JP2008525779A - ガス混合物から希ガスを回収する方法 - Google Patents
ガス混合物から希ガスを回収する方法 Download PDFInfo
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- JP2008525779A JP2008525779A JP2007547615A JP2007547615A JP2008525779A JP 2008525779 A JP2008525779 A JP 2008525779A JP 2007547615 A JP2007547615 A JP 2007547615A JP 2007547615 A JP2007547615 A JP 2007547615A JP 2008525779 A JP2008525779 A JP 2008525779A
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- gas
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- noble
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- 239000007789 gas Substances 0.000 title claims abstract description 503
- 239000000203 mixture Substances 0.000 title claims abstract description 126
- 229910052756 noble gas Inorganic materials 0.000 title claims abstract description 85
- 238000000034 method Methods 0.000 title claims abstract description 44
- 150000002835 noble gases Chemical class 0.000 title description 11
- 229910052724 xenon Inorganic materials 0.000 claims abstract description 118
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims abstract description 118
- 239000012159 carrier gas Substances 0.000 claims abstract description 66
- 229910052734 helium Inorganic materials 0.000 claims abstract description 64
- 239000001307 helium Substances 0.000 claims abstract description 58
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims abstract description 57
- 238000010926 purge Methods 0.000 claims abstract description 33
- 238000004817 gas chromatography Methods 0.000 claims abstract description 32
- 239000012528 membrane Substances 0.000 claims abstract description 31
- 229910052743 krypton Inorganic materials 0.000 claims abstract description 11
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000003860 storage Methods 0.000 claims description 134
- 239000003463 adsorbent Substances 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 38
- 230000008929 regeneration Effects 0.000 claims description 8
- 238000011069 regeneration method Methods 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 239000000376 reactant Substances 0.000 claims description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 6
- 238000007599 discharging Methods 0.000 claims description 6
- 238000000746 purification Methods 0.000 claims description 6
- 239000002912 waste gas Substances 0.000 claims description 6
- 230000001172 regenerating effect Effects 0.000 claims description 5
- 238000011282 treatment Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052754 neon Inorganic materials 0.000 claims description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052786 argon Inorganic materials 0.000 abstract description 8
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 7
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 abstract description 3
- 238000011084 recovery Methods 0.000 description 41
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 14
- 238000000926 separation method Methods 0.000 description 11
- 238000001020 plasma etching Methods 0.000 description 6
- 238000011144 upstream manufacturing Methods 0.000 description 6
- 230000000717 retained effect Effects 0.000 description 5
- 241000894007 species Species 0.000 description 5
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- -1 perfluoro compounds Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910004261 CaF 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 150000002605 large molecules Chemical class 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 206010002091 Anaesthesia Diseases 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910004018 SiF Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000037005 anaesthesia Effects 0.000 description 1
- 230000003444 anaesthetic effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000002737 fuel gas Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002371 helium Chemical class 0.000 description 1
- AFAUWLCCQOEICZ-UHFFFAOYSA-N helium xenon Chemical compound [He].[Xe] AFAUWLCCQOEICZ-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 230000004112 neuroprotection Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
- C01B23/0036—Physical processing only
- C01B23/0042—Physical processing only by making use of membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
- B01D15/08—Selective adsorption, e.g. chromatography
- B01D15/10—Selective adsorption, e.g. chromatography characterised by constructional or operational features
- B01D15/24—Selective adsorption, e.g. chromatography characterised by constructional or operational features relating to the treatment of the fractions to be distributed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/025—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with wetted adsorbents; Chromatography
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
- C01B23/0036—Physical processing only
- C01B23/0052—Physical processing only by adsorption in solids
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0029—Obtaining noble gases
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0029—Obtaining noble gases
- C01B2210/0037—Xenon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Separation Of Gases By Adsorption (AREA)
- Treating Waste Gases (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/019,843 US7368000B2 (en) | 2004-12-22 | 2004-12-22 | Treatment of effluent gases |
| PCT/GB2005/004839 WO2006067384A1 (en) | 2004-12-22 | 2005-12-15 | Method of recovering a noble gas from a gas mixture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008525779A true JP2008525779A (ja) | 2008-07-17 |
