JP2009545865A - Led半導体基体 - Google Patents
Led半導体基体 Download PDFInfo
- Publication number
- JP2009545865A JP2009545865A JP2009522085A JP2009522085A JP2009545865A JP 2009545865 A JP2009545865 A JP 2009545865A JP 2009522085 A JP2009522085 A JP 2009522085A JP 2009522085 A JP2009522085 A JP 2009522085A JP 2009545865 A JP2009545865 A JP 2009545865A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- quantum
- semiconductor substrate
- led semiconductor
- stress
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
- H10H20/841—Reflective coatings, e.g. dielectric Bragg reflectors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Led Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006035627A DE102006035627A1 (de) | 2006-07-31 | 2006-07-31 | LED-Halbleiterkörper |
| PCT/DE2007/001349 WO2008014772A1 (de) | 2006-07-31 | 2007-07-27 | Led-halbleiterkörper |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009545865A true JP2009545865A (ja) | 2009-12-24 |
| JP2009545865A5 JP2009545865A5 (enExample) | 2011-06-16 |
Family
ID=38739481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009522085A Pending JP2009545865A (ja) | 2006-07-31 | 2007-07-27 | Led半導体基体 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8405065B2 (enExample) |
| EP (1) | EP2047527B1 (enExample) |
| JP (1) | JP2009545865A (enExample) |
| KR (1) | KR20090033897A (enExample) |
| CN (1) | CN101496187A (enExample) |
| DE (1) | DE102006035627A1 (enExample) |
| TW (1) | TWI370557B (enExample) |
| WO (1) | WO2008014772A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9287369B2 (en) | 2012-03-08 | 2016-03-15 | Kabushiki Kaisha Toshiba | Nitride semiconductor element and nitride semiconductor wafer |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2578752T3 (es) | 2009-02-05 | 2016-08-01 | Arkema Inc. | Fibras aprestadas con poliétercetonacetonas |
| JP5684501B2 (ja) * | 2010-07-06 | 2015-03-11 | 昭和電工株式会社 | 発光ダイオード用エピタキシャルウェーハ |
| JP5801542B2 (ja) | 2010-07-13 | 2015-10-28 | 昭和電工株式会社 | 発光ダイオード及び発光ダイオードランプ |
| JP6024278B2 (ja) * | 2012-08-10 | 2016-11-16 | 住友電気工業株式会社 | 発光素子 |
| DE102012107795B4 (de) * | 2012-08-23 | 2022-02-03 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterkörper und optoelektronischer Halbleiterchip |
| US9508891B2 (en) * | 2014-11-21 | 2016-11-29 | Epistar Corporation | Method for making light-emitting device |
| US9306115B1 (en) * | 2015-02-10 | 2016-04-05 | Epistar Corporation | Light-emitting device |
| DE102015109793A1 (de) * | 2015-06-18 | 2016-12-22 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauteil |
| DE102015109796A1 (de) * | 2015-06-18 | 2016-12-22 | Osram Opto Semiconductors Gmbh | Leuchtdiodenchip |
| DE102015119817A1 (de) | 2015-11-17 | 2017-05-18 | Osram Opto Semiconductors Gmbh | Halbleiterbauelement |
| US9859470B2 (en) * | 2016-03-10 | 2018-01-02 | Epistar Corporation | Light-emitting device with adjusting element |
| DE102019115351A1 (de) * | 2019-06-06 | 2020-12-10 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterbauelement mit Strahlungskonversionselement und Verfahren zum Herstellen von Strahlungskonversionselementen |
| KR102333489B1 (ko) * | 2019-10-01 | 2021-12-01 | 에피스타 코포레이션 | 발광 디바이스 |
| CN112838150B (zh) * | 2020-12-31 | 2022-05-13 | 武汉光迅科技股份有限公司 | 发光二极管及其形成方法 |
| US12278304B2 (en) * | 2021-02-04 | 2025-04-15 | Mellanox Technologies, Ltd. | High modulation speed PIN-type photodiode |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09162482A (ja) * | 1995-12-08 | 1997-06-20 | Nippon Telegr & Teleph Corp <Ntt> | 面発光半導体レーザ |
