a plurality of anode nets spaced apart from each other; and a power supply control module electrically connected to each of the anode nets, wherein the power supply control module respectively supplies power to each of the anode nets to generate respectively for each of the anode nets Current density.

【0007】【0007】

本發明另提供一種具有多陽極控制裝置的電鍍設備,用以電鍍基板,該電鍍設備包括:一本體,定義有用以輸送所述基板的一第二方向;一對輸送滾輪組,於該本體呈上下相對配設,所述基板則於該對輸送滾輪組之間沿該第二方向輸送;一陰極連接組,配設於該本體,該陰極連接組具有多數陰極連接件,各該陰極連接件電性連接於所述基板的一邊;以及一對多陽極控制裝置,於該本體呈上下相對配設,各該多陽極控制裝置通過各該輸送滾輪組分別面向所述基板的兩面,各該多陽極控制裝置包含:一陽極模組和一供電控制模組:該陽極模組,包含彼此並排且之間相隔一間距的多數陽極網;該供電控制模組,分別電性連接於各該陽極網,該供電控制模組對各該陽極網分別供電,以在各該陽極網分別產生所需的電流密度。 The present invention further provides an electroplating apparatus having a multi-anode control device for electroplating a substrate, the electroplating apparatus comprising: a body defining a second direction for transporting the substrate; and a pair of transport roller sets on the body The bottom plate is oppositely disposed, the substrate is transported in the second direction between the pair of transport roller sets; a cathode connection group is disposed on the body, the cathode connection group has a plurality of cathode connectors, each of the cathode connectors Electrically connected to one side of the substrate; and a pair of multi-anode control devices disposed on the upper and lower sides of the substrate, each of the multi-anode control devices facing each side of the substrate through each of the transport roller sets, each of which The anode control device comprises: an anode module and a power supply control module: the anode module comprises a plurality of anode nets arranged side by side and spaced apart from each other; the power supply control module is electrically connected to each of the anode nets The power supply control module separately supplies power to each of the anode nets to generate a desired current density in each of the anode nets.

【0008】[0008]

相較於先前技術,本發明具有以下功效:能使各陽極網所分別獲得的電流密度,與基板不同位置所分別獲得的陰極電彼此互補,從而對基板進行均勻電鍍。 Compared with the prior art, the present invention has the following effects: the current density respectively obtained by each anode mesh, and the cathode electric power respectively obtained at different positions of the substrate are complementary to each other, thereby uniformly plating the substrate.

【0052】[0052]

100…多陽極控制裝置 100...multi-anode control device

【0053】[0053]

1…陽極模組 1...anode module

【0054】[0054]

1a…第一邊 1a...first side

【0055】[0055]

1b…第二邊 1b...second side

【0056】[0056]

11…陽極網 11...anode net

【0057】[0057]

111…電鍍液輸出孔 111... plating solution output hole

【0058】[0058]

2…供電控制模組 2...Power supply control module

【0059】[0059]

21…電力輸出部 21...electric output department

【0060】[0060]

22…整流器 22...rectifier

【0061】[0061]

3…絕緣架體 3...insulated frame

【0062】[0062]

31…框架 31...frame

【0063】[0063]

311…定位肋 311... positioning rib

【0064】[0064]

32…肋條 32...ribs

【0065】[0065]

4…電鍍液輸送結構 4... plating solution conveying structure

【0066】[0066]

41…分流管 41... shunt tube

【0067】[0067]

411…入口 411... entrance

【0068】[0068]

412…出口 412...export

【0069】[0069]

42…輸送管 42...transport tube

【0070】[0070]

421…電鍍液輸出部 421... plating solution output

【0071】[0071]

500…基板 500... substrate

【0072】[0072]

600…本體 600... body

【0073】[0073]

700…輸送滾輪組 700...transport roller set

【0074】[0074]

800…陰極連接組 800...cathode connection group

【0075】[0075]

8…陰極連接件 8...cathode connector

【0076】[0076]

A…夾角 A... angle

【0077】[0077]

D1…第一方向 D1...first direction

【0078】[0078]

D2…第二方向 D2...second direction

【0079】[0079]

S1、S2、S3、S4、S5…間距 S1, S2, S3, S4, S5... spacing

【0009】【0009】

圖1為本發明中的陽極模組第一實施例的立體圖。 1 is a perspective view of a first embodiment of an anode module in accordance with the present invention.

【0010】[0010]

圖2為本發明中的陽極模組第二實施例的俯視圖。 2 is a plan view of a second embodiment of the anode module of the present invention.

【0011】[0011]

圖3為本發明中的陽極模組第三實施例的俯視圖。 Figure 3 is a plan view of a third embodiment of the anode module of the present invention.

【0012】[0012]

圖4為本發明中的陽極模組第四實施例的俯視圖。 Figure 4 is a plan view of a fourth embodiment of the anode module of the present invention.

【0013】[0013]

圖5為本發明多陽極控制裝置的部分立體圖(不含電鍍液輸送結構)。 Figure 5 is a partial perspective view of a multi-anode control device of the present invention (without plating solution transport structure).

【0014】[0014]

圖6為本發明多陽極控制裝置的部分立體圖(包含電鍍液輸送結構)。 Figure 6 is a partial perspective view of a multi-anode control device of the present invention (including a plating solution transport structure).

