KR101146267B1 - 필름을 형성하기 위해 유기 물질을 표면상으로 증기화하는 장치 및 방법 - Google Patents

필름을 형성하기 위해 유기 물질을 표면상으로 증기화하는 장치 및 방법 Download PDF

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KR101146267B1
KR101146267B1 KR1020067019489A KR20067019489A KR101146267B1 KR 101146267 B1 KR101146267 B1 KR 101146267B1 KR 1020067019489 A KR1020067019489 A KR 1020067019489A KR 20067019489 A KR20067019489 A KR 20067019489A KR 101146267 B1 KR101146267 B1 KR 101146267B1
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organic material
vaporized
permeable
manifold
stream
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KR20070004754A (ko
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마이클 롱
데이빗 리차드 스트립
제레미 매튜 그레이스
데니스 레이 프리만
네일 피터 리든
브루스 에드우드 코페
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글로벌 오엘이디 테크놀러지 엘엘씨
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/101—Liquid Source Chemical Depostion, i.e. LSCVD or Aerosol Chemical Vapor Deposition, i.e. ACVD

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Nozzles (AREA)
KR1020067019489A 2004-03-22 2005-03-14 필름을 형성하기 위해 유기 물질을 표면상으로 증기화하는 장치 및 방법 Expired - Lifetime KR101146267B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/805,980 2004-03-22
US10/805,980 US7238389B2 (en) 2004-03-22 2004-03-22 Vaporizing fluidized organic materials
PCT/US2005/008545 WO2005093117A2 (en) 2004-03-22 2005-03-14 Vaporizing fluidized organic materials

Publications (2)

Publication Number Publication Date
KR20070004754A KR20070004754A (ko) 2007-01-09
KR101146267B1 true KR101146267B1 (ko) 2012-05-15

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KR1020067019489A Expired - Lifetime KR101146267B1 (ko) 2004-03-22 2005-03-14 필름을 형성하기 위해 유기 물질을 표면상으로 증기화하는 장치 및 방법

