JP2008524450A5 - - Google Patents

Download PDF

Info

Publication number
JP2008524450A5
JP2008524450A5 JP2007548264A JP2007548264A JP2008524450A5 JP 2008524450 A5 JP2008524450 A5 JP 2008524450A5 JP 2007548264 A JP2007548264 A JP 2007548264A JP 2007548264 A JP2007548264 A JP 2007548264A JP 2008524450 A5 JP2008524450 A5 JP 2008524450A5
Authority
JP
Japan
Prior art keywords
substrate
coating
product stream
stream
reactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007548264A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008524450A (ja
Filing date
Publication date
Priority claimed from US11/017,214 external-priority patent/US7491431B2/en
Application filed filed Critical
Publication of JP2008524450A publication Critical patent/JP2008524450A/ja
Publication of JP2008524450A5 publication Critical patent/JP2008524450A5/ja
Pending legal-status Critical Current

Links

JP2007548264A 2004-12-20 2005-12-07 反応性堆積による緻密コーティング形成 Pending JP2008524450A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/017,214 US7491431B2 (en) 2004-12-20 2004-12-20 Dense coating formation by reactive deposition
PCT/US2005/044403 WO2006068846A2 (en) 2004-12-20 2005-12-07 Dense coating formation by reactive deposition

Publications (2)

Publication Number Publication Date
JP2008524450A JP2008524450A (ja) 2008-07-10
JP2008524450A5 true JP2008524450A5 (https=) 2009-01-29

Family

ID=36596196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007548264A Pending JP2008524450A (ja) 2004-12-20 2005-12-07 反応性堆積による緻密コーティング形成

Country Status (7)

Country Link
US (1) US7491431B2 (https=)
EP (1) EP1841541A2 (https=)
JP (1) JP2008524450A (https=)
KR (1) KR20070091666A (https=)
CN (1) CN101119807A (https=)
TW (1) TWI308600B (https=)
WO (1) WO2006068846A2 (https=)