| JP2005109124A (ja) * | 2003-09-30 | 2005-04-21 | Shin Etsu Handotai Co Ltd | 発光素子及びその製造方法 |
| JP2005175462A (ja) * | 2003-11-21 | 2005-06-30 | Sanken Electric Co Ltd | 半導体発光素子及びその製造方法 |
| JP2006120884A (ja) * | 2004-10-22 | 2006-05-11 | Ricoh Co Ltd | 半導体発光素子および面発光レーザおよび面発光レーザアレイおよび画像形成装置および光ピックアップシステムおよび光送信モジュールおよび光送受信モジュールおよび光通信システム |
| JP2006196880A (ja) * | 2004-12-17 | 2006-07-27 | Matsushita Electric Ind Co Ltd | 光半導体装置及びその製造方法 |
| JP2007012688A (ja) * | 2005-06-28 | 2007-01-18 | Toshiba Corp | 半導体発光素子 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5132981A (en) * | 1989-05-31 | 1992-07-21 | Hitachi, Ltd. | Semiconductor optical device |
| GB2263814B (en) * | 1992-01-17 | 1996-01-10 | Northern Telecom Ltd | Semiconductor mixed crystal quantum well device manufacture |
| JPH07202260A (ja) * | 1993-12-27 | 1995-08-04 | Furukawa Electric Co Ltd:The | 歪超格子発光素子 |
| EP0700138B1 (en) * | 1994-08-29 | 2001-12-19 | Matsushita Electric Industrial Co., Ltd. | Strained quantum well semiconducteur laser device and method for fabricating the same |
| US6233264B1 (en) * | 1996-08-27 | 2001-05-15 | Ricoh Company, Ltd. | Optical semiconductor device having an active layer containing N |
| US5825796A (en) * | 1996-09-25 | 1998-10-20 | Picolight Incorporated | Extended wavelength strained layer lasers having strain compensated layers |
| JPH11150330A (ja) * | 1997-11-14 | 1999-06-02 | Sony Corp | 半導体発光素子 |
| JPH11274635A (ja) * | 1998-03-19 | 1999-10-08 | Hitachi Ltd | 半導体発光装置 |
| US6657233B2 (en) * | 1998-08-19 | 2003-12-02 | Ricoh Company, Ltd. | Light emitting devices with layered III-V semiconductor structures, and modules and systems for computer, network and optical communication, using such device |
| US6711195B2 (en) * | 2002-02-28 | 2004-03-23 | Agilent Technologies, Inc. | Long-wavelength photonic device with GaAsSb quantum-well layer |
| US20030235224A1 (en) * | 2002-06-19 | 2003-12-25 | Ohlander Ulf Roald | Strained quantum-well structure having ternary-alloy material in both quantum-well layers and barrier layers |
| US7801194B2 (en) * | 2002-07-01 | 2010-09-21 | Sharp Kabushiki Kaisha | Semiconductor laser device and optical disk unit using the same |
| TWI226138B (en) * | 2003-01-03 | 2005-01-01 | Super Nova Optoelectronics Cor | GaN-based LED vertical device structure and the manufacturing method thereof |
| JP2004235649A (ja) * | 2003-01-31 | 2004-08-19 | Osram Opto Semiconductors Gmbh | 電気コンタクト領域を備えたモジュールの製造方法および半導体層列および活性ゾーンを有するモジュール |
| JP2004296634A (ja) * | 2003-03-26 | 2004-10-21 | Sharp Corp | 半導体レーザ装置および光ディスク装置 |
| JP2004296637A (ja) * | 2003-03-26 | 2004-10-21 | Sharp Corp | 半導体レーザ装置および光ディスク装置 |
| DE102004024611A1 (de) * | 2003-05-23 | 2005-03-03 | Osram Opto Semiconductors Gmbh | Optisch gepumpte Halbleitervorrichtung |
| TW200520266A (en) * | 2003-11-21 | 2005-06-16 | Sanken Electric Co Ltd | Semiconductor luminous element and manufacturing method of the same |
| TWI254469B (en) | 2004-04-14 | 2006-05-01 | Osram Opto Semiconductors Gmbh | Luminous diode chip |
| DE102005016592A1 (de) | 2004-04-14 | 2005-11-24 | Osram Opto Semiconductors Gmbh | Leuchtdiodenchip |
| DE102004026125A1 (de) * | 2004-05-28 | 2005-12-22 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauteil und Verfahren zu dessen Herstellung |
| WO2005122350A1 (ja) * | 2004-06-11 | 2005-12-22 | Ricoh Company, Ltd. | 面発光レーザダイオードおよびその製造方法 |
