US3775693A
(en)
|
1971-11-29 |
1973-11-27 |
Moskek Co |
Mosfet logic inverter for integrated circuits
|
US4800303A
(en)
|
1987-05-19 |
1989-01-24 |
Gazelle Microcircuits, Inc. |
TTL compatible output buffer
|
US5218607A
(en)
|
1989-06-23 |
1993-06-08 |
Kabushiki Kaisha Toshiba |
Computer having a resume function and operable on an internal power source
|
JPH0327419A
(ja)
|
1989-06-23 |
1991-02-05 |
Toshiba Corp |
パーソナルコンピュータ
|
US5039883A
(en)
|
1990-02-21 |
1991-08-13 |
Nec Electronics Inc. |
Dual input universal logic structure
|
US6242289B1
(en)
|
1995-09-08 |
2001-06-05 |
Semiconductor Energy Laboratories Co., Ltd. |
Method for producing semiconductor device
|
JPH11505377A
(ja)
|
1995-08-03 |
1999-05-18 |
フィリップス エレクトロニクス ネムローゼ フェンノートシャップ |
半導体装置
|
JPH09270677A
(ja)
*
|
1995-09-05 |
1997-10-14 |
Mitsubishi Electric Corp |
フリップフロップ回路及びスキャンパス並びに記憶回路
|
US6078194A
(en)
|
1995-11-13 |
2000-06-20 |
Vitesse Semiconductor Corporation |
Logic gates for reducing power consumption of gallium arsenide integrated circuits
|
JP3625598B2
(ja)
|
1995-12-30 |
2005-03-02 |
三星電子株式会社 |
液晶表示装置の製造方法
|
JPH1078836A
(ja)
*
|
1996-09-05 |
1998-03-24 |
Hitachi Ltd |
データ処理装置
|
JP4103968B2
(ja)
|
1996-09-18 |
2008-06-18 |
株式会社半導体エネルギー研究所 |
絶縁ゲイト型半導体装置
|
US5767729A
(en)
*
|
1996-10-31 |
1998-06-16 |
Integrated Silicon Solution Inc. |
Distribution charge pump for nonvolatile memory device
|
US5980092A
(en)
|
1996-11-19 |
1999-11-09 |
Unisys Corporation |
Method and apparatus for optimizing a gated clock structure using a standard optimization tool
|
CA2305703A1
(en)
|
1997-10-10 |
1999-04-22 |
David W. Christianson |
Compositions and methods for inhibiting arginase activity
|
US6049883A
(en)
|
1998-04-01 |
2000-04-11 |
Tjandrasuwita; Ignatius B. |
Data path clock skew management in a dynamic power management environment
|
JP4170454B2
(ja)
|
1998-07-24 |
2008-10-22 |
Hoya株式会社 |
透明導電性酸化物薄膜を有する物品及びその製造方法
|
JP2000150861A
(ja)
|
1998-11-16 |
2000-05-30 |
Tdk Corp |
酸化物薄膜
|
JP3276930B2
(ja)
|
1998-11-17 |
2002-04-22 |
科学技術振興事業団 |
トランジスタ及び半導体装置
|
US6204695B1
(en)
|
1999-06-18 |
2001-03-20 |
Xilinx, Inc. |
Clock-gating circuit for reducing power consumption
|
TW460731B
(en)
|
1999-09-03 |
2001-10-21 |
Ind Tech Res Inst |
Electrode structure and production method of wide viewing angle LCD
|
US6281710B1
(en)
|
1999-12-17 |
2001-08-28 |
Hewlett-Packard Company |
Selective latch for a domino logic gate
|
JP4089858B2
(ja)
|
2000-09-01 |
2008-05-28 |
国立大学法人東北大学 |
半導体デバイス
|
JP3727838B2
(ja)
|
2000-09-27 |
2005-12-21 |
株式会社東芝 |
半導体集積回路
|
KR20020038482A
(ko)
|
2000-11-15 |
2002-05-23 |
모리시타 요이찌 |
박막 트랜지스터 어레이, 그 제조방법 및 그것을 이용한표시패널
|
TW465188B
(en)
|
2001-01-02 |
2001-11-21 |
Faraday Tech Corp |
Clock gate buffer circuit
|
JP3997731B2
(ja)
|
2001-03-19 |
2007-10-24 |
富士ゼロックス株式会社 |