Families Citing this family (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002044765A2 (en) * 2000-10-26 2002-06-06 Nanogram Corporation Multilayered optical structures
US6952504B2 (en) * 2001-12-21 2005-10-04 Neophotonics Corporation Three dimensional engineering of planar optical structures
ATE529901T1 (de) * 2004-02-27 2011-11-15 Canon Kk Piezoelektrischer dünnfilm, verfahren zur herstellung eines piezoelektrischen dünnfilms, piezoelektrisches element und inkjet- aufzeichnungskopf
ATE527907T1 (de) * 2004-04-23 2011-10-15 Panasonic Elec Works Co Ltd Gebläseheizung mit elektrostatischem zerstäuber
JP4453021B2 (ja) * 2005-04-01 2010-04-21 セイコーエプソン株式会社 半導体装置の製造方法及び半導体製造装置
CN101443888B (zh) * 2006-03-13 2011-03-16 内诺格雷姆公司 薄硅或者锗片以及由薄片形成的光电池
JP4434167B2 (ja) * 2006-03-28 2010-03-17 セイコーエプソン株式会社 半導体装置の製造方法
JP5545608B2 (ja) * 2006-07-18 2014-07-09 日本碍子株式会社 誘電体デバイス
US8815013B2 (en) * 2006-07-19 2014-08-26 Intermolecular, Inc. Method and system for isolated and discretized process sequence integration
EP2044623A4 (en) * 2006-07-19 2012-10-03 Intermolecular Inc METHOD AND SYSTEM FOR INTEGRATING ISOLATED AND DISCRETED PROCESSES
US20080038486A1 (en) * 2006-08-03 2008-02-14 Helmuth Treichel Radical Assisted Batch Film Deposition
US8076185B1 (en) 2006-08-23 2011-12-13 Rockwell Collins, Inc. Integrated circuit protection and ruggedization coatings and methods
US8166645B2 (en) * 2006-08-23 2012-05-01 Rockwell Collins, Inc. Method for providing near-hermetically coated, thermally protected integrated circuit assemblies
US7915527B1 (en) 2006-08-23 2011-03-29 Rockwell Collins, Inc. Hermetic seal and hermetic connector reinforcement and repair with low temperature glass coatings
US8617913B2 (en) * 2006-08-23 2013-12-31 Rockwell Collins, Inc. Alkali silicate glass based coating and method for applying
US8084855B2 (en) 2006-08-23 2011-12-27 Rockwell Collins, Inc. Integrated circuit tampering protection and reverse engineering prevention coatings and methods
US8637980B1 (en) 2007-12-18 2014-01-28 Rockwell Collins, Inc. Adhesive applications using alkali silicate glass for electronics
US8581108B1 (en) 2006-08-23 2013-11-12 Rockwell Collins, Inc. Method for providing near-hermetically coated integrated circuit assemblies
US8174830B2 (en) 2008-05-06 2012-05-08 Rockwell Collins, Inc. System and method for a substrate with internal pumped liquid metal for thermal spreading and cooling
US7465681B2 (en) * 2006-08-25 2008-12-16 Corning Incorporated Method for producing smooth, dense optical films
AU2012261639B2 (en) * 2006-09-13 2014-02-27 The University Of Akron Catalysts Compositions for use in Fuel Cells
EP2059965A4 (en) * 2006-09-13 2012-03-28 Univ Akron CATALYST COMPOSITIONS FOR FUEL CELLS
US20080081007A1 (en) * 2006-09-29 2008-04-03 Mott Corporation, A Corporation Of The State Of Connecticut Sinter bonded porous metallic coatings
US9149750B2 (en) 2006-09-29 2015-10-06 Mott Corporation Sinter bonded porous metallic coatings
JP4362834B2 (ja) * 2006-10-11 2009-11-11 セイコーエプソン株式会社 半導体装置の製造方法、電子機器の製造方法および半導体製造装置
JP4407685B2 (ja) * 2006-10-11 2010-02-03 セイコーエプソン株式会社 半導体装置の製造方法および電子機器の製造方法
US20090026421A1 (en) * 2007-01-22 2009-01-29 Xuegeng Li Optimized laser pyrolysis reactor and methods therefor
US8853527B2 (en) * 2007-02-16 2014-10-07 Nanogram Corporation Solar cell structures, photovoltaic panels and corresponding processes
