JP2007531819A - 流動化した有機材料の気化 - Google Patents
流動化した有機材料の気化 Download PDFInfo
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- JP2007531819A JP2007531819A JP2007505009A JP2007505009A JP2007531819A JP 2007531819 A JP2007531819 A JP 2007531819A JP 2007505009 A JP2007505009 A JP 2007505009A JP 2007505009 A JP2007505009 A JP 2007505009A JP 2007531819 A JP2007531819 A JP 2007531819A
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Classifications
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S427/00—Coating processes
- Y10S427/101—Liquid Source Chemical Depostion, i.e. LSCVD or Aerosol Chemical Vapor Deposition, i.e. ACVD
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Nozzles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/805,980 US7238389B2 (en) | 2004-03-22 | 2004-03-22 | Vaporizing fluidized organic materials |
| PCT/US2005/008545 WO2005093117A2 (en) | 2004-03-22 | 2005-03-14 | Vaporizing fluidized organic materials |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012247297A Division JP5727448B2 (ja) | 2004-03-22 | 2012-11-09 | 流動化した有機材料の気化 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007531819A true JP2007531819A (ja) | 2007-11-08 |
| JP2007531819A5 JP2007531819A5 (enExample) | 2008-05-01 |
Family
ID=34963135
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007505009A Pending JP2007531819A (ja) | 2004-03-22 | 2005-03-14 | 流動化した有機材料の気化 |
| JP2012247297A Expired - Lifetime JP5727448B2 (ja) | 2004-03-22 | 2012-11-09 | 流動化した有機材料の気化 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012247297A Expired - Lifetime JP5727448B2 (ja) | 2004-03-22 | 2012-11-09 | 流動化した有機材料の気化 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7238389B2 (enExample) |
| EP (1) | EP1733066B1 (enExample) |
| JP (2) | JP2007531819A (enExample) |
| KR (1) | KR101146267B1 (enExample) |
| CN (1) | CN1934284B (enExample) |
| TW (1) | TWI360581B (enExample) |
| WO (1) | WO2005093117A2 (enExample) |
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| JP2011521431A (ja) * | 2008-05-19 | 2011-07-21 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 電子デバイスにおける気相コーティングの装置および方法 |
| JP2014520210A (ja) * | 2011-06-22 | 2014-08-21 | アイクストロン、エスイー | Ｏｌｅｄの堆積方法および装置特にそのための蒸発装置 |
| JP2014523486A (ja) * | 2011-06-22 | 2014-09-11 | アイクストロン、エスイー | Ｏｌｅｄの堆積方法および装置 |
| JP2015107489A (ja) * | 2008-11-07 | 2015-06-11 | デュール システムズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 塗装機械部品、具体的にはベルカップ、およびその製造方法 |
| KR20150138008A (ko) * | 2014-05-30 | 2015-12-09 | 히다치 조센 가부시키가이샤 | 진공증착장치 |
| KR101577683B1 (ko) | 2008-01-08 | 2015-12-15 | 글로벌 오엘이디 테크놀러지 엘엘씨 | 정확한 분말계량을 수반한 기화기기 |
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| US8526213B2 (en) | 2010-11-01 | 2013-09-03 | Micron Technology, Inc. | Memory cells, methods of programming memory cells, and methods of forming memory cells |
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- 2005-03-14 CN CN2005800089387A patent/CN1934284B/zh not_active Expired - Lifetime
- 2005-03-14 EP EP05728357.4A patent/EP1733066B1/en not_active Expired - Lifetime
- 2005-03-14 WO PCT/US2005/008545 patent/WO2005093117A2/en not_active Ceased
- 2005-03-14 KR KR1020067019489A patent/KR101146267B1/ko not_active Expired - Lifetime
- 2005-03-14 JP JP2007505009A patent/JP2007531819A/ja active Pending
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| JPH01266801A (ja) * | 1988-01-16 | 1989-10-24 | Philips Gloeilampenfab:Nv | 低揮発性物質の蒸気で富化されたガス流の発生装置 |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101577683B1 (ko) | 2008-01-08 | 2015-12-15 | 글로벌 오엘이디 테크놀러지 엘엘씨 | 정확한 분말계량을 수반한 기화기기 |
| JP2011521431A (ja) * | 2008-05-19 | 2011-07-21 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 電子デバイスにおける気相コーティングの装置および方法 |
| JP2015107489A (ja) * | 2008-11-07 | 2015-06-11 | デュール システムズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 塗装機械部品、具体的にはベルカップ、およびその製造方法 |
| US10471445B2 (en) | 2008-11-07 | 2019-11-12 | Dürr Systems GmbH | Coating machine component including a functional element that is a coating |
| JP2014520210A (ja) * | 2011-06-22 | 2014-08-21 | アイクストロン、エスイー | Ｏｌｅｄの堆積方法および装置特にそのための蒸発装置 |
| JP2014523486A (ja) * | 2011-06-22 | 2014-09-11 | アイクストロン、エスイー | Ｏｌｅｄの堆積方法および装置 |
| KR20150138008A (ko) * | 2014-05-30 | 2015-12-09 | 히다치 조센 가부시키가이샤 | 진공증착장치 |
| JP2016006220A (ja) * | 2014-05-30 | 2016-01-14 | 日立造船株式会社 | 真空蒸着装置 |
| KR102303175B1 (ko) * | 2014-05-30 | 2021-09-15 | 히다치 조센 가부시키가이샤 | 진공증착장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| US7238389B2 (en) | 2007-07-03 |
| TWI360581B (en) | 2012-03-21 |
| US20050208220A1 (en) | 2005-09-22 |
| JP2013057129A (ja) | 2013-03-28 |
| CN1934284A (zh) | 2007-03-21 |
| CN1934284B (zh) | 2010-06-23 |
| JP5727448B2 (ja) | 2015-06-03 |
| EP1733066A2 (en) | 2006-12-20 |
| KR20070004754A (ko) | 2007-01-09 |
| WO2005093117A3 (en) | 2005-12-15 |
| WO2005093117A2 (en) | 2005-10-06 |
| EP1733066B1 (en) | 2016-12-07 |
| TW200604358A (en) | 2006-02-01 |
| KR101146267B1 (ko) | 2012-05-15 |
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