JP2012097786A5 - - Google Patents

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Publication number
JP2012097786A5
JP2012097786A5 JP2010244365A JP2010244365A JP2012097786A5 JP 2012097786 A5 JP2012097786 A5 JP 2012097786A5 JP 2010244365 A JP2010244365 A JP 2010244365A JP 2010244365 A JP2010244365 A JP 2010244365A JP 2012097786 A5 JP2012097786 A5 JP 2012097786A5
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JP
Japan
Prior art keywords
spring mechanism
supports
natural frequency
detection system
command value
Prior art date
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Application number
JP2010244365A
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English (en)
Japanese (ja)
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JP5641878B2 (ja
JP2012097786A (ja
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Publication date
Application filed filed Critical
Priority to JP2010244365A priority Critical patent/JP5641878B2/ja
Priority claimed from JP2010244365A external-priority patent/JP5641878B2/ja
Priority to EP11008268.2A priority patent/EP2447776B1/en
Priority to US13/280,243 priority patent/US9052614B2/en
Priority to KR1020110110920A priority patent/KR101446383B1/ko
Publication of JP2012097786A publication Critical patent/JP2012097786A/ja
Publication of JP2012097786A5 publication Critical patent/JP2012097786A5/ja
Application granted granted Critical
Publication of JP5641878B2 publication Critical patent/JP5641878B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010244365A 2010-10-29 2010-10-29 振動制御装置、リソグラフィー装置、および、物品の製造方法 Expired - Fee Related JP5641878B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010244365A JP5641878B2 (ja) 2010-10-29 2010-10-29 振動制御装置、リソグラフィー装置、および、物品の製造方法
EP11008268.2A EP2447776B1 (en) 2010-10-29 2011-10-13 Vibration control apparatus, lithography apparatus, and method of manufacturing article
US13/280,243 US9052614B2 (en) 2010-10-29 2011-10-24 Vibration control apparatus, lithography apparatus, and method of manufacturing article
KR1020110110920A KR101446383B1 (ko) 2010-10-29 2011-10-28 진동 제어 장치, 리소그래피 장치, 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010244365A JP5641878B2 (ja) 2010-10-29 2010-10-29 振動制御装置、リソグラフィー装置、および、物品の製造方法

Publications (3)

Publication Number Publication Date
JP2012097786A JP2012097786A (ja) 2012-05-24
JP2012097786A5 true JP2012097786A5 (enExample) 2013-12-12
JP5641878B2 JP5641878B2 (ja) 2014-12-17

Family

ID=45033649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010244365A Expired - Fee Related JP5641878B2 (ja) 2010-10-29 2010-10-29 振動制御装置、リソグラフィー装置、および、物品の製造方法

Country Status (4)

Country Link
US (1) US9052614B2 (enExample)
EP (1) EP2447776B1 (enExample)
JP (1) JP5641878B2 (enExample)
KR (1) KR101446383B1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008047562B4 (de) 2008-09-16 2012-11-08 Carl Zeiss Smt Gmbh Vorrichtung zur Dämpfung von Schwingungen in Projektionsbelichtungsanlagen für die Halbleiterlithographie
DE102011007917A1 (de) * 2011-04-21 2012-10-25 Asml Netherlands B.V. Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
KR101772504B1 (ko) * 2012-11-27 2017-09-12 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 기판 지지 시스템, 디바이스 제조 방법 및 제어 프로그램
DE102013201081A1 (de) * 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Vorrichtung zur Lagerung eines optischen Bauelements
JP6218459B2 (ja) * 2013-07-02 2017-10-25 キヤノン株式会社 除振装置、除振方法、リソグラフィ装置及びデバイスの製造方法
US9664265B2 (en) * 2013-09-12 2017-05-30 Massachusetts Institute Of Technology Methods and apparatus for selective rod actuation
JP6278676B2 (ja) 2013-11-29 2018-02-14 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
JP6302305B2 (ja) * 2014-03-18 2018-03-28 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
JP6333081B2 (ja) * 2014-06-23 2018-05-30 キヤノン株式会社 振動制御装置、リソグラフィ装置、および物品の製造方法
WO2017118508A1 (en) 2016-01-07 2017-07-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2018101671A (ja) * 2016-12-19 2018-06-28 キヤノン株式会社 インプリント装置及び物品の製造方法
DE112018004189T5 (de) * 2017-08-15 2020-04-30 Technical Manufacturing Corporation Präzisions-Schwingungsisolationssystem mit Boden-Feed-Forward-Unterstützung

Family Cites Families (25)

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IL77057A (en) * 1985-03-26 1990-03-19 Wright Barry Corp Active vibration isolation system
JP3581499B2 (ja) 1996-09-27 2004-10-27 キヤノン株式会社 除振装置及びその制御方法
JPH11230246A (ja) 1998-02-18 1999-08-27 Tokkyo Kiki Kk アクティブ除振装置
JP3554186B2 (ja) * 1998-04-08 2004-08-18 キヤノン株式会社 露光装置、デバイス製造方法および反力受け方法
JPH11315883A (ja) * 1998-04-30 1999-11-16 Canon Inc 除振装置、露光装置およびデバイス製造方法
JP2978162B1 (ja) * 1998-08-25 1999-11-15 財団法人神奈川科学技術アカデミー アクティブ除振装置
TW468090B (en) * 1998-12-17 2001-12-11 Asm Lithography Bv Servo control method, and its application in a lithographic projection apparatus
US6563128B2 (en) * 2001-03-09 2003-05-13 Cymer, Inc. Base stabilization system
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JP2003058254A (ja) 2001-08-13 2003-02-28 Canon Inc 位置・姿勢制御装置
EP1321822A1 (en) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US20050035074A1 (en) * 2003-05-19 2005-02-17 Mcgarry Matthew Wall mountable display racks, hangers, and associated display methods
US7084956B2 (en) * 2003-06-13 2006-08-01 Asml Netherlands B.V Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device
US7248339B2 (en) * 2003-07-04 2007-07-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5107575B2 (ja) * 2003-09-05 2012-12-26 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 慣性基準質量を有する能動型防振用アクチュエータ構成
US7571793B2 (en) * 2004-01-26 2009-08-11 Koninklijke Philips Electronics N.V. Actuator arrangement for active vibration isolation using a payload as an inertial reference mass
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JP4934356B2 (ja) 2006-06-20 2012-05-16 株式会社日立製作所 映像処理エンジンおよびそれを含む映像処理システム
JP5036259B2 (ja) * 2006-09-14 2012-09-26 キヤノン株式会社 除振装置、露光装置及びデバイス製造方法
US20080309910A1 (en) * 2007-05-31 2008-12-18 Nikon Corporation Vibration isolating apparatus, control method for vibration isolating apparatus, and exposure apparatus
US20090201484A1 (en) * 2007-10-29 2009-08-13 Nikon Corporation Utilities supply member connection apparatus, stage apparatus, projection optical system support apparatus and exposure apparatus
NL2003772A (en) * 2008-12-11 2010-06-14 Asml Netherlands Bv Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus.

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