| JP4224041B2 (ja) * | 2004-08-26 | 2009-02-12 | シャープ株式会社 | 半導体レーザ素子、半導体レーザ素子の製造方法、光ディスク装置および光伝送システム |
| DE102004057802B4 (de) * | 2004-11-30 | 2011-03-24 | Osram Opto Semiconductors Gmbh | Strahlungemittierendes Halbleiterbauelement mit Zwischenschicht |
| US7459719B2 (en) * | 2004-12-17 | 2008-12-02 | Panasonic Corporation | Superlattice optical semiconductor device where each barrier layer has high content of group III elements in center portion and low content near well layer |
| JP4460473B2 (ja) * | 2005-02-23 | 2010-05-12 | シャープ株式会社 | 半導体レーザ装置の製造方法 |
| US7376169B2 (en) * | 2005-03-07 | 2008-05-20 | Joseph Reid Henrichs | Optical phase conjugation laser diode |
| DE102006039369A1 (de) * | 2005-12-30 | 2007-07-05 | Osram Opto Semiconductors Gmbh | LED-Halbleiterkörper und Verwendung eines LED-Halbleiterkörpers |
| DE102006028692B4 (de) * | 2006-05-19 | 2021-09-02 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Elektrisch leitende Verbindung mit isolierendem Verbindungsmedium |
| US8115213B2 (en) * | 2007-02-08 | 2012-02-14 | Phoseon Technology, Inc. | Semiconductor light sources, systems, and methods |
| US20080197369A1 (en) * | 2007-02-20 | 2008-08-21 | Cree, Inc. | Double flip semiconductor device and method for fabrication |
| US20090238227A1 (en) * | 2008-03-05 | 2009-09-24 | Rohm Co., Ltd. | Semiconductor light emitting device |
| JP5102082B2 (ja) * | 2008-03-18 | 2012-12-19 | 株式会社リコー | 画像形成装置 |
-
2006
- 2006-07-31 DE DE102006035627A patent/DE102006035627A1/de not_active Withdrawn
-
2007
- 2007-07-27 KR KR1020097003151A patent/KR20090033897A/ko not_active Withdrawn
- 2007-07-27 WO PCT/DE2007/001349 patent/WO2008014772A1/de not_active Ceased
- 2007-07-27 JP JP2009522085A patent/JP2009545865A/ja active Pending
- 2007-07-27 EP EP07817415.8A patent/EP2047527B1/de active Active
- 2007-07-27 US US12/375,528 patent/US8405065B2/en active Active
- 2007-07-27 CN CNA2007800285790A patent/CN101496187A/zh active Pending
- 2007-07-30 TW TW096127685A patent/TWI370557B/zh not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09162482A (ja) * | 1995-12-08 | 1997-06-20 | Nippon Telegr & Teleph Corp <Ntt> | 面発光半導体レーザ |
| JP2005109124A (ja) * | 2003-09-30 | 2005-04-21 | Shin Etsu Handotai Co Ltd | 発光素子及びその製造方法 |
| JP2005175462A (ja) * | 2003-11-21 | 2005-06-30 | Sanken Electric Co Ltd | 半導体発光素子及びその製造方法 |
| JP2006120884A (ja) * | 2004-10-22 | 2006-05-11 | Ricoh Co Ltd | 半導体発光素子および面発光レーザおよび面発光レーザアレイおよび画像形成装置および光ピックアップシステムおよび光送信モジュールおよび光送受信モジュールおよび光通信システム |
| JP2006196880A (ja) * | 2004-12-17 | 2006-07-27 | Matsushita Electric Ind Co Ltd | 光半導体装置及びその製造方法 |
| JP2007012688A (ja) * | 2005-06-28 | 2007-01-18 | Toshiba Corp | 半導体発光素子 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9287369B2 (en) | 2012-03-08 | 2016-03-15 | Kabushiki Kaisha Toshiba | Nitride semiconductor element and nitride semiconductor wafer |
| US9508804B2 (en) | 2012-03-08 | 2016-11-29 | Kabushiki Kaisha Toshiba | Nitride semiconductor element and nitride semiconductor wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090302307A1 (en) | 2009-12-10 |
| TW200810159A (en) | 2008-02-16 |
| EP2047527A1 (de) | 2009-04-15 |
| WO2008014772A1 (de) | 2008-02-07 |
| TWI370557B (en) | 2012-08-11 |
| CN101496187A (zh) | 2009-07-29 |
| EP2047527B1 (de) | 2017-11-22 |
| DE102006035627A1 (de) | 2008-02-07 |
| US8405065B2 (en) | 2013-03-26 |
| KR20090033897A (ko) | 2009-04-06 |
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