【0015】[0015]

圖7為本發明多陽極控制裝置中的供電控制模組的供電方式示意圖。 FIG. 7 is a schematic diagram of a power supply mode of a power supply control module in a multi-anode control device according to the present invention.

【0016】[0016]

圖8為本發明電鍍設備的剖視圖。 Figure 8 is a cross-sectional view of the plating apparatus of the present invention.

【0017】[0017]

圖9~圖21分別為本發明中的陽極模組第五~十七實施例的俯視圖。 9 to 21 are top views of the fifth to seventeenth embodiment of the anode module of the present invention, respectively.

【0018】[0018]

有關本發明的詳細說明和技術內容,配合圖式說明如下,然而所附圖式僅提供參考與說明用,非用以限制本發明。 The detailed description and technical content of the present invention are set forth below with reference to the accompanying drawings.

【0019】[0019]

本發明提供一種具有多陽極控制裝置的電鍍設備,如圖8所示,電鍍設備用以對一基板500進行電鍍,電鍍設備包括一陰極連接組800以及一對多陽極控制裝置100。陰極連接組800具有用以電性連接於基板500一邊的多數陰極連接件8。多陽極控制裝置100則包括有一陽極模組1以及一供電控制模組2。 The present invention provides an electroplating apparatus having a multi-anode control device. As shown in FIG. 8, an electroplating apparatus for electroplating a substrate 500 includes a cathode connection group 800 and a pair of multi-anode control devices 100. The cathode connection set 800 has a plurality of cathode connectors 8 for electrically connecting to one side of the substrate 500. The multi-anode control device 100 includes an anode module 1 and a power supply control module 2.

【0020】[0020]

如圖1所示,為陽極模組1第一實施例的立體圖。陽極模組1具有對應於陰極連接件8(參圖8)的一第一邊1a以及相對於第一邊1a的一第二邊1b。從陽極模組1的第一邊1a到第二邊1b定義為一第一方向D1。陽極模組1則包含有依第一方向D1間隔並排且分別開設有多數電鍍液輸出孔111的多數陽極網11。各陽極網11之間相隔有一間距,各間距可為如圖1所示的斜線形狀的間距S1(陽極模組1的第一實施例)、如圖2所示的直線形狀的間距S2(陽極模組1的第二實施例)、如圖3所示的圓弧線形狀的間距S3(陽極模組1的第三實施例)或如圖4所示的鋸齒彎折線形狀的間距S4(陽極模組1的第四實施例),本發明並未限定。 As shown in FIG. 1, it is a perspective view of the first embodiment of the anode module 1. The anode module 1 has a first side 1a corresponding to the cathode connector 8 (see Fig. 8) and a second side 1b opposite to the first side 1a. The first side 1a to the second side 1b of the anode module 1 is defined as a first direction D1. The anode module 1 includes a plurality of anode meshes 11 which are arranged side by side in the first direction D1 and are respectively provided with a plurality of plating solution output holes 111. Each of the anode webs 11 is spaced apart by a pitch, and each of the pitches may be a diagonally-shaped pitch S1 as shown in FIG. 1 (first embodiment of the anode module 1), and a linear-shaped pitch S2 as shown in FIG. 2 (anode) The second embodiment of the module 1), the pitch S3 of the circular arc shape shown in FIG. 3 (the third embodiment of the anode module 1) or the pitch S4 of the sawtooth bending line shape as shown in FIG. 4 (anode) The fourth embodiment of the module 1) is not limited by the present invention.

【0021】[0021]

電鍍設備用以輸送基板500的方向定義為一第二方向D2(參考圖2和圖8所示)。 The direction in which the plating apparatus is used to transport the substrate 500 is defined as a second direction D2 (refer to FIGS. 2 and 8).

【0022】[0022]

前述第二實施例的各陽極網11之間呈直線形狀的間距S2若與第二方向D2平行(圖中未示),將會在基板500上形成一條未電鍍的線;為了避免此等情況發生,如圖2所示,因此必須斜置第二實施例的陽極模組1,使陽極模組1中的任相鄰二陽極網11之間的間距S2,對應陽極模組1所呈現的線形形狀與第二方向D2之間形成一夾角A,夾角A的角度為大於15度且小於75度,本發明並未限制,如此一來就能避免在基板500上形成未電鍍的線。 If the pitch S2 of the linear shape between the anode webs 11 of the second embodiment is parallel to the second direction D2 (not shown), an unplated line will be formed on the substrate 500; in order to avoid such a situation Occurs, as shown in FIG. 2, the anode module 1 of the second embodiment must be tilted so that the spacing S2 between any adjacent two anode webs 11 in the anode module 1 corresponds to the linear shape of the anode module 1. An angle A is formed between the second direction D2 and the angle A of the angle A is greater than 15 degrees and less than 75 degrees. The present invention is not limited, so that the formation of the unplated line on the substrate 500 can be avoided.

【0023】[0023]

至於如圖1所示的斜線形狀的間距S1(陽極模組1的第一實施例)、如圖3所示的圓弧線形狀的間距S3(陽極模組1的第三實施例)和如圖4所示的鋸齒彎折線形狀的間距S4(陽極模組1的第四實施例),由於各間距S1、S3、S4皆未與第二方向D2平行,因此不會在基板500上形成未電鍍的線,換言之,也就不須斜置第一、第三和第四實施例的陽極模組1。 As for the pitch S1 of the oblique line shape shown in FIG. 1 (the first embodiment of the anode module 1), the pitch S3 of the circular arc shape shown in FIG. 3 (the third embodiment of the anode module 1), and The pitch S4 of the zigzag bent line shape shown in FIG. 4 (the fourth embodiment of the anode module 1) does not form the substrate 500 because the pitches S1, S3, and S4 are not parallel to the second direction D2. The electroplated wires, in other words, the anode modules 1 of the first, third and fourth embodiments are not necessarily inclined.