US7857946B2 (en) * 2007-04-26 2010-12-28 Canon Anelva Corporation Sputtering film forming method, electronic device manufacturing method, and sputtering system
US7791166B2 (en) * 2007-05-04 2010-09-07 International Business Machines Corporation Formation of dummy features and inductors in semiconductor fabrication
US20090017292A1 (en) * 2007-06-15 2009-01-15 Henry Hieslmair Reactive flow deposition and synthesis of inorganic foils
WO2009002544A1 (en) * 2007-06-26 2008-12-31 Rolls-Royce Corporation Prism mount for a laser deposition device
KR20090002841A (ko) * 2007-07-04 2009-01-09 삼성전자주식회사 산화물 반도체, 이를 포함하는 박막 트랜지스터 및 그 제조방법
EP2183813A1 (en) * 2007-08-09 2010-05-12 President And Fellows Of Harvard College Micro-scale energy conversion devices and methods
US8363189B2 (en) * 2007-12-18 2013-01-29 Rockwell Collins, Inc. Alkali silicate glass for displays
US8205337B2 (en) * 2008-09-12 2012-06-26 Rockwell Collins, Inc. Fabrication process for a flexible, thin thermal spreader
US8616266B2 (en) * 2008-09-12 2013-12-31 Rockwell Collins, Inc. Mechanically compliant thermal spreader with an embedded cooling loop for containing and circulating electrically-conductive liquid
US8221089B2 (en) 2008-09-12 2012-07-17 Rockwell Collins, Inc. Thin, solid-state mechanism for pumping electrically conductive liquids in a flexible thermal spreader
US8650886B2 (en) * 2008-09-12 2014-02-18 Rockwell Collins, Inc. Thermal spreader assembly with flexible liquid cooling loop having rigid tubing sections and flexible tubing sections
US20090317033A1 (en) * 2008-06-20 2009-12-24 Industrial Technology Research Institute Integrated circuit and photonic board thereof
US8119040B2 (en) * 2008-09-29 2012-02-21 Rockwell Collins, Inc. Glass thick film embedded passive material
US8168463B2 (en) * 2008-10-17 2012-05-01 Stion Corporation Zinc oxide film method and structure for CIGS cell
US8932781B2 (en) * 2008-10-30 2015-01-13 Georgia Tech Research Corporation Chemical compositions, methods of making the chemical compositions, and structures made from the chemical compositions
US20100294349A1 (en) * 2009-05-20 2010-11-25 Uma Srinivasan Back contact solar cells with effective and efficient designs and corresponding patterning processes
US20100294352A1 (en) * 2009-05-20 2010-11-25 Uma Srinivasan Metal patterning for electrically conductive structures based on alloy formation
JP5410174B2 (ja) * 2009-07-01 2014-02-05 株式会社日立国際電気 半導体装置の製造方法、基板処理方法および基板処理システム
US20100112324A1 (en) * 2009-08-06 2010-05-06 Boaz Premakaran T Coatings on Glass
CN102782176B (zh) * 2009-08-24 2014-10-15 应用材料公司 通过热喷涂原位沉积电池活性锂材料
TWI523246B (zh) * 2009-09-21 2016-02-21 納克公司 用於薄膜太陽能電池形成之矽墨水、對應方法及太陽能電池結構
BR112012013498B1 (pt) * 2009-12-04 2020-08-18 The Regents Of The University Of Michigan Montagem de bico de borrifo a frio e método de cobertura por borrifo a frio
US10119195B2 (en) 2009-12-04 2018-11-06 The Regents Of The University Of Michigan Multichannel cold spray apparatus
JP5987150B2 (ja) * 2010-03-04 2016-09-07 イマジニアリング株式会社 被膜形成装置
WO2011162769A2 (en) * 2010-06-25 2011-12-29 Utc Power Corporation Composite seal for fuel cells, process of manufacture, and fuel cell stack using same
US8912083B2 (en) 2011-01-31 2014-12-16 Nanogram Corporation Silicon substrates with doped surface contacts formed from doped silicon inks and corresponding processes
US9059449B2 (en) * 2011-03-25 2015-06-16 Bloom Energy Corporation Rapid thermal processing for SOFC manufacturing
