JP2010189641A5 - - Google Patents

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JP2010189641A5
JP2010189641A5 JP2010036379A JP2010036379A JP2010189641A5 JP 2010189641 A5 JP2010189641 A5 JP 2010189641A5 JP 2010036379 A JP2010036379 A JP 2010036379A JP 2010036379 A JP2010036379 A JP 2010036379A JP 2010189641 A5 JP2010189641 A5 JP 2010189641A5
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Japan
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composition
group
weight
aliphatic ester
containing component
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JP2010036379A
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JP2010189641A (ja
JP5656419B2 (ja
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Claims (1)

  1. 組成物の合計重量に対して、
    A 0〜29重量%の、結合する脂肪族エステル基及び2つのシクロヘキセンオキシド基を有し、かつ当該結合する脂肪族エステル基のミリ当量が100gの組成物当たり50meq未満である、カチオン的に硬化可能な成分
    B 10〜85重量%の、成A以外のエポキシ基含有成分
    C 1〜50重量%の、下記式(2)により示されるオキセタン基含有成分
    D 1〜25重量%の多官能性アクリレート
    E ラジカル光開始剤
    F カチオン性光開始剤
    を含む照射硬化可能な組成物であって、
    組成物が化学線照射及び60分のUV後硬化による完全硬化の後に、
    (i) 1000〜10000MPaの範囲の曲げ弾性率、
    を有するところの組成物。
    Figure 2010189641
    [式中、RはC1〜C4のアルキル基、Zは酸素、RはH、C1〜C8のアルキル基、又はフェニル基を表す。]
JP2010036379A 2002-05-03 2010-02-22 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法 Expired - Lifetime JP5656419B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37723902P 2002-05-03 2002-05-03
US60/377,239 2002-05-03

Related Parent Applications (1)

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JP2004502060A Division JP2005529200A (ja) 2002-05-03 2003-05-01 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法

Publications (3)

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JP2010189641A JP2010189641A (ja) 2010-09-02
JP2010189641A5 true JP2010189641A5 (ja) 2011-03-03
JP5656419B2 JP5656419B2 (ja) 2015-01-21

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JP2004502060A Pending JP2005529200A (ja) 2002-05-03 2003-05-01 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法
JP2010036379A Expired - Lifetime JP5656419B2 (ja) 2002-05-03 2010-02-22 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法

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JP2004502060A Pending JP2005529200A (ja) 2002-05-03 2003-05-01 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法

Country Status (9)

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US (3) US7183040B2 (ja)
EP (2) EP2466378B1 (ja)
JP (2) JP2005529200A (ja)
KR (3) KR20120086737A (ja)
CN (2) CN101706639A (ja)
AU (1) AU2003224516A1 (ja)
ES (1) ES2405107T3 (ja)
HK (1) HK1080554A1 (ja)
WO (1) WO2003093901A1 (ja)

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