JP2012528357A5 - - Google Patents

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Publication number
JP2012528357A5
JP2012528357A5 JP2012513096A JP2012513096A JP2012528357A5 JP 2012528357 A5 JP2012528357 A5 JP 2012528357A5 JP 2012513096 A JP2012513096 A JP 2012513096A JP 2012513096 A JP2012513096 A JP 2012513096A JP 2012528357 A5 JP2012528357 A5 JP 2012528357A5
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JP
Japan
Prior art keywords
speed
mask
image
photosensitive material
along
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JP2012513096A
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English (en)
Japanese (ja)
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JP5690334B2 (ja
JP2012528357A (ja
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Priority claimed from US12/472,618 external-priority patent/US8339573B2/en
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Publication of JP2012528357A5 publication Critical patent/JP2012528357A5/ja
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Publication of JP5690334B2 publication Critical patent/JP5690334B2/ja
Expired - Fee Related legal-status Critical Current
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JP2012513096A 2009-05-27 2010-05-13 基板をフォトイメージングする方法及び装置 Expired - Fee Related JP5690334B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/472,618 2009-05-27
US12/472,618 US8339573B2 (en) 2009-05-27 2009-05-27 Method and apparatus for photoimaging a substrate
PCT/US2010/034707 WO2010138312A1 (en) 2009-05-27 2010-05-13 Method and apparatus for photoimaging a substrate

Publications (3)

Publication Number Publication Date
JP2012528357A JP2012528357A (ja) 2012-11-12
JP2012528357A5 true JP2012528357A5 (https=) 2013-06-27
JP5690334B2 JP5690334B2 (ja) 2015-03-25

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JP2012513096A Expired - Fee Related JP5690334B2 (ja) 2009-05-27 2010-05-13 基板をフォトイメージングする方法及び装置

Country Status (7)

Country Link
US (1) US8339573B2 (https=)
EP (1) EP2435881A1 (https=)
JP (1) JP5690334B2 (https=)
KR (1) KR20120018200A (https=)
CN (1) CN102460306B (https=)
SG (1) SG175986A1 (https=)
WO (1) WO2010138312A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101924309B1 (ko) * 2011-12-20 2018-11-30 가부시키가이샤 니콘 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
CN103057256B (zh) * 2012-06-21 2015-12-09 深圳市众立生包装科技有限公司 一种高精度印刷系统和印刷方法
JP5963194B2 (ja) * 2012-07-17 2016-08-03 株式会社ブイ・テクノロジー 露光装置
WO2015143428A1 (en) * 2014-03-21 2015-09-24 Carpe Diem Technologies, Inc. System and method for fabricating miniature structures on a flexible substrate
JP6510768B2 (ja) * 2014-05-23 2019-05-08 株式会社オーク製作所 露光装置
TWI709831B (zh) * 2014-09-04 2020-11-11 日商尼康股份有限公司 元件製造方法
WO2016114178A1 (ja) * 2015-01-15 2016-07-21 株式会社村田製作所 露光装置
KR102288354B1 (ko) * 2015-08-10 2021-08-11 삼성디스플레이 주식회사 플렉서블 디스플레이 장치의 제조 방법
CN105549340B (zh) * 2016-02-24 2017-10-24 上海大学 卷对卷柔性衬底光刻方法和装置
JP6332482B2 (ja) * 2017-01-13 2018-05-30 株式会社ニコン 基板処理装置
CN110275388A (zh) * 2018-03-17 2019-09-24 深圳市深龙杰科技有限公司 一种固体介质光学成像的方法
JP7089920B2 (ja) * 2018-03-29 2022-06-23 株式会社オーク製作所 露光装置
DE102019128198B3 (de) * 2019-10-18 2021-02-25 Laser Imaging Systems Gmbh Vorrichtung zur Mustereinbringung mittels Strahlung an einem aufgewickelten Endlossubstrat