US9511572B2 (en) 2011-05-25 2016-12-06 Southwest Research Institute Nanocrystalline interlayer coating for increasing service life of thermal barrier coating on high temperature components
GB2491643A (en) * 2011-06-10 2012-12-12 Lambson Ltd Method of forming a polymeric material on a substrate
KR102018401B1 (ko) * 2011-09-23 2019-10-21 인텔리전트 에너지 리미티드 복합체 표면상의 연료전지 어레이 형성방법
US9147584B2 (en) * 2011-11-16 2015-09-29 Taiwan Semiconductor Manufacturing Company, Ltd. Rotating curing
EP2780489B1 (en) 2011-11-18 2019-01-09 First Solar, Inc Vapor transport deposition method and system for material co-deposition
CN104737268A (zh) 2012-01-12 2015-06-24 第一太阳能有限公司 在半导体器件的不同层中提供掺杂剂浓度控制的方法和系统
US9428837B2 (en) 2012-03-27 2016-08-30 United Technologies Corporation Multi-material thermal barrier coating system
US9698386B2 (en) 2012-04-13 2017-07-04 Oti Lumionics Inc. Functionalization of a substrate
US8853070B2 (en) 2012-04-13 2014-10-07 Oti Lumionics Inc. Functionalization of a substrate
JP6412493B2 (ja) * 2012-04-13 2018-10-24 オーティーアイ ルミオニクス インコーポレーテッドOti Lumionics Inc. 基板の官能基化
US9435915B1 (en) 2012-09-28 2016-09-06 Rockwell Collins, Inc. Antiglare treatment for glass
CN102925890B (zh) * 2012-10-26 2014-07-09 山东大学 一种镍-铝基金属间化合物耐腐蚀涂层的制备方法
ES2870712T3 (es) 2013-02-01 2021-10-27 Emd Acquisition Llc Composiciones mejoradas de óxido de litio manganeso
US10793941B2 (en) * 2013-10-25 2020-10-06 Raytheon Technologies Corporation Plasma spraying system with adjustable coating medium nozzle
CN103820757B (zh) * 2014-03-19 2015-12-30 沈阳慧宇真空技术有限公司 一种激光分子束蒸发系统变向传动定位机构
US10828400B2 (en) 2014-06-10 2020-11-10 The Research Foundation For The State University Of New York Low temperature, nanostructured ceramic coatings
US10253984B2 (en) * 2015-04-28 2019-04-09 United Technologies Corporation Reflective coating for components
US10241409B2 (en) 2015-12-22 2019-03-26 AZ Electronic Materials (Luxembourg) S.à.r.l. Materials containing metal oxides, processes for making same, and processes for using same
SG11201804950PA (en) * 2015-12-28 2018-07-30 Matheson Tri Gas Inc Use of reactive fluids in additive manufacturing and the products made therefrom
US20170330725A1 (en) * 2016-05-13 2017-11-16 Axcelis Technologies, Inc. Lanthanated tungsten ion source and beamline components
US9956587B2 (en) * 2016-08-29 2018-05-01 The Aerospace Corporation Fabrication assembly and methods for fabricating composite mirror objects
CN108611627B (zh) 2016-12-13 2020-09-01 华邦电子股份有限公司 金属青铜类化合物、其制造方法以及墨水
CN112203778B (zh) * 2018-06-22 2022-08-30 林德有限责任公司 气缸阀以及用于抑制污染物在气缸和气缸阀中形成的方法
TWI902284B (zh) * 2018-07-18 2025-10-21 美商應用材料股份有限公司 原子層沉積所沉積的抗侵蝕金屬氟化物塗層
US20200024735A1 (en) * 2018-07-18 2020-01-23 Applied Materials, Inc. Erosion resistant metal fluoride coatings deposited by atomic layer deposition
WO2020047470A1 (en) * 2018-08-31 2020-03-05 The Regents Of The University Of Michigan Polymer precursors for solid state electrolytes
CN111533554B (zh) * 2020-04-30 2022-03-11 福建火炬电子科技股份有限公司 一种高压陶瓷脉冲电容器、介质材料及其制备方法
TWI739652B (zh) * 2020-11-06 2021-09-11 愛能有限公司 用於鋪設坡屋頂之太陽能電池板及其施工方式
CN113003929B (zh) * 2021-04-03 2023-04-28 南京至淳宏远科技有限公司 一种用于掺稀土预制棒制备的气相蒸发装置
WO2023086105A1 (en) * 2021-11-15 2023-05-19 Massachusetts Institute Of Technology Spray pyrolysis of lithium salt films
CN114774886B (zh) * 2022-06-21 2022-09-13 柔电(武汉)科技有限公司 一种耐氧化抗盐雾吸波材料粉体及制备方法
CN116314722A (zh) * 2023-04-23 2023-06-23 青岛新泰和纳米科技有限公司 一种氟氮掺杂无定形碳包覆硅碳复合材料及其制备方法
CN116288256B (zh) * 2023-05-17 2023-11-07 青禾晶元(天津)半导体材料有限公司 一种雾化气相沉积装置和雾化气相沉积方法