【0024】[0024]

供電控制模組2分別電性連接於各陽極網11,以讓供電控制模組2分別供電給各陽極網11,從而在各陽極網11分別產生所需的電流密度(未標示符號)。由於陽極網11的邊際效應,使得陽極網11邊際的電流密度反而會增加,因此,實際上仍需視情況利用供電控制模組2分別調整提供給各陽極網11的電流;所述情況有多種,於本實施例中將以其中一種下述的情況為例進行說明,但不限於此: The power supply control modules 2 are electrically connected to the anode nets 11 respectively, so that the power supply control modules 2 respectively supply power to the anode nets 11, thereby generating respective current densities (unlabeled symbols) in the respective anode nets 11. Due to the marginal effect of the anode mesh 11, the current density at the margin of the anode mesh 11 is rather increased. Therefore, it is actually necessary to separately adjust the current supplied to each anode mesh 11 by the power supply control module 2 as the case may be; In the present embodiment, one of the following cases will be described as an example, but is not limited thereto:

【0025】[0025]

若陽極網11距離第一邊1a愈遠,則陽極網11所需的電流密度愈大,也就是:各電流密度的大小與各陽極網11距離第一邊1a的長度成正比。據此,經由供電控制模組2的分別微調控制,使距離第一邊1a愈遠的陽極網11,所產生的電流密度愈大。如此一來,剛好與陰極連接件8帶給基板500的電流密度大小彼此互補,從而能在基板500上進行均勻電鍍。當然,在實施上,各陽極網11的面積以彼此相同為佳,以使供電控制模組2的微調控制趨於簡單。 The farther the anode web 11 is from the first side 1a, the greater the current density required for the anode web 11, that is, the magnitude of each current density is proportional to the length of each anode web 11 from the first side 1a. Accordingly, the higher the current density generated by the anode network 11 farther from the first side 1a, via the respective fine adjustment control of the power supply control module 2. As a result, the current density of the substrate 500 directly adjacent to the cathode connector 8 is complementary to each other, so that uniform plating can be performed on the substrate 500. Of course, in practice, the area of each anode mesh 11 is preferably the same as each other, so that the fine adjustment control of the power supply control module 2 tends to be simple.

【0026】[0026]

如圖7所示,供電控制模組2可為具有多數整流器22的實施方式。因此,各整流器22的陽極將分別經由各電力輸出部21電性連接於各陽極網11,各整流器22的陰極則經由陰極連接件8(參圖8所示)而電性連接於基板500的一面和另一面。基板500的一面和另一面彼此相對。藉此,以讓供電控制模組2經由各整流器22對各陽極網11分別輸出所需大小的陽極電。 As shown in FIG. 7, the power supply control module 2 can be an embodiment having a plurality of rectifiers 22. Therefore, the anodes of the rectifiers 22 are electrically connected to the anode grids 11 via the respective power output portions 21, and the cathodes of the rectifiers 22 are electrically connected to the substrate 500 via the cathode connectors 8 (shown in FIG. 8). One side and the other side. One side and the other side of the substrate 500 are opposed to each other. Thereby, the power supply control module 2 outputs the anode electric power of a desired magnitude to each of the anode nets 11 via the respective rectifiers 22.

【0027】[0027]

當然,供電控制模組2還可為單一顆整流器(圖中未示),且供電控制模組2具有多數電力輸出部21。各電力輸出部21分別電性連接於各陽極網11。藉此,以讓供電控制模組2經由各電力輸出部21對各陽極網11分別輸出所需大小的陽極電。 Of course, the power supply control module 2 can also be a single rectifier (not shown), and the power supply control module 2 has a plurality of power output portions 21. Each of the power output units 21 is electrically connected to each of the anode nets 11 . Thereby, the power supply control module 2 outputs the anode power of a desired magnitude to each of the anode nets 11 via the respective power output units 21.

【0028】[0028]

如圖5和圖6所示,本發明多陽極控制裝置100還包括一絕緣架體3和一電鍍液輸送結構4。前述陽極模組1則配設於絕緣架體3,陽極模組1配設於絕緣架體3的方式將說明如下,但不限於如下說明的方式。 As shown in FIGS. 5 and 6, the multi-anode control device 100 of the present invention further includes an insulating frame body 3 and a plating solution conveying structure 4. The anode module 1 is disposed in the insulating frame 3, and the anode module 1 is disposed in the insulating frame 3 as follows. However, the present invention is not limited to the one described below.

【0029】[0029]

絕緣架體3包含一框架31和跨接於框架31內的多數肋條32。陽極模組1架設於框架31內,並使各肋條32對應任相鄰二陽極網1之間的間距S1(或其它間距S2~S4)位置固定陽極模組1,從而讓陽極模組1定位於框架31內。 The insulating frame 3 includes a frame 31 and a plurality of ribs 32 spanning the frame 31. The anode module 1 is mounted in the frame 31, and the ribs 32 are fixed to the anode module 1 at positions corresponding to the spacing S1 (or other spacings S2 to S4) between the adjacent two anode webs 1, thereby positioning the anode module 1 in the frame. 31 inside.