基材上に結晶性半導体薄膜を形成する方法
|
JP2002289859A
(ja)
|
2001-03-23 |
2002-10-04 |
Minolta Co Ltd |
薄膜トランジスタ
|
DE10119051B4
(de)
|
2001-04-18 |
2006-12-28 |
Infineon Technologies Ag |
Schaltungsanordnung zur Freigabe eines Taktsignals in Abhängigkeit von einem Freigabesignal
|
US6822478B2
(en)
|
2001-07-03 |
2004-11-23 |
Texas Instruments Incorporated |
Data-driven clock gating for a sequential data-capture device
|
JP3925839B2
(ja)
|
2001-09-10 |
2007-06-06 |
シャープ株式会社 |
半導体記憶装置およびその試験方法
|
JP4090716B2
(ja)
|
2001-09-10 |
2008-05-28 |
雅司 川崎 |
薄膜トランジスタおよびマトリクス表示装置
|
JP4974202B2
(ja)
|
2001-09-19 |
2012-07-11 |
ルネサスエレクトロニクス株式会社 |
半導体集積回路
|
JP4164562B2
(ja)
|
2002-09-11 |
2008-10-15 |
独立行政法人科学技術振興機構 |
ホモロガス薄膜を活性層として用いる透明薄膜電界効果型トランジスタ
|
US7061014B2
(en)
|
2001-11-05 |
2006-06-13 |
Japan Science And Technology Agency |
Natural-superlattice homologous single crystal thin film, method for preparation thereof, and device using said single crystal thin film
|
JP4083486B2
(ja)
|
2002-02-21 |
2008-04-30 |
独立行政法人科学技術振興機構 |
LnCuO(S,Se,Te)単結晶薄膜の製造方法
|
CN1445821A
(zh)
|
2002-03-15 |
2003-10-01 |
三洋电机株式会社 |
ZnO膜和ZnO半导体层的形成方法、半导体元件及其制造方法
|
JP3933591B2
(ja)
|
2002-03-26 |
2007-06-20 |
淳二 城戸 |
有機エレクトロルミネッセント素子
|
US7339187B2
(en)
|
2002-05-21 |
2008-03-04 |
State Of Oregon Acting By And Through The Oregon State Board Of Higher Education On Behalf Of Oregon State University |
Transistor structures
|
JP2004022625A
(ja)
|
2002-06-13 |
2004-01-22 |
Murata Mfg Co Ltd |
半導体デバイス及び該半導体デバイスの製造方法
|
US7398442B2
(en)
|
2002-06-21 |
2008-07-08 |
Koninklijke Philips Electronics N.V. |
Electronic circuit with asynchronously operating components
|
US7105868B2
(en)
|
2002-06-24 |
2006-09-12 |
Cermet, Inc. |
High-electron mobility transistor with zinc oxide
|
TWI272641B
(en)
|
2002-07-16 |
2007-02-01 |
Semiconductor Energy Lab |
Method of manufacturing a semiconductor device
|
JP3910902B2
(ja)
|
2002-10-02 |
2007-04-25 |
松下電器産業株式会社 |
集積回路装置
|
US7067843B2
(en)
|
2002-10-11 |
2006-06-27 |
E. I. Du Pont De Nemours And Company |
Transparent oxide semiconductor thin film transistors
|
US6788567B2
(en)
|
2002-12-02 |
2004-09-07 |
Rohm Co., Ltd. |
Data holding device and data holding method
|
JP4166105B2
(ja)
|
2003-03-06 |
2008-10-15 |
シャープ株式会社 |
半導体装置およびその製造方法
|
JP2004273732A
(ja)
|
2003-03-07 |
2004-09-30 |
Sharp Corp |
アクティブマトリクス基板およびその製造方法
|
JP4108633B2
(ja)
|
2003-06-20 |
2008-06-25 |
シャープ株式会社 |
薄膜トランジスタおよびその製造方法ならびに電子デバイス
|
US7262463B2
(en)
|
2003-07-25 |
2007-08-28 |
Hewlett-Packard Development Company, L.P. |
Transistor including a deposited channel region having a doped portion
|
US7076748B2
(en)
|
2003-08-01 |
2006-07-11 |
Atrenta Inc. |
Identification and implementation of clock gating in the design of integrated circuits
|
US7282782B2
(en)
|
2004-03-12 |
2007-10-16 |
Hewlett-Packard Development Company, L.P. |