| JP2008525779A5 JP2008525779A5 (enExample) | 2009-02-12 |
Family
ID=36051545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007547615A Pending JP2008525779A (ja) | 2004-12-22 | 2005-12-15 | ガス混合物から希ガスを回収する方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7368000B2 (enExample) |
| EP (1) | EP1841690A1 (enExample) |
| JP (1) | JP2008525779A (enExample) |
| KR (1) | KR20070086519A (enExample) |
| TW (1) | TWI399236B (enExample) |
| WO (1) | WO2006067384A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009297709A (ja) * | 2008-05-28 | 2009-12-24 | L'air Liquide-Sa Pour L'etude & L'exploitation Des Procedes Georges Claude | 流体又は流体混合物のためのプラズマ処理システム |
| KR20140111335A (ko) * | 2012-01-10 | 2014-09-18 | 알스톰 테크놀러지 리미티드 | 산업 시설로부터의 가스 유출물의 여과 방법 |
| JP2023000161A (ja) * | 2021-06-17 | 2023-01-04 | エドワーズ株式会社 | 希ガス回収システム、及び、希ガス回収方法 |
| JP2023535629A (ja) * | 2020-07-28 | 2023-08-18 | エドワーズ リミテッド | 希ガス回収システム |
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| US20050250347A1 (en) * | 2003-12-31 | 2005-11-10 | Bailey Christopher M | Method and apparatus for maintaining by-product volatility in deposition process |
| JP4895612B2 (ja) * | 2004-01-29 | 2012-03-14 | 大陽日酸株式会社 | 排ガス処理方法および排ガス処理装置 |
| GB0521944D0 (en) | 2005-10-27 | 2005-12-07 | Boc Group Plc | Method of treating gas |
| DE102006034601B3 (de) * | 2006-07-26 | 2008-02-07 | Schmidt, Klaus, Prof. Dr. | Rückhaltung von Edelgasen im Atemgas bei beatmeten Patienten mit Hilfe von Membranseparation |
| GB0618016D0 (en) * | 2006-09-13 | 2006-10-18 | Boc Group Plc | Method of recycling hydrogen |
| US20080072953A1 (en) * | 2006-09-27 | 2008-03-27 | Thinsilicon Corp. | Back contact device for photovoltaic cells and method of manufacturing a back contact device |
| JP5202836B2 (ja) * | 2006-12-01 | 2013-06-05 | 日本エア・リキード株式会社 | キセノンの回収システムおよび回収装置 |
| US20080295882A1 (en) * | 2007-05-31 | 2008-12-04 | Thinsilicon Corporation | Photovoltaic device and method of manufacturing photovoltaic devices |
| WO2009055750A1 (en) * | 2007-10-26 | 2009-04-30 | Applied Materials, Inc. | Methods and apparatus for smart abatement using an improved fuel circuit |
| WO2009100162A2 (en) * | 2008-02-05 | 2009-08-13 | Applied Materials, Inc. | Systems and methods for treating flammable effluent gases from manufacturing processes |
| CN101939713B (zh) * | 2008-02-05 | 2013-05-22 | 应用材料公司 | 运作电子装置制造系统的方法与设备 |
| US8340827B2 (en) * | 2008-06-20 | 2012-12-25 | Lam Research Corporation | Methods for controlling time scale of gas delivery into a processing chamber |
| US8021468B2 (en) * | 2008-06-23 | 2011-09-20 | Siemens Medical Solutions Usa, Inc. | Room temperature chemical trap for the purification of gaseous methane |
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| US20110114156A1 (en) * | 2009-06-10 | 2011-05-19 | Thinsilicon Corporation | Photovoltaic modules having a built-in bypass diode and methods for manufacturing photovoltaic modules having a built-in bypass diode |
| JP2012522404A (ja) * | 2009-06-10 | 2012-09-20 | シンシリコン・コーポレーション | 光起電モジュール、及び複数半導体層スタックを有する光起電モジュールを製造する方法 |
| US8535414B2 (en) * | 2010-09-30 | 2013-09-17 | Air Products And Chemicals, Inc. | Recovering of xenon by adsorption process |
| US8920573B2 (en) * | 2011-09-14 | 2014-12-30 | Institute Of Nuclear Energy Research, Atomic Energy Council | Method of improving purity and yield of chemical product in automatic radioactive medicine synthesis system |
| CN102832096B (zh) * | 2012-09-20 | 2015-11-25 | 中微半导体设备(上海)有限公司 | 一种用于真空处理装置的气体供应装置及其气体供应及切换方法 |
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| US12285715B2 (en) | 2020-07-28 | 2025-04-29 | Edwards Limited | Noble gas recovery system |
| TWI808870B (zh) * | 2022-08-11 | 2023-07-11 | 印能科技股份有限公司 | 氣體回收設備 |
| KR102710551B1 (ko) * | 2023-09-01 | 2024-09-26 | 주식회사 에프알디 | 흡착칼럼을 이용한 제논 및 크립톤 함유 미정제 혼합가스의 추출방법 |
| KR20250082903A (ko) | 2023-11-30 | 2025-06-09 | (주)한양기술공업 | 희유가스 흡착제 및 이를 구비한 반도체 공정 후 희유가스 포집-정제 시스템 |
| KR20250082914A (ko) | 2023-11-30 | 2025-06-09 | (주)한양기술공업 | 반도체 공정 후 희유가스 포집-정제 시스템 |
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- 2005-12-15 WO PCT/GB2005/004839 patent/WO2006067384A1/en not_active Ceased
- 2005-12-15 EP EP05821460A patent/EP1841690A1/en not_active Withdrawn
- 2005-12-15 KR KR1020077014130A patent/KR20070086519A/ko not_active Withdrawn
- 2005-12-22 TW TW094145911A patent/TWI399236B/zh not_active IP Right Cessation
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| DE19641643A1 (de) * | 1996-10-09 | 1998-04-16 | Linde Ag | Verfahren zur Abtrennung von Xenon aus einem Gasgemisch |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2009297709A (ja) * | 2008-05-28 | 2009-12-24 | L'air Liquide-Sa Pour L'etude & L'exploitation Des Procedes Georges Claude | 流体又は流体混合物のためのプラズマ処理システム |
| KR20140111335A (ko) * | 2012-01-10 | 2014-09-18 | 알스톰 테크놀러지 리미티드 | 산업 시설로부터의 가스 유출물의 여과 방법 |
| KR101687461B1 (ko) | 2012-01-10 | 2016-12-19 | 제네럴 일렉트릭 테크놀러지 게엠베하 | 산업 시설로부터의 가스 유출물의 여과 방법 |
| JP2023535629A (ja) * | 2020-07-28 | 2023-08-18 | エドワーズ リミテッド | 希ガス回収システム |
| JP2023000161A (ja) * | 2021-06-17 | 2023-01-04 | エドワーズ株式会社 | 希ガス回収システム、及び、希ガス回収方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1841690A1 (en) | 2007-10-10 |
| US20060130649A1 (en) | 2006-06-22 |
| TWI399236B (zh) | 2013-06-21 |
| KR20070086519A (ko) | 2007-08-27 |
| TW200640555A (en) | 2006-12-01 |
| US7368000B2 (en) | 2008-05-06 |
| WO2006067384A1 (en) | 2006-06-29 |
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