TWI399236B - 從氣體混合物中回收惰性氣體之方法 - Google Patents

從氣體混合物中回收惰性氣體之方法 Download PDF

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Publication number
TWI399236B
TWI399236B TW094145911A TW94145911A TWI399236B TW I399236 B TWI399236 B TW I399236B TW 094145911 A TW094145911 A TW 094145911A TW 94145911 A TW94145911 A TW 94145911A TW I399236 B TWI399236 B TW I399236B
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Taiwan
Prior art keywords
gas
column
inert
mixture
stream
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TW094145911A
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English (en)
Chinese (zh)
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TW200640555A (en
Inventor
Ravi Jain
Julian Richard Dean
Robert Bruce Grant
Paul Alan Stockman
Naum Perelman
Neil Condon
Andrew John Harpham
William Robert Gerristead
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Boc Group Plc
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Publication of TW200640555A publication Critical patent/TW200640555A/zh
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Publication of TWI399236B publication Critical patent/TWI399236B/zh

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C01B23/001—Purification or separation processes of noble gases
    • C01B23/0036—Physical processing only
    • C01B23/0042—Physical processing only by making use of membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B01D15/08—Selective adsorption, e.g. chromatography
    • B01D15/10—Selective adsorption, e.g. chromatography characterised by constructional or operational features
    • B01D15/24—Selective adsorption, e.g. chromatography characterised by constructional or operational features relating to the treatment of the fractions to be distributed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/025—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with wetted adsorbents; Chromatography
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C01B23/001—Purification or separation processes of noble gases
    • C01B23/0036—Physical processing only
    • C01B23/0052—Physical processing only by adsorption in solids
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0029—Obtaining noble gases
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0029—Obtaining noble gases
    • C01B2210/0037—Xenon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Treating Waste Gases (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
TW094145911A 2004-12-22 2005-12-22 從氣體混合物中回收惰性氣體之方法 TWI399236B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/019,843 US7368000B2 (en) 2004-12-22 2004-12-22 Treatment of effluent gases

Publications (2)

Publication Number Publication Date
TW200640555A TW200640555A (en) 2006-12-01
TWI399236B true TWI399236B (zh) 2013-06-21

Family

ID=36051545

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094145911A TWI399236B (zh) 2004-12-22 2005-12-22 從氣體混合物中回收惰性氣體之方法

Country Status (6)

Country Link
US (1) US7368000B2 (enExample)
EP (1) EP1841690A1 (enExample)
JP (1) JP2008525779A (enExample)
KR (1) KR20070086519A (enExample)
TW (1) TWI399236B (enExample)
WO (1) WO2006067384A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
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US10814251B2 (en) 2018-02-07 2020-10-27 SCREEN Holdings Co., Ltd. Substrate processing method and substrate processing apparatus
TWI790348B (zh) * 2018-02-09 2023-01-21 日商東京威力科創股份有限公司 電漿處理系統及電漿處理方法
TWI808870B (zh) * 2022-08-11 2023-07-11 印能科技股份有限公司 氣體回收設備

