JP2008274297A - エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 - Google Patents
エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 Download PDFInfo
- Publication number
- JP2008274297A JP2008274297A JP2008187177A JP2008187177A JP2008274297A JP 2008274297 A JP2008274297 A JP 2008274297A JP 2008187177 A JP2008187177 A JP 2008187177A JP 2008187177 A JP2008187177 A JP 2008187177A JP 2008274297 A JP2008274297 A JP 2008274297A
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- Prior art keywords
- group
- epoxy resin
- substituted
- methylene
- methylene group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000003822 epoxy resin Substances 0.000 title claims abstract description 140
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 140
- 239000000203 mixture Substances 0.000 title claims description 36
- -1 9-fluorenyl group Chemical group 0.000 claims abstract description 49
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims abstract description 36
- 125000003118 aryl group Chemical group 0.000 claims abstract description 14
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 11
- 125000001624 naphthyl group Chemical group 0.000 claims abstract description 11
- 125000006267 biphenyl group Chemical group 0.000 claims abstract description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 10
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 20
- 238000001723 curing Methods 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 17
- 239000011256 inorganic filler Substances 0.000 claims description 8
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 238000013007 heat curing Methods 0.000 claims 1
- 239000003063 flame retardant Substances 0.000 abstract description 19
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 abstract description 16
- 230000000694 effects Effects 0.000 abstract description 10
- 238000006243 chemical reaction Methods 0.000 description 28
- 229920005989 resin Polymers 0.000 description 28
- 239000011347 resin Substances 0.000 description 28
- 239000000047 product Substances 0.000 description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 21
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 20
- 150000001875 compounds Chemical class 0.000 description 18
- 239000004065 semiconductor Substances 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 229920003986 novolac Polymers 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 238000001819 mass spectrum Methods 0.000 description 13
- 239000004593 Epoxy Substances 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 150000002440 hydroxy compounds Chemical class 0.000 description 9
- 150000002989 phenols Chemical class 0.000 description 9
- 239000002994 raw material Substances 0.000 description 9
- 239000002966 varnish Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- 238000002329 infrared spectrum Methods 0.000 description 8
- 239000003566 sealing material Substances 0.000 description 8
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 7
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 7
