JP2009525590A5 - - Google Patents

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Publication number
JP2009525590A5
JP2009525590A5 JP2008539331A JP2008539331A JP2009525590A5 JP 2009525590 A5 JP2009525590 A5 JP 2009525590A5 JP 2008539331 A JP2008539331 A JP 2008539331A JP 2008539331 A JP2008539331 A JP 2008539331A JP 2009525590 A5 JP2009525590 A5 JP 2009525590A5
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JP
Japan
Prior art keywords
euv
illumination system
aperture stop
sensor device
light source
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Application number
JP2008539331A
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English (en)
Japanese (ja)
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JP2009525590A (ja
JP5236478B2 (ja
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Priority claimed from PCT/EP2006/010725 external-priority patent/WO2007054291A1/en
Publication of JP2009525590A publication Critical patent/JP2009525590A/ja
Publication of JP2009525590A5 publication Critical patent/JP2009525590A5/ja
Application granted granted Critical
Publication of JP5236478B2 publication Critical patent/JP5236478B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008539331A 2005-11-10 2006-11-09 光源の変動を測定するためのシステムを備えたｅｕｖ照明システム Expired - Fee Related JP5236478B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US73593205P 2005-11-10 2005-11-10
US60/735,932 2005-11-10
PCT/EP2006/010725 WO2007054291A1 (en) 2005-11-10 2006-11-09 Euv illumination system with a system for measuring fluctuations of the light source

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2011283031A Division JP5236065B2 (ja) 2005-11-10 2011-12-26 光源の変動を測定するためのシステムを備えたｅｕｖ照明システム
JP2012245711A Division JP5337292B2 (ja) 2005-11-10 2012-11-07 光源の変動を測定するためのシステムを備えたｅｕｖ照明システム

Publications (3)

Publication Number Publication Date
JP2009525590A JP2009525590A (ja) 2009-07-09
JP2009525590A5 true JP2009525590A5 (https=) 2009-12-24
JP5236478B2 JP5236478B2 (ja) 2013-07-17

Family

ID=37663120

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2008539331A Expired - Fee Related JP5236478B2 (ja) 2005-11-10 2006-11-09 光源の変動を測定するためのシステムを備えたｅｕｖ照明システム
JP2011283031A Expired - Fee Related JP5236065B2 (ja) 2005-11-10 2011-12-26 光源の変動を測定するためのシステムを備えたｅｕｖ照明システム
JP2012245711A Expired - Fee Related JP5337292B2 (ja) 2005-11-10 2012-11-07 光源の変動を測定するためのシステムを備えたｅｕｖ照明システム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2011283031A Expired - Fee Related JP5236065B2 (ja) 2005-11-10 2011-12-26 光源の変動を測定するためのシステムを備えたｅｕｖ照明システム
JP2012245711A Expired - Fee Related JP5337292B2 (ja) 2005-11-10 2012-11-07 光源の変動を測定するためのシステムを備えたｅｕｖ照明システム

Country Status (4)

Country Link
US (2) US7875865B2 (https=)
JP (3) JP5236478B2 (https=)
KR (1) KR101370203B1 (https=)
WO (1) WO2007054291A1 (https=)

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JP2013211517A (ja) * 2012-03-01 2013-10-10 Gigaphoton Inc Ｅｕｖ光集光装置
US20140158894A1 (en) * 2012-12-12 2014-06-12 Kla-Tencor Corporation Method and device using photoelectrons for in-situ beam power and stability monitoring in euv systems
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DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
DE102013224435A1 (de) 2013-11-28 2015-05-28 Carl Zeiss Smt Gmbh Messanordnung zur Messung optischer Eigenschaften eines reflektiven optischen Elements, insbesondere für die Mikrolithographie
KR101528332B1 (ko) * 2014-01-09 2015-06-15 한국과학기술연구원 극자외선 발생 및 분광기 캘리브레이션 장치 및 그 방법
EP3146557A1 (en) 2014-05-20 2017-03-29 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO A radiation sensor device for high energy photons
KR102271772B1 (ko) 2015-03-11 2021-07-01 삼성전자주식회사 Euv 대역외 광량 분포의 측정 방법 및 이를 이용한 euv 노광기의 성능 검사 방법
DE102015212658A1 (de) * 2015-07-07 2017-01-12 Carl Zeiss Smt Gmbh Lithographieanlage und verfahren zum betreiben einer lithographieanlage
JP6278427B1 (ja) * 2017-01-05 2018-02-14 レーザーテック株式会社 光学装置、及び除振方法
NL2021472A (en) 2017-09-20 2019-03-26 Asml Netherlands Bv Radiation Source
DE102017217266A1 (de) * 2017-09-28 2019-03-28 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung von Eigenschaften einer EUV-Quelle
KR102693181B1 (ko) 2021-09-10 2024-08-08 주식회사 이솔 다층막 반사형 존플레이트를 이용한 euv용 조명 장치 및 그 제조방법
KR102736650B1 (ko) * 2021-10-15 2024-12-02 주식회사 이솔 Euv 마스크 및 euv 팰리클의 반사도와 투과도 측정장치
KR102693199B1 (ko) 2021-10-15 2024-08-08 주식회사 이솔 다층막 반사형 존플레이트를 이용한 euv 마스크 검사장치
DE102021213327B3 (de) * 2021-11-26 2023-03-16 Carl Zeiss Smt Gmbh Metrologiesystem zur Untersuchung von Objekten mit EUV-Messlicht
KR102788301B1 (ko) 2022-07-07 2025-03-31 주식회사 이솔 프리폼 조명계가 구현된 고성능 euv 현미경 장치
KR102830685B1 (ko) 2022-08-05 2025-07-07 주식회사 이솔 타원 미러가 적용된 프리폼 조명계 구조의 고성능 euv 현미경 장치
KR20240082039A (ko) * 2022-12-01 2024-06-10 삼성전자주식회사 모니터링 유닛 및 이를 포함하는 기판 처리 장치
KR102832819B1 (ko) 2022-12-28 2025-07-11 주식회사 이솔 프리폼 조명계 구조의 고성능 euv 현미경 장치
CN120731400A (zh) * 2023-03-14 2025-09-30 Asml荷兰有限公司 用于确定euv辐射的性质的方法和系统

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