JP2008153498A5 - - Google Patents

Download PDF

Info

Publication number
JP2008153498A5
JP2008153498A5 JP2006341108A JP2006341108A JP2008153498A5 JP 2008153498 A5 JP2008153498 A5 JP 2008153498A5 JP 2006341108 A JP2006341108 A JP 2006341108A JP 2006341108 A JP2006341108 A JP 2006341108A JP 2008153498 A5 JP2008153498 A5 JP 2008153498A5
Authority
JP
Japan
Prior art keywords
shielding plate
substrate
light
exposure apparatus
light shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006341108A
Other languages
English (en)
Japanese (ja)
Other versions
JP4838698B2 (ja
JP2008153498A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006341108A priority Critical patent/JP4838698B2/ja
Priority claimed from JP2006341108A external-priority patent/JP4838698B2/ja
Priority to US11/956,204 priority patent/US7477357B2/en
Priority to TW096148076A priority patent/TWI388939B/zh
Priority to KR1020070132921A priority patent/KR100929268B1/ko
Publication of JP2008153498A publication Critical patent/JP2008153498A/ja
Publication of JP2008153498A5 publication Critical patent/JP2008153498A5/ja
Application granted granted Critical
Publication of JP4838698B2 publication Critical patent/JP4838698B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006341108A 2006-12-19 2006-12-19 露光装置およびデバイス製造方法 Expired - Fee Related JP4838698B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006341108A JP4838698B2 (ja) 2006-12-19 2006-12-19 露光装置およびデバイス製造方法
US11/956,204 US7477357B2 (en) 2006-12-19 2007-12-13 Exposure apparatus and device manufacturing method
TW096148076A TWI388939B (zh) 2006-12-19 2007-12-14 曝光設備及裝置製造方法
KR1020070132921A KR100929268B1 (ko) 2006-12-19 2007-12-18 노광장치 및 디바이스 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006341108A JP4838698B2 (ja) 2006-12-19 2006-12-19 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008153498A JP2008153498A (ja) 2008-07-03
JP2008153498A5 true JP2008153498A5 (enExample) 2009-01-22
JP4838698B2 JP4838698B2 (ja) 2011-12-14

Family

ID=39526728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006341108A Expired - Fee Related JP4838698B2 (ja) 2006-12-19 2006-12-19 露光装置およびデバイス製造方法

Country Status (4)

Country Link
US (1) US7477357B2 (enExample)
JP (1) JP4838698B2 (enExample)
KR (1) KR100929268B1 (enExample)
TW (1) TWI388939B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5272584B2 (ja) * 2008-08-29 2013-08-28 株式会社ニコン 遮光ユニット、可変スリット装置、及び露光装置
JP5204725B2 (ja) * 2009-06-09 2013-06-05 Ｋｂセーレン株式会社 ポリウレタン極細繊維の製造方法
JP5127875B2 (ja) 2010-04-28 2013-01-23 キヤノン株式会社 リソグラフィ装置及び物品の製造方法
JP6243616B2 (ja) * 2013-03-26 2017-12-06 キヤノン株式会社 露光装置および物品の製造方法
CN116193090B (zh) * 2023-03-01 2025-08-01 深圳市和天创科技股份有限公司 一种投影仪自动六角校正装置及校正方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078381A (en) * 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
US5854671A (en) * 1993-05-28 1998-12-29 Nikon Corporation Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure
US6013401A (en) * 1997-03-31 2000-01-11 Svg Lithography Systems, Inc. Method of controlling illumination field to reduce line width variation
US5966202A (en) * 1997-03-31 1999-10-12 Svg Lithography Systems, Inc. Adjustable slit
AU4057999A (en) * 1998-06-02 1999-12-20 Nikon Corporation Scanning aligner, method of manufacture thereof, and method of manufacturing device
JP2000114164A (ja) * 1998-10-09 2000-04-21 Canon Inc 走査型投影露光装置及びそれを用いたデバイスの製造方法
JP3056206B1 (ja) * 1999-03-18 2000-06-26 広島日本電気株式会社 ダミーパターン形成方法及び半導体製造方法
US6704090B2 (en) * 2000-05-11 2004-03-09 Nikon Corporation Exposure method and exposure apparatus
JP2002033272A (ja) * 2000-05-11 2002-01-31 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP2002110529A (ja) * 2000-10-03 2002-04-12 Nikon Corp 投影露光装置及び該装置を用いたマイクロデバイス製造方法
JP2002184676A (ja) * 2000-12-18 2002-06-28 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2004063988A (ja) * 2002-07-31 2004-02-26 Canon Inc 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4631707B2 (ja) * 2003-11-13 2011-02-16 株式会社ニコン 照明装置、露光装置、露光方法及びデバイスの製造方法
JP4581639B2 (ja) 2003-11-13 2010-11-17 株式会社ニコン 可変スリット装置、照明装置、露光装置、及びデバイスの製造方法
KR20060059491A (ko) * 2004-11-29 2006-06-02 삼성전자주식회사 레티클 마스킹 블레이드 및 이를 포함하는 반도체 소자제조용 노광 장치

Similar Documents

Publication Publication Date Title
CN1267788C (zh) 曝光装置检查用掩模、曝光装置检查方法和曝光装置
CN1251028C (zh) 照明装置及应用该照明装置的曝光装置和器件制造方法
JP2011233781A5 (enExample)
JP2004363590A5 (enExample)
JP2016134444A5 (enExample)
JP2010062281A5 (enExample)
EP3276413A1 (en) Mask plate, mask exposure device and mask exposure method
JP2010021443A5 (enExample)
JP2004526993A5 (enExample)
JP2005311187A5 (enExample)
KR20150033730A (ko) 디지털 스테레오 이미지 인쇄를 위한 가동 가압 및 차광 메커니즘 및 이를 위한 방법
JP2008147314A5 (enExample)
JP2007329435A5 (enExample)
JP2010204588A5 (enExample)
JP2005012169A5 (enExample)
JP2017156640A (ja) シャッタユニット、リソグラフィ装置、インプリント装置、及び物品の製造方法
CN102854754B (zh) 曝光方法及其装置
JP2008513995A5 (enExample)
JP2009164355A5 (enExample)
JP2005191495A5 (enExample)
JP2014192255A5 (enExample)
WO2019061556A1 (zh) 一种显示器的基板的制造方法及光罩
JP2009117556A5 (enExample)
JP2007273749A5 (enExample)
JP2005085991A5 (enExample)