Combined binary oxide semiconductor device
|
CN102354658B
(zh)
|
2004-03-12 |
2015-04-01 |
独立行政法人科学技术振兴机构 |
薄膜晶体管的制造方法
|
US7145174B2
(en)
|
2004-03-12 |
2006-12-05 |
Hewlett-Packard Development Company, Lp. |
Semiconductor device
|
US7297977B2
(en)
|
2004-03-12 |
2007-11-20 |
Hewlett-Packard Development Company, L.P. |
Semiconductor device
|
US7211825B2
(en)
|
2004-06-14 |
2007-05-01 |
Yi-Chi Shih |
Indium oxide-based thin film transistors and circuits
|
JP2006100760A
(ja)
|
2004-09-02 |
2006-04-13 |
Casio Comput Co Ltd |
薄膜トランジスタおよびその製造方法
|
US7285501B2
(en)
|
2004-09-17 |
2007-10-23 |
Hewlett-Packard Development Company, L.P. |
Method of forming a solution processed device
|
US7298084B2
(en)
|
2004-11-02 |
2007-11-20 |
3M Innovative Properties Company |
Methods and displays utilizing integrated zinc oxide row and column drivers in conjunction with organic light emitting diodes
|
US7829444B2
(en)
|
2004-11-10 |
2010-11-09 |
Canon Kabushiki Kaisha |
Field effect transistor manufacturing method
|
US7863611B2
(en)
|
2004-11-10 |
2011-01-04 |
Canon Kabushiki Kaisha |
Integrated circuits utilizing amorphous oxides
|
US7453065B2
(en)
|
2004-11-10 |
2008-11-18 |
Canon Kabushiki Kaisha |
Sensor and image pickup device
|
EP1810335B1
(en)
|
2004-11-10 |
2020-05-27 |
Canon Kabushiki Kaisha |
Light-emitting device
|
US7791072B2
(en)
|
2004-11-10 |
2010-09-07 |
Canon Kabushiki Kaisha |
Display
|
RU2358355C2
(ru)
|
2004-11-10 |
2009-06-10 |
Кэнон Кабусики Кайся |
Полевой транзистор
|
EP1812969B1
(en)
|
2004-11-10 |
2015-05-06 |
Canon Kabushiki Kaisha |
Field effect transistor comprising an amorphous oxide
|
US7256622B2
(en)
|
2004-12-08 |
2007-08-14 |
Naveen Dronavalli |
AND, OR, NAND, and NOR logical gates
|
US7579224B2
(en)
|
2005-01-21 |
2009-08-25 |
Semiconductor Energy Laboratory Co., Ltd. |
Method for manufacturing a thin film semiconductor device
|
TWI569441B
(zh)
|
2005-01-28 |
2017-02-01 |
半導體能源研究所股份有限公司 |
半導體裝置,電子裝置,和半導體裝置的製造方法
|
TWI505473B
(zh)
|
2005-01-28 |
2015-10-21 |
Semiconductor Energy Lab |
半導體裝置,電子裝置,和半導體裝置的製造方法
|
US7858451B2
(en)
|
2005-02-03 |
2010-12-28 |
Semiconductor Energy Laboratory Co., Ltd. |
Electronic device, semiconductor device and manufacturing method thereof
|
US7948171B2
(en)
|
2005-02-18 |
2011-05-24 |
Semiconductor Energy Laboratory Co., Ltd. |
Light emitting device
|
US20060197092A1
(en)
|
2005-03-03 |
2006-09-07 |
Randy Hoffman |
System and method for forming conductive material on a substrate
|
US8681077B2
(en)
|
2005-03-18 |
2014-03-25 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device, and display device, driving method and electronic apparatus thereof
|
US7544967B2
(en)
|
2005-03-28 |
2009-06-09 |
Massachusetts Institute Of Technology |
