JP2012104848A - 低飽和磁化自由層を有するスピン転移磁気素子 - Google Patents
低飽和磁化自由層を有するスピン転移磁気素子 Download PDFInfo
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Abstract
【解決手段】磁気素子100は、固定層110と、非磁性であるスペーサ層120と、自由層磁化を有する自由層130とを備える。スペーサ層120は、固定層110と自由層130との間に存在する。自由層130は、被ドープ強磁性材料を含む。被ドープ強磁性材料は、自由層130が室温で1430emu/cm3以下の低飽和磁化を有するように、少なくとも1つの非磁性材料で希釈された少なくとも1つの強磁性材料か、フェリ磁性的にドープされた少なくとも1つの強磁性材料か、又は、少なくとも1つの非磁性材料で希釈され且つフェリ磁性的にドープされた少なくとも1つの強磁性材料を含む。書き込み電流が磁気素子100を通過する時、自由層磁化がスピン転移を用いて切換えられる。
【選択図】図2A
Description
αtMs[Heff−2πMs]/g(θ)
上式において、
α=現象学的ギルバート(Gilbert)減衰定数
t=自由層の厚さ
Ms=自由層の飽和磁化
Heff=自由層の有効磁場
であり、g(θ)は、スピン転移効率を反映する。
Claims (44)
- 磁気素子であって、
固定層と、
非磁性であるスペーサ層と、
自由層磁化を有する自由層であって、前記スペーサ層が前記固定層と前記自由層との間に存在し、被ドープ強磁性材料を含む前記自由層と、
を備え、前記被ドープ強磁性材料は、前記自由層が室温で1430emu/cm3以下の低飽和磁化を有するように、少なくとも1つの非磁性材料で希釈された少なくとも1つの強磁性材料か、フェリ磁性的にドープされた少なくとも1つの強磁性材料か、又は、少なくとも1つの非磁性材料で希釈され且つフェリ磁性的にドープされた少なくとも1つの強磁性材料を含み、
前記少なくとも1つの非磁性材料で希釈された少なくとも1つの強磁性材料は、少なくともCoX、FeX、CoFeX、NiFeX、CoXY、FeXY、CoFeXY、NiFeXY、及び/又はCoNiFeXY(ここで、X又はYは、Cr、Cu、Au、B、Nb、Mo、Pt、Pd、Ta、Rh、Ru、Ag、TaN、CuN、TaCuNである)、及び/又はCoFeX(ここで、Xは、Cr、Cu、Au、Nb、Mo、Pt、Pd、Ta、Rh、Ru、Ag、TaN、CuN及びTaCuNである)を含み、
前記磁気素子は、書き込み電流が前記磁気素子を通過する時、前記自由層磁化がスピン転移により切り替えられるように構成されている、磁気素子。 - 請求項1に記載の磁気素子において、
X及びYは、5〜80原子パーセントの範囲にあるPt及びPdを除き、少なくとも5原子パーセントであり且つ60原子パーセント以下である、磁気素子。 - 請求項1に記載の磁気素子において、
前記自由層は、CoX、FeX、CoFeX、NiFeX及び/又はCoNiFeXを含み、Xは、5〜60原子パーセントの範囲で少なくとも1つの希土類元素を含む、磁気素子。 - 請求項3に記載の磁気素子において、
前記少なくとも1つの希土類元素は、5〜60原子パーセントのGd又はTbである、磁気素子。 - 請求項3に記載の磁気素子において、
前記自由層は更に、少なくとも1つの追加のドーパントを含み、前記少なくとも1つの追加のドーパントは、Cr、Cu、Au、Nb、Mo、Pt、Pd、Ta、Rh及び/又はRuを含む、磁気素子。 - 請求項1に記載の磁気素子は更に、
前記自由層と前記スペーサ層との間に存在する高スピン分極層を備える、磁気素子。 - 請求項1に記載の磁気素子において、
前記固定層は、複数の二分子層を含み、前記複数の二分子層の各々は、xを1未満とすると、FexCo1−x層及びCu層を含む、磁気素子。 - 磁気素子であって、
