JP2009060078A5 - - Google Patents

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Publication number
JP2009060078A5
JP2009060078A5 JP2008110540A JP2008110540A JP2009060078A5 JP 2009060078 A5 JP2009060078 A5 JP 2009060078A5 JP 2008110540 A JP2008110540 A JP 2008110540A JP 2008110540 A JP2008110540 A JP 2008110540A JP 2009060078 A5 JP2009060078 A5 JP 2009060078A5
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JP
Japan
Prior art keywords
compound semiconductor
semiconductor layer
conductivity type
layer
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008110540A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009060078A (ja
JP5223439B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2008110540A external-priority patent/JP5223439B2/ja
Priority to JP2008110540A priority Critical patent/JP5223439B2/ja
Priority to US12/311,916 priority patent/US8320421B2/en
Priority to PCT/JP2008/059195 priority patent/WO2008146651A1/ja
Priority to TW097118527A priority patent/TWI394336B/zh
Priority to KR1020097009308A priority patent/KR20100014237A/ko
Priority to CN2008800012177A priority patent/CN101569069B/zh
Publication of JP2009060078A publication Critical patent/JP2009060078A/ja
Publication of JP2009060078A5 publication Critical patent/JP2009060078A5/ja
Publication of JP5223439B2 publication Critical patent/JP5223439B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008110540A 2007-05-28 2008-04-21 半導体発光素子 Active JP5223439B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2008110540A JP5223439B2 (ja) 2007-05-28 2008-04-21 半導体発光素子
KR1020097009308A KR20100014237A (ko) 2007-05-28 2008-05-20 반도체 발광소자
PCT/JP2008/059195 WO2008146651A1 (ja) 2007-05-28 2008-05-20 半導体発光素子
TW097118527A TWI394336B (zh) 2007-05-28 2008-05-20 Semiconductor light emitting element
US12/311,916 US8320421B2 (en) 2007-05-28 2008-05-20 Semiconductor light-emitting device
CN2008800012177A CN101569069B (zh) 2007-05-28 2008-05-20 半导体发光装置

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2007139963 2007-05-28
JP2007139963 2007-05-28
JP2007202522 2007-08-03
JP2007202522 2007-08-03
JP2008110540A JP5223439B2 (ja) 2007-05-28 2008-04-21 半導体発光素子

Publications (3)

Publication Number Publication Date
JP2009060078A JP2009060078A (ja) 2009-03-19
JP2009060078A5 true JP2009060078A5 (enExample) 2011-06-02
JP5223439B2 JP5223439B2 (ja) 2013-06-26

Family

ID=40555503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008110540A Active JP5223439B2 (ja) 2007-05-28 2008-04-21 半導体発光素子

Country Status (5)

Country Link
US (1) US8320421B2 (enExample)
JP (1) JP5223439B2 (enExample)
KR (1) KR20100014237A (enExample)
CN (1) CN101569069B (enExample)
TW (1) TWI394336B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007080896A (ja) * 2005-09-12 2007-03-29 Sanyo Electric Co Ltd 半導体素子
JP5186852B2 (ja) * 2007-09-14 2013-04-24 ソニー株式会社 半導体発光素子
JP6181661B2 (ja) * 2012-10-22 2017-08-16 シャープ株式会社 窒化物半導体発光素子
JP6828272B2 (ja) * 2016-05-25 2021-02-10 株式会社リコー 面発光レーザ、面発光レーザアレイ、光源ユニット及びレーザ装置
US11183215B1 (en) 2017-11-20 2021-11-23 Seagate Technology Llc Thin-film crystalline structure with surfaces having selected plane orientations

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US5111469A (en) * 1989-08-15 1992-05-05 Sony Corporation Semiconductor laser
US5070510A (en) * 1989-12-12 1991-12-03 Sharp Kabushiki Kaisha Semiconductor laser device
JPH04199587A (ja) * 1990-11-29 1992-07-20 Toshiba Corp 光半導体素子
US5255280A (en) * 1991-04-22 1993-10-19 Sony Corporation Semiconductor laser
JPH05183223A (ja) * 1991-12-26 1993-07-23 Nec Corp 固体レーザ発振器
JPH05183233A (ja) 1991-12-27 1993-07-23 Mitsubishi Electric Corp 半導体レーザおよびその製造方法
US5359619A (en) * 1992-02-20 1994-10-25 Sumitomo Electric Industries, Ltd. Multi-beam semiconductor laser and method for producing the same
CA2091302A1 (en) * 1992-03-11 1993-09-12 Ichiro Yoshida Semiconductor laser and process for fabricating the same
JPH05283813A (ja) * 1992-03-31 1993-10-29 Toshiba Corp 半導体装置の製造方法
JP3154198B2 (ja) * 1992-08-25 2001-04-09 ソニー株式会社 半導体レーザとその製法
US5311533A (en) * 1992-10-23 1994-05-10 Polaroid Corporation Index-guided laser array with select current paths defined by migration-enhanced dopant incorporation and dopant diffusion
JP3225699B2 (ja) * 1992-12-15 2001-11-05 ソニー株式会社 半導体レーザ及びこれを用いた光学装置
JPH10256647A (ja) * 1997-03-12 1998-09-25 Fuji Electric Co Ltd 半導体レーザ素子およびその製造方法
US6181723B1 (en) * 1997-05-07 2001-01-30 Sharp Kabushiki Kaisha Semiconductor light emitting device with both carbon and group II element atoms as p-type dopants and method for producing the same
JP3652072B2 (ja) * 1997-07-30 2005-05-25 シャープ株式会社 半導体レーザ素子
JP2000101200A (ja) * 1998-09-25 2000-04-07 Sony Corp 半導体レーザーおよびマルチ半導体レーザー
JP3676965B2 (ja) * 1999-08-31 2005-07-27 シャープ株式会社 半導体レーザ素子及びその製造方法
JP2004022934A (ja) * 2002-06-19 2004-01-22 Sony Corp 半導体レーザ素子及びその製造方法
US7215691B2 (en) * 2002-09-19 2007-05-08 Matsushita Electric Industrial Co., Ltd. Semiconductor laser device and method for fabricating the same
JP4298460B2 (ja) 2003-10-06 2009-07-22 フォスター電機株式会社 パネルスピーカ
WO2005117217A1 (ja) * 2004-05-26 2005-12-08 Nippon Telegraph And Telephone Corporation 半導体光素子及びその製造方法
JP4780999B2 (ja) * 2005-04-14 2011-09-28 三洋電機株式会社 半導体レーザ素子の製造方法
JP2006303237A (ja) * 2005-04-21 2006-11-02 Sharp Corp 化合物半導体レーザ素子
JP2008294076A (ja) * 2007-05-22 2008-12-04 Sumitomo Electric Ind Ltd 半導体レーザ素子
JP2009071172A (ja) * 2007-09-14 2009-04-02 Sony Corp 半導体発光素子及びその製造方法、並びに、下地層の形成方法
JP5186852B2 (ja) * 2007-09-14 2013-04-24 ソニー株式会社 半導体発光素子

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