- 125000003700 epoxy group Chemical group 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 6
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 6
- 229930003836 cresol Natural products 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 6
- FXLOVSHXALFLKQ-UHFFFAOYSA-N p-tolualdehyde Chemical compound CC1=CC=C(C=O)C=C1 FXLOVSHXALFLKQ-UHFFFAOYSA-N 0.000 description 6
- 239000005011 phenolic resin Substances 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- 230000021736 acetylation Effects 0.000 description 5
- 238000006640 acetylation reaction Methods 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 150000002366 halogen compounds Chemical class 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- LCRCBXLHWTVPEQ-UHFFFAOYSA-N 2-phenylbenzaldehyde Chemical compound O=CC1=CC=CC=C1C1=CC=CC=C1 LCRCBXLHWTVPEQ-UHFFFAOYSA-N 0.000 description 4
- 0 Cc1c(*)c(I2*C2)c(Cc(c(*2)c(C)c(I3*C3)c3*)c3I3*C3)c2c1C Chemical compound Cc1c(*)c(I2*C2)c(Cc(c(*2)c(C)c(I3*C3)c3*)c3I3*C3)c2c1C 0.000 description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 3
- 239000001431 2-methylbenzaldehyde Substances 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- POQJHLBMLVTHAU-UHFFFAOYSA-N 3,4-Dimethylbenzaldehyde Chemical compound CC1=CC=C(C=O)C=C1C POQJHLBMLVTHAU-UHFFFAOYSA-N 0.000 description 3
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- SSUJUUNLZQVZMO-UHFFFAOYSA-N 1,2,3,4,8,9,10,10a-octahydropyrimido[1,2-a]azepine Chemical compound C1CCC=CN2CCCNC21 SSUJUUNLZQVZMO-UHFFFAOYSA-N 0.000 description 2
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 2
- AUFZRCJENRSRLY-UHFFFAOYSA-N 2,3,5-trimethylhydroquinone Chemical compound CC1=CC(O)=C(C)C(C)=C1O AUFZRCJENRSRLY-UHFFFAOYSA-N 0.000 description 2
- GSKNLOOGBYYDHV-UHFFFAOYSA-N 2-methylphenol;naphthalen-1-ol Chemical compound CC1=CC=CC=C1O.C1=CC=C2C(O)=CC=CC2=C1 GSKNLOOGBYYDHV-UHFFFAOYSA-N 0.000 description 2
- PJKVFARRVXDXAD-UHFFFAOYSA-N 2-naphthaldehyde Chemical compound C1=CC=CC2=CC(C=O)=CC=C21 PJKVFARRVXDXAD-UHFFFAOYSA-N 0.000 description 2
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
- KXAKDOWCKQHQIQ-UHFFFAOYSA-N 4,5,6-trimethylbenzene-1,3-diol Chemical compound CC1=C(C)C(O)=CC(O)=C1C KXAKDOWCKQHQIQ-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000012796 inorganic flame retardant Chemical class 0.000 description 2
- YDSWCNNOKPMOTP-UHFFFAOYSA-N mellitic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O YDSWCNNOKPMOTP-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- VSWALKINGSNVAR-UHFFFAOYSA-N naphthalen-1-ol;phenol Chemical compound OC1=CC=CC=C1.C1=CC=C2C(O)=CC=CC2=C1 VSWALKINGSNVAR-UHFFFAOYSA-N 0.000 description 2
- DFQICHCWIIJABH-UHFFFAOYSA-N naphthalene-2,7-diol Chemical compound C1=CC(O)=CC2=CC(O)=CC=C21 DFQICHCWIIJABH-UHFFFAOYSA-N 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 239000003444 phase transfer catalyst Substances 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 150000003018 phosphorus compounds Chemical class 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 235000013824 polyphenols Nutrition 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 238000006798 ring closing metathesis reaction Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- KGSFMPRFQVLGTJ-UHFFFAOYSA-N 1,1,2-triphenylethylbenzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(C=1C=CC=CC=1)CC1=CC=CC=C1 KGSFMPRFQVLGTJ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- UIFVCPMLQXKEEU-UHFFFAOYSA-N 2,3-dimethylbenzaldehyde Chemical compound CC1=CC=CC(C=O)=C1C UIFVCPMLQXKEEU-UHFFFAOYSA-N 0.000 description 1