【0030】[0030]

當然,為了能夠穩固地將陽極模組1定位於框架31內,框架31對應於第一邊1a和第二邊1b位置分別設置有一定位肋311,以讓陽極模組1的第一邊1a和第二邊1b分別定位於框架31的二定位肋311上。 Of course, in order to stably position the anode module 1 in the frame 31, the frame 31 is respectively provided with a positioning rib 311 corresponding to the first side 1a and the second side 1b to allow the first side 1a of the anode module 1 and The second sides 1b are respectively positioned on the two positioning ribs 311 of the frame 31.

【0031】[0031]

電鍍液輸送結構4包含一分流管41和多數輸送管42。分流管41連接於框架31且具有一入口411和多數出口412。各輸送管42分別連接於各出口412與框架31之間,各輸送管42具有多數電鍍液輸出部421。各電鍍液輸出部421則經由各電鍍液輸出孔111伸出於陽極模組1。因此,電鍍液經由入口411輸入分流管41內,再經由各出口412將電鍍液輸出到各輸送管42,最後則經由各電鍍液輸出部421噴出電鍍液。 The plating solution delivery structure 4 includes a shunt tube 41 and a plurality of delivery tubes 42. The shunt tube 41 is coupled to the frame 31 and has an inlet 411 and a plurality of outlets 412. Each of the transport tubes 42 is connected between each of the outlets 412 and the frame 31, and each of the transport tubes 42 has a plurality of plating liquid output portions 421. Each of the plating solution output portions 421 protrudes from the anode module 1 via the plating solution output holes 111. Therefore, the plating solution is supplied into the shunt tube 41 through the inlet 411, and the plating solution is output to the respective transfer tubes 42 through the respective outlets 412. Finally, the plating solution is discharged through the respective plating solution output portions 421.

【0032】[0032]

必須說明的是,本發明多陽極控制裝置100雖然能以具有絕緣架體3的方式來實施,但實際上也能以不具有絕緣架體3的方式來實施。前者可藉由絕緣架體3而能模組化地組卸於一電鍍設備,後者則能讓結構趨於簡單,本發明並未限定。 It should be noted that although the multi-anode control device 100 of the present invention can be implemented with the insulating frame 3, it can be implemented without the insulating frame 3 in practice. The former can be modularly assembled into an electroplating apparatus by the insulating frame body 3, and the latter can make the structure tend to be simple, and the invention is not limited.

【0033】[0033]

如圖8所示,為本發明具有多陽極控制裝置100的電鍍設備的剖視圖。電鍍設備用以對一基板500電鍍,電鍍設備包括:一本體600、一對輸送滾輪組700、前述的陰極連接組800以及前述的一對多陽極控制裝置100。 As shown in FIG. 8, a cross-sectional view of a plating apparatus having a multi-anode control device 100 of the present invention is shown. The electroplating apparatus is used to electroplate a substrate 500. The electroplating apparatus includes a body 600, a pair of transport roller sets 700, the aforementioned cathode connection set 800, and the aforementioned pair of multi-anode control devices 100.

【0034】[0034]

本體600定義有用以輸送基板500的前述第二方向D2(參考圖1或圖2)。二輸送滾輪組700則於本體600呈上下相對配設,使基板500能在二輸送滾輪組700之間沿第二方向D2輸送。陰極連接組800配設於本體600,陰極連接組800的各陰極連接件8則位於二陽極模組1的第一邊1a之間。 The body 600 defines a second direction D2 (refer to FIG. 1 or FIG. 2) that is useful for transporting the substrate 500. The two transport roller sets 700 are disposed on the upper and lower sides of the main body 600 so that the substrate 500 can be transported between the two transport roller sets 700 in the second direction D2. The cathode connection group 800 is disposed on the body 600, and each cathode connection member 8 of the cathode connection group 800 is located between the first sides 1a of the two anode modules 1.

【0035】[0035]

二多陽極控制裝置100並在本體600呈上下相對配設,各多陽極控制裝置100則通過各輸送滾輪組700分別面向基板500的一面和另一面。 The two-anode control device 100 is disposed above and below the main body 600, and each of the multi-anode control devices 100 faces one side and the other side of the substrate 500 through the respective transport roller groups 700.

【0036】[0036]

各多陽極控制裝置100則包含前述的陽極模組1和供電控制模組2(如圖7所示)。 Each of the multi-anode control devices 100 includes the aforementioned anode module 1 and power supply control module 2 (shown in FIG. 7).

【0037】[0037]

參考圖1所示,各陽極模組1中的任相鄰二陽極網11之間的間距S,對應陽極模組1所呈現的線形形狀與第二方向D2之間形成有一夾角A。夾角A的角度為大於15度且小於75度,本發明並未限制。 Referring to FIG. 1, the spacing S between any adjacent two anode webs 11 in each anode module 1 forms an angle A between the linear shape of the anode module 1 and the second direction D2. The angle of the included angle A is greater than 15 degrees and less than 75 degrees, and the invention is not limited.

