JP2005085991A5 - - Google Patents

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Publication number
JP2005085991A5
JP2005085991A5 JP2003316726A JP2003316726A JP2005085991A5 JP 2005085991 A5 JP2005085991 A5 JP 2005085991A5 JP 2003316726 A JP2003316726 A JP 2003316726A JP 2003316726 A JP2003316726 A JP 2003316726A JP 2005085991 A5 JP2005085991 A5 JP 2005085991A5
Authority
JP
Japan
Prior art keywords
optical system
exposure apparatus
detection
projection optical
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003316726A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005085991A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003316726A priority Critical patent/JP2005085991A/ja
Priority claimed from JP2003316726A external-priority patent/JP2005085991A/ja
Priority to EP04021381A priority patent/EP1515190A3/en
Priority to US10/938,356 priority patent/US20050052633A1/en
Publication of JP2005085991A publication Critical patent/JP2005085991A/ja
Publication of JP2005085991A5 publication Critical patent/JP2005085991A5/ja
Priority to US12/140,628 priority patent/US7626680B2/en
Pending legal-status Critical Current

Links

JP2003316726A 2003-09-09 2003-09-09 露光装置及び該装置を用いたデバイス製造方法 Pending JP2005085991A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003316726A JP2005085991A (ja) 2003-09-09 2003-09-09 露光装置及び該装置を用いたデバイス製造方法
EP04021381A EP1515190A3 (en) 2003-09-09 2004-09-08 Exposure apparatus and device fabrication method using the same
US10/938,356 US20050052633A1 (en) 2003-09-09 2004-09-09 Exposure apparatus and device fabrication method using the same
US12/140,628 US7626680B2 (en) 2003-09-09 2008-06-17 Exposure apparatus and device fabrication method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003316726A JP2005085991A (ja) 2003-09-09 2003-09-09 露光装置及び該装置を用いたデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2005085991A JP2005085991A (ja) 2005-03-31
JP2005085991A5 true JP2005085991A5 (enExample) 2006-10-26

Family

ID=34131957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003316726A Pending JP2005085991A (ja) 2003-09-09 2003-09-09 露光装置及び該装置を用いたデバイス製造方法

Country Status (3)

Country Link
US (2) US20050052633A1 (enExample)
EP (1) EP1515190A3 (enExample)
JP (1) JP2005085991A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060024711A1 (en) * 2004-07-02 2006-02-02 Helicos Biosciences Corporation Methods for nucleic acid amplification and sequence determination
US7433017B2 (en) * 2004-12-22 2008-10-07 Nikon Corporation Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method
JP4724470B2 (ja) * 2005-06-02 2011-07-13 キヤノン株式会社 露光方法
JPWO2007119821A1 (ja) * 2006-04-14 2009-08-27 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
US7969550B2 (en) * 2007-04-19 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2003678A (en) * 2008-12-17 2010-06-21 Asml Holding Nv Euv mask inspection system.
NL2003658A (en) * 2008-12-31 2010-07-01 Asml Holding Nv Euv mask inspection.
JP2014527312A (ja) * 2011-09-16 2014-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィパターニングデバイスを監視する装置
CN114077163B (zh) * 2020-08-14 2023-03-31 长鑫存储技术有限公司 光罩传送装置及曝光系统
US12399440B2 (en) * 2023-06-02 2025-08-26 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and methods

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5424552A (en) * 1991-07-09 1995-06-13 Nikon Corporation Projection exposing apparatus
JPH05291112A (ja) * 1992-04-06 1993-11-05 Nikon Corp フォトマスク平面性維持装置
JP3387075B2 (ja) * 1994-12-12 2003-03-17 株式会社ニコン 走査露光方法、露光装置、及び走査型露光装置
JP3477898B2 (ja) * 1995-03-23 2003-12-10 株式会社ニコン 投影露光装置
JPH09180989A (ja) * 1995-12-26 1997-07-11 Toshiba Corp 露光装置および露光方法
JPH1092717A (ja) * 1996-09-11 1998-04-10 Nikon Corp 走査型露光装置
US6549271B2 (en) * 1997-01-28 2003-04-15 Nikon Corporation Exposure apparatus and method
JPH1145846A (ja) 1997-07-25 1999-02-16 Nikon Corp 走査型露光方法及び装置
JPH10223519A (ja) * 1997-02-04 1998-08-21 Nikon Corp 投影露光装置
DE19860522C1 (de) * 1998-12-29 2000-04-20 Juergen Hoffmann Kalorische Maschine
JP2001351854A (ja) * 1999-10-19 2001-12-21 Nikon Corp パターン転写型荷電粒子線露光装置、パターン転写型荷電粒子線露光方法及び半導体素子の製造方法
WO2002043123A1 (en) * 2000-11-22 2002-05-30 Nikon Corporation Aligner, aligning method and method for fabricating device
JP2002305138A (ja) * 2001-04-05 2002-10-18 Nikon Corp 露光装置および露光方法
JP3762323B2 (ja) * 2002-04-02 2006-04-05 キヤノン株式会社 露光装置

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