JP2011508354A - セルのソースのir降下に対処するためのソース電位の調整 - Google Patents
セルのソースのir降下に対処するためのソース電位の調整 Download PDFInfo
- Publication number
- JP2011508354A JP2011508354A JP2010539660A JP2010539660A JP2011508354A JP 2011508354 A JP2011508354 A JP 2011508354A JP 2010539660 A JP2010539660 A JP 2010539660A JP 2010539660 A JP2010539660 A JP 2010539660A JP 2011508354 A JP2011508354 A JP 2011508354A
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- 230000015654 memory Effects 0.000 claims abstract description 224
- 238000003860 storage Methods 0.000 claims abstract description 73
- 238000000034 method Methods 0.000 claims abstract description 28
- 230000008878 coupling Effects 0.000 claims description 12
- 238000010168 coupling process Methods 0.000 claims description 12
- 238000005859 coupling reaction Methods 0.000 claims description 12
- 238000002955 isolation Methods 0.000 claims description 11
- 238000007667 floating Methods 0.000 description 29
- 230000006870 function Effects 0.000 description 9
- 238000013461 design Methods 0.000 description 8
- 230000001419 dependent effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000008186 active pharmaceutical agent Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000003491 array Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000002784 hot electron Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 230000005689 Fowler Nordheim tunneling Effects 0.000 description 1
- 101100015484 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) GPA1 gene Proteins 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000013643 reference control Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/30—Power supply circuits
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/961,871 US7764547B2 (en) | 2007-12-20 | 2007-12-20 | Regulation of source potential to combat cell source IR drop |
| PCT/US2008/086694 WO2009082637A1 (en) | 2007-12-20 | 2008-12-12 | Regulation of source potential to combat cell source ir drop |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011508354A true JP2011508354A (ja) | 2011-03-10 |
| JP2011508354A5 JP2011508354A5 (enExample) | 2012-01-19 |
Family
ID=40380429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010539660A Pending JP2011508354A (ja) | 2007-12-20 | 2008-12-12 | セルのソースのir降下に対処するためのソース電位の調整 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7764547B2 (enExample) |
| EP (1) | EP2223304A1 (enExample) |
| JP (1) | JP2011508354A (enExample) |
| KR (1) | KR20100111666A (enExample) |
| CN (1) | CN101903955A (enExample) |
| TW (1) | TW200945349A (enExample) |
| WO (1) | WO2009082637A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009163793A (ja) * | 2007-12-28 | 2009-07-23 | Toshiba Corp | 半導体記憶装置 |
| JP5667260B1 (ja) * | 2013-08-20 | 2015-02-12 | ウィンボンド エレクトロニクス コーポレーション | 半導体記憶装置 |
| JP2015049916A (ja) * | 2013-09-02 | 2015-03-16 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| KR20150103184A (ko) * | 2013-03-14 | 2015-09-09 | 실리콘 스토리지 테크놀로지 인크 | 어드밴스트 나노미터 플래시 메모리의 동적 프로그래밍 |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7606076B2 (en) * | 2007-04-05 | 2009-10-20 | Sandisk Corporation | Sensing in non-volatile storage using pulldown to regulated source voltage to remove system noise |
| US7764547B2 (en) | 2007-12-20 | 2010-07-27 | Sandisk Corporation | Regulation of source potential to combat cell source IR drop |
| US7701761B2 (en) * | 2007-12-20 | 2010-04-20 | Sandisk Corporation | Read, verify word line reference voltage to track source level |
| JP4635066B2 (ja) * | 2008-03-19 | 2011-02-16 | 株式会社東芝 | 半導体記憶装置 |
