JP2009062599A5 - - Google Patents

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Publication number
JP2009062599A5
JP2009062599A5 JP2007233533A JP2007233533A JP2009062599A5 JP 2009062599 A5 JP2009062599 A5 JP 2009062599A5 JP 2007233533 A JP2007233533 A JP 2007233533A JP 2007233533 A JP2007233533 A JP 2007233533A JP 2009062599 A5 JP2009062599 A5 JP 2009062599A5
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JP
Japan
Prior art keywords
exhaust
exhaust pipe
gas
film forming
exhaust gas
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JP2007233533A
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English (en)
Japanese (ja)
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JP5133013B2 (ja
JP2009062599A (ja
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Priority claimed from JP2007233533A external-priority patent/JP5133013B2/ja
Priority to JP2007233533A priority Critical patent/JP5133013B2/ja
Priority to PCT/JP2008/065661 priority patent/WO2009034865A1/ja
Priority to CN200880106461XA priority patent/CN101802256B/zh
Priority to KR1020127003984A priority patent/KR101209997B1/ko
Priority to US12/677,417 priority patent/US20110020544A1/en
Priority to KR1020107005256A priority patent/KR101151513B1/ko
Publication of JP2009062599A publication Critical patent/JP2009062599A/ja
Publication of JP2009062599A5 publication Critical patent/JP2009062599A5/ja
Publication of JP5133013B2 publication Critical patent/JP5133013B2/ja
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Expired - Fee Related legal-status Critical Current
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JP2007233533A 2007-09-10 2007-09-10 成膜装置の排気系構造、成膜装置、および排ガスの処理方法 Expired - Fee Related JP5133013B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2007233533A JP5133013B2 (ja) 2007-09-10 2007-09-10 成膜装置の排気系構造、成膜装置、および排ガスの処理方法
US12/677,417 US20110020544A1 (en) 2007-09-10 2008-09-01 Exhaust system structure of film formation apparatus, film formation apparatus, and exhaust gas processing method
CN200880106461XA CN101802256B (zh) 2007-09-10 2008-09-01 成膜装置的排气系统结构、成膜装置和排出气体的处理方法
KR1020127003984A KR101209997B1 (ko) 2007-09-10 2008-09-01 성막 장치의 배기계 구조, 성막 장치 및 배기 가스의 처리 방법
PCT/JP2008/065661 WO2009034865A1 (ja) 2007-09-10 2008-09-01 成膜装置の排気系構造、成膜装置、および排ガスの処理方法
KR1020107005256A KR101151513B1 (ko) 2007-09-10 2008-09-01 성막 장치의 배기계 구조, 성막 장치 및 배기 가스의 처리 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007233533A JP5133013B2 (ja) 2007-09-10 2007-09-10 成膜装置の排気系構造、成膜装置、および排ガスの処理方法

Publications (3)

Publication Number Publication Date
JP2009062599A JP2009062599A (ja) 2009-03-26
JP2009062599A5 true JP2009062599A5 (enExample) 2010-07-01
JP5133013B2 JP5133013B2 (ja) 2013-01-30

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Family Applications (1)

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JP2007233533A Expired - Fee Related JP5133013B2 (ja) 2007-09-10 2007-09-10 成膜装置の排気系構造、成膜装置、および排ガスの処理方法

Country Status (5)

Country Link
US (1) US20110020544A1 (enExample)
JP (1) JP5133013B2 (enExample)
KR (2) KR101209997B1 (enExample)
CN (1) CN101802256B (enExample)
WO (1) WO2009034865A1 (enExample)

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TWI783382B (zh) * 2020-03-18 2022-11-11 日商國際電氣股份有限公司 基板處理裝置，排氣裝置及半導體裝置的製造方法
KR20220091744A (ko) 2020-12-24 2022-07-01 삼성전자주식회사 파우더 부산물 억제를 위해 흡착제를 포함하는 배기 가스 처리 시스템
KR102800611B1 (ko) * 2020-12-30 2025-04-29 세메스 주식회사 기판 처리 장치 및 이를 운용하는 방법
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