JP2011520762A5 - - Google Patents
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- Publication number
- JP2011520762A5 JP2011520762A5 JP2011510823A JP2011510823A JP2011520762A5 JP 2011520762 A5 JP2011520762 A5 JP 2011520762A5 JP 2011510823 A JP2011510823 A JP 2011510823A JP 2011510823 A JP2011510823 A JP 2011510823A JP 2011520762 A5 JP2011520762 A5 JP 2011520762A5
- Authority
- JP
- Japan
- Prior art keywords
- polysilane
- ppm
- halogen
- halogenated
- halogenated polysilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000548 poly(silane) polymer Polymers 0.000 claims 28
- 150000002367 halogens Chemical class 0.000 claims 16
- 229910052736 halogen Inorganic materials 0.000 claims 15
- 150000001875 compounds Chemical class 0.000 claims 8
- 125000001424 substituent group Chemical group 0.000 claims 8
- 229910052739 hydrogen Inorganic materials 0.000 claims 7
- 239000001257 hydrogen Substances 0.000 claims 7
- 239000000203 mixture Substances 0.000 claims 7
- 238000001069 Raman spectroscopy Methods 0.000 claims 6
- 238000000034 method Methods 0.000 claims 6
- 150000002431 hydrogen Chemical class 0.000 claims 5
- 229910008045 Si-Si Inorganic materials 0.000 claims 4
- 229910006411 Si—Si Inorganic materials 0.000 claims 4
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- 239000010703 silicon Substances 0.000 claims 4
- 239000000126 substance Substances 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 1
- 229910052794 bromium Inorganic materials 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 230000026030 halogenation Effects 0.000 claims 1
- 238000005658 halogenation reaction Methods 0.000 claims 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 238000001845 vibrational spectrum Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008025261A DE102008025261B4 (de) | 2008-05-27 | 2008-05-27 | Halogeniertes Polysilan und plasmachemisches Verfahren zu dessen Herstellung |
| DE102008025261.1 | 2008-05-27 | ||
| PCT/DE2009/000726 WO2009143823A2 (de) | 2008-05-27 | 2009-05-27 | Halogeniertes polysilan und plasmachemisches verfahren zu dessen herstellung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011520762A JP2011520762A (ja) | 2011-07-21 |
| JP2011520762A5 true JP2011520762A5 (https=) | 2012-06-28 |
| JP5658143B2 JP5658143B2 (ja) | 2015-01-21 |
Family
ID=41134603
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011510823A Expired - Fee Related JP5658143B2 (ja) | 2008-05-27 | 2009-05-27 | ハロゲン化ポリシラン及びこれを製造するためのプラズマ化学処理 |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US9701795B2 (https=) |
| EP (1) | EP2296803B1 (https=) |
| JP (1) | JP5658143B2 (https=) |
| KR (1) | KR101620122B1 (https=) |
| CN (1) | CN102105216A (https=) |
| AU (1) | AU2009253522B2 (https=) |
| BR (1) | BRPI0912048B1 (https=) |
| CA (1) | CA2726000C (https=) |
| DE (1) | DE102008025261B4 (https=) |
| IL (1) | IL209579A0 (https=) |
| MX (1) | MX2010013005A (https=) |
| MY (1) | MY159112A (https=) |
| RU (1) | RU2502555C2 (https=) |
| TW (1) | TW201012750A (https=) |
| UA (1) | UA103479C2 (https=) |