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3229607A (en) * 1963-03-19 1966-01-18 Polaroid Corp Photographic products, processes and apparatus
US3562005A (en) * 1968-04-09 1971-02-09 Western Electric Co Method of generating precious metal-reducing patterns
US3783520A (en) * 1970-09-28 1974-01-08 Bell Telephone Labor Inc High accuracy alignment procedure utilizing moire patterns
US3998544A (en) * 1975-06-13 1976-12-21 Terminal Data Corporation Synchronous auxiliary camera projector
US4174174A (en) * 1977-03-15 1979-11-13 Xerox Corporation Composing reducing camera
US4190352A (en) * 1977-06-30 1980-02-26 Bell Telephone Laboratories, Incorporated Method and apparatus for continuously patterning a photosensitive tape
JPS5614573A (en) 1979-07-13 1981-02-12 Kuraray Co Ltd Preparing hot melt adhesive
US4302096A (en) * 1980-02-11 1981-11-24 Sperry Corporation Graphic forms overlay apparatus
US4801979A (en) * 1987-12-23 1989-01-31 Innovative Technology, Inc. Device for copying microfiche
US4924257A (en) * 1988-10-05 1990-05-08 Kantilal Jain Scan and repeat high resolution projection lithography system
US5227839A (en) * 1991-06-24 1993-07-13 Etec Systems, Inc. Small field scanner
JPH0567558A (ja) * 1991-09-06 1993-03-19 Nikon Corp 露光方法
KR950004968B1 (ko) * 1991-10-15 1995-05-16 가부시키가이샤 도시바 투영노광 장치
US5328073A (en) * 1992-06-24 1994-07-12 Eastman Kodak Company Film registration and ironing gate assembly
US5285236A (en) * 1992-09-30 1994-02-08 Kanti Jain Large-area, high-throughput, high-resolution projection imaging system
US5591958A (en) * 1993-06-14 1997-01-07 Nikon Corporation Scanning exposure method and apparatus
JP3291849B2 (ja) * 1993-07-15 2002-06-17 株式会社ニコン 露光方法、デバイス形成方法、及び露光装置
US5563867A (en) * 1994-06-30 1996-10-08 Discovision Associates Optical tape duplicator
US5739964A (en) * 1995-03-22 1998-04-14 Etec Systems, Inc. Magnification correction for small field scanning
US5652645A (en) * 1995-07-24 1997-07-29 Anvik Corporation High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates
US5721606A (en) * 1995-09-07 1998-02-24 Jain; Kanti Large-area, high-throughput, high-resolution, scan-and-repeat, projection patterning system employing sub-full mask
US5621216A (en) * 1996-04-26 1997-04-15 International Business Machines Corporation Hardware/software implementation for multipass E-beam mask writing
JPH09320933A (ja) * 1996-05-28 1997-12-12 Nikon Corp 走査型露光装置
US6312134B1 (en) * 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
US6538723B2 (en) * 1996-08-05 2003-03-25 Nikon Corporation Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing
JPH10189414A (ja) * 1996-12-26 1998-07-21 Nikon Corp Ｘ線投影露光装置及びｘ線投影露光方法
US5795299A (en) * 1997-01-31 1998-08-18 Acuson Corporation Ultrasonic transducer assembly with extended flexible circuits
US5897986A (en) * 1997-05-28 1999-04-27 Anvik Corporation Projection patterning of large substrates using limited-travel x-y stage
US5923403A (en) * 1997-07-08 1999-07-13 Anvik Corporation Simultaneous, two-sided projection lithography system
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
US20010003028A1 (en) * 1997-09-19 2001-06-07 Nikon Corporation Scanning Exposure Method
JPH11251229A (ja) * 1998-02-27 1999-09-17 Canon Inc 露光装置およびデバイス製造方法
WO1999046835A1 (en) * 1998-03-11 1999-09-16 Nikon Corporation Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus
US6304316B1 (en) * 1998-10-22 2001-10-16 Anvik Corporation Microlithography system for high-resolution large-area patterning on curved surfaces
JP2000252192A (ja) * 1999-02-26 2000-09-14 Nikon Corp 投影露光方法および投影露光装置
JP2000277408A (ja) * 1999-03-23 2000-10-06 Nikon Corp 露光装置および露光方法
US6285438B1 (en) * 1999-05-19 2001-09-04 Nikon Corporation Scanning exposure method with reduced time between scans
