JP2005085991A - 露光装置及び該装置を用いたデバイス製造方法 - Google Patents

露光装置及び該装置を用いたデバイス製造方法 Download PDF

Info

Publication number
JP2005085991A
JP2005085991A JP2003316726A JP2003316726A JP2005085991A JP 2005085991 A JP2005085991 A JP 2005085991A JP 2003316726 A JP2003316726 A JP 2003316726A JP 2003316726 A JP2003316726 A JP 2003316726A JP 2005085991 A JP2005085991 A JP 2005085991A
Authority
JP
Japan
Prior art keywords
original
exposure apparatus
optical system
detection
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003316726A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005085991A5 (enExample
Inventor
Tetsuya Mori
鉄也 森
Yuichi Osakabe
祐一 刑部
Tadayasu Nishikawa
忠康 西川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003316726A priority Critical patent/JP2005085991A/ja
Priority to EP04021381A priority patent/EP1515190A3/en
Priority to US10/938,356 priority patent/US20050052633A1/en
Publication of JP2005085991A publication Critical patent/JP2005085991A/ja
Publication of JP2005085991A5 publication Critical patent/JP2005085991A5/ja
Priority to US12/140,628 priority patent/US7626680B2/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Projection-Type Copiers In General (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003316726A 2003-09-09 2003-09-09 露光装置及び該装置を用いたデバイス製造方法 Pending JP2005085991A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003316726A JP2005085991A (ja) 2003-09-09 2003-09-09 露光装置及び該装置を用いたデバイス製造方法
EP04021381A EP1515190A3 (en) 2003-09-09 2004-09-08 Exposure apparatus and device fabrication method using the same
US10/938,356 US20050052633A1 (en) 2003-09-09 2004-09-09 Exposure apparatus and device fabrication method using the same
US12/140,628 US7626680B2 (en) 2003-09-09 2008-06-17 Exposure apparatus and device fabrication method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003316726A JP2005085991A (ja) 2003-09-09 2003-09-09 露光装置及び該装置を用いたデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2005085991A true JP2005085991A (ja) 2005-03-31
JP2005085991A5 JP2005085991A5 (enExample) 2006-10-26

Family

ID=34131957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003316726A Pending JP2005085991A (ja) 2003-09-09 2003-09-09 露光装置及び該装置を用いたデバイス製造方法

Country Status (3)

Country Link
US (2) US20050052633A1 (enExample)
EP (1) EP1515190A3 (enExample)
JP (1) JP2005085991A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006339438A (ja) * 2005-06-02 2006-12-14 Canon Inc 露光方法及び装置
WO2007119821A1 (ja) * 2006-04-14 2007-10-25 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
JP2014527312A (ja) * 2011-09-16 2014-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィパターニングデバイスを監視する装置

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060024711A1 (en) * 2004-07-02 2006-02-02 Helicos Biosciences Corporation Methods for nucleic acid amplification and sequence determination
TWI484302B (zh) * 2004-12-22 2015-05-11 尼康股份有限公司 光罩表面的高度方向位置測定方法、曝光裝置以及曝光方法
US7969550B2 (en) * 2007-04-19 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2003678A (en) * 2008-12-17 2010-06-21 Asml Holding Nv Euv mask inspection system.
NL2003658A (en) * 2008-12-31 2010-07-01 Asml Holding Nv Euv mask inspection.
CN114077163B (zh) * 2020-08-14 2023-03-31 长鑫存储技术有限公司 光罩传送装置及曝光系统
US12399440B2 (en) * 2023-06-02 2025-08-26 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and methods