- VVHFXJOCUKBZFS-UHFFFAOYSA-N 2-(chloromethyl)-2-methyloxirane Chemical compound ClCC1(C)CO1 VVHFXJOCUKBZFS-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical class [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- ZPSJGADGUYYRKE-UHFFFAOYSA-N 2H-pyran-2-one Chemical compound O=C1C=CC=CO1 ZPSJGADGUYYRKE-UHFFFAOYSA-N 0.000 description 1
- YWFGCYQKXLSDKT-UHFFFAOYSA-N 3-(2,3-diethylphenyl)pentan-3-ylazanium;chloride Chemical compound [Cl-].CCC1=CC=CC(C([NH3+])(CC)CC)=C1CC YWFGCYQKXLSDKT-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- XPTSZFDOQUGZTP-UHFFFAOYSA-N 7-methylnaphthalene-1,6-diol Chemical compound C1=CC=C2C=C(O)C(C)=CC2=C1O XPTSZFDOQUGZTP-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
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- C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
- C07D407/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing three or more hetero rings
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- C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D311/78—Ring systems having three or more relevant rings
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
- C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D311/78—Ring systems having three or more relevant rings
- C07D311/80—Dibenzopyrans; Hydrogenated dibenzopyrans
- C07D311/82—Xanthenes
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
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Abstract
Description
この反応条件としては、上記の2段階逐次反応が進行し、所望の骨格が生成する条件であればよい。具体的には、前記ジヒドロキシベンゼン又は前記ジヒドロキシナフタレンと、前記カルボニル基含有化合物との反応比率は、前者1モルに対し後者が0.1〜3.0モルとなる範囲であり、反応温度は50〜200℃の範囲である。
ここで、フェノールアラルキル樹脂、ナフトールアラルキル樹脂、ビフェニル変性フェノールアラルキル樹脂とは、例えば、下記一般式(5)又は一般式(6)で表されるものが挙げられる。
撹拌装置と加熱装置が付いた1リットル四つ口フラスコに、トリメチルハイドロキノン152g(1.0モル)をトルエン500gとエチレングリコールモノエチルエーテル200gの混合溶媒に溶解した。その溶液にパラトルエンスルホン酸4.6gを加え、41%ホルマリン44g(0.6モル)を発熱に注意しながら滴下して、水分を留去しながら100〜120℃で15時間撹拌した。次いで、冷却して析出結晶を濾別し、中性になるまで繰り返し水で洗浄した後に、乾燥して下記の多価ヒドロキシ化合物、132g(GPC純度:98%)を得た。図1のNMRスペクトル(13C)と図2のIRスペクトル(KBr)と図3のマススペクトルから構造を同定した。
温度計、滴下ロート、冷却管、攪拌機を取り付けたフラスコに窒素ガスパージを施しながら、実施例1で得られた多価ヒドロキシ化合物、149g(水酸基1.0当量)、エピクロルヒドリン463g(5.0モル)、n−ブタノール53g、テトラエチルベンジルアンモニウムクロライド2.3gを仕込み溶解させた。65℃に昇温した後に、共沸する圧力までに減圧して、49%水酸化ナトリウム水溶液82g(1.0モル)を5時間かけて滴下した、次いで同条件下で0.5時間攪拌を続けた。この間、共沸で留出してきた留出分をディーンスタークトラップで分離して、水層を除去し、油層を反応系内に戻しながら反応した。その後、未反応のエピクロルヒドリンを減圧蒸留して留去させた。それで得られた粗エポキシ樹脂にメチルイソブチルケトン550gとn−ブタノール55gとを加え溶解した。さらにこの溶液に10%水酸化ナトリウム水溶液15gを添加して80℃で2時間反応させた後に洗浄液のPHが中性となるまで水100gで水洗を3回繰り返した。次いで共沸によって系内を脱水し、精密濾過を経た後に、溶媒を減圧下で留去して目的の下記構造式で表わされるエポキシ樹脂(A)188gを得た。得られたエポキシ樹脂のエポキシ当量は227g/eq.であった。また、図4のNMRスペクトル(13C)、と図5のIRスペクトル(KBr)、と図6のマススペクトルから構造を同定した。さらに、GPC分析より平均繰り返し単位数pは0.1であることを確認した。