Family Cites Families (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3806570A (en) 1972-03-30 1974-04-23 Corning Glass Works Method for producing high quality fused silica
US3934061A (en) 1972-03-30 1976-01-20 Corning Glass Works Method of forming planar optical waveguides
US3883336A (en) 1974-01-11 1975-05-13 Corning Glass Works Method of producing glass in a flame
US3923484A (en) 1974-01-11 1975-12-02 Corning Glass Works Flame method of producing glass
US4011067A (en) 1974-01-30 1977-03-08 Minnesota Mining And Manufacturing Company Filter medium layered between supporting layers
US3932162A (en) 1974-06-21 1976-01-13 Corning Glass Works Method of making glass optical waveguide
JPS51102014A (en) 1974-11-01 1976-09-09 Komatsu Denshi Kinzoku Kk Kojundotomeigarasutaino seizohoho
JPS5263213A (en) 1975-11-20 1977-05-25 Komatsu Denshi Kinzoku Kk Process for preparing highhpurity transparent silica glass products
US4119509A (en) 1976-06-11 1978-10-10 Massachusetts Institute Of Technology Method and apparatus for isotope separation from a gas stream
US4140912A (en) 1977-07-25 1979-02-20 The United States Of America As Represented By The Secretary Of The Navy Atmospheric radon monitor
US4581248A (en) 1984-03-07 1986-04-08 Roche Gregory A Apparatus and method for laser-induced chemical vapor deposition
CA1255382A (en) 1984-08-10 1989-06-06 Masao Kawachi Hybrid optical integrated circuit with alignment guides
DE3442790A1 (de) 1984-11-23 1986-06-05 Dieter Prof. Dr. Linz Bäuerle Verfahren zur herstellung von duennschichtkondensatoren
US4782787A (en) 1986-01-08 1988-11-08 Roche Gregory A Apparatus for laser-induced chemical vapor deposition
GB2185494B (en) 1986-01-18 1989-11-15 Stc Plc Vapour phase deposition process
US4868005A (en) 1986-04-09 1989-09-19 Massachusetts Institute Of Technology Method and apparatus for photodeposition of films on surfaces
US4681640A (en) 1986-08-06 1987-07-21 The United States Of America As Represented By The Secretary Of The Army Laser-induced chemical vapor deposition of germanium and doped-germanium films
US4986214A (en) * 1986-12-16 1991-01-22 Mitsubishi Denki Kabushiki Kaisha Thin film forming apparatus
JPS63153277A (ja) * 1986-12-17 1988-06-25 Fuji Electric Corp Res & Dev Ltd レ−ザcvd装置
US5060595A (en) 1988-04-12 1991-10-29 Ziv Alan R Via filling by selective laser chemical vapor deposition
JP2511503B2 (ja) 1988-08-22 1996-06-26 沖電気工業株式会社 タングステン膜の形成方法
JPH0288775A (ja) 1988-09-26 1990-03-28 Victor Co Of Japan Ltd レーザーcvd装置
US5043548A (en) 1989-02-08 1991-08-27 General Electric Company Axial flow laser plasma spraying
JPH02310363A (ja) 1989-05-24 1990-12-26 Mitsubishi Electric Corp レーザ蒸着装置
US5017317A (en) 1989-12-04 1991-05-21 Board Of Regents, The Uni. Of Texas System Gas phase selective beam deposition
JP3038413B2 (ja) * 1990-12-21 2000-05-08 大阪瓦斯株式会社 光cvd法による膜作成装置
US5276012A (en) 1991-02-12 1994-01-04 Ngk Spark Plug Co., Ltd. Laser-assisted CVD process forming oxide superconducting films
JPH05273426A (ja) 1991-12-06 1993-10-22 Sumitomo Electric Ind Ltd 光導波膜の作製方法およびこれを用いた光導波路の作製方法
US5174826A (en) 1991-12-06 1992-12-29 General Electric Company Laser-assisted chemical vapor deposition
US5246745A (en) 1991-12-23 1993-09-21 International Business Machines Corporation Laser-induced chemical vapor deposition of thin-film conductors
JPH05313221A (ja) 1992-05-11 1993-11-26 Ricoh Co Ltd 強誘電体結晶素子及びそれを用いた第二高調波発生素子
JPH06116743A (ja) 1992-10-02 1994-04-26 Vacuum Metallurgical Co Ltd ガス・デポジション法による微粒子膜の形成法およびその形成装置
TW263566B (https=) 1993-01-14 1995-11-21 Sumitomo Electric Industries
US5858465A (en) 1993-03-24 1999-01-12 Georgia Tech Research Corporation Combustion chemical vapor deposition of phosphate films and coatings
ES2193156T3 (es) 1993-03-24 2003-11-01 Georgia Tech Res Inst Procedimiento y aparato para la preparacion de capas y recubrimientos por medio de deposicion quimica en fase de vapor asistida por combustion.
WO1994026425A1 (en) 1993-05-17 1994-11-24 Mcdonnell Douglas Corporation Laser absorption wave deposition process
US5514350A (en) 1994-04-22 1996-05-07 Rutgers, The State University Of New Jersey Apparatus for making nanostructured ceramic powders and whiskers
US5622750A (en) 1994-10-31 1997-04-22 Lucent Technologies Inc. Aerosol process for the manufacture of planar waveguides
US5744777A (en) 1994-12-09 1998-04-28 Northwestern University Small particle plasma spray apparatus, method and coated article
EP0848658B1 (en) 1995-08-04 2006-10-11 nGimat Co. Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions
AU6915696A (en) 1995-09-07 1997-03-27 Penn State Research Foundation, The High production rate of nano particles by laser liquid interaction
US5874134A (en) 1996-01-29 1999-02-23 Regents Of The University Of Minnesota Production of nanostructured materials by hypersonic plasma particle deposition
US6011981A (en) 1996-03-12 2000-01-04 International Superconductivity Technology Center Oxide superconductor multilayered film and oxide superconductor josephson device
US5885904A (en) 1997-02-14 1999-03-23 Advanced Micro Devices, Inc. Method to incorporate, and a device having, oxide enhancement dopants using gas immersion laser doping (GILD) for selectively growing an oxide layer
US5958348A (en) 1997-02-28 1999-09-28 Nanogram Corporation Efficient production of particles by chemical reaction
JPH10280152A (ja) 1997-04-14 1998-10-20 Nec Corp チャンバレスレーザcvd装置
DE19730231A1 (de) 1997-07-15 1999-01-21 Abb Research Ltd Verfahren zum elektrostatischen Beschichten
US6290735B1 (en) 1997-10-31 2001-09-18 Nanogram Corporation Abrasive particles for surface polishing
US6726990B1 (en) 1998-05-27 2004-04-27 Nanogram Corporation Silicon oxide particles
US5938979A (en) 1997-10-31 1999-08-17 Nanogram Corporation Electromagnetic shielding
JP2963993B1 (ja) 1998-07-24 1999-10-18 工業技術院長 超微粒子成膜法
JP3256741B2 (ja) 1998-07-24 2002-02-12 独立行政法人産業技術総合研究所 超微粒子成膜法
US6074888A (en) 1998-08-18 2000-06-13 Trw Inc. Method for fabricating semiconductor micro epi-optical components
US7108894B2 (en) * 1998-09-30 2006-09-19 Optomec Design Company Direct Write™ System
US6097144A (en) 1998-10-28 2000-08-01 International Lead Zinc Research Organization, Inc. Cathode ray tubes having reduced glass browning properties
BR9914871A (pt) 1998-10-30 2001-07-03 Corning Inc Métodos de manufaturamento de fuligem para pré-formas de fibra ótica e pré-formas produzidas pelos métodos
US6254928B1 (en) 1999-09-02 2001-07-03 Micron Technology, Inc. Laser pyrolysis particle forming method and particle forming method
US6923946B2 (en) * 1999-11-26 2005-08-02 Ut-Battelle, Llc Condensed phase conversion and growth of nanorods instead of from vapor
KR20040012671A (ko) * 2000-10-17 2004-02-11 네오포토닉스 코포레이션 반응성 증착에 의한 코팅 형성
US7311947B2 (en) * 2003-10-10 2007-12-25 Micron Technology, Inc. Laser assisted material deposition