【0038】[0038]

據此,基板500經由二輸送滾輪組700的輸送而朝第二方向D2前進。各陰極連接件8電性連接於基板500的一邊而提供陰極電,使基板500愈遠離陰極連接件8的位置,所獲得的陰極電愈小。此時,各多陽極控制裝置100將藉由各供電控制模組2的控制,使愈遠離陰極連接件8位置的陽極網11,所獲得的電流密度愈大,如此彼此互補,使能對基板500的一面和另一面進行均勻電鍍。 Accordingly, the substrate 500 advances in the second direction D2 via the conveyance of the two transport roller groups 700. Each of the cathode connectors 8 is electrically connected to one side of the substrate 500 to provide cathode electricity, and the farther the substrate 500 is from the position of the cathode connector 8, the smaller the cathode power obtained. At this time, each multi-anode control device 100 will control the power supply control module 2 to make the current density of the anode mesh 11 farther away from the position of the cathode connector 8 larger, so that they complement each other and enable the substrate. Uniform plating is performed on one side of the 500 side and the other side.

【0039】[0039]

此外,如圖9~圖21所示,分別為前述陽極模組1的第五~十七實施例。其中,如圖9~圖16所示的陽極模組1皆包含三片陽極網11,各陽極網11之間相隔有一間距;如圖17~圖21所示的陽極模組1則皆包含四片陽極網11,各陽極網11之間亦相隔有一間距。 Further, as shown in FIGS. 9 to 21, the fifth to seventeenth embodiments of the anode module 1 are respectively shown. The anode modules 1 shown in FIG. 9 to FIG. 16 each include three anode nets 11 with a spacing between the anode webs 11; the anode modules 1 shown in FIG. 17 to FIG. 21 each include four. The anode grid 11 is also spaced apart from each other by an anode web 11 .

【0040】[0040]

圖9中呈斜線形狀的各間距S1為彼此平行(陽極模組1的第五實施例),圖10中亦呈斜線形狀的各間距S1則彼此對稱(陽極模組1的第六實施例)。 The pitches S1 of the hatched shape in Fig. 9 are parallel to each other (the fifth embodiment of the anode module 1), and the pitches S1 which are also hatched in Fig. 10 are symmetrical to each other (the sixth embodiment of the anode module 1) .

【0041】[0041]

圖11中呈圓弧線形狀的各間距S3為彼此平行(陽極模組1的第七實施例),圖12中亦呈圓弧線形狀的間距S3則彼此對稱(陽極模組1的第八實施例)。 In Fig. 11, the pitches S3 in the shape of a circular arc are parallel to each other (the seventh embodiment of the anode module 1), and the pitch S3 in the shape of a circular arc in Fig. 12 is symmetrical to each other (the eighth of the anode module 1) Example).

【0042】[0042]

圖13中呈鋸齒彎折線形狀的各間距S4為彼此平行(陽極模組1的第九實施例),圖14中亦呈鋸齒彎折線形狀的間距S4則彼此對稱(陽極模組1的第十實施例)。 The pitches S4 in the shape of the zigzag bent line in FIG. 13 are parallel to each other (the ninth embodiment of the anode module 1), and the pitch S4 in the shape of the zigzag bent line in FIG. 14 is symmetrical to each other (the tenth of the anode module 1) Example).

【0043】[0043]

圖15中呈圓弧彎折線形狀的各間距S5為彼此平行(陽極模組1的第十一實施例),圖16中亦呈圓弧彎折線形狀的間距S5則彼此對稱(陽極模組1的第十二實施例)。 The pitches S5 in the shape of the arc curve line in Fig. 15 are parallel to each other (the eleventh embodiment of the anode module 1), and the pitch S5 in the shape of the arc curve line in Fig. 16 is symmetrical to each other (anode module 1) Twelfth embodiment).

【0044】[0044]

圖17中呈斜線形狀的任相鄰二間距S1之間為彼此對稱(陽極模組1的第十三實施例),至於亦呈斜線形狀的各間距S1為彼此平行的實施例,則見於圖1(陽極模組1的第一實施例)。 The adjacent two pitches S1 of the oblique line shape in Fig. 17 are symmetrical with each other (the thirteenth embodiment of the anode module 1), and the embodiments in which the pitches S1 of the oblique line shape are parallel to each other are shown in Fig. 1 (see Fig. 1). First embodiment of the anode module 1).

【0045】[0045]

圖18中呈圓弧線形狀的任相鄰二間距S3之間為彼此對稱(陽極模組1的第十四實施例),至於亦呈圓弧線形狀的各間距S3為彼此平行的實施例,則見於圖3(陽極模組1的第三實施例)。 In FIG. 18, any adjacent two pitches S3 having a circular arc shape are symmetrical with each other (the fourteenth embodiment of the anode module 1), and as for the embodiments in which the respective pitches S3 of the circular arc shape are parallel to each other, See Figure 3 (third embodiment of anode module 1).

【0046】[0046]

圖19中呈圓弧彎折線形狀的各間距S5為彼此平行(陽極模組1的第十五實施例),圖20中亦呈圓弧彎折線形狀的任相鄰二間距S5則彼此對稱(陽極模組1的第十六實施例)。 In Fig. 19, the respective pitches S5 in the shape of a circular arc curve are parallel to each other (the fifteenth embodiment of the anode module 1), and any adjacent two pitches S5 which are also in the shape of a circular arc in Fig. 20 are symmetrical to each other (anode mode) Sixteenth embodiment of group 1).

