CN1934284B - 蒸发流化的有机物质的方法 - Google Patents

蒸发流化的有机物质的方法 Download PDF

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Publication number
CN1934284B
CN1934284B CN2005800089387A CN200580008938A CN1934284B CN 1934284 B CN1934284 B CN 1934284B CN 2005800089387 A CN2005800089387 A CN 2005800089387A CN 200580008938 A CN200580008938 A CN 200580008938A CN 1934284 B CN1934284 B CN 1934284B
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China
Prior art keywords
organic substance
parts
evaporation
organic
permeable
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Expired - Lifetime
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CN2005800089387A
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English (en)
Chinese (zh)
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CN1934284A (zh
Inventor
M·朗
D·R·斯特里普
J·M·格雷斯
D·R·弗里曼
N·P·雷登
B·E·克佩
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Global OLED Technology LLC
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Global OLED Technology LLC
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Publication of CN1934284A publication Critical patent/CN1934284A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/101—Liquid Source Chemical Depostion, i.e. LSCVD or Aerosol Chemical Vapor Deposition, i.e. ACVD

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Nozzles (AREA)
CN2005800089387A 2004-03-22 2005-03-14 蒸发流化的有机物质的方法 Expired - Lifetime CN1934284B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/805,980 US7238389B2 (en) 2004-03-22 2004-03-22 Vaporizing fluidized organic materials
US10/805,980 2004-03-22
PCT/US2005/008545 WO2005093117A2 (en) 2004-03-22 2005-03-14 Vaporizing fluidized organic materials

Publications (2)

Publication Number Publication Date
CN1934284A CN1934284A (zh) 2007-03-21
CN1934284B true CN1934284B (zh) 2010-06-23

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ID=34963135

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800089387A Expired - Lifetime CN1934284B (zh) 2004-03-22 2005-03-14 蒸发流化的有机物质的方法

Country Status (7)

Country Link
US (1) US7238389B2 (enExample)
EP (1) EP1733066B1 (enExample)
JP (2) JP2007531819A (enExample)
KR (1) KR101146267B1 (enExample)
CN (1) CN1934284B (enExample)
TW (1) TWI360581B (enExample)
WO (1) WO2005093117A2 (enExample)

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DE102006026576A1 (de) * 2006-06-06 2008-01-10 Aixtron Ag Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs
US20080254217A1 (en) * 2007-04-16 2008-10-16 Boroson Michael L Fine control of vaporized organic material
DE102007030499A1 (de) * 2007-06-30 2009-01-08 Aixtron Ag Vorrichtung und Verfahren zum Abscheiden von insbesondere dotierten Schichten mittels OVPD oder dergleichen
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US20090110956A1 (en) * 2007-10-26 2009-04-30 Begley William J Oled device with electron transport material combination
US8076009B2 (en) * 2007-10-26 2011-12-13 Global Oled Technology, Llc. OLED device with fluoranthene electron transport materials
US8420229B2 (en) * 2007-10-26 2013-04-16 Global OLED Technologies LLC OLED device with certain fluoranthene light-emitting dopants
US8431242B2 (en) * 2007-10-26 2013-04-30 Global Oled Technology, Llc. OLED device with certain fluoranthene host
US7883583B2 (en) 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
DE102008011185A1 (de) * 2008-02-27 2009-09-03 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung einer dotierten organischen halbleitenden Schicht
US7947974B2 (en) * 2008-03-25 2011-05-24 Global Oled Technology Llc OLED device with hole-transport and electron-transport materials
TW201011114A (en) * 2008-05-19 2010-03-16 Du Pont Apparatus and method of vapor coating in an electronic device
US7931975B2 (en) * 2008-11-07 2011-04-26 Global Oled Technology Llc Electroluminescent device containing a flouranthene compound
DE102008056411A1 (de) 2008-11-07 2010-05-20 Dürr Systems GmbH Beschichtungsanlagenbauteil, insbesondere Glockenteller, und entsprechendes Herstellungsverfahren
US8088500B2 (en) * 2008-11-12 2012-01-03 Global Oled Technology Llc OLED device with fluoranthene electron injection materials
US7968215B2 (en) 2008-12-09 2011-06-28 Global Oled Technology Llc OLED device with cyclobutene electron injection materials
US8216697B2 (en) * 2009-02-13 2012-07-10 Global Oled Technology Llc OLED with fluoranthene-macrocyclic materials
US8147989B2 (en) * 2009-02-27 2012-04-03 Global Oled Technology Llc OLED device with stabilized green light-emitting layer
US8206842B2 (en) 2009-04-06 2012-06-26 Global Oled Technology Llc Organic element for electroluminescent devices
US20120071001A1 (en) * 2010-09-17 2012-03-22 Elpida Memory, Inc. Vaporizing and feed apparatus and vaporizing and feed method
US8526213B2 (en) 2010-11-01 2013-09-03 Micron Technology, Inc. Memory cells, methods of programming memory cells, and methods of forming memory cells
KR101806916B1 (ko) * 2011-03-17 2017-12-12 한화테크윈 주식회사 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법
DE102011051261A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu
DE102011051260A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs
DE102011051931A1 (de) 2011-07-19 2013-01-24 Aixtron Se Vorrichtung und Verfahren zum Bestimmen des Dampfdrucks eines in einem Trägergasstrom verdampften Ausgangsstoffes
KR20130015144A (ko) * 2011-08-02 2013-02-13 삼성디스플레이 주식회사 증착원어셈블리, 유기층증착장치 및 이를 이용한 유기발광표시장치의 제조 방법
US8969116B2 (en) * 2012-01-23 2015-03-03 Universal Display Corporation Selective OLED vapor deposition using electric charges
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DE102014117492A1 (de) 2014-11-28 2016-06-02 Aixtron Se Vorrichtung zum Abscheiden einer Schicht auf einem Substrat
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CN1320718A (zh) * 2000-03-09 2001-11-07 城户淳二 有机化合物的汽相沉积法和精制法

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Also Published As

Publication number Publication date
US7238389B2 (en) 2007-07-03
TWI360581B (en) 2012-03-21
US20050208220A1 (en) 2005-09-22
JP2013057129A (ja) 2013-03-28
CN1934284A (zh) 2007-03-21
JP5727448B2 (ja) 2015-06-03
EP1733066A2 (en) 2006-12-20
KR20070004754A (ko) 2007-01-09
WO2005093117A3 (en) 2005-12-15
WO2005093117A2 (en) 2005-10-06
EP1733066B1 (en) 2016-12-07
JP2007531819A (ja) 2007-11-08
TW200604358A (en) 2006-02-01
KR101146267B1 (ko) 2012-05-15

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Effective date: 20100421

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Granted publication date: 20100623