JP3658091B2 - 走査型露光方法および該方法を用いたデバイス製造方法 - Google Patents

走査型露光方法および該方法を用いたデバイス製造方法 Download PDF

Info

Publication number
JP3658091B2
JP3658091B2 JP17908396A JP17908396A JP3658091B2 JP 3658091 B2 JP3658091 B2 JP 3658091B2 JP 17908396 A JP17908396 A JP 17908396A JP 17908396 A JP17908396 A JP 17908396A JP 3658091 B2 JP3658091 B2 JP 3658091B2
Authority
JP
Japan
Prior art keywords
alignment marks
reference plate
coordinate system
movable stage
detecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17908396A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1027738A5 (enExample
JPH1027738A (ja
Inventor
文夫 坂井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP17908396A priority Critical patent/JP3658091B2/ja
Priority to US08/684,100 priority patent/US5751404A/en
Priority to DE69627584T priority patent/DE69627584T2/de
Priority to EP96305399A priority patent/EP0756206B1/en
Priority to EP01201189A priority patent/EP1115032B1/en
Priority to DE1996631260 priority patent/DE69631260T2/de
Priority to KR1019960029915A priority patent/KR100211011B1/ko
Publication of JPH1027738A publication Critical patent/JPH1027738A/ja
Publication of JPH1027738A5 publication Critical patent/JPH1027738A5/ja
Application granted granted Critical
Publication of JP3658091B2 publication Critical patent/JP3658091B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP17908396A 1995-07-24 1996-07-09 走査型露光方法および該方法を用いたデバイス製造方法 Expired - Fee Related JP3658091B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP17908396A JP3658091B2 (ja) 1996-07-09 1996-07-09 走査型露光方法および該方法を用いたデバイス製造方法
US08/684,100 US5751404A (en) 1995-07-24 1996-07-22 Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
EP96305399A EP0756206B1 (en) 1995-07-24 1996-07-23 Scanning exposure apparatus and exposure method using the same
EP01201189A EP1115032B1 (en) 1995-07-24 1996-07-23 Scanning exposure apparatus, exposure method using the same, and device manufacturing method
DE69627584T DE69627584T2 (de) 1995-07-24 1996-07-23 Abtastbelichtungsapparat und Belichtungsverfahren unter Verwendung desselben
DE1996631260 DE69631260T2 (de) 1995-07-24 1996-07-23 Abtastbelichtungsapparat, Belichtungsverfahren unter Verwendung desselben und Verfahren zur Herstellung der Vorrichtung
KR1019960029915A KR100211011B1 (ko) 1995-07-24 1996-07-24 주사노광장치 및 이것을 사용한 노광방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17908396A JP3658091B2 (ja) 1996-07-09 1996-07-09 走査型露光方法および該方法を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JPH1027738A JPH1027738A (ja) 1998-01-27
JPH1027738A5 JPH1027738A5 (enExample) 2004-07-15
JP3658091B2 true JP3658091B2 (ja) 2005-06-08

Family

ID=16059794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17908396A Expired - Fee Related JP3658091B2 (ja) 1995-07-24 1996-07-09 走査型露光方法および該方法を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP3658091B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6628372B2 (en) * 2001-02-16 2003-09-30 Mccullough Andrew W. Use of multiple reticles in lithographic printing tools
JP4054666B2 (ja) 2002-12-05 2008-02-27 キヤノン株式会社 露光装置
JP4726232B2 (ja) * 2006-10-31 2011-07-20 キヤノン株式会社 露光方法、露光装置及びデバイスの製造方法
CN113359399B (zh) * 2020-03-05 2023-02-10 上海微电子装备（集团）股份有限公司 一种曝光方法及曝光系统

Also Published As

Publication number Publication date
JPH1027738A (ja) 1998-01-27

Similar Documents

Publication Publication Date Title
KR100211011B1 (ko) 주사노광장치 및 이것을 사용한 노광방법
JP4029182B2 (ja) 露光方法
US20020037460A1 (en) Stage unit, measurement unit and measurement method, and exposure apparatus and exposure method
JP4434372B2 (ja) 投影露光装置およびデバイス製造方法
JP2018072541A (ja) パターン形成方法、基板の位置決め方法、位置決め装置、パターン形成装置、及び、物品の製造方法
JP3315540B2 (ja) 位置計測装置、位置合わせ装置、露光装置およびデバイスの製造方法
JP3210145B2 (ja) 走査型露光装置及び該装置を用いてデバイスを製造する方法
JP3530692B2 (ja) 走査型露光装置及びそれを用いたデバイスの製造方法
JP3658091B2 (ja) 走査型露光方法および該方法を用いたデバイス製造方法
JP3507205B2 (ja) 走査型露光装置及び該装置を用いてデバイスを製造する方法
JP2000187338A (ja) 露光装置およびデバイス製造方法
JP4196411B2 (ja) 露光装置及びデバイス製造方法
JP3576722B2 (ja) 走査型露光装置及びそれを用いたデバイス製造方法
JP2003059808A (ja) 露光方法及びデバイス製造方法
JP3722330B2 (ja) 露光装置およびデバイス製造方法
JP3530716B2 (ja) 走査投影露光装置
JPH088175A (ja) 位置合せ装置及び位置合せ方法
JP3584121B2 (ja) 走査型投影露光装置
JPH1152545A (ja) レチクルおよびそれによって転写されたパターンならびにレチクルと半導体ウエハとの位置合わせ方法
JP2987899B2 (ja) 位置合わせ方法
JP3441966B2 (ja) 走査型露光装置および方法、デバイス製造方法
JPH11195584A (ja) 走査型露光装置及び走査露光方法、並びにデバイス製造方法
JPH06347215A (ja) 位置検出装置
JPH1079340A (ja) 走査型露光装置および方法
JP2001085316A (ja) 露光装置、デバイス製造方法およびステージ装置

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050201

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20050222

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20050311

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080318

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090318

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100318

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100318

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110318

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120318

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130318

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140318

Year of fee payment: 9

LAPS Cancellation because of no payment of annual fees