JP2010282636A5 - - Google Patents

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JP2010282636A5
JP2010282636A5 JP2010156714A JP2010156714A JP2010282636A5 JP 2010282636 A5 JP2010282636 A5 JP 2010282636A5 JP 2010156714 A JP2010156714 A JP 2010156714A JP 2010156714 A JP2010156714 A JP 2010156714A JP 2010282636 A5 JP2010282636 A5 JP 2010282636A5
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surface profile
value
generating
error
test substrate
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JP2010156714A
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JP2010282636A (ja
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Priority claimed from US09/033,997 external-priority patent/US6151532A/en
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JP2010156714A 1998-03-03 2010-07-09 プラズマプロセスによる表面プロファイルを予測するための方法及び装置 Pending JP2010282636A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/033,997 US6151532A (en) 1998-03-03 1998-03-03 Method and apparatus for predicting plasma-process surface profiles

Related Parent Applications (1)

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JP2000535027A Division JP4641619B2 (ja) 1998-03-03 1999-02-18 プラズマプロセスによる表面プロファイルを予測するための方法及び装置

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JP2010282636A JP2010282636A (ja) 2010-12-16
JP2010282636A5 true JP2010282636A5 (enExample) 2011-10-27

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JP2000535027A Expired - Fee Related JP4641619B2 (ja) 1998-03-03 1999-02-18 プラズマプロセスによる表面プロファイルを予測するための方法及び装置
JP2010156714A Pending JP2010282636A (ja) 1998-03-03 2010-07-09 プラズマプロセスによる表面プロファイルを予測するための方法及び装置

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JP2000535027A Expired - Fee Related JP4641619B2 (ja) 1998-03-03 1999-02-18 プラズマプロセスによる表面プロファイルを予測するための方法及び装置

Country Status (8)

Country Link
US (6) US6151532A (enExample)
EP (1) EP1060501B1 (enExample)
JP (2) JP4641619B2 (enExample)
KR (1) KR100582969B1 (enExample)
AT (1) ATE293840T1 (enExample)
DE (1) DE69924834T2 (enExample)
TW (1) TW452827B (enExample)
WO (1) WO1999045567A1 (enExample)

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