Low voltage flexible organic/transparent transistor for selective gas sensing, photodetecting and CMOS device applications
|
US7645478B2
(en)
|
2005-03-31 |
2010-01-12 |
3M Innovative Properties Company |
Methods of making displays
|
US8300031B2
(en)
|
2005-04-20 |
2012-10-30 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device comprising transistor having gate and drain connected through a current-voltage conversion element
|
JP2006344849A
(ja)
|
2005-06-10 |
2006-12-21 |
Casio Comput Co Ltd |
薄膜トランジスタ
|
US7402506B2
(en)
|
2005-06-16 |
2008-07-22 |
Eastman Kodak Company |
Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby
|
US7691666B2
(en)
|
2005-06-16 |
2010-04-06 |
Eastman Kodak Company |
Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby
|
US7507618B2
(en)
|
2005-06-27 |
2009-03-24 |
3M Innovative Properties Company |
Method for making electronic devices using metal oxide nanoparticles
|
KR100711890B1
(ko)
|
2005-07-28 |
2007-04-25 |
삼성에스디아이 주식회사 |
유기 발광표시장치 및 그의 제조방법
|
US7323909B2
(en)
|
2005-07-29 |
2008-01-29 |
Sequence Design, Inc. |
Automatic extension of clock gating technique to fine-grained power gating
|
JP2007059128A
(ja)
|
2005-08-23 |
2007-03-08 |
Canon Inc |
有機el表示装置およびその製造方法
|
JP4850457B2
(ja)
|
2005-09-06 |
2012-01-11 |
キヤノン株式会社 |
薄膜トランジスタ及び薄膜ダイオード
|
JP4560502B2
(ja)
|
2005-09-06 |
2010-10-13 |
キヤノン株式会社 |
電界効果型トランジスタ
|
JP4280736B2
(ja)
|
2005-09-06 |
2009-06-17 |
キヤノン株式会社 |
半導体素子
|
JP5116225B2
(ja)
|
2005-09-06 |
2013-01-09 |
キヤノン株式会社 |
酸化物半導体デバイスの製造方法
|
JP2007073705A
(ja)
|
2005-09-06 |
2007-03-22 |
Canon Inc |
酸化物半導体チャネル薄膜トランジスタおよびその製造方法
|
EP1998374A3
(en)
|
2005-09-29 |
2012-01-18 |
Semiconductor Energy Laboratory Co, Ltd. |
Semiconductor device having oxide semiconductor layer and manufacturing method thereof
|
JP5037808B2
(ja)
|
2005-10-20 |
2012-10-03 |
キヤノン株式会社 |
アモルファス酸化物を用いた電界効果型トランジスタ、及び該トランジスタを用いた表示装置
|
KR101117948B1
(ko)
|
2005-11-15 |
2012-02-15 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
액정 디스플레이 장치 제조 방법
|
TWI292281B
(en)
|
2005-12-29 |
2008-01-01 |
Ind Tech Res Inst |
Pixel structure of active organic light emitting diode and method of fabricating the same
|
US7867636B2
(en)
|
2006-01-11 |
2011-01-11 |
Murata Manufacturing Co., Ltd. |
Transparent conductive film and method for manufacturing the same
|
US20070161165A1
(en)
|
2006-01-12 |
2007-07-12 |
Toppoly Optoelectronics Corp. |
Systems and methods involving thin film transistors
|
JP4977478B2
(ja)
|
2006-01-21 |
2012-07-18 |
三星電子株式会社 |
ZnOフィルム及びこれを用いたTFTの製造方法
|
US7576394B2
(en)
|
2006-02-02 |
2009-08-18 |
Kochi Industrial Promotion Center |
Thin film transistor including low resistance conductive thin films and manufacturing method thereof
|
US7977169B2
(en)
|
2006-02-15 |
2011-07-12 |
Kochi Industrial Promotion Center |
Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof
|
KR20070101595A
(ko)
|
2006-04-11 |
2007-10-17 |
삼성전자주식회사 |
ZnO TFT
|
US20070252928A1
(en)
|
2006-04-28 |
2007-11-01 |
Toppan Printing Co., Ltd. |
Structure, transmission type liquid crystal display, reflection type display and manufacturing method thereof
|
US7443202B2
(en)
|
2006-06-02 |
2008-10-28 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device and electronic apparatus having the same
|
JP5028033B2
(ja)
|
2006-06-13 |
2012-09-19 |
キヤノン株式会社 |
酸化物半導体膜のドライエッチング方法
|
JP4999400B2
(ja)
|
2006-08-09 |
2012-08-15 |
キヤノン株式会社 |
酸化物半導体膜のドライエッチング方法
|
JP4609797B2
(ja)
|
2006-08-09 |
2011-01-12 |
Nec液晶テクノロジー株式会社 |
薄膜デバイス及びその製造方法
|
JP4332545B2
(ja)
|
2006-09-15 |
2009-09-16 |
キヤノン株式会社 |
電界効果型トランジスタ及びその製造方法
|
JP5164357B2
(ja)
|
2006-09-27 |
2013-03-21 |
キヤノン株式会社 |
半導体装置及び半導体装置の製造方法
|
JP4274219B2
(ja)
|
2006-09-27 |
2009-06-03 |
セイコーエプソン株式会社 |
電子デバイス、有機エレクトロルミネッセンス装置、有機薄膜半導体装置
|
US7622371B2
(en)
|
2006-10-10 |
2009-11-24 |
Hewlett-Packard Development Company, L.P. |
Fused nanocrystal thin film semiconductor and method
|
US7772021B2
(en)
|
2006-11-29 |
2010-08-10 |
Samsung Electronics Co., Ltd. |
Flat panel displays comprising a thin-film transistor having a semiconductive oxide in its channel and methods of fabricating the same for use in flat panel displays
|
JP2008140684A
(ja)
|
2006-12-04 |
2008-06-19 |
Toppan Printing Co Ltd |
カラーelディスプレイおよびその製造方法
|
US7576582B2
(en)
|
2006-12-05 |
2009-08-18 |
Electronics And Telecommunications Research Institute |
Low-power clock gating circuit
|
KR101303578B1
(ko)
|
2007-01-05 |
2013-09-09 |
삼성전자주식회사 |
박막 식각 방법
|
US8207063B2
(en)
|
2007-01-26 |
2012-06-26 |
Eastman Kodak Company |
Process for atomic layer deposition
|
KR100851215B1
(ko)
|
2007-03-14 |
2008-08-07 |
삼성에스디아이 주식회사 |
박막 트랜지스터 및 이를 이용한 유기 전계 발광표시장치
|
US7795613B2
(en)
|
2007-04-17 |
2010-09-14 |
Toppan Printing Co., Ltd. |
Structure with transistor
|
KR101325053B1
(ko)
|
2007-04-18 |
2013-11-05 |
삼성디스플레이 주식회사 |
박막 트랜지스터 기판 및 이의 제조 방법
|
KR20080094300A
(ko)
|
2007-04-19 |
2008-10-23 |
삼성전자주식회사 |
박막 트랜지스터 및 그 제조 방법과 박막 트랜지스터를포함하는 평판 디스플레이
|
KR101334181B1
(ko)
|
2007-04-20 |
2013-11-28 |
삼성전자주식회사 |
선택적으로 결정화된 채널층을 갖는 박막 트랜지스터 및 그제조 방법
|
US8274078B2
(en)
|
2007-04-25 |
2012-09-25 |
Canon Kabushiki Kaisha |
Metal oxynitride semiconductor containing zinc
|
KR101345376B1
(ko)
|
2007-05-29 |
2013-12-24 |
삼성전자주식회사 |
ZnO 계 박막 트랜지스터 및 그 제조방법
|
JP5215158B2
(ja)
|
2007-12-17 |
2013-06-19 |
富士フイルム株式会社 |
無機結晶性配向膜及びその製造方法、半導体デバイス
|
JP5140459B2
(ja)
|
2008-02-28 |
2013-02-06 |
ローム株式会社 |
不揮発性記憶ゲートおよびその動作方法、および不揮発性記憶ゲート組込み型論理回路およびその動作方法
|
KR100941843B1
(ko)
|
2008-04-14 |
2010-02-11 |
삼성모바일디스플레이주식회사 |
인버터 및 이를 구비한 표시장치
|
US8314765B2
(en)
|
2008-06-17 |
2012-11-20 |
Semiconductor Energy Laboratory Co., Ltd. |
Driver circuit, display device, and electronic device