第1固定層と、
導電性及び非磁性であるスペーサ層と、
自由層磁化を有する自由層であって、前記スペーサ層が前記第1固定層と前記自由層との間に存在し、低飽和磁化自由層である前記自由層であって、室温で1430emu/cm3以下の低飽和磁化を有するように被ドープ強磁性材料を含む前記自由層と、
絶縁体である障壁層であって、トンネル通過可能な厚さを有する前記障壁層と、
第2固定層であって、前記障壁層が前記自由層と前記第2固定層との間に存在する前記第2固定層と、を備え、
前記磁気素子は、書き込み電流が前記磁気素子を通過する時、前記自由層磁化がスピン転移により切り替えられるように構成されている、磁気素子。 - 請求項8に記載の磁気素子において、
前記自由層は、少なくとも1つの非磁性材料で希釈された少なくとも1つの強磁性材料を含む、磁気素子。 - 請求項8に記載の磁気素子において、
前記自由層は、CoX、FeX、CoFeX、NiFeX、CoXY、FeXY、CoFeXY、NiFeXY及び/又はCoNiFeXYを含み、ここで、X又はYは、Cr、Cu、Au、B、Nb、Mo、Pt、Pd、Ta、Rh、Ru、Ag、TaN、CuN及び/又はTaCuNである、磁気素子。 - 請求項10に記載の磁気素子において、
X及びYは、Cr、Cu、Au、B、Nb、Mo、Pt、Pd、Ta、Rh、Ru、Ag、TaN、CuN及び/又はTaCuNの場合には少なくとも5原子パーセントであり且つ60原子パーセント以下であり、Pt及びPdの場合には少なくとも5原子パーセントであり且つ80原子パーセント以下である、磁気素子。 - 請求項8に記載の磁気素子において、
前記自由層は、少なくとも1つの強磁性層及び少なくとも1つの非磁性層を含む多層を含む、磁気素子。 - 請求項12に記載の磁気素子において、
前記自由層は、複数の二分子層を含み、前記複数の二分子層の各々は、xを1未満とすると、FexCo1−x層及びCu層を含む、磁気素子。 - 請求項13に記載の磁気素子において、
xが0.5である、磁気素子。 - 請求項13に記載の磁気素子において、
前記Cu層又はFeCo層は、その厚さが、1オングストローム以上であり且つ8オングストローム以下である、磁気素子。 - 請求項8に記載の磁気素子において、
前記自由層は、少なくとも1つのドーパントでフェリ磁性的にドープされた少なくとも1つの強磁性材料を含む、磁気素子。 - 請求項16に記載の磁気素子において、
前記自由層は、CoX、FeX、CoFeX、NiFeX及び/又はCoNiFeXを含み、ここで、Xは、少なくとも1つの希土類元素を含む、磁気素子。 - 請求項17に記載の磁気素子において、
前記少なくとも1つの希土類元素は、Gd又はTbである、磁気素子。 - 請求項18に記載の磁気素子において、
前記自由層は更に、少なくとも1つの追加のドーパントを含み、前記少なくとも1つの追加のドーパントは、Cr、Cu、Au、Nb、Mo、Pt、Pd、Ta、Rh及び/又はRuを含む、磁気素子。 - 請求項8に記載の磁気素子は更に、
前記自由層と前記スペーサ層との間に存在する高スピン分極層を備える、磁気素子。 - 請求項8に記載の磁気素子において、
前記固定層は、複数の二分子層を含み、前記複数の二分子層の各々は、xを1未満とすると、FexCo1−x層及びCu層を含む、磁気素子。 - 請求項8に記載の磁気素子において、
前記自由層は単一の自由層である、磁気素子。 - 請求項8に記載の磁気素子において、
前記第1固定層は、前記スペーサ層に隣接する強磁性層を含む第1合成固定層であり、前記強磁性層は、第1磁化を有し、前記第2固定層は、第2磁化を有し、前記第1磁化及び前記第2磁化は、逆方向に向いている、磁気素子。 - 請求項23に記載の磁気素子において、
前記第2固定層は、第2合成固定層である、磁気素子。 - 請求項24に記載の磁気素子において、