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Country Link
US (1) US7238389B2 (enExample)
EP (1) EP1733066B1 (enExample)
JP (2) JP2007531819A (enExample)
KR (1) KR101146267B1 (enExample)
CN (1) CN1934284B (enExample)
TW (1) TWI360581B (enExample)
WO (1) WO2005093117A2 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004014311A (ja) * 2002-06-07 2004-01-15 Sony Corp 有機薄膜の形成方法
US20060275542A1 (en) * 2005-06-02 2006-12-07 Eastman Kodak Company Deposition of uniform layer of desired material
US20060273713A1 (en) * 2005-06-02 2006-12-07 Eastman Kodak Company Process for making an organic light-emitting device
US20060286405A1 (en) 2005-06-17 2006-12-21 Eastman Kodak Company Organic element for low voltage electroluminescent devices
JP4959961B2 (ja) * 2005-07-29 2012-06-27 株式会社ジャパンディスプレイセントラル 有機ｅｌ素子の製造方法
US20070231490A1 (en) * 2006-03-29 2007-10-04 Eastman Kodak Company Uniformly vaporizing metals and organic materials
DE102006026576A1 (de) * 2006-06-06 2008-01-10 Aixtron Ag Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs
US20080254217A1 (en) * 2007-04-16 2008-10-16 Boroson Michael L Fine control of vaporized organic material
DE102007030499A1 (de) * 2007-06-30 2009-01-08 Aixtron Ag Vorrichtung und Verfahren zum Abscheiden von insbesondere dotierten Schichten mittels OVPD oder dergleichen
US8802193B2 (en) * 2007-09-13 2014-08-12 Ramot At Tel-Aviv University Ltd. Vapor deposition of biomolecules
JP2009094276A (ja) * 2007-10-09 2009-04-30 Elpida Memory Inc 固体成膜原料導入装置
US8420229B2 (en) * 2007-10-26 2013-04-16 Global OLED Technologies LLC OLED device with certain fluoranthene light-emitting dopants
US8431242B2 (en) * 2007-10-26 2013-04-30 Global Oled Technology, Llc. OLED device with certain fluoranthene host
US8076009B2 (en) * 2007-10-26 2011-12-13 Global Oled Technology, Llc. OLED device with fluoranthene electron transport materials
US20090110956A1 (en) * 2007-10-26 2009-04-30 Begley William J Oled device with electron transport material combination
US7883583B2 (en) 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
DE102008011185A1 (de) * 2008-02-27 2009-09-03 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung einer dotierten organischen halbleitenden Schicht
US7947974B2 (en) * 2008-03-25 2011-05-24 Global Oled Technology Llc OLED device with hole-transport and electron-transport materials
KR20110014653A (ko) * 2008-05-19 2011-02-11 이 아이 듀폰 디 네모아 앤드 캄파니 전자 소자에서 증기 코팅 장치 및 방법
US7931975B2 (en) * 2008-11-07 2011-04-26 Global Oled Technology Llc Electroluminescent device containing a flouranthene compound
DE102008056411A1 (de) 2008-11-07 2010-05-20 Dürr Systems GmbH Beschichtungsanlagenbauteil, insbesondere Glockenteller, und entsprechendes Herstellungsverfahren
US8088500B2 (en) * 2008-11-12 2012-01-03 Global Oled Technology Llc OLED device with fluoranthene electron injection materials
US7968215B2 (en) 2008-12-09 2011-06-28 Global Oled Technology Llc OLED device with cyclobutene electron injection materials
US8216697B2 (en) * 2009-02-13 2012-07-10 Global Oled Technology Llc OLED with fluoranthene-macrocyclic materials
US8147989B2 (en) * 2009-02-27 2012-04-03 Global Oled Technology Llc OLED device with stabilized green light-emitting layer
US8206842B2 (en) 2009-04-06 2012-06-26 Global Oled Technology Llc Organic element for electroluminescent devices
US20120071001A1 (en) * 2010-09-17 2012-03-22 Elpida Memory, Inc. Vaporizing and feed apparatus and vaporizing and feed method
US8526213B2 (en) 2010-11-01 2013-09-03 Micron Technology, Inc. Memory cells, methods of programming memory cells, and methods of forming memory cells
KR101806916B1 (ko) * 2011-03-17 2017-12-12 한화테크윈 주식회사 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법
DE102011051261A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu
DE102011051260A1 (de) 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs
DE102011051931A1 (de) 2011-07-19 2013-01-24 Aixtron Se Vorrichtung und Verfahren zum Bestimmen des Dampfdrucks eines in einem Trägergasstrom verdampften Ausgangsstoffes
KR20130015144A (ko) * 2011-08-02 2013-02-13 삼성디스플레이 주식회사 증착원어셈블리, 유기층증착장치 및 이를 이용한 유기발광표시장치의 제조 방법
US8969116B2 (en) * 2012-01-23 2015-03-03 Universal Display Corporation Selective OLED vapor deposition using electric charges
EP2746423B1 (en) * 2012-12-20 2019-12-18 Applied Materials, Inc. Deposition arrangement, deposition apparatus and method of operation thereof
JP6584067B2 (ja) * 2014-05-30 2019-10-02 日立造船株式会社 真空蒸着装置
DE102014109195A1 (de) * 2014-07-01 2016-01-07 Aixtron Se Vorrichtung und Verfahren zum Erzeugen eines Dampfes aus mehreren flüssigen oder festen Ausgangsstoffen für eine CVD- oder PVD-Einrichtung
CN104178734B (zh) * 2014-07-21 2016-06-15 京东方科技集团股份有限公司 蒸发镀膜装置
DE102014117492A1 (de) 2014-11-28 2016-06-02 Aixtron Se Vorrichtung zum Abscheiden einer Schicht auf einem Substrat
DE102017112668A1 (de) 2017-06-08 2018-12-13 Aixtron Se Verfahren zum Abscheiden von OLEDs
WO2021058093A1 (en) * 2019-09-24 2021-04-01 Applied Materials, Inc. Evaporation apparatus for evaporating a material to be evaporated, evaporation source, and evaporation method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002030419A (ja) * 2000-07-18 2002-01-31 Canon Inc 成膜装置および方法

