JP2009071171A5 - - Google Patents

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Publication number
JP2009071171A5
JP2009071171A5 JP2007239800A JP2007239800A JP2009071171A5 JP 2009071171 A5 JP2009071171 A5 JP 2009071171A5 JP 2007239800 A JP2007239800 A JP 2007239800A JP 2007239800 A JP2007239800 A JP 2007239800A JP 2009071171 A5 JP2009071171 A5 JP 2009071171A5
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JP
Japan
Prior art keywords
compound semiconductor
semiconductor layer
impurity
layer
conductivity type
Prior art date
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Application number
JP2007239800A
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English (en)
Japanese (ja)
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JP5186852B2 (ja
JP2009071171A (ja
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Publication date
Application filed filed Critical
Priority to JP2007239800A priority Critical patent/JP5186852B2/ja
Priority claimed from JP2007239800A external-priority patent/JP5186852B2/ja
Priority to US12/208,855 priority patent/US7915625B2/en
Publication of JP2009071171A publication Critical patent/JP2009071171A/ja
Publication of JP2009071171A5 publication Critical patent/JP2009071171A5/ja
Application granted granted Critical
Publication of JP5186852B2 publication Critical patent/JP5186852B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007239800A 2007-09-14 2007-09-14 半導体発光素子 Expired - Fee Related JP5186852B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007239800A JP5186852B2 (ja) 2007-09-14 2007-09-14 半導体発光素子
US12/208,855 US7915625B2 (en) 2007-09-14 2008-09-11 Semiconductor light emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007239800A JP5186852B2 (ja) 2007-09-14 2007-09-14 半導体発光素子

Publications (3)

Publication Number Publication Date
JP2009071171A JP2009071171A (ja) 2009-04-02
JP2009071171A5 true JP2009071171A5 (enExample) 2010-05-13
JP5186852B2 JP5186852B2 (ja) 2013-04-24

Family

ID=40453502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007239800A Expired - Fee Related JP5186852B2 (ja) 2007-09-14 2007-09-14 半導体発光素子

Country Status (2)

Country Link
US (1) US7915625B2 (enExample)
JP (1) JP5186852B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5223439B2 (ja) * 2007-05-28 2013-06-26 ソニー株式会社 半導体発光素子
US8699537B2 (en) * 2009-10-29 2014-04-15 Tarun Kumar Sharma Application-oriented nitride substrates for epitaxial growth of electronic and optoelectronic device structures
US8575659B1 (en) * 2011-08-13 2013-11-05 Hrl Laboratories, Llc Carbon-beryllium combinationally doped semiconductor
JP6828272B2 (ja) * 2016-05-25 2021-02-10 株式会社リコー 面発光レーザ、面発光レーザアレイ、光源ユニット及びレーザ装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2990837B2 (ja) 1991-04-22 1999-12-13 ソニー株式会社 半導体レーザ
JPH06132608A (ja) * 1992-10-20 1994-05-13 Sony Corp 半導体レーザ及びその製造方法
US5311533A (en) * 1992-10-23 1994-05-10 Polaroid Corporation Index-guided laser array with select current paths defined by migration-enhanced dopant incorporation and dopant diffusion
JP2894186B2 (ja) * 1993-03-03 1999-05-24 日本電気株式会社 光半導体装置
JP3399018B2 (ja) * 1993-05-18 2003-04-21 ソニー株式会社 半導体レーザ及びその製造方法
JP2960838B2 (ja) * 1993-07-30 1999-10-12 シャープ株式会社 半導体装置及びその製造方法
JP3763708B2 (ja) * 1999-09-21 2006-04-05 株式会社東芝 半導体レーザの製造方法
JP2002232082A (ja) * 2000-11-30 2002-08-16 Furukawa Electric Co Ltd:The 埋込型半導体レーザ素子の製造方法、及び埋込型半導体レーザ素子
JPWO2004074805A1 (ja) * 2003-02-18 2006-06-01 富士通株式会社 光源装置
US20060243992A1 (en) * 2003-12-26 2006-11-02 Sumitomo Electric Industries, Ltd. Semiconductor light-emitting device
JP2008288284A (ja) * 2007-05-15 2008-11-27 Sumitomo Electric Ind Ltd 半導体光素子及びその製造方法
JP5223439B2 (ja) * 2007-05-28 2013-06-26 ソニー株式会社 半導体発光素子
JP2009071172A (ja) * 2007-09-14 2009-04-02 Sony Corp 半導体発光素子及びその製造方法、並びに、下地層の形成方法

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