JP2007538413A5 - - Google Patents

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Publication number
JP2007538413A5
JP2007538413A5 JP2007527467A JP2007527467A JP2007538413A5 JP 2007538413 A5 JP2007538413 A5 JP 2007538413A5 JP 2007527467 A JP2007527467 A JP 2007527467A JP 2007527467 A JP2007527467 A JP 2007527467A JP 2007538413 A5 JP2007538413 A5 JP 2007538413A5
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JP
Japan
Prior art keywords
process chamber
depositing
coating film
precursor
ion implantation
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JP2007527467A
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English (en)
Japanese (ja)
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JP2007538413A (ja
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Priority claimed from US10/850,222 external-priority patent/US20050260354A1/en
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Publication of JP2007538413A publication Critical patent/JP2007538413A/ja
Publication of JP2007538413A5 publication Critical patent/JP2007538413A5/ja
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JP2007527467A 2004-05-20 2005-05-19 プラズマイオン注入システムのためのインサイチュプロセスチャンバの調整方法 Withdrawn JP2007538413A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/850,222 US20050260354A1 (en) 2004-05-20 2004-05-20 In-situ process chamber preparation methods for plasma ion implantation systems
PCT/US2005/017699 WO2005114692A2 (en) 2004-05-20 2005-05-19 In-situ process chamber preparation methods for plasma ion implantation systems

Publications (2)

Publication Number Publication Date
JP2007538413A JP2007538413A (ja) 2007-12-27
JP2007538413A5 true JP2007538413A5 (https=) 2008-07-03

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JP2007527467A Withdrawn JP2007538413A (ja) 2004-05-20 2005-05-19 プラズマイオン注入システムのためのインサイチュプロセスチャンバの調整方法

Country Status (6)

Country Link
US (1) US20050260354A1 (https=)
JP (1) JP2007538413A (https=)
KR (1) KR20070026608A (https=)
CN (1) CN1977351A (https=)
TW (1) TW200602510A (https=)
WO (1) WO2005114692A2 (https=)

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