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2447789A (en) * 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
US2704727A (en) * 1951-10-08 1955-03-22 Ohio Commw Eng Co Method of deposition of non-conductive copper coatings from vapor phase
JPH01103857A (ja) * 1982-03-16 1989-04-20 Futaba Corp 半導体装置
JPS58167602A (ja) * 1982-03-29 1983-10-03 Futaba Corp 有機物薄膜の形成方法
US4734451A (en) * 1983-09-01 1988-03-29 Battelle Memorial Institute Supercritical fluid molecular spray thin films and fine powders
US4885211A (en) * 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4769292A (en) * 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
JPH01102436A (ja) * 1987-10-15 1989-04-20 Hitachi Ltd 光変調素子及びその製造方法
DE3801147A1 (de) * 1988-01-16 1989-07-27 Philips Patentverwaltung Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms
JPH03162567A (ja) * 1989-11-22 1991-07-12 Canon Inc クラスタイオンビーム蒸着装置
JPH04120270A (ja) * 1990-09-10 1992-04-21 Matsushita Electric Ind Co Ltd クラスタイオンビーム発生方法およびクラスタイオンビーム発生装置
JPH04176863A (ja) * 1990-11-09 1992-06-24 Mitsubishi Electric Corp 薄膜形成装置
JPH04225535A (ja) * 1990-12-27 1992-08-14 Fujitsu Ltd 金属蒸気発生装置および該装置を用いた気相エピタキシャル成長装置
JPH05125525A (ja) * 1991-11-05 1993-05-21 Mitsubishi Electric Corp 有機薄膜形成装置
JPH07138738A (ja) * 1993-11-16 1995-05-30 Canon Inc 蒸発用るつぼ及びそれを用いた薄膜形成方法
JP3203286B2 (ja) * 1994-02-17 2001-08-27 三菱電機株式会社 薄膜形成装置およびその蒸発源用るつぼ並びに昇華性蒸発材料の薄膜形成方法
JPH07238368A (ja) * 1994-02-25 1995-09-12 Mitsubishi Electric Corp 薄膜形成装置
JPH07258828A (ja) * 1994-03-24 1995-10-09 Matsushita Electric Works Ltd 膜形成方法
FR2727322B1 (fr) * 1994-11-30 1996-12-27 Kodak Pathe Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede
JP3813664B2 (ja) * 1996-07-26 2006-08-23 日本碍子株式会社 多結晶セラミックス膜の製造方法
US5835678A (en) * 1996-10-03 1998-11-10 Emcore Corporation Liquid vaporizer system and method
JP3586551B2 (ja) * 1998-01-27 2004-11-10 松下電器産業株式会社 光記録媒体の製造方法及び製造装置
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
JP4303814B2 (ja) * 1998-11-25 2009-07-29 Ｔｄｋ株式会社 有機ｅｌ素子の製造装置および製造方法
JP4312289B2 (ja) * 1999-01-28 2009-08-12 キヤノンアネルバ株式会社 有機薄膜形成装置
EP1132493A3 (en) * 2000-03-09 2001-09-19 Junji Kido Vapor deposition method of organic compound and refinement method of organic compound
DE10048759A1 (de) * 2000-09-29 2002-04-11 Aixtron Gmbh Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD
JP2002233796A (ja) * 2001-02-07 2002-08-20 Auto Network Gijutsu Kenkyusho:Kk 薄膜形成装置及び薄膜形成方法
JP2002246175A (ja) * 2001-02-16 2002-08-30 Sony Corp 有機材料薄膜の形成方法及びその装置、並びに有機電界発光素子の製造方法
JP2003007579A (ja) * 2001-06-19 2003-01-10 Matsushita Electric Ind Co Ltd 有機薄膜形成方法
US20030168013A1 (en) * 2002-03-08 2003-09-11 Eastman Kodak Company Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device
WO2003083169A1 (en) * 2002-04-01 2003-10-09 Ans Inc Apparatus and method for depositing organic matter of vapor phase

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002030419A (ja) * 2000-07-18 2002-01-31 Canon Inc 成膜装置および方法

Also Published As

Publication number Publication date
EP1733066B1 (en) 2016-12-07
KR20070004754A (ko) 2007-01-09
EP1733066A2 (en) 2006-12-20
TW200604358A (en) 2006-02-01
WO2005093117A2 (en) 2005-10-06
CN1934284B (zh) 2010-06-23
JP2007531819A (ja) 2007-11-08
JP5727448B2 (ja) 2015-06-03
TWI360581B (en) 2012-03-21
WO2005093117A3 (en) 2005-12-15
JP2013057129A (ja) 2013-03-28
US20050208220A1 (en) 2005-09-22
CN1934284A (zh) 2007-03-21
US7238389B2 (en) 2007-07-03

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