| KR101053700B1 (ko) * | 2009-05-11 | 2011-08-02 | 주식회사 하이닉스반도체 | 전압 생성 회로 및 이를 구비한 불휘발성 메모리 소자 |
| KR101669550B1 (ko) * | 2009-09-10 | 2016-10-26 | 삼성전자주식회사 | 공통 소스 라인의 노이즈를 줄이는 플래시 메모리 장치, 그것의 동작 방법, 그리고 그것을 포함하는 메모리 시스템 |
| US8169830B2 (en) * | 2009-09-17 | 2012-05-01 | Micron Technology, Inc. | Sensing for all bit line architecture in a memory device |
| US8427886B2 (en) * | 2011-07-11 | 2013-04-23 | Lsi Corporation | Memory device with trimmable power gating capabilities |
| KR101861084B1 (ko) | 2011-07-11 | 2018-05-28 | 삼성전자주식회사 | 비휘발성 메모리 장치, 이의 동작 방법, 및 비휘발성 메모리 장치를 포함하는 전자 장치 |
| US9236102B2 (en) | 2012-10-12 | 2016-01-12 | Micron Technology, Inc. | Apparatuses, circuits, and methods for biasing signal lines |
| US8897054B2 (en) * | 2013-02-18 | 2014-11-25 | Intel Mobile Communications GmbH | ROM device with keepers |
| US9042190B2 (en) * | 2013-02-25 | 2015-05-26 | Micron Technology, Inc. | Apparatuses, sense circuits, and methods for compensating for a wordline voltage increase |
| US9202579B2 (en) * | 2013-03-14 | 2015-12-01 | Sandisk Technologies Inc. | Compensation for temperature dependence of bit line resistance |
| KR20140145367A (ko) * | 2013-06-13 | 2014-12-23 | 에스케이하이닉스 주식회사 | 반도체 메모리 장치, 그것을 포함하는 메모리 시스템 및 그것의 동작 방법 |
| US9177663B2 (en) | 2013-07-18 | 2015-11-03 | Sandisk Technologies Inc. | Dynamic regulation of memory array source line |
| US9672875B2 (en) | 2014-01-27 | 2017-06-06 | Micron Technology, Inc. | Methods and apparatuses for providing a program voltage responsive to a voltage determination |
| US9368224B2 (en) | 2014-02-07 | 2016-06-14 | SanDisk Technologies, Inc. | Self-adjusting regulation current for memory array source line |
| KR102167609B1 (ko) * | 2014-05-13 | 2020-10-20 | 삼성전자주식회사 | 비휘발성 메모리 장치 및 그것의 프로그램 방법 |
| KR20160008875A (ko) * | 2014-07-15 | 2016-01-25 | 에스케이하이닉스 주식회사 | 반도체 메모리 장치 및 그것의 동작 방법 |
| US9208895B1 (en) | 2014-08-14 | 2015-12-08 | Sandisk Technologies Inc. | Cell current control through power supply |
| US9349468B2 (en) | 2014-08-25 | 2016-05-24 | SanDisk Technologies, Inc. | Operational amplifier methods for charging of sense amplifier internal nodes |
| JP6313252B2 (ja) | 2015-03-16 | 2018-04-18 | 東芝メモリ株式会社 | 半導体メモリ装置 |
| US9892791B2 (en) * | 2015-06-16 | 2018-02-13 | Sandisk Technologies Llc | Fast scan to detect bit line discharge time |
| CN105895153B (zh) * | 2016-03-25 | 2019-07-02 | 上海华虹宏力半导体制造有限公司 | 存储器及其干扰检测和消除的方法、装置 |
| KR102620805B1 (ko) * | 2016-09-22 | 2024-01-04 | 에스케이하이닉스 주식회사 | 반도체 메모리 장치 |
| US10763304B2 (en) * | 2017-06-27 | 2020-09-01 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor structure and method of forming the same |
| JP7091130B2 (ja) * | 2018-05-08 | 2022-06-27 | キオクシア株式会社 | 半導体記憶装置 |
| JP2019200828A (ja) * | 2018-05-16 | 2019-11-21 | 東芝メモリ株式会社 | 半導体記憶装置 |
| KR102555006B1 (ko) | 2019-02-22 | 2023-07-14 | 삼성전자주식회사 | 반도체 메모리 장치 및 이를 포함하는 메모리 시스템 |
| US10984872B1 (en) * | 2019-12-05 | 2021-04-20 | Integrated Silicon Solution, (Cayman) Inc. | Non-volatile memory with source line resistance compensation |
| US11049572B1 (en) * | 2020-03-06 | 2021-06-29 | Macronix International Co., Ltd. | Memory device, source line voltage adjuster and source line voltage adjusting method thereof |
| TWI764104B (zh) * | 2020-03-06 | 2022-05-11 | 旺宏電子股份有限公司 | 記憶體裝置、源極線電壓調整器及其源極線電壓調整方法 |
| US11942179B2 (en) * | 2022-04-11 | 2024-03-26 | Macronix International Co., Ltd. | Threshold voltage variation compensation in integrated circuits |
