JP2008525779A5 - - Google Patents

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Publication number
JP2008525779A5
JP2008525779A5 JP2007547615A JP2007547615A JP2008525779A5 JP 2008525779 A5 JP2008525779 A5 JP 2008525779A5 JP 2007547615 A JP2007547615 A JP 2007547615A JP 2007547615 A JP2007547615 A JP 2007547615A JP 2008525779 A5 JP2008525779 A5 JP 2008525779A5
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JP
Japan
Prior art keywords
gas
noble
stream
rich
gas stream
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007547615A
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English (en)
Japanese (ja)
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JP2008525779A (ja
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Publication date
Priority claimed from US11/019,843 external-priority patent/US7368000B2/en
Application filed filed Critical
Publication of JP2008525779A publication Critical patent/JP2008525779A/ja
Publication of JP2008525779A5 publication Critical patent/JP2008525779A5/ja
Pending legal-status Critical Current

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JP2007547615A 2004-12-22 2005-12-15 ガス混合物から希ガスを回収する方法 Pending JP2008525779A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/019,843 US7368000B2 (en) 2004-12-22 2004-12-22 Treatment of effluent gases
PCT/GB2005/004839 WO2006067384A1 (en) 2004-12-22 2005-12-15 Method of recovering a noble gas from a gas mixture

Publications (2)

Publication Number Publication Date
JP2008525779A JP2008525779A (ja) 2008-07-17
JP2008525779A5 true JP2008525779A5 (enExample) 2009-02-12

Family

ID=36051545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007547615A Pending JP2008525779A (ja) 2004-12-22 2005-12-15 ガス混合物から希ガスを回収する方法

Country Status (6)

Country Link
US (1) US7368000B2 (enExample)
EP (1) EP1841690A1 (enExample)
JP (1) JP2008525779A (enExample)
KR (1) KR20070086519A (enExample)
TW (1) TWI399236B (enExample)
WO (1) WO2006067384A1 (enExample)

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JP6368458B2 (ja) * 2013-05-24 2018-08-01 株式会社荏原製作所 除害機能付真空ポンプ
JP6441660B2 (ja) * 2014-03-17 2018-12-19 株式会社荏原製作所 除害機能付真空ポンプ
JP6472653B2 (ja) * 2014-03-17 2019-02-20 株式会社荏原製作所 除害機能付真空ポンプ
CN104383784B (zh) * 2014-11-27 2016-03-02 中国科学技术大学 从环境气体中分离提取惰性气体的系统和方法
TWI547305B (zh) * 2014-12-18 2016-09-01 財團法人工業技術研究院 中空纖維吸附壓縮空氣乾燥系統
JP6175471B2 (ja) * 2015-10-30 2017-08-02 日本エア・リキード株式会社 ネオン回収精製システムおよびネオン回収精製方法
JP6734061B2 (ja) * 2016-01-29 2020-08-05 アジレント・テクノロジーズ・インクＡｇｉｌｅｎｔ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． プラズマ分光分析装置
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JP7096004B2 (ja) * 2018-02-07 2022-07-05 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
JP7020951B2 (ja) * 2018-02-09 2022-02-16 東京エレクトロン株式会社 プラズマ処理システムおよびプラズマ処理方法
CN108899104B (zh) * 2018-07-26 2020-12-04 中国核动力研究设计院 一种用于制备85Kr标准源的方法
CN109665505B (zh) * 2018-12-21 2020-11-06 北京放射性核素实验室 一种大气氙富集纯化方法及装置
CN109665506B (zh) * 2018-12-21 2020-11-06 北京放射性核素实验室 大气氙富集纯化方法及装置
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WO2021167218A1 (ko) * 2020-02-19 2021-08-26 (주)한양기술공업 가스 포집 시스템 및 가스 포집 방법
KR102368202B1 (ko) * 2020-02-19 2022-03-02 (주)한양기술공업 가스 포집 시스템 및 가스 포집 방법
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JP2023000161A (ja) * 2021-06-17 2023-01-04 エドワーズ株式会社 希ガス回収システム、及び、希ガス回収方法
TWI808870B (zh) * 2022-08-11 2023-07-11 印能科技股份有限公司 氣體回收設備
KR102710551B1 (ko) * 2023-09-01 2024-09-26 주식회사 에프알디 흡착칼럼을 이용한 제논 및 크립톤 함유 미정제 혼합가스의 추출방법
KR20250082903A (ko) 2023-11-30 2025-06-09 (주)한양기술공업 희유가스 흡착제 및 이를 구비한 반도체 공정 후 희유가스 포집-정제 시스템
KR20250082914A (ko) 2023-11-30 2025-06-09 (주)한양기술공업 반도체 공정 후 희유가스 포집-정제 시스템

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