JP5641878B2 - 振動制御装置、リソグラフィー装置、および、物品の製造方法 - Google Patents

振動制御装置、リソグラフィー装置、および、物品の製造方法 Download PDF

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Publication number
JP5641878B2
JP5641878B2 JP2010244365A JP2010244365A JP5641878B2 JP 5641878 B2 JP5641878 B2 JP 5641878B2 JP 2010244365 A JP2010244365 A JP 2010244365A JP 2010244365 A JP2010244365 A JP 2010244365A JP 5641878 B2 JP5641878 B2 JP 5641878B2
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JP
Japan
Prior art keywords
spring mechanism
vibration control
control device
vibration
displacement detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010244365A
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English (en)
Japanese (ja)
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JP2012097786A5 (enExample
JP2012097786A (ja
Inventor
縄田　亮
亮 縄田
克己 浅田
克己 浅田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010244365A priority Critical patent/JP5641878B2/ja
Priority to EP11008268.2A priority patent/EP2447776B1/en
Priority to US13/280,243 priority patent/US9052614B2/en
Priority to KR1020110110920A priority patent/KR101446383B1/ko
Publication of JP2012097786A publication Critical patent/JP2012097786A/ja
Publication of JP2012097786A5 publication Critical patent/JP2012097786A5/ja
Application granted granted Critical
Publication of JP5641878B2 publication Critical patent/JP5641878B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/002—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion characterised by the control method or circuitry
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/022—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using dampers and springs in combination
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D19/00—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F2230/00—Purpose; Design features
    • F16F2230/08—Sensor arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
JP2010244365A 2010-10-29 2010-10-29 振動制御装置、リソグラフィー装置、および、物品の製造方法 Expired - Fee Related JP5641878B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010244365A JP5641878B2 (ja) 2010-10-29 2010-10-29 振動制御装置、リソグラフィー装置、および、物品の製造方法
EP11008268.2A EP2447776B1 (en) 2010-10-29 2011-10-13 Vibration control apparatus, lithography apparatus, and method of manufacturing article
US13/280,243 US9052614B2 (en) 2010-10-29 2011-10-24 Vibration control apparatus, lithography apparatus, and method of manufacturing article
KR1020110110920A KR101446383B1 (ko) 2010-10-29 2011-10-28 진동 제어 장치, 리소그래피 장치, 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010244365A JP5641878B2 (ja) 2010-10-29 2010-10-29 振動制御装置、リソグラフィー装置、および、物品の製造方法

Publications (3)

Publication Number Publication Date
JP2012097786A JP2012097786A (ja) 2012-05-24
JP2012097786A5 JP2012097786A5 (enExample) 2013-12-12
JP5641878B2 true JP5641878B2 (ja) 2014-12-17

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JP2010244365A Expired - Fee Related JP5641878B2 (ja) 2010-10-29 2010-10-29 振動制御装置、リソグラフィー装置、および、物品の製造方法

Country Status (4)

Country Link
US (1) US9052614B2 (enExample)
EP (1) EP2447776B1 (enExample)
JP (1) JP5641878B2 (enExample)
KR (1) KR101446383B1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
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DE102008047562B4 (de) 2008-09-16 2012-11-08 Carl Zeiss Smt Gmbh Vorrichtung zur Dämpfung von Schwingungen in Projektionsbelichtungsanlagen für die Halbleiterlithographie
DE102011007917A1 (de) * 2011-04-21 2012-10-25 Asml Netherlands B.V. Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
KR101772504B1 (ko) * 2012-11-27 2017-09-12 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 기판 지지 시스템, 디바이스 제조 방법 및 제어 프로그램
DE102013201081A1 (de) * 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Vorrichtung zur Lagerung eines optischen Bauelements
JP6218459B2 (ja) * 2013-07-02 2017-10-25 キヤノン株式会社 除振装置、除振方法、リソグラフィ装置及びデバイスの製造方法
US9664265B2 (en) * 2013-09-12 2017-05-30 Massachusetts Institute Of Technology Methods and apparatus for selective rod actuation
JP6278676B2 (ja) 2013-11-29 2018-02-14 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
JP6302305B2 (ja) * 2014-03-18 2018-03-28 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
JP6333081B2 (ja) * 2014-06-23 2018-05-30 キヤノン株式会社 振動制御装置、リソグラフィ装置、および物品の製造方法
WO2017118508A1 (en) 2016-01-07 2017-07-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2018101671A (ja) * 2016-12-19 2018-06-28 キヤノン株式会社 インプリント装置及び物品の製造方法
DE112018004189T5 (de) * 2017-08-15 2020-04-30 Technical Manufacturing Corporation Präzisions-Schwingungsisolationssystem mit Boden-Feed-Forward-Unterstützung

Family Cites Families (25)

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IL77057A (en) * 1985-03-26 1990-03-19 Wright Barry Corp Active vibration isolation system
JP3581499B2 (ja) 1996-09-27 2004-10-27 キヤノン株式会社 除振装置及びその制御方法
JPH11230246A (ja) 1998-02-18 1999-08-27 Tokkyo Kiki Kk アクティブ除振装置
JP3554186B2 (ja) * 1998-04-08 2004-08-18 キヤノン株式会社 露光装置、デバイス製造方法および反力受け方法
JPH11315883A (ja) * 1998-04-30 1999-11-16 Canon Inc 除振装置、露光装置およびデバイス製造方法
JP2978162B1 (ja) * 1998-08-25 1999-11-15 財団法人神奈川科学技術アカデミー アクティブ除振装置
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JP2003058254A (ja) 2001-08-13 2003-02-28 Canon Inc 位置・姿勢制御装置
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JP5036259B2 (ja) * 2006-09-14 2012-09-26 キヤノン株式会社 除振装置、露光装置及びデバイス製造方法
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Also Published As

Publication number Publication date
KR101446383B1 (ko) 2014-10-01
EP2447776A2 (en) 2012-05-02
EP2447776A3 (en) 2015-04-29
US9052614B2 (en) 2015-06-09
US20120105820A1 (en) 2012-05-03
JP2012097786A (ja) 2012-05-24
KR20120046054A (ko) 2012-05-09
EP2447776B1 (en) 2016-12-14

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