JP2009539593A5 - - Google Patents

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Publication number
JP2009539593A5
JP2009539593A5 JP2009514770A JP2009514770A JP2009539593A5 JP 2009539593 A5 JP2009539593 A5 JP 2009539593A5 JP 2009514770 A JP2009514770 A JP 2009514770A JP 2009514770 A JP2009514770 A JP 2009514770A JP 2009539593 A5 JP2009539593 A5 JP 2009539593A5
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JP
Japan
Prior art keywords
structured
substantially flat
support
base layer
matrix material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009514770A
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English (en)
Japanese (ja)
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JP2009539593A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/EP2007/055701 external-priority patent/WO2007144322A1/de
Publication of JP2009539593A publication Critical patent/JP2009539593A/ja
Publication of JP2009539593A5 publication Critical patent/JP2009539593A5/ja
Pending legal-status Critical Current

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JP2009514770A 2006-06-14 2007-06-11 支持体上に導電性の表面を製造する方法 Pending JP2009539593A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06115487 2006-06-14
PCT/EP2007/055701 WO2007144322A1 (de) 2006-06-14 2007-06-11 Verfahren zur herstellung von elektrisch leitfähigen oberflächen auf einem träger

Publications (2)

Publication Number Publication Date
JP2009539593A JP2009539593A (ja) 2009-11-19
JP2009539593A5 true JP2009539593A5 (enExample) 2010-07-15

Family

ID=38461132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009514770A Pending JP2009539593A (ja) 2006-06-14 2007-06-11 支持体上に導電性の表面を製造する方法

Country Status (11)

Country Link
US (1) US20090285976A1 (enExample)
EP (1) EP2033501A1 (enExample)
JP (1) JP2009539593A (enExample)
KR (1) KR20090025337A (enExample)
CN (1) CN101491166B (enExample)
BR (1) BRPI0712709A2 (enExample)
CA (1) CA2654797A1 (enExample)
IL (1) IL195620A0 (enExample)
RU (1) RU2436266C2 (enExample)
TW (1) TW200806127A (enExample)
WO (1) WO2007144322A1 (enExample)

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FR2952384B1 (fr) * 2009-11-10 2012-12-14 Commissariat Energie Atomique Depot selectif de nanoparticules
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US10544483B2 (en) 2010-03-04 2020-01-28 Lockheed Martin Corporation Scalable processes for forming tin nanoparticles, compositions containing tin nanoparticles, and applications utilizing same
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CN102404934B (zh) * 2010-09-09 2015-01-14 富葵精密组件(深圳)有限公司 电路板基板及其制作方法
TWI398198B (zh) * 2010-09-13 2013-06-01 Zhen Ding Technology Co Ltd 具有接地屏蔽結構之電路板及其製作方法
US9475946B2 (en) * 2011-09-30 2016-10-25 Ppg Industries Ohio, Inc. Graphenic carbon particle co-dispersions and methods of making same
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JP2015524624A (ja) * 2012-08-06 2015-08-24 ダウ グローバル テクノロジーズ エルエルシー 高信頼性光起電デバイス
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CN105885474B (zh) * 2015-07-16 2017-09-08 国网浙江省电力公司湖州供电公司 一种碳黑静电吸附碳纳米管导电填料的制备方法
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