| WO (1) | WO2009143823A2 (https=) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1943669A4 (en) * | 2005-10-05 | 2012-06-13 | Kovio Inc | LINEAR AND NETWORKED HIGHLY MOLECULAR POLYSILANES, POLYGERMANES AND COPOLYMERS THEREOF, COMPOSITIONS CONTAINING THEM AND METHOD FOR THE PREPARATION AND USE OF SUCH COMPOUNDS AND COMPOSITIONS |
| DE102008025260B4 (de) * | 2008-05-27 | 2010-03-18 | Rev Renewable Energy Ventures, Inc. | Halogeniertes Polysilan und thermisches Verfahren zu dessen Herstellung |
| DE102009033351B3 (de) | 2009-07-16 | 2011-02-24 | Technische Universität Bergakademie Freiberg | Verfahren zur Herstellung von Oligo- und Polysilanen |
| DE102009056436B4 (de) | 2009-12-02 | 2013-06-27 | Spawnt Private S.À.R.L. | Chloridhaltiges Silicium |
| DE102009056437B4 (de) | 2009-12-02 | 2013-06-27 | Spawnt Private S.À.R.L. | Verfahren und Vorrichtung zur Herstellung von kurzkettigen halogenierten Polysilanen |
| DE102009056438B4 (de) | 2009-12-02 | 2013-05-16 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Hexachlordisilan |
| DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
| US9263262B2 (en) | 2010-05-05 | 2016-02-16 | Spawnt Private S.À.R.L. | Nanowires made of novel precursors and method for the production thereof |
| DE102010025710A1 (de) | 2010-06-30 | 2012-01-05 | Spawnt Private S.À.R.L. | Speichermaterial und Verfahren zur Gewinnung von H-Silanen aus diesem |
| DE102010025948A1 (de) * | 2010-07-02 | 2012-01-05 | Spawnt Private S.À.R.L. | Polysilane mittlerer Kettenlänge und Verfahren zu deren Herstellung |
| DE102010043646A1 (de) | 2010-11-09 | 2012-05-10 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Trichlorsilan |
| DE102013207447A1 (de) | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Octachlortrisilan |
| DE102013207444A1 (de) | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Polychlorsilanen |
| DE102014203810A1 (de) | 2014-03-03 | 2015-09-03 | Evonik Degussa Gmbh | Verfahren zur Herstellung reiner Octachlortrisilane und Decachlortetrasilane |
| DE102014007767B4 (de) | 2014-05-21 | 2025-08-28 | Christian Bauch | Verfahren zur Herstellung halogenierter Oligosilane aus Silicium und Tetrachlorsilan |
| DE102014007766B4 (de) | 2014-05-21 | 2025-10-16 | Christian Bauch | Verfahren zur plasmachemischen Herstellung halogenierter Oligosilane aus Tetrachlorsilan |
| DE102014109275A1 (de) | 2014-07-02 | 2016-01-07 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Nanopartikeln, Nanopartikel und deren Verwendung |
| DE102015009129B4 (de) | 2014-07-22 | 2016-12-15 | Norbert Auner | Verfahren zur Spaltung von Silicium-Silicium-Bindungen und/oder von Silicium-Chlor-Bindungen in Mono-, Poly- und/oder Oligosilanen |
| EP3088359B1 (de) | 2015-04-28 | 2018-09-12 | Evonik Degussa GmbH | Verfahren zur herstellung von octachlortrisilan und höherer polychlorsilane unter verwertung von hexachlordisilan |
| JP7125062B2 (ja) * | 2019-01-25 | 2022-08-24 | 株式会社東芝 | 判定方法及び処理方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB703349A (en) | 1949-12-10 | 1954-02-03 | Ferranti Ltd | Improvements relating to coin-actuated mechanisms |
| GB702349A (en) * | 1950-07-08 | 1954-01-13 | British Thomson Houston Co Ltd | Improvements in and relating to the preparation of chloropolysilanes |
| DE955414C (de) | 1954-09-04 | 1957-01-03 | Kali Cheime Ag | Verfahren zur Herstellung von Siliciumsubbromiden |