| JP2024136330A (ja) * | 2023-03-23 | 2024-10-04 | キオクシア株式会社 | 半導体記憶装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10154803A (ja) * | 1996-11-25 | 1998-06-09 | Toshiba Corp | 不揮発性半導体メモリ |
| EP1331644A2 (en) * | 2001-12-28 | 2003-07-30 | STMicroelectronics S.r.l. | Regulation method for the source voltage in a nonvolatile memory cell during programming and corresponding program circuit |
| WO2006105363A1 (en) * | 2005-04-01 | 2006-10-05 | Sandisk Corporation | Non-volatile memory and method with control gate compensation for source line bias errors |
| JP2007080306A (ja) * | 2005-09-09 | 2007-03-29 | Toshiba Corp | 不揮発性半導体記憶装置 |
| JP2009087432A (ja) * | 2007-09-28 | 2009-04-23 | Toshiba Corp | 不揮発性半導体記憶装置 |
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| IT1224062B (it) * | 1979-09-28 | 1990-09-26 | Ates Componenti Elettron | Metodo di programmazione per una memoria a semiconduttore non volatile elettricamente alterabile |
| JPS5977700A (ja) * | 1982-10-25 | 1984-05-04 | Toshiba Corp | 不揮発性半導体メモリ装置 |
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| US7701761B2 (en) * | 2007-12-20 | 2010-04-20 | Sandisk Corporation | Read, verify word line reference voltage to track source level |
| US7764547B2 (en) | 2007-12-20 | 2010-07-27 | Sandisk Corporation | Regulation of source potential to combat cell source IR drop |
| US7593265B2 (en) * | 2007-12-28 | 2009-09-22 | Sandisk Corporation | Low noise sense amplifier array and method for nonvolatile memory |
-
2007
- 2007-12-20 US US11/961,871 patent/US7764547B2/en active Active
-
2008
- 2008-12-12 CN CN2008801221659A patent/CN101903955A/zh active Pending
- 2008-12-12 KR KR1020107013249A patent/KR20100111666A/ko not_active Withdrawn
- 2008-12-12 WO PCT/US2008/086694 patent/WO2009082637A1/en not_active Ceased
- 2008-12-12 JP JP2010539660A patent/JP2011508354A/ja active Pending
- 2008-12-12 EP EP08865757A patent/EP2223304A1/en not_active Withdrawn
- 2008-12-19 TW TW097149961A patent/TW200945349A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10154803A (ja) * | 1996-11-25 | 1998-06-09 | Toshiba Corp | 不揮発性半導体メモリ |
| EP1331644A2 (en) * | 2001-12-28 | 2003-07-30 | STMicroelectronics S.r.l. | Regulation method for the source voltage in a nonvolatile memory cell during programming and corresponding program circuit |
| WO2006105363A1 (en) * | 2005-04-01 | 2006-10-05 | Sandisk Corporation | Non-volatile memory and method with control gate compensation for source line bias errors |
| JP2007080306A (ja) * | 2005-09-09 | 2007-03-29 | Toshiba Corp | 不揮発性半導体記憶装置 |
| JP2009087432A (ja) * | 2007-09-28 | 2009-04-23 | Toshiba Corp | 不揮発性半導体記憶装置 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009163793A (ja) * | 2007-12-28 | 2009-07-23 | Toshiba Corp | 半導体記憶装置 |
| KR20150103184A (ko) * | 2013-03-14 | 2015-09-09 | 실리콘 스토리지 테크놀로지 인크 | 어드밴스트 나노미터 플래시 메모리의 동적 프로그래밍 |
| KR101697450B1 (ko) | 2013-03-14 | 2017-01-17 | 실리콘 스토리지 테크놀로지 인크 | 어드밴스트 나노미터 플래시 메모리의 동적 프로그래밍 |
| JP5667260B1 (ja) * | 2013-08-20 | 2015-02-12 | ウィンボンド エレクトロニクス コーポレーション | 半導体記憶装置 |
| US9153335B2 (en) | 2013-08-20 | 2015-10-06 | Winbond Electronics Corp. | Clamp voltage generator of a semiconductor memory apparatus |
| JP2015049916A (ja) * | 2013-09-02 | 2015-03-16 | 株式会社東芝 | 不揮発性半導体記憶装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090161433A1 (en) | 2009-06-25 |
| US7764547B2 (en) | 2010-07-27 |
| EP2223304A1 (en) | 2010-09-01 |
| WO2009082637A1 (en) | 2009-07-02 |
| TW200945349A (en) | 2009-11-01 |
| CN101903955A (zh) | 2010-12-01 |
| KR20100111666A (ko) | 2010-10-15 |
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