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05291112A (ja) * 1992-04-06 1993-11-05 Nikon Corp フォトマスク平面性維持装置
JPH08264428A (ja) * 1995-03-23 1996-10-11 Nikon Corp 投影露光装置
JPH09180989A (ja) * 1995-12-26 1997-07-11 Toshiba Corp 露光装置および露光方法
JPH1092717A (ja) * 1996-09-11 1998-04-10 Nikon Corp 走査型露光装置
JPH10223519A (ja) * 1997-02-04 1998-08-21 Nikon Corp 投影露光装置
JP2001351854A (ja) * 1999-10-19 2001-12-21 Nikon Corp パターン転写型荷電粒子線露光装置、パターン転写型荷電粒子線露光方法及び半導体素子の製造方法
JP2002305138A (ja) * 2001-04-05 2002-10-18 Nikon Corp 露光装置および露光方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5424552A (en) * 1991-07-09 1995-06-13 Nikon Corporation Projection exposing apparatus
JP3387075B2 (ja) * 1994-12-12 2003-03-17 株式会社ニコン 走査露光方法、露光装置、及び走査型露光装置
JPH1145846A (ja) 1997-07-25 1999-02-16 Nikon Corp 走査型露光方法及び装置
US6549271B2 (en) * 1997-01-28 2003-04-15 Nikon Corporation Exposure apparatus and method
DE19860522C1 (de) * 1998-12-29 2000-04-20 Juergen Hoffmann Kalorische Maschine
JPWO2002043123A1 (ja) * 2000-11-22 2004-04-02 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
JP3762323B2 (ja) * 2002-04-02 2006-04-05 キヤノン株式会社 露光装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05291112A (ja) * 1992-04-06 1993-11-05 Nikon Corp フォトマスク平面性維持装置
JPH08264428A (ja) * 1995-03-23 1996-10-11 Nikon Corp 投影露光装置
JPH09180989A (ja) * 1995-12-26 1997-07-11 Toshiba Corp 露光装置および露光方法
JPH1092717A (ja) * 1996-09-11 1998-04-10 Nikon Corp 走査型露光装置
JPH10223519A (ja) * 1997-02-04 1998-08-21 Nikon Corp 投影露光装置
JP2001351854A (ja) * 1999-10-19 2001-12-21 Nikon Corp パターン転写型荷電粒子線露光装置、パターン転写型荷電粒子線露光方法及び半導体素子の製造方法
JP2002305138A (ja) * 2001-04-05 2002-10-18 Nikon Corp 露光装置および露光方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006339438A (ja) * 2005-06-02 2006-12-14 Canon Inc 露光方法及び装置
US7498596B2 (en) 2005-06-02 2009-03-03 Canon Kabushiki Kaisha Exposure method that obtains, prior to exposure, reticle surface form data and measurement position error, for scanning control
WO2007119821A1 (ja) * 2006-04-14 2007-10-25 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
JP2014527312A (ja) * 2011-09-16 2014-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィパターニングデバイスを監視する装置

Also Published As

Publication number Publication date
EP1515190A3 (en) 2009-03-25
US20080252869A1 (en) 2008-10-16
US7626680B2 (en) 2009-12-01
US20050052633A1 (en) 2005-03-10
EP1515190A2 (en) 2005-03-16

Similar Documents

Publication Publication Date Title
US7965387B2 (en) Image plane measurement method, exposure method, device manufacturing method, and exposure apparatus
JP5387169B2 (ja) 遮光ユニット、可変スリット装置、及び露光装置
US7626680B2 (en) Exposure apparatus and device fabrication method using the same
JP2005175034A (ja) 露光装置
KR20020075432A (ko) 파면수차 측정장치, 파면수차 측정방법, 노광장치 및마이크로 디바이스의 제조방법
KR20010085449A (ko) 광학 결상 시스템에서의 광행차 측정 방법
JP2008171960A (ja) 位置検出装置及び露光装置
US20080068595A1 (en) Measurement Method, Exposure Method, and Device Manufacturing Method
JP2005175400A (ja) 露光装置
JP2002198303A (ja) 露光装置、光学特性計測方法、及びデバイス製造方法
JP4692862B2 (ja) 検査装置、該検査装置を備えた露光装置、およびマイクロデバイスの製造方法
JP3762323B2 (ja) 露光装置
US20120206701A1 (en) Aberration measurement method, exposure apparatus, and device manufacturing method
JP2002231616A (ja) 位置計測装置及び方法、露光装置及び方法、並びにデバイス製造方法
US7295326B2 (en) Apparatus and method for measuring the optical performance of an optical element
KR101019389B1 (ko) 노광 장치
JP4078683B2 (ja) 投影露光装置及び投影露光方法並びに走査露光方法
JPWO2002047132A1 (ja) Ｘ線投影露光装置およびｘ線投影露光方法および半導体デバイス
JP2002246302A (ja) 位置検出装置および露光装置
JP4817700B2 (ja) 露光装置及び方法、並びに、デバイス製造方法
JPH11233424A (ja) 投影光学装置、収差測定方法、及び投影方法、並びにデバイス製造方法
JP6729663B2 (ja) 露光方法及び露光装置
JP2005209926A (ja) マーク検出方法とその装置、露光方法とその装置、及び、デバイス製造方法
JP2007173533A (ja) 露光装置、露光方法及びデバイス製造方法
JPH08298238A (ja) 投影露光装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060905

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060905

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090219

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090224

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090424

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090721

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090918

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091215

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20100506