前記第2合成固定層は、前記障壁層に隣接する第2強磁性層を含み、前記第2強磁性層は、第2磁化を有し、前記第1磁化及び前記第2磁化は、逆方向に向いている、磁気素子。 - 請求項8に記載の磁気素子において、
前記第1固定層及び前記第2固定層は、前記第1固定層及び前記第2固定層の双方からの電荷キャリアが、スピン転移による前記自由層磁化のスイッチングに寄与し得るように構成されている、磁気素子。 - 磁気素子であって、
第1固定層と、
非磁性である第1スペーサ層と、
第1自由層であって、前記第1スペーサ層が前記第1固定層と前記第1自由層との間に存在する、前記第1自由層と、
第2自由層磁化を有する第2自由層であって、前記第1自由層及び前記第2自由層が静磁気的に結合されている、前記第2自由層と、
非磁性である第2スペーサ層と、
第2固定層であって、前記第2スペーサ層が前記第2自由層と前記第2固定層との間に存在する、前記第2固定層と、を備え、
前記磁気素子は、書き込み電流が前記磁気素子を通過する時、前記自由層磁化がスピン転移により切り替えられるように構成されており、
前記第1自由層は第1低飽和磁化を有するように構成されており、及び/又は前記第2自由層は第2低飽和磁化を有するように構成されており、
前記第1自由層が室温で1430emu/cm3以下の前記第1低飽和磁化を有するように被ドープ強磁性材料を含み、及び/又は前記第2自由層が室温で1430emu/cm3以下の前記第2低飽和磁化を有するように被ドープ強磁性材料を含む、磁気素子。 - 請求項27に記載の磁気素子は更に、
前記第1自由層と前記第2自由層との間に存在し、前記第1自由層及び前記第2自由層を静磁気的に結合させるように構成されている分離層を備える、磁気素子。 - 請求項28に記載の磁気素子において、
前記分離層は更に、Cu、Ag、Au、Pt、Mn、CuPt、CuMn、Cu/Pt/Cuサンドイッチ構造、Cu/Mn/Cuサンドイッチ構造、又はCu/PtMn[1−20A]/Cuサンドイッチ構造を含む、磁気素子。 - 請求項27に記載の磁気素子において、
前記第1自由層及び/又は前記第2自由層は、少なくとも1つの非磁性材料で希釈された少なくとも1つの強磁性材料を含む、磁気素子。 - 請求項30に記載の磁気素子において、
前記第1自由層及び/又は前記第2自由層は、CoX、FeX、CoFeX、NiFeX、CoXY、FeXY、CoFeXY、NiFeXY及び/又はCoNiFeXYを含み、ここで、X又はYは、Cr、Cu、Au、B、Nb、Mo、Pt、Pd、Ta、Rh、Ru、Ag、TaN、CuN及び/又はTaCuNである、磁気素子。 - 請求項31に記載の磁気素子において、
X及びYは、Cr、Cu、Au、B、Nb、Mo、Ta、Rh、Ru、Ag、TaN、CuN及び/又はTaCuNの場合には少なくとも5原子パーセントであり且つ60原子パーセント以下であり、Pt及びPdの場合には少なくとも5原子パーセントであり且つ80パーセント以下である、磁気素子。 - 請求項27に記載の磁気素子において、
前記第1自由層及び/又は前記第2自由層は、少なくとも1つの強磁性層及び少なくとも1つの非磁性層を含む多層を含む、磁気素子。 - 請求項33に記載の磁気素子において、
前記第1自由層及び/又は前記第2自由層は、複数の二分子層を含み、前記複数の二分子層の各々は、xを1未満とすると、FexCo1−x層及びCu層を含む、磁気素子。 - 請求項34に記載の磁気素子において、
xが0.5である、磁気素子。 - 請求項35に記載の磁気素子において、
前記Cu層又はFeCo層は、その厚さが、1オングストローム以上であり且つ8オングストローム以下である、磁気素子。 - 請求項27に記載の磁気素子において、
前記第1自由層及び/又は前記第2自由層は、少なくとも1つのドーパントでフェリ磁性的にドープされた少なくとも1つの強磁性材料を含む、磁気素子。 - 請求項37に記載の磁気素子において、