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US20050250347A1 (en) * 2003-12-31 2005-11-10 Bailey Christopher M Method and apparatus for maintaining by-product volatility in deposition process
JP4895612B2 (ja) * 2004-01-29 2012-03-14 大陽日酸株式会社 排ガス処理方法および排ガス処理装置
GB0521944D0 (en) 2005-10-27 2005-12-07 Boc Group Plc Method of treating gas
DE102006034601B3 (de) * 2006-07-26 2008-02-07 Schmidt, Klaus, Prof. Dr. Rückhaltung von Edelgasen im Atemgas bei beatmeten Patienten mit Hilfe von Membranseparation
GB0618016D0 (en) * 2006-09-13 2006-10-18 Boc Group Plc Method of recycling hydrogen
US20080072953A1 (en) * 2006-09-27 2008-03-27 Thinsilicon Corp. Back contact device for photovoltaic cells and method of manufacturing a back contact device
JP5202836B2 (ja) * 2006-12-01 2013-06-05 日本エア・リキード株式会社 キセノンの回収システムおよび回収装置
US20080295882A1 (en) * 2007-05-31 2008-12-04 Thinsilicon Corporation Photovoltaic device and method of manufacturing photovoltaic devices
WO2009055750A1 (en) * 2007-10-26 2009-04-30 Applied Materials, Inc. Methods and apparatus for smart abatement using an improved fuel circuit
WO2009100162A2 (en) * 2008-02-05 2009-08-13 Applied Materials, Inc. Systems and methods for treating flammable effluent gases from manufacturing processes
CN101939713B (zh) * 2008-02-05 2013-05-22 应用材料公司 运作电子装置制造系统的方法与设备
FR2932059A1 (fr) * 2008-05-28 2009-12-04 Air Liquide Systeme de traitement par plasma d'un fluide ou melange de fluides
US8340827B2 (en) * 2008-06-20 2012-12-25 Lam Research Corporation Methods for controlling time scale of gas delivery into a processing chamber
US8021468B2 (en) * 2008-06-23 2011-09-20 Siemens Medical Solutions Usa, Inc. Room temperature chemical trap for the purification of gaseous methane
US8042566B2 (en) * 2008-07-23 2011-10-25 Atmel Corporation Ex-situ component recovery
WO2010037102A2 (en) * 2008-09-29 2010-04-01 Thinsilicon Corporation Monolithically-integrated solar module
EP2356673A4 (en) * 2008-12-10 2012-06-06 Thinsilicon Corp SYSTEM AND METHOD FOR RECYCLING A GAS USED TO DEPOSIT A SEMICONDUCTOR LAYER
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US20110114156A1 (en) * 2009-06-10 2011-05-19 Thinsilicon Corporation Photovoltaic modules having a built-in bypass diode and methods for manufacturing photovoltaic modules having a built-in bypass diode
JP2012522404A (ja) * 2009-06-10 2012-09-20 シンシリコン・コーポレーション 光起電モジュール、及び複数半導体層スタックを有する光起電モジュールを製造する方法
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US8920573B2 (en) * 2011-09-14 2014-12-30 Institute Of Nuclear Energy Research, Atomic Energy Council Method of improving purity and yield of chemical product in automatic radioactive medicine synthesis system
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CN102832096B (zh) * 2012-09-20 2015-11-25 中微半导体设备(上海)有限公司 一种用于真空处理装置的气体供应装置及其气体供应及切换方法
US10076620B2 (en) 2012-12-22 2018-09-18 Dmf Medical Incorporated Anesthetic circuit having a hollow fiber membrane
JP6368458B2 (ja) * 2013-05-24 2018-08-01 株式会社荏原製作所 除害機能付真空ポンプ
JP6441660B2 (ja) * 2014-03-17 2018-12-19 株式会社荏原製作所 除害機能付真空ポンプ
JP6472653B2 (ja) * 2014-03-17 2019-02-20 株式会社荏原製作所 除害機能付真空ポンプ
CN104383784B (zh) * 2014-11-27 2016-03-02 中国科学技术大学 从环境气体中分离提取惰性气体的系统和方法
TWI547305B (zh) * 2014-12-18 2016-09-01 財團法人工業技術研究院 中空纖維吸附壓縮空氣乾燥系統
JP6175471B2 (ja) * 2015-10-30 2017-08-02 日本エア・リキード株式会社 ネオン回収精製システムおよびネオン回収精製方法
JP6734061B2 (ja) * 2016-01-29 2020-08-05 アジレント・テクノロジーズ・インクＡｇｉｌｅｎｔ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． プラズマ分光分析装置
US10677713B1 (en) * 2016-08-04 2020-06-09 Hrl Laboratories, Llc Adaptive gas analyzer
CN107632099A (zh) * 2017-08-31 2018-01-26 天津市鹏翔科技有限公司 一种智能在线连续取样自动分析系统及方法
US10773203B2 (en) * 2017-09-27 2020-09-15 U.S. Department Of Energy Transition group metals for the capture of radioactive xenon
US10824049B1 (en) 2017-10-06 2020-11-03 Hrl Laboratories, Llc Optical-frequency up-converting spectrometric imager
CN108899104B (zh) * 2018-07-26 2020-12-04 中国核动力研究设计院 一种用于制备85Kr标准源的方法
CN109665505B (zh) * 2018-12-21 2020-11-06 北京放射性核素实验室 一种大气氙富集纯化方法及装置
CN109665506B (zh) * 2018-12-21 2020-11-06 北京放射性核素实验室 大气氙富集纯化方法及装置
US11557462B2 (en) * 2019-03-13 2023-01-17 Kla Corporation Collecting and recycling rare gases in semiconductor processing equipment
WO2021167218A1 (ko) * 2020-02-19 2021-08-26 (주)한양기술공업 가스 포집 시스템 및 가스 포집 방법
KR102368202B1 (ko) * 2020-02-19 2022-03-02 (주)한양기술공업 가스 포집 시스템 및 가스 포집 방법
US12285715B2 (en) 2020-07-28 2025-04-29 Edwards Limited Noble gas recovery system
GB2597545A (en) * 2020-07-28 2022-02-02 Edwards Ltd A noble gas recovery system
JP2023000161A (ja) * 2021-06-17 2023-01-04 エドワーズ株式会社 希ガス回収システム、及び、希ガス回収方法
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10814251B2 (en) 2018-02-07 2020-10-27 SCREEN Holdings Co., Ltd. Substrate processing method and substrate processing apparatus
TWI733075B (zh) * 2018-02-07 2021-07-11 日商斯庫林集團股份有限公司 基板處理方法及基板處理裝置
TWI790348B (zh) * 2018-02-09 2023-01-21 日商東京威力科創股份有限公司 電漿處理系統及電漿處理方法
US11699573B2 (en) 2018-02-09 2023-07-11 Tokyo Electron Limited Plasma processing method
TWI808870B (zh) * 2022-08-11 2023-07-11 印能科技股份有限公司 氣體回收設備

Also Published As

Publication number Publication date
EP1841690A1 (en) 2007-10-10
JP2008525779A (ja) 2008-07-17
US20060130649A1 (en) 2006-06-22
KR20070086519A (ko) 2007-08-27
TW200640555A (en) 2006-12-01
US7368000B2 (en) 2008-05-06
WO2006067384A1 (en) 2006-06-29

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