【0047】[0047]

圖21中呈鋸齒彎折線形狀的任相鄰二間距S4之間為彼此對稱(陽極模組1的第十七實施例),至於亦呈鋸齒彎折線形狀的各間距S4為彼此平行的實施例,則見於圖4(陽極模組1的第四實施例)。 In Fig. 21, any two adjacent pitches S4 in the shape of a zigzag bent line are symmetrical with each other (the seventeenth embodiment of the anode module 1), and as for the embodiments in which the respective pitches S4 of the zigzag bent line shape are parallel to each other, See Figure 4 (fourth embodiment of the anode module 1).

【0048】[0048]

值得注意的是,前述陽極模組1任一實施例(包含第一~十七實施例)中的每一片陽極網11的面積皆相同,以使供電控制模組2的微調控制趨於簡單。 It should be noted that the area of each anode mesh 11 in any of the foregoing anode modules 1 (including the first to seventeenth embodiments) is the same, so that the fine adjustment control of the power supply control module 2 tends to be simple.

【0049】[0049]

綜上所述,本發明相較於先前技術具有以下功效:藉由供電控制模組2能對陽極模組1的各陽極網11進行微調控制,使愈遠離陰極連接件8位置的陽極網11,所獲得的電流密度愈大,以與基板500愈遠離陰極連接件8所獲得陰極電愈小的位置彼此互補,從而能對基板500進行均勻電鍍。 In summary, the present invention has the following effects as compared with the prior art: the power supply control module 2 can finely control the anode meshes 11 of the anode module 1 to make the anode mesh 11 farther away from the cathode connector 8 The larger the current density obtained, the more complementary the position of the substrate 500 to the cathode electrode 8 is, so that the substrate 500 can be uniformly plated.

【0050】[0050]

此外,本發明還具有其它功效:藉由多陽極控制裝置100還能因為絕緣架體3而能模組化地組卸於電鍍設備,使組卸多陽極控制裝置100變得簡便且容易。 In addition, the present invention has other effects: the multi-anode control device 100 can also be modularly assembled and unloaded by the plating apparatus due to the insulating frame body 3, making the assembly of the multi-anode control device 100 simple and easy.

【0051】[0051]

以上所述者,僅為本發明的較佳可行實施例而已,非因此即侷限本發明的專利範圍,舉凡運用本發明說明書及圖式內容所為的等效結構變化,均理同包含於本發明的權利範圍內,合予陳明。 The above is only a preferred embodiment of the present invention, and is not intended to limit the scope of the invention, and equivalent structural changes made by the description of the present invention and the contents of the drawings are included in the present invention. Within the scope of the rights, it is given to Chen Ming.

100…多陽極控制裝置100...multi-anode control device

1…陽極模組1...anode module

11…陽極網11...anode net

111…電鍍液輸出孔111... plating solution output hole

2…供電控制模組2...Power supply control module

21…電力輸出部21...electric output department

3…絕緣架體3...insulated frame

31…框架31...frame

311…定位肋311... positioning rib

32…肋條32...ribs

Claims (17)