| SU435190A1 (ru) * | 1972-12-08 | 1974-07-05 | Способ получения гексахлордисилана | |
| US4309259A (en) | 1980-05-09 | 1982-01-05 | Motorola, Inc. | High pressure plasma hydrogenation of silicon tetrachloride |
| US4374182A (en) | 1980-07-07 | 1983-02-15 | Dow Corning Corporation | Preparation of silicon metal through polymer degradation |
| JPS591505A (ja) | 1982-06-28 | 1984-01-06 | Tdk Corp | 低摩擦薄膜付き物品 |
| JPS59182222A (ja) | 1983-03-30 | 1984-10-17 | Mitsui Toatsu Chem Inc | ポリクロロシランの製造方法 |
| JPS6389414A (ja) | 1986-10-03 | 1988-04-20 | Mitsubishi Metal Corp | クロロポリシランの製造方法 |
| RU2142909C1 (ru) * | 1998-07-30 | 1999-12-20 | Институт химии высокочистых веществ РАН | Способ получения высокочистого трихлорсилана и устройство для его осуществления |
| US6858196B2 (en) | 2001-07-19 | 2005-02-22 | Asm America, Inc. | Method and apparatus for chemical synthesis |
| DE102005024041A1 (de) | 2005-05-25 | 2006-11-30 | City Solar Ag | Verfahren zur Herstellung von Silicium aus Halogensilanen |
| EP1943669A4 (en) | 2005-10-05 | 2012-06-13 | Kovio Inc | LINEAR AND NETWORKED HIGHLY MOLECULAR POLYSILANES, POLYGERMANES AND COPOLYMERS THEREOF, COMPOSITIONS CONTAINING THEM AND METHOD FOR THE PREPARATION AND USE OF SUCH COMPOUNDS AND COMPOSITIONS |
| EP2043691A1 (en) | 2006-07-17 | 2009-04-08 | Boehringer Ingelheim International GmbH | New paediatric indications for direct thrombin inhibitors |
| DE102006034061A1 (de) * | 2006-07-20 | 2008-01-24 | REV Renewable Energy Ventures, Inc., Aloha | Polysilanverarbeitung und Verwendung |
| DE102006043929B4 (de) | 2006-09-14 | 2016-10-06 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von festen Polysilanmischungen |
| DE102007007874A1 (de) | 2007-02-14 | 2008-08-21 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane |
| DE102007013219A1 (de) | 2007-03-15 | 2008-09-18 | Rev Renewable Energy Ventures, Inc. | Plasmagestützte Synthese |
-
2008
- 2008-05-27 DE DE102008025261A patent/DE102008025261B4/de not_active Expired - Fee Related
-
2009
- 2009-05-27 BR BRPI0912048-3A patent/BRPI0912048B1/pt not_active IP Right Cessation
- 2009-05-27 CN CN2009801198089A patent/CN102105216A/zh active Pending
- 2009-05-27 WO PCT/DE2009/000726 patent/WO2009143823A2/de not_active Ceased
- 2009-05-27 RU RU2010152681/05A patent/RU2502555C2/ru not_active IP Right Cessation
- 2009-05-27 JP JP2011510823A patent/JP5658143B2/ja not_active Expired - Fee Related
- 2009-05-27 KR KR1020107029329A patent/KR101620122B1/ko not_active Expired - Fee Related
- 2009-05-27 US US12/995,173 patent/US9701795B2/en not_active Expired - Fee Related
- 2009-05-27 CA CA2726000A patent/CA2726000C/en not_active Expired - Fee Related
- 2009-05-27 MY MYPI2010005617A patent/MY159112A/en unknown
- 2009-05-27 MX MX2010013005A patent/MX2010013005A/es active IP Right Grant
- 2009-05-27 UA UAA201014141A patent/UA103479C2/ru unknown
- 2009-05-27 AU AU2009253522A patent/AU2009253522B2/en not_active Ceased
- 2009-05-27 TW TW098117639A patent/TW201012750A/zh unknown
- 2009-05-27 EP EP09753539.7A patent/EP2296803B1/de not_active Revoked
-
2010
- 2010-11-25 IL IL209579A patent/IL209579A0/en unknown
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