|
JP4623179B2
(ja)
|
2008-09-18 |
2011-02-02 |
ソニー株式会社 |
薄膜トランジスタおよびその製造方法
|
JP5451280B2
(ja)
|
2008-10-09 |
2014-03-26 |
キヤノン株式会社 |
ウルツ鉱型結晶成長用基板およびその製造方法ならびに半導体装置
|
JP5781720B2
(ja)
|
2008-12-15 |
2015-09-24 |
ルネサスエレクトロニクス株式会社 |
半導体装置及び半導体装置の製造方法
|
KR101746198B1
(ko)
*
|
2009-09-04 |
2017-06-12 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
표시장치 및 전자기기
|
WO2011034012A1
(en)
|
2009-09-16 |
2011-03-24 |
Semiconductor Energy Laboratory Co., Ltd. |
Logic circuit, light emitting device, semiconductor device, and electronic device
|
KR101740943B1
(ko)
|
2009-09-24 |
2017-06-15 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
표시 장치
|
KR101711236B1
(ko)
|
2009-10-09 |
2017-02-28 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
반도체 장치
|
KR102689629B1
(ko)
|
2009-10-16 |
2024-07-31 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
반도체 장치
|
KR101745747B1
(ko)
|
2009-10-16 |
2017-06-27 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
논리 회로 및 반도체 장치
|
EP2494594B1
(en)
|
2009-10-29 |
2020-02-19 |
Semiconductor Energy Laboratory Co. Ltd. |
Semiconductor device
|
SG188112A1
(en)
|
2009-10-30 |
2013-03-28 |
Semiconductor Energy Lab |
Logic circuit and semiconductor device
|
KR101700154B1
(ko)
|
2009-11-20 |
2017-01-26 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
래치 회로와 회로
|
KR101781336B1
(ko)
|
2009-12-25 |
2017-09-25 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
반도체 장치
|
WO2011096262A1
(en)
*
|
2010-02-05 |
2011-08-11 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device
|
JP5714973B2
(ja)
|
2010-05-21 |
2015-05-07 |
株式会社半導体エネルギー研究所 |
半導体装置
|
WO2011145706A1
(en)
|
2010-05-21 |
2011-11-24 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device and display device
|
WO2011145707A1
(en)
|
2010-05-21 |
2011-11-24 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device and display device
|
US8928466B2
(en)
|
2010-08-04 |
2015-01-06 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device
|
TWI524347B
(zh)
*
|
2010-08-06 |
2016-03-01 |
半導體能源研究所股份有限公司 |
半導體裝置及其驅動方法
|
US8422272B2
(en)
*
|
2010-08-06 |
2013-04-16 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device and driving method thereof
|
WO2012029638A1
(en)
|
2010-09-03 |
2012-03-08 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device
|
TWI632551B
(zh)
|
2010-12-03 |
2018-08-11 |
半導體能源研究所股份有限公司 |
積體電路,其驅動方法,及半導體裝置
|
TWI621121B
(zh)
|
2011-01-05 |
2018-04-11 |
半導體能源研究所股份有限公司 |
儲存元件、儲存裝置、及信號處理電路
|
US8760903B2
(en)
*
|
2011-03-11 |
2014-06-24 |
Semiconductor Energy Laboratory Co., Ltd. |
Storage circuit
|
WO2012153697A1
(en)
*
|
2011-05-06 |
2012-11-15 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor memory device
|
KR101922397B1
(ko)
*
|
2011-05-20 |
2018-11-28 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
반도체 장치
|