JP2010189563A5 - - Google Patents
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- JP2010189563A5 JP2010189563A5 JP2009036289A JP2009036289A JP2010189563A5 JP 2010189563 A5 JP2010189563 A5 JP 2010189563A5 JP 2009036289 A JP2009036289 A JP 2009036289A JP 2009036289 A JP2009036289 A JP 2009036289A JP 2010189563 A5 JP2010189563 A5 JP 2010189563A5
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- JP
- Japan
- Prior art keywords
- thf
- metal ion
- molecular weight
- polymer compound
- ion impurities
- Prior art date
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 32
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 16
- 239000012535 impurity Substances 0.000 description 14
- 229910021645 metal ion Inorganic materials 0.000 description 14
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- 229910021642 ultra pure water Inorganic materials 0.000 description 7
- 239000012498 ultrapure water Substances 0.000 description 7
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- 238000005342 ion exchange Methods 0.000 description 4
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 4
- 125000000542 sulfonic acid group Chemical group 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- XYHMJVZAEWACCS-UHFFFAOYSA-N dimethyl 1,2,3,4,4a,5,6,7,8,8a-decahydronaphthalene-2,6-dicarboxylate Chemical compound C1C(C(=O)OC)CCC2CC(C(=O)OC)CCC21 XYHMJVZAEWACCS-UHFFFAOYSA-N 0.000 description 1
- GYUVMLBYMPKZAZ-UHFFFAOYSA-N dimethyl naphthalene-2,6-dicarboxylate Chemical compound C1=C(C(=O)OC)C=CC2=CC(C(=O)OC)=CC=C21 GYUVMLBYMPKZAZ-UHFFFAOYSA-N 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009036289A JP5225139B2 (ja) | 2009-02-19 | 2009-02-19 | フォトリソグラフィ用高分子化合物の金属イオン不純物除去方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009036289A JP5225139B2 (ja) | 2009-02-19 | 2009-02-19 | フォトリソグラフィ用高分子化合物の金属イオン不純物除去方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010189563A JP2010189563A (ja) | 2010-09-02 |
| JP2010189563A5 true JP2010189563A5 (enExample) | 2012-03-08 |
| JP5225139B2 JP5225139B2 (ja) | 2013-07-03 |
Family
ID=42815932
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009036289A Active JP5225139B2 (ja) | 2009-02-19 | 2009-02-19 | フォトリソグラフィ用高分子化合物の金属イオン不純物除去方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5225139B2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5854253B2 (ja) * | 2011-03-29 | 2016-02-09 | 三菱レイヨン株式会社 | 半導体リソグラフィー用高分子化合物の製造方法 |
| JP5858273B2 (ja) * | 2011-04-06 | 2016-02-10 | 三菱レイヨン株式会社 | 半導体リソグラフィー用高分子化合物の製造方法 |
| JP5935328B2 (ja) * | 2012-01-11 | 2016-06-15 | 三菱レイヨン株式会社 | β位に置換基を持つラクトン構造を有する化合物または重合体の製造方法 |
| US10307752B2 (en) | 2012-06-26 | 2019-06-04 | Mitsubishi Chemical Corporation | Method for producing polymer, and polymer |
| JP5914241B2 (ja) * | 2012-08-07 | 2016-05-11 | 株式会社ダイセル | 高分子化合物の製造方法、高分子化合物、及びフォトレジスト用樹脂組成物 |
| JP6086618B2 (ja) * | 2015-02-13 | 2017-03-01 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、及びレジスト膜 |
| JP2019040201A (ja) * | 2018-10-30 | 2019-03-14 | 信越化学工業株式会社 | パターン形成方法 |
| JP7249904B2 (ja) | 2019-07-25 | 2023-03-31 | 丸善石油化学株式会社 | 酸分解性樹脂の製造方法 |
| US11651961B2 (en) * | 2019-08-02 | 2023-05-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Patterning process of a semiconductor structure with enhanced adhesion |
| CN119179230A (zh) * | 2024-09-29 | 2024-12-24 | 国科天骥(山东)新材料有限责任公司 | 一种含自交联树脂的电子束光刻胶组合物及其制备方法和应用 |
| CN119200332A (zh) * | 2024-09-29 | 2024-12-27 | 国科天骥(山东)新材料有限责任公司 | 一种用于电子束光刻工艺的层状结构及其光刻工艺 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2819250B2 (ja) * | 1994-12-15 | 1998-10-30 | 丸善石油化学株式会社 | ビニルフェノール系重合体の金属除去法 |
| JP3363051B2 (ja) * | 1997-02-21 | 2003-01-07 | 丸善石油化学株式会社 | ビニルフェノール系重合体の金属除去法 |
| JP2001350266A (ja) * | 2000-06-09 | 2001-12-21 | Sumitomo Chem Co Ltd | レジスト組成物の製造方法 |
| JP2003238682A (ja) * | 2002-02-19 | 2003-08-27 | Sumitomo Bakelite Co Ltd | ポリアミド系化合物中の金属除去方法 |
| JP4637476B2 (ja) * | 2002-12-19 | 2011-02-23 | 東京応化工業株式会社 | ホトレジスト組成物の製造方法 |
| JP3841107B2 (ja) * | 2003-02-21 | 2006-11-01 | Ｊｓｒ株式会社 | ネガ型感放射線性樹脂組成物 |
-
2009
- 2009-02-19 JP JP2009036289A patent/JP5225139B2/ja active Active
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