前記第1自由層及び/又は前記第2自由層は、CoX、FeX、CoFeX、NiFeX及び/又はNiCoFeXを含み、ここで、Xは、5〜60原子パーセントの範囲で、少なくとも1つの希土類元素を含む、磁気素子。 - 請求項38に記載の磁気素子において、
前記少なくとも1つの希土類元素は、5〜60原子パーセントのGd又はTbである、磁気素子。 - 請求項38に記載の磁気素子において、
前記第1自由層及び/又は前記第2自由層は更に、少なくとも1つの追加のドーパントを含み、前記少なくとも1つの追加のドーパントは、Cr、Cu、Au、Nb、Mo、Pt、Pd、Ta、Rh又はRuを含む、磁気素子。 - 請求項38に記載の磁気素子において、
前記第2スペーサ層は、障壁層であり、前記障壁層は、電荷キャリアが前記第2固定層と前記第2自由層との間をトンネル通過可能に構成されている、磁気素子。 - 請求項38に記載の磁気素子は更に、
前記第1自由層と前記第1スペーサ層との間及び/又は前記第2スペーサ層と前記第2自由層との間に存在する高スピン分極層を備える、磁気素子。 - 請求項27に記載の磁気素子において、
前記第1固定層及び/又は前記第2固定層は、複数の二分子層を含み、前記複数の二分子層の各々は、xを1未満とすると、FexCo1−x層及びCu層を含む、磁気素子。 - 磁気素子を提供するための方法であって、
固定層を設けること、
非磁性であるスペーサ層を設けること、
自由層磁化を有する自由層を設けることであって、前記スペーサ層が前記固定層と前記自由層との間に存在し、前記自由層が被ドープ強磁性材料を含み、前記被ドープ強磁性材料は、前記自由層が室温で1430emu/cm3以下の低飽和磁化を有するように、少なくとも1つの非磁性材料で希釈された少なくとも1つの強磁性材料か、フェリ磁性的にドープされた少なくとも1つの強磁性材料か、又は、少なくとも1つの非磁性材料で希釈され且つフェリ磁性的にドープされた少なくとも1つの強磁性材料を含む、前記自由層を設けること、を備え、
前記少なくとも1つの非磁性材料で希釈された少なくとも1つの強磁性材料は、少なくともCoX、FeX、NiFeX、CoXY、FeXY、CoFeXY、NiFeXY、及び/又はCoNiFeXY(ここで、X又はYは、Cr、Cu、Au、B、Nb、Mo、Pt、Pd、Ta、Rh、Ru、Ag、TaN、CuN、TaCuNである)、及び/又はCoFeX(ここで、Xは、Cr、Cu、Au、Nb、Mo、Pt、Pd、Ta、Rh、Ru、Ag、TaN、CuN及びTaCuNである)を含み、
前記磁気素子は、書き込み電流が前記磁気素子を通過する時、前記自由層磁化がスピン転移により切り替えられるように構成されている、方法。
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WO2005079528A3 (en) | 2006-10-19 |
EP1716561A4 (en) | 2010-09-29 |
JP5612563B2 (ja) | 2014-10-22 |
EP1716561A2 (en) | 2006-11-02 |
JP2007525839A (ja) | 2007-09-06 |
CN1938874A (zh) | 2007-03-28 |
JP5247033B2 (ja) | 2013-07-24 |
WO2005079528A2 (en) | 2005-09-01 |
KR100856197B1 (ko) | 2008-09-03 |
US20050184839A1 (en) | 2005-08-25 |
US7242045B2 (en) | 2007-07-10 |
US7821087B2 (en) | 2010-10-26 |
US20070159734A1 (en) | 2007-07-12 |
KR20060123641A (ko) | 2006-12-01 |
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