JP2010059488A - 成膜方法及び成膜装置 - Google Patents

成膜方法及び成膜装置 Download PDF

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Publication number
JP2010059488A
JP2010059488A JP2008226532A JP2008226532A JP2010059488A JP 2010059488 A JP2010059488 A JP 2010059488A JP 2008226532 A JP2008226532 A JP 2008226532A JP 2008226532 A JP2008226532 A JP 2008226532A JP 2010059488 A JP2010059488 A JP 2010059488A
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Japan
Prior art keywords
film
film forming
gas
tungsten
base material
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JP2008226532A
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Japanese (ja)
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JP2010059488A5 (enExample
Inventor
Takashi Nishimori
崇 西森
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2008226532A priority Critical patent/JP2010059488A/ja
Publication of JP2010059488A publication Critical patent/JP2010059488A/ja
Publication of JP2010059488A5 publication Critical patent/JP2010059488A5/ja
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JP2008226532A 2008-09-03 2008-09-03 成膜方法及び成膜装置 Pending JP2010059488A (ja)

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JP2008226532A JP2010059488A (ja) 2008-09-03 2008-09-03 成膜方法及び成膜装置

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JP2010059488A true JP2010059488A (ja) 2010-03-18
JP2010059488A5 JP2010059488A5 (enExample) 2011-08-25

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012184449A (ja) * 2011-03-03 2012-09-27 Taiyo Nippon Sanso Corp 金属薄膜の製膜方法、金属薄膜、および金属薄膜の製膜装置
WO2018021014A1 (ja) * 2016-07-26 2018-02-01 東京エレクトロン株式会社 タングステン膜の成膜方法
CN109427576A (zh) * 2017-09-04 2019-03-05 东京毅力科创株式会社 蚀刻方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6340314A (ja) * 1986-08-05 1988-02-20 Hiroshima Univ 触媒ｃｖｄ法による薄膜の製造法とその装置
JPH07223898A (ja) * 1994-02-08 1995-08-22 Sumitomo Electric Ind Ltd ダイヤモンドの合成法
JP2000073172A (ja) * 1998-08-27 2000-03-07 Hideki Matsumura 触媒化学蒸着装置
JP2000277501A (ja) * 1999-03-25 2000-10-06 Japan Science & Technology Corp 化学蒸着装置
JP2000277502A (ja) * 1999-03-25 2000-10-06 Japan Science & Technology Corp 化学蒸着装置
JP2007042815A (ja) * 2005-08-02 2007-02-15 Ulvac Japan Ltd 触媒線化学気相成長装置および触媒線化学気相成長装置における触媒線の再生方法
JP2007308735A (ja) * 2006-05-16 2007-11-29 Tokyo Electron Ltd 成膜方法及び成膜装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6340314A (ja) * 1986-08-05 1988-02-20 Hiroshima Univ 触媒ｃｖｄ法による薄膜の製造法とその装置
JPH07223898A (ja) * 1994-02-08 1995-08-22 Sumitomo Electric Ind Ltd ダイヤモンドの合成法
JP2000073172A (ja) * 1998-08-27 2000-03-07 Hideki Matsumura 触媒化学蒸着装置
JP2000277501A (ja) * 1999-03-25 2000-10-06 Japan Science & Technology Corp 化学蒸着装置
JP2000277502A (ja) * 1999-03-25 2000-10-06 Japan Science & Technology Corp 化学蒸着装置
JP2007042815A (ja) * 2005-08-02 2007-02-15 Ulvac Japan Ltd 触媒線化学気相成長装置および触媒線化学気相成長装置における触媒線の再生方法
JP2007308735A (ja) * 2006-05-16 2007-11-29 Tokyo Electron Ltd 成膜方法及び成膜装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012184449A (ja) * 2011-03-03 2012-09-27 Taiyo Nippon Sanso Corp 金属薄膜の製膜方法、金属薄膜、および金属薄膜の製膜装置
WO2018021014A1 (ja) * 2016-07-26 2018-02-01 東京エレクトロン株式会社 タングステン膜の成膜方法
CN109427576A (zh) * 2017-09-04 2019-03-05 东京毅力科创株式会社 蚀刻方法
JP2019046994A (ja) * 2017-09-04 2019-03-22 東京エレクトロン株式会社 エッチング方法
CN109427576B (zh) * 2017-09-04 2023-03-10 东京毅力科创株式会社 蚀刻方法

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