JP2010059488A5 - - Google Patents
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- Publication number
- JP2010059488A5 JP2010059488A5 JP2008226532A JP2008226532A JP2010059488A5 JP 2010059488 A5 JP2010059488 A5 JP 2010059488A5 JP 2008226532 A JP2008226532 A JP 2008226532A JP 2008226532 A JP2008226532 A JP 2008226532A JP 2010059488 A5 JP2010059488 A5 JP 2010059488A5
- Authority
- JP
- Japan
- Prior art keywords
- film forming
- film
- gas
- tungsten
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010408 film Substances 0.000 claims description 128
- 239000000463 material Substances 0.000 claims description 56
- 239000011248 coating agent Substances 0.000 claims description 43
- 238000000576 coating method Methods 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 43
- 229910052721 tungsten Inorganic materials 0.000 claims description 40
- 239000010937 tungsten Substances 0.000 claims description 40
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 34
- 239000003054 catalyst Substances 0.000 claims description 33
- 239000010409 thin film Substances 0.000 claims description 25
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 238000005121 nitriding Methods 0.000 claims description 15
- 238000004140 cleaning Methods 0.000 claims description 12
- 238000011109 contamination Methods 0.000 claims description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000000470 constituent Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 229910052741 iridium Inorganic materials 0.000 claims description 8
- 229910052702 rhenium Inorganic materials 0.000 claims description 8
- 229910052707 ruthenium Inorganic materials 0.000 claims description 8
- 230000003197 catalytic effect Effects 0.000 claims description 7
- -1 tungsten nitride Chemical class 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000004590 computer program Methods 0.000 claims 2
- 239000012528 membrane Substances 0.000 claims 1
- 230000003213 activating effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000004913 activation Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008226532A JP2010059488A (ja) | 2008-09-03 | 2008-09-03 | 成膜方法及び成膜装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008226532A JP2010059488A (ja) | 2008-09-03 | 2008-09-03 | 成膜方法及び成膜装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010059488A JP2010059488A (ja) | 2010-03-18 |
| JP2010059488A5 true JP2010059488A5 (enExample) | 2011-08-25 |
Family
ID=42186611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008226532A Pending JP2010059488A (ja) | 2008-09-03 | 2008-09-03 | 成膜方法及び成膜装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2010059488A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6041464B2 (ja) * | 2011-03-03 | 2016-12-07 | 大陽日酸株式会社 | 金属薄膜の製膜方法、および金属薄膜の製膜装置 |
| KR20190035784A (ko) * | 2016-07-26 | 2019-04-03 | 도쿄엘렉트론가부시키가이샤 | 텅스텐막의 성막 방법 |
| JP6883495B2 (ja) * | 2017-09-04 | 2021-06-09 | 東京エレクトロン株式会社 | エッチング方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6340314A (ja) * | 1986-08-05 | 1988-02-20 | Hiroshima Univ | 触媒ｃｖｄ法による薄膜の製造法とその装置 |
| JP3470371B2 (ja) * | 1994-02-08 | 2003-11-25 | 住友電気工業株式会社 | ダイヤモンドの合成法 |
| JP4099270B2 (ja) * | 1998-08-27 | 2008-06-11 | 英樹 松村 | 触媒化学蒸着装置 |
| JP4505072B2 (ja) * | 1999-03-25 | 2010-07-14 | 独立行政法人科学技術振興機構 | 化学蒸着方法及び化学蒸着装置 |
| JP4505073B2 (ja) * | 1999-03-25 | 2010-07-14 | 独立行政法人科学技術振興機構 | 化学蒸着装置 |
| JP4947682B2 (ja) * | 2005-08-02 | 2012-06-06 | 株式会社アルバック | 触媒線化学気相成長装置および触媒線化学気相成長装置における触媒線の再生方法 |
| JP5135710B2 (ja) * | 2006-05-16 | 2013-02-06 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
-
2008
- 2008-09-03 JP JP2008226532A patent/JP2010059488A/ja active Pending
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