WO2001020733A1 (en) * 1999-09-10 2001-03-22 Nikon Corporation Light source and wavelength stabilization control method, exposure apparatus and exposure method, method for producing exposure apparatus, and device manufacturing method and device
JP2001007023A (ja) * 2000-01-01 2001-01-12 Nikon Corp 投影露光方法及び装置、並びに素子製造方法
US6933098B2 (en) * 2000-01-11 2005-08-23 Sipix Imaging Inc. Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
JP2001319871A (ja) * 2000-02-29 2001-11-16 Nikon Corp 露光方法、濃度フィルタの製造方法、及び露光装置
JP2001274054A (ja) * 2000-03-24 2001-10-05 Canon Inc 露光装置、半導体デバイス製造方法および半導体デバイス製造工場
JP2001284210A (ja) * 2000-03-30 2001-10-12 Canon Inc 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP4947842B2 (ja) * 2000-03-31 2012-06-06 キヤノン株式会社 荷電粒子線露光装置
JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置
JP2002009133A (ja) * 2000-06-26 2002-01-11 Canon Inc 基板搬送装置
EP1303792B1 (en) * 2000-07-16 2012-10-03 Board Of Regents, The University Of Texas System High-resolution overlay alignement methods and systems for imprint lithography
JP2002050559A (ja) * 2000-08-01 2002-02-15 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JP2002057089A (ja) * 2000-08-09 2002-02-22 Canon Inc 露光装置
JP2002110526A (ja) * 2000-10-03 2002-04-12 Canon Inc 走査露光方法及び走査露光装置
JP2002217095A (ja) * 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
JP2002158155A (ja) * 2000-11-17 2002-05-31 Canon Inc 露光装置および露光方法
JP3762307B2 (ja) * 2001-02-15 2006-04-05 キヤノン株式会社 レーザ干渉干渉計システムを含む露光装置
TW556044B (en) * 2001-02-15 2003-10-01 Sipix Imaging Inc Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
US6621553B2 (en) * 2001-03-30 2003-09-16 Perkinelmer, Inc. Apparatus and method for exposing substrates
AU2002253574A1 (en) * 2001-04-24 2002-11-11 Canon Kabushiki Kaisha Exposure method and apparatus
JP2002334826A (ja) * 2001-05-09 2002-11-22 Canon Inc 露光方法、面位置合わせ方法、露光装置及びデバイス製造方法
EP1276016B1 (en) * 2001-07-09 2009-06-10 Canon Kabushiki Kaisha Exposure apparatus
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
US6774509B2 (en) * 2002-01-30 2004-08-10 Defond Manufacturing Limited Electrical switch assembly
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
US6774983B2 (en) * 2002-08-12 2004-08-10 Anvik Corporation Distributed projection system
JP2004111579A (ja) * 2002-09-17 2004-04-08 Canon Inc 露光方法及び装置
JP3689698B2 (ja) * 2003-01-31 2005-08-31 キヤノン株式会社 投影露光装置、投影露光方法および被露光部材の製造方法
JP3977302B2 (ja) * 2003-08-13 2007-09-19 キヤノン株式会社 露光装置及びその使用方法並びにデバイス製造方法
US7165959B2 (en) * 2003-09-09 2007-01-23 3M Innovative Properties Company Apparatus and method for producing two-sided patterned webs in registration
US7270942B2 (en) * 2003-10-22 2007-09-18 Lsi Corporation Optimized mirror design for optical direct write
US7296717B2 (en) * 2003-11-21 2007-11-20 3M Innovative Properties Company Method and apparatus for controlling a moving web
JP4861400B2 (ja) * 2005-03-09 2012-01-25 スリーエム イノベイティブ プロパティズ カンパニー 位置合わせされた両面パターン化ウェブの作製装置および方法
JP4648063B2 (ja) * 2005-04-19 2011-03-09 日東電工株式会社 カテーテル用フレキシブル配線回路基板、並びに、該フレキシブル配線回路基板を用いたカテーテル及びその製造方法
JP2009501280A (ja) 2005-07-12 2009-01-15 スリーエム イノベイティブ プロパティズ カンパニー 基材上に材料模様を連続的に付着させるための装置及び方法
US8383330B2 (en) * 2005-09-07 2013-02-26 Fujifilm Corporation Pattern exposure method and pattern exposure apparatus
EP2052294A4 (en) * 2006-08-03 2012-08-22 3M Innovative Properties Co FLEXIBLE CIRCUITS WITH LONG LENGTH AND MANUFACTURING PROCESS THEREFOR
US7683351B2 (en) * 2006-12-01 2010-03-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7400457B1 (en) * 2007-01-04 2008-07-15 Stockeryale Canada Inc. Rectangular flat-top beam shaper
US20080171422A1 (en) * 2007-01-11 2008-07-17 Tokie Jeffrey H Apparatus and methods for fabrication of thin film electronic devices and circuits

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