ホルマリンをベンズアルデヒド64g(0.6モル)に変更した以外は、実施例1と同様にして、下記に示される目的の多価ヒドロキシ化合物175g(GPC純度:99%)を得た。図7のNMRスペクトル(13C)と図8のIRスペクトル(KBr)と図9のマススペクトルから構造を同定した。
実施例1で得られた多価フェノール化合物の代わりに、実施例3で得られた多価フェノール化合物187g(水酸基当量1.0g/eq.)に代えた以外は、実施例2と同様にして、目的の下記構造式で表わされるエポキシ樹脂(B)220gを得た。得られたエポキシ樹脂のエポキシ当量は262g/eq.であった。また、図10のNMRスペクトル(13C)、と図11のIRスペクトル(KBr)、と図12のマススペクトルから構造を同定した。さらに、GPCチャートから下記構造式の繰り返し単位数pは0.1であることを確認した。
ホルマリンをビフェニルアルデヒド197g(1.2モル)に変更した以外は実施例1と同様にして、目的の下記構造式で表わされる多価フェノール化合物448g(GPC純度:99%)を得た。この化合物の水酸基当量は225g/eq.(アセチル化法)であり、GPCによる純度は99%であった。
実施例1で得られた多価フェノール化合物の代わりに、実施例5で得られた多価フェノール化合物225g(水酸基当量1.0g/eq.)に代えた以外は、実施例2と同様にして、目的の下記構造式で表わされるエポキシ樹脂(C)247gを得た。得られたエポキシ樹脂のエポキシ当量は303g/eq.であり、マススペクトルのM+=562であることから下記構造式であることを確認した。また、GPCから下記構造式の繰り返し単位数pは0.1であることを確認した。
2,7ジヒドロキシナフタレン320g(2.0モル)及びホルマリンをビフェニルアルデヒド236g(1.2モル)に変更した以外は実施例1と同様にして、目的の下記構造式で表わされる多価フェノール化合物276g(GPC純度:99%)を得た。この化合物の水酸基当量は157g/eq.(アセチル化法)であり、GPCによる純度は99%であった。
実施例1で得られた多価フェノール化合物の代わりに、実施例7で得られた多価フェノール化合物157g(水酸基当量1.0g/eq.)に代えた以外は、実施例2と同様にして、目的の下記構造式で表わされるエポキシ樹脂(D)190gを得た。得られたエポキシ樹脂のエポキシ当量は230g/eq.であり、マススペクトルのM+=426であり、下記構造式のエポキシ樹脂であることを確認した。また、GPCから繰り返し単位数pは0.1であることを確認した。
ホルマリンを4−メチルベンズアルデヒド162g(1.2モル)に変更した以外は実施例1と同様にして、下記構造式で表わされる多価フェノール化合物388g(GPC純度:99%)、を得た。この化合物の水酸基当量は194g/eq.(アセチル化法)であり、GPCによる純度は99%であった。
実施例1で得られた多価フェノール化合物の代わりに、実施例9で得られた多価フェノール化合物194g(水酸基当量1.0g/eq.)に代えた以外は、実施例2と同様にして、目的の下記構造式で表わされるエポキシ樹脂(E)225gを得た。得られたエポキシ樹脂のエポキシ当量は273g/eq.であり、マススペクトルのM+=500であることから下記構造式のエポキシ樹脂であることを確認した。また、GPCから繰り返し単位数pは0.1であることを確認した。
ホルマリンを3,4−ジメチルベンズアルデヒド179g(1.2モル)に変更した以外は実施例1と同様にして、目的の下記構造式で表わされる多価フェノール化合物399g(GPC純度:99%)を得た。この化合物の水酸基当量は201g/eq.(アセチル化法)であり、GPCによる純度は99%であった。
実施例1で得られた多価フェノール化合物の代わりに、実施例11で得られた多価フェノール化合物201g(水酸基当量1.0g/eq.)に代えた以外は、実施例2と同様にして、下記構造式で表わされるエポキシ樹脂(F)230gを得た。得られたエポキシ樹脂のエポキシ当量は277g/eq.であり、マススペクトルのM+=514であることから下記構造式で表されるエポキシ樹脂であることを確認した。また、GPCから繰り返し単位数pは0.1であることを確認した。
ホルマリンを2,3−ジメチルベンズアルデヒド179g(1.2モル)に変更した以外は実施例1と同様にして、下記構造式で表わされる多価フェノール化合物、398g(GPC純度:99%)、を得た。この化合物の水酸基当量は201g/eq.(アセチル化法)、であり、GPCによる純度は99%であった。
実施例1で得られた多価フェノール化合物の代わりに、実施例13で得られた多価フェノール化合物201g(水酸基当量1.0g/eq.)に代えた以外は、実施例2と同様にして、下記構造式で表わされるエポキシ樹脂(G)229gを得た。得られたエポキシ樹脂のエポキシ当量は276g/eq.であり、マススペクトルのM+=514であることから下記構造式で表されるエポキシ樹脂あることを確認した。また、GPCから繰り返し数pは0.1であることを確認した。
上記エポキシ樹脂樹脂(A)〜(C)、比較用のエポキシ樹脂としてBPA型エポキシ樹脂(EPICLON 850S:大日本インキ化学工業(株)製)、クレゾールノボラック型エポキシ樹脂(EPICLON N−665−EXP−S:大日本インキ化学工業(株))、ジシクロペンタジエン−フェノール重付加物型エポキシ樹脂(EPICLON HP−7200:大日本インキ化学工業(株)製;エポキシ当量263g/eq、軟化点65℃、150℃の溶融粘度0.8ポイズ)を用い、硬化剤としてフェノールアラルキル樹脂(ミレックス XLC−LL:三井化学(株)、製)、硬化促進剤としてトリフェニルフォスフィン(TPP)、無機充填材として球状シリカを用いて、第1表に示した組成で配合し、2本ロールを用いて100℃の温度で10分間溶融混練して目的の組成物を得た。尚、表中の組成は質量基準の配合比を示すものである。
Claims (5)
- 請求項1に記載のエポキシ樹脂と硬化剤とを含有することを特徴とするエポキシ樹脂組成物。
- 前記エポキシ樹脂及び硬化剤に加え、無機充填材を組成物中65〜95質量%となる割合で含有するものである請求項3に記載の組成物。
- 請求項3又は4に記載の組成物を熱硬化してなることを特徴とする硬化物。
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Cited By (1)
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US10886119B2 (en) * | 2018-08-17 | 2021-01-05 | Rohm And Haas Electronic Materials Llc | Aromatic underlayer |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02189326A (ja) * | 1989-01-18 | 1990-07-25 | Mitsubishi Petrochem Co Ltd | 電子部品封止用エポキシ樹脂組成物 |
