JPH1027738A5 - - Google Patents

Info

Publication number
JPH1027738A5
JPH1027738A5 JP1996179083A JP17908396A JPH1027738A5 JP H1027738 A5 JPH1027738 A5 JP H1027738A5 JP 1996179083 A JP1996179083 A JP 1996179083A JP 17908396 A JP17908396 A JP 17908396A JP H1027738 A5 JPH1027738 A5 JP H1027738A5
Authority
JP
Japan
Prior art keywords
alignment marks
reference plate
movable stage
coordinate system
detecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996179083A
Other languages
English (en)
Japanese (ja)
Other versions
JP3658091B2 (ja
JPH1027738A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP17908396A external-priority patent/JP3658091B2/ja
Priority to JP17908396A priority Critical patent/JP3658091B2/ja
Priority to US08/684,100 priority patent/US5751404A/en
Priority to DE69627584T priority patent/DE69627584T2/de
Priority to EP01201189A priority patent/EP1115032B1/en
Priority to EP96305399A priority patent/EP0756206B1/en
Priority to DE1996631260 priority patent/DE69631260T2/de
Priority to KR1019960029915A priority patent/KR100211011B1/ko
Publication of JPH1027738A publication Critical patent/JPH1027738A/ja
Publication of JPH1027738A5 publication Critical patent/JPH1027738A5/ja
Publication of JP3658091B2 publication Critical patent/JP3658091B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP17908396A 1995-07-24 1996-07-09 走査型露光方法および該方法を用いたデバイス製造方法 Expired - Fee Related JP3658091B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP17908396A JP3658091B2 (ja) 1996-07-09 1996-07-09 走査型露光方法および該方法を用いたデバイス製造方法
US08/684,100 US5751404A (en) 1995-07-24 1996-07-22 Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
EP96305399A EP0756206B1 (en) 1995-07-24 1996-07-23 Scanning exposure apparatus and exposure method using the same
EP01201189A EP1115032B1 (en) 1995-07-24 1996-07-23 Scanning exposure apparatus, exposure method using the same, and device manufacturing method
DE69627584T DE69627584T2 (de) 1995-07-24 1996-07-23 Abtastbelichtungsapparat und Belichtungsverfahren unter Verwendung desselben
DE1996631260 DE69631260T2 (de) 1995-07-24 1996-07-23 Abtastbelichtungsapparat, Belichtungsverfahren unter Verwendung desselben und Verfahren zur Herstellung der Vorrichtung
KR1019960029915A KR100211011B1 (ko) 1995-07-24 1996-07-24 주사노광장치 및 이것을 사용한 노광방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17908396A JP3658091B2 (ja) 1996-07-09 1996-07-09 走査型露光方法および該方法を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JPH1027738A JPH1027738A (ja) 1998-01-27
JPH1027738A5 true JPH1027738A5 (enExample) 2004-07-15
JP3658091B2 JP3658091B2 (ja) 2005-06-08

Family

ID=16059794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17908396A Expired - Fee Related JP3658091B2 (ja) 1995-07-24 1996-07-09 走査型露光方法および該方法を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP3658091B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6628372B2 (en) * 2001-02-16 2003-09-30 Mccullough Andrew W. Use of multiple reticles in lithographic printing tools
JP4054666B2 (ja) 2002-12-05 2008-02-27 キヤノン株式会社 露光装置
JP4726232B2 (ja) * 2006-10-31 2011-07-20 キヤノン株式会社 露光方法、露光装置及びデバイスの製造方法
CN113359399B (zh) * 2020-03-05 2023-02-10 上海微电子装备（集团）股份有限公司 一种曝光方法及曝光系统

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