【第1項】[Item 1] 一種多陽極控制裝置,搭配一陰極連接件使用,所述陰極連接件電性連接於基板的一邊,該多陽極控制裝置包括:
一陽極模組,包含彼此並排且之間相隔一間距的多數陽極網;以及
一供電控制模組,分別電性連接於各該陽極網,該供電控制模組對各該陽極網分別供電,以在各該陽極網分別產生所需的電流密度。
A multi-anode control device is used in conjunction with a cathode connector, the cathode connector is electrically connected to one side of the substrate, and the multi-anode control device comprises:
An anode module comprising a plurality of anode nets arranged side by side and spaced apart from each other; and a power supply control module electrically connected to each of the anode nets, wherein the power supply control module respectively supplies power to each of the anode nets The desired current density is produced in each of the anode networks.
【第2項】[Item 2] 如請求項1所述的多陽極控制裝置,其中該陽極模組具有對應於所述陰極連接件的一第一邊和相對於該第一邊的一第二邊,該陽極模組從該第一邊到該第二邊定義為一第一方向,各該陽極網依該第一方向彼此間隔並排。 The multi-anode control device of claim 1, wherein the anode module has a first side corresponding to the cathode connecting member and a second side opposite to the first side, the anode module is from the first One side to the second side is defined as a first direction, and each of the anode nets is spaced apart from each other in the first direction. 【第3項】[Item 3] 如請求項2所述的多陽極控制裝置,其中各該陽極網所產生的該電流密度的大小與各該陽極網距離該第一邊的長度成正比。 The multi-anode control device of claim 2, wherein the magnitude of the current density generated by each of the anode meshes is proportional to the length of each of the anode webs from the first side. 【第4項】[Item 4] 如請求項1所述的多陽極控制裝置,其中該間距可為直線、斜線、鋸齒彎折線、圓弧彎折線或圓弧線。 The multi-anode control device according to claim 1, wherein the pitch is a straight line, a diagonal line, a zigzag bending line, a circular arc line or a circular line. 【第5項】[Item 5] 如請求項1所述的多陽極控制裝置,其中各該陽極網開設有多數電鍍液輸出孔。 The multi-anode control device of claim 1, wherein each of the anode meshes is provided with a plurality of plating solution output holes. 【第6項】[Item 6] 如請求項1所述的多陽極控制裝置,其中各該陽極網具有彼此相同的面積。 The multi-anode control device of claim 1, wherein each of the anode meshes has the same area as each other. 【第7項】[Item 7] 如請求項1所述的多陽極控制裝置,其中該供電控制模組為一整流器,該整流器具有多數電力輸出部,各該電力輸出部分別電性連接於各該陽極網。 The multi-anode control device of claim 1, wherein the power supply control module is a rectifier having a plurality of power output portions, each of the power output portions being electrically connected to each of the anode nets. 【第8項】[Item 8] 如請求項1所述的多陽極控制裝置,其中該供電控制模組具有多數整流器,各該整流器分別電性連接於各該陽極網。 The multi-anode control device of claim 1, wherein the power supply control module has a plurality of rectifiers, each of the rectifiers being electrically connected to each of the anode networks. 【第9項】[Item 9] 如請求項1所述的多陽極控制裝置,進一步包括一絕緣架體,該陽極模組配設於該絕緣架體。 The multi-anode control device of claim 1, further comprising an insulating frame, the anode module being disposed on the insulating frame. 【第10項】[Item 10] 如請求項9所述的多陽極控制裝置,其中該絕緣架體包含一框架和跨接於該框架內的多數肋條,該陽極模組架設於該框架內,各該肋條對應任相鄰二該陽極網之間的該間距位置固定該陽極模組。 The multi-anode control device of claim 9, wherein the insulating frame comprises a frame and a plurality of ribs spanning the frame, the anode module being mounted in the frame, each rib corresponding to the adjacent two of the anode mesh The spacing between the positions fixes the anode module. 【第11項】[Item 11] 如請求項9所述的多陽極控制裝置,進一步包括一電鍍液輸送結構,該電鍍液輸送結構包含一分流管和多數輸送管,該分流管連接於該絕緣架體,該分流管具有一入口和多數出口,各該輸送管則分別連接於各該出口與該絕緣架體之間,各該輸送管還具有多數電鍍液輸出部,各該電鍍液輸出部伸出於該陽極模組。 The multi-anode control device of claim 9, further comprising a plating solution conveying structure comprising a shunt tube and a plurality of conveying tubes, the shunt tube being connected to the insulating frame body, the shunt tube having an inlet And a plurality of outlets, each of the conveying pipes being respectively connected between each of the outlets and the insulating frame body, each of the conveying pipes further having a plurality of plating liquid output portions, wherein each of the plating liquid output portions protrudes from the anode module. 【第12項】[Item 12] 如請求項11所述的多陽極控制裝置,其中各該陽極網開設有多數電鍍液輸出孔,該電鍍液輸送結構的各該電鍍液輸出部分別對應該陽極模組的各該電鍍液輸出孔伸出。 The multi-anode control device according to claim 11, wherein each of the anode nets is provided with a plurality of electroplating liquid output holes, and each of the electroplating liquid output portions of the electroplating liquid transporting structure respectively correspond to the electroplating liquid output holes of the anode module Extend. 【第13項】[Item 13] 一種具有多陽極控制裝置的電鍍設備,用以電鍍基板,該電鍍設備包括:
一本體,定義有用以輸送所述基板的一第二方向;
一對輸送滾輪組,於該本體呈上下相對配設,所述基板則於該對輸送滾輪組之間沿該第二方向輸送;
一陰極連接組,配設於該本體,該陰極連接組具有多數陰極連接件,各該陰極連接件電性連接於所述基板的一邊;以及
一對多陽極控制裝置,於該本體呈上下相對配設,各該多陽極控制裝置通過各該輸送滾輪組分別面向所述基板的兩面,各該多陽極控制裝置包含:一陽極模組和一供電控制模組:
該陽極模組,包含彼此並排且之間相隔一間距的多數陽極網;
該供電控制模組,分別電性連接於各該陽極網,該供電控制模組對各該陽極網分別供電,以在各該陽極網分別產生所需的電流密度。
An electroplating apparatus having a multi-anode control device for electroplating a substrate, the electroplating apparatus comprising:
a body defining a second direction useful for transporting the substrate;
a pair of transport roller sets are disposed on the upper and lower sides of the body, and the substrate is transported in the second direction between the pair of transport roller sets;
a cathode connection group is disposed on the body, the cathode connection group has a plurality of cathode connectors, each of the cathode connectors is electrically connected to one side of the substrate; and a pair of multi-anode control devices are vertically opposed to the body The multi-anode control device is respectively disposed on both sides of the substrate through the respective transport roller groups, and each of the multi-anode control devices comprises: an anode module and a power supply control module:
The anode module comprises a plurality of anode meshes arranged side by side with a spacing therebetween;
The power supply control module is electrically connected to each of the anode nets, and the power supply control module separately supplies power to each of the anode nets to generate a required current density in each of the anode nets.
【第14項】[Item 14] 如請求項13所述的電鍍設備,其中該陽極模組具有對應於所述陰極連接件的一第一邊和相對於該第一邊的一第二邊,該陽極模組從該第一邊到該第二邊定義為一第一方向,各該陽極網依該第一方向彼此間隔並排。 The electroplating apparatus of claim 13, wherein the anode module has a first side corresponding to the cathode connecting member and a second side opposite to the first side, the anode module is from the first side The second side is defined as a first direction, and each of the anode meshes is spaced apart from each other in the first direction. 【第15項】[Item 15] 如請求項14所述的電鍍設備,其中各該陽極網所產生的該電流密度的大小與各該陽極網距離該第一邊的長度成正比。 The electroplating apparatus of claim 14, wherein the magnitude of the current density generated by each of the anode webs is proportional to the length of each of the anode webs from the first side. 【第16項】[Item 16] 如請求項13所述的電鍍設備,其中該陽極模組中的任相鄰二該陽極網之間的該間距對應該陽極模組所呈現的線形形狀,與該第二方向之間形成有一夾角。 The electroplating apparatus of claim 13, wherein the spacing between any two adjacent anode webs in the anode module corresponds to a linear shape exhibited by the anode module, and an angle is formed between the second direction. 【第17項】[Item 17] 如請求項16所述的電鍍設備,其中該夾角的角度為大於15度且小於75度。 The electroplating apparatus of claim 16, wherein the angle of the included angle is greater than 15 degrees and less than 75 degrees.
TW103127528A 2014-08-11 2014-08-11 Multi-anode control device and electroplating equipment having the same TWI530593B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW103127528A TWI530593B (en) 2014-08-11 2014-08-11 Multi-anode control device and electroplating equipment having the same
CN201510485222.1A CN105369337A (en) 2014-08-11 2015-08-10 Multi-anode control device and electroplating equipment with same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW103127528A TWI530593B (en) 2014-08-11 2014-08-11 Multi-anode control device and electroplating equipment having the same

