JP2009540122A5 - - Google Patents

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Publication number
JP2009540122A5
JP2009540122A5 JP2009514435A JP2009514435A JP2009540122A5 JP 2009540122 A5 JP2009540122 A5 JP 2009540122A5 JP 2009514435 A JP2009514435 A JP 2009514435A JP 2009514435 A JP2009514435 A JP 2009514435A JP 2009540122 A5 JP2009540122 A5 JP 2009540122A5
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Japan
Prior art keywords
chamber
precursor gas
substrate
introducing
gas
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JP2009514435A
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English (en)
Japanese (ja)
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JP2009540122A (ja
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Priority claimed from US11/446,077 external-priority patent/US20070281089A1/en
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JP2009514435A 2006-06-05 2007-04-05 連続送り物体へのロールツーロール原子層堆積システム及び方法 Pending JP2009540122A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/446,077 US20070281089A1 (en) 2006-06-05 2006-06-05 Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
PCT/US2007/066029 WO2008057625A2 (en) 2006-06-05 2007-04-05 Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects

Publications (2)

Publication Number Publication Date
JP2009540122A JP2009540122A (ja) 2009-11-19
JP2009540122A5 true JP2009540122A5 (enExample) 2010-05-20

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JP2009514435A Pending JP2009540122A (ja) 2006-06-05 2007-04-05 連続送り物体へのロールツーロール原子層堆積システム及び方法

Country Status (5)

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US (1) US20070281089A1 (enExample)
EP (1) EP2029792A2 (enExample)
JP (1) JP2009540122A (enExample)
KR (1) KR20090043474A (enExample)
WO (1) WO2008057625A2 (enExample)

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