JPH02258830A (ja) * | 1989-03-31 | 1990-10-19 | Yuka Shell Epoxy Kk | 半導体封止用エポキシ樹脂組成物 |
JPH0337221A (ja) * | 1989-07-04 | 1991-02-18 | Yuka Shell Epoxy Kk | 半導体封止用エポキシ樹脂組成物 |
JPH04217675A (ja) * | 1990-10-30 | 1992-08-07 | Dainippon Ink & Chem Inc | エポキシ樹脂、その製造方法及びエポキシ樹脂組成物 |
JPH04337316A (ja) * | 1991-05-15 | 1992-11-25 | Mitsui Toatsu Chem Inc | エポキシ樹脂組成物 |
JPH06135871A (ja) * | 1992-10-26 | 1994-05-17 | Hitachi Chem Co Ltd | ビス(ヒドロキシナフチル)メタン化合物の製造方法 |
JPH08176274A (ja) * | 1994-12-26 | 1996-07-09 | Hitachi Chem Co Ltd | 熱硬化性樹脂組成物 |
JP2000336248A (ja) * | 1999-05-27 | 2000-12-05 | Dainippon Ink & Chem Inc | エポキシ樹脂組成物および電気積層板 |
JP2001042525A (ja) * | 1999-07-30 | 2001-02-16 | Dainippon Ink & Chem Inc | アルカリ現像型感光性樹脂組成物 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5550244A (en) * | 1978-10-05 | 1980-04-11 | Fuji Photo Film Co Ltd | Color photographic material |
JPH01283280A (ja) * | 1988-05-06 | 1989-11-14 | Asahi Denka Kogyo Kk | 新規エポキシ化合物及びその製造方法 |
US5780571A (en) * | 1993-03-22 | 1998-07-14 | Nippon Kayaku Kabushiki Kaisha | Naphthalene ring-containing resins, resin compositions and cured products thereof |
JPH11140277A (ja) | 1997-11-10 | 1999-05-25 | Sumitomo Bakelite Co Ltd | エポキシ樹脂組成物及びこれを用いた半導体装置 |
JP2000038517A (ja) * | 1998-05-21 | 2000-02-08 | Yoshitomi Fine Chemical Kk | キサンテン―2,7―ジオ―ル化合物を含有する有機高分子材料 |
-
2002
- 2002-07-09 DE DE60214093T patent/DE60214093T2/de not_active Expired - Lifetime
- 2002-07-09 EP EP02014977A patent/EP1275673B1/en not_active Expired - Fee Related
- 2002-07-09 US US10/190,491 patent/US6784228B2/en not_active Expired - Fee Related
-
2008
- 2008-07-18 JP JP2008187177A patent/JP5262389B2/ja not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02189326A (ja) * | 1989-01-18 | 1990-07-25 | Mitsubishi Petrochem Co Ltd | 電子部品封止用エポキシ樹脂組成物 |
JPH02258830A (ja) * | 1989-03-31 | 1990-10-19 | Yuka Shell Epoxy Kk | 半導体封止用エポキシ樹脂組成物 |
JPH0337221A (ja) * | 1989-07-04 | 1991-02-18 | Yuka Shell Epoxy Kk | 半導体封止用エポキシ樹脂組成物 |
JPH04217675A (ja) * | 1990-10-30 | 1992-08-07 | Dainippon Ink & Chem Inc | エポキシ樹脂、その製造方法及びエポキシ樹脂組成物 |
JPH04337316A (ja) * | 1991-05-15 | 1992-11-25 | Mitsui Toatsu Chem Inc | エポキシ樹脂組成物 |
JPH06135871A (ja) * | 1992-10-26 | 1994-05-17 | Hitachi Chem Co Ltd | ビス(ヒドロキシナフチル)メタン化合物の製造方法 |
JPH08176274A (ja) * | 1994-12-26 | 1996-07-09 | Hitachi Chem Co Ltd | 熱硬化性樹脂組成物 |
JP2000336248A (ja) * | 1999-05-27 | 2000-12-05 | Dainippon Ink & Chem Inc | エポキシ樹脂組成物および電気積層板 |
JP2001042525A (ja) * | 1999-07-30 | 2001-02-16 | Dainippon Ink & Chem Inc | アルカリ現像型感光性樹脂組成物 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014208131A1 (ja) * | 2013-06-26 | 2014-12-31 | Dic株式会社 | エポキシ化合物、エポキシ樹脂、硬化性組成物、その硬化物、半導体封止材料、及びプリント配線基板 |
JP5679248B1 (ja) * | 2013-06-26 | 2015-03-04 | Dic株式会社 | エポキシ化合物、エポキシ樹脂、硬化性組成物、その硬化物、半導体封止材料、及びプリント配線基板 |
KR20160026847A (ko) * | 2013-06-26 | 2016-03-09 | 디아이씨 가부시끼가이샤 | 에폭시 화합물, 에폭시 수지, 경화성 조성물, 그 경화물, 반도체 봉지 재료, 및 프린트 배선 기판 |
KR102145814B1 (ko) | 2013-06-26 | 2020-08-19 | 디아이씨 가부시끼가이샤 | 에폭시 화합물, 에폭시 수지, 경화성 조성물, 그 경화물, 반도체 봉지 재료, 및 프린트 배선 기판 |
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