Similar Documents

Publication Publication Date Title
JP2008524450A5 (https=)
WO2006068846A3 (en) Dense coating formation by reactive deposition
JP2004511342A5 (https=)
JP2007277723A5 (https=)
WO2005005686A1 (ja) 金属酸化物被膜の成膜方法および蒸着装置
JP2009144242A5 (ja) タングステン膜の製造方法および装置
EP0739250A1 (en) Using lasers to fabricate coatings on substrates
CN109877341B (zh) 一种纳米金属颗粒的冶炼方法及其图案化的方法
WO1995031584A1 (en) Surface treatment techniques
Yu et al. Solution precursor plasma spray process as an alternative rapid one-step route for the development of hierarchical ZnO films for improved photocatalytic degradation
Yamada et al. Fabrication of titanium dioxide photocatalyst coatings by cold spray
CN101978098B (zh) 通过冷气喷涂形成涂层的方法
US20030228414A1 (en) Direct application of catalysts to substrates for treatment of the atmosphere
CN114574955A (zh) 一种催化剂双辅助的二维过渡金属硫族化合物薄膜的制备方法
KR20130130284A (ko) 레이저를 이용한 나노입자 합성장치 및 방법
CN201071403Y (zh) 一种上进上出的垂直喷淋式mocvd反应器
US20090095128A1 (en) Uniform aerosol delivery for flow-based pyrolysis for inorganic material synthesis
CN104609406B (zh) 一种常压二段过程催化固体碳源合成石墨烯的方法
KR20190084472A (ko) 액체 플라즈마 연속 코팅장치 및 방법
US20120315709A1 (en) Process and apparatus for producing a substrate
CN202558940U (zh) 基于大面积电子束的工件表面快速涂覆重熔装置
WO2008081182A1 (en) Methods of adhering particles to a material by heating
JP6614651B2 (ja) シリコンナノ粒子の製造方法及び装置
WO2023099674A1 (de) Verfahren und vorrichtung zum abscheiden einer ein element der v. hauptgruppe enthaltenen schicht in einer prozesskammer und anschliessendem reinigen der prozesskammer
CN213266693U (zh) 钛基板连续镀金属硫化物的装置