Publications (2)

Publication Number Publication Date
TW201606141A TW201606141A (en) 2016-02-16
TWI530593B true TWI530593B (en) 2016-04-21

Family

ID=55371952

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103127528A TWI530593B (en) 2014-08-11 2014-08-11 Multi-anode control device and electroplating equipment having the same

Country Status (2)

Country Link
CN (1) CN105369337A (en)
TW (1) TWI530593B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI572748B (en) * 2016-09-20 2017-03-01 翁健名 Electroplating rack for tubular structure

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107190307A (en) * 2016-03-15 2017-09-22 先丰通讯股份有限公司 Electroplating anode device
CN107190306A (en) * 2016-03-15 2017-09-22 先丰通讯股份有限公司 Electroplating system
CN212505140U (en) * 2020-05-09 2021-02-09 京东方科技集团股份有限公司 Electrode structure and electrochemical deposition apparatus

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5007993A (en) * 1989-06-20 1991-04-16 Hull Harry F Electrolytic processing apparatus and method with time multiplexed power supply
JPH07150397A (en) * 1993-11-26 1995-06-13 Nobuyasu Doi Power feeder for electroplating
JPH1096097A (en) * 1996-09-24 1998-04-14 Hitachi Cable Ltd Electroplating device
US6203685B1 (en) * 1999-01-20 2001-03-20 International Business Machines Corporation Apparatus and method for selective electrolytic metallization/deposition utilizing a fluid head
CN1746339A (en) * 2005-09-07 2006-03-15 沪士电子股份有限公司 Jetting electroplating method directly of nozzle
JP2011127172A (en) * 2009-12-17 2011-06-30 Nitto Denko Corp Plating device and method of fabricating wiring circuit board
CN102373497B (en) * 2010-08-16 2014-05-21 富葵精密组件(深圳)有限公司 Electroplating apparatus and electroplating method thereof
JP6129497B2 (en) * 2011-09-29 2017-05-17 アルメックスPe株式会社 Continuous plating equipment
JP5795514B2 (en) * 2011-09-29 2015-10-14 アルメックスPe株式会社 Continuous plating equipment
CN202543369U (en) * 2012-04-13 2012-11-21 常德力元新材料有限责任公司 Anode module for industrial electrofacing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI572748B (en) * 2016-09-20 2017-03-01 翁健名 Electroplating rack for tubular structure

Also Published As

Publication number Publication date
CN105369337A (en) 2016-03-02
TW201606141A (en) 2016-02-16

Similar Documents

Publication Publication Date Title
TWI530593B (en) Multi-anode control device and electroplating equipment having the same
CN105088323B (en) Board-like Electropolating hangers
KR101613406B1 (en) Device for vertical galvanic metal deposition on a substrate
US9624595B2 (en) Electroplating apparatus with improved throughput
US10106906B2 (en) Plating apparatus
CN106167913A (en) Plating bath device
CN101479409B (en) Metal wire rod plating insoluble anode and metal wire rod plating method using it
JP2016180148A (en) Electrolytic plating apparatus
JP6517574B2 (en) Electrolytic plating system
KR20120023238A (en) A boat to transfer substrate
CN115058759B (en) Electroplating equipment and film plating machine
CN216688357U (en) Close formula crude foil machine anode plate connection structure and crude foil machine
CN108914178A (en) A method of it is uneven to solve galvanoplastic preparation wick thickness
CN215925133U (en) Anode plate for film coating machine and film coating machine
CN207749197U (en) Electroplating bath
CN107841784A (en) Electroplating printed circuit board cathode shading device
CN217922411U (en) Anode plate structure and coating machine
CN216998636U (en) Electroplating device and electroplating equipment
JP2020029592A (en) Electrically-conductive ring, power supply device using electrically-conductive ring, and electroplating jig using power supply device
TWI407859B (en) Roll-to-roll transporting equipment for plating a selective portion on flexible circuit board and process thereof
CN209702364U (en) A kind of electro-desalting component
CN209299590U (en) A kind of plating auxiliary device
CN216998653U (en) Titanium basket, electroplating device and electroplating equipment
CN217149348U (en) Copper foil production equipment for shortening conducting bar
CN211238182U (en) Square boat structure