JP2007333965A - 露光用照明装置 - Google Patents

露光用照明装置 Download PDF

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Publication number
JP2007333965A
JP2007333965A JP2006164901A JP2006164901A JP2007333965A JP 2007333965 A JP2007333965 A JP 2007333965A JP 2006164901 A JP2006164901 A JP 2006164901A JP 2006164901 A JP2006164901 A JP 2006164901A JP 2007333965 A JP2007333965 A JP 2007333965A
Authority
JP
Japan
Prior art keywords
lamp
voltage
lighting
lamps
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006164901A
Other languages
English (en)
Japanese (ja)
Inventor
Gunji Mizutani
谷 軍 司 水
Hiroyuki Imai
井 洋 之 今
Tadahiro Toki
樹 忠 博 東
Gen Orito
戸 弦 折
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
Original Assignee
Adtec Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Engineering Co Ltd filed Critical Adtec Engineering Co Ltd
Priority to JP2006164901A priority Critical patent/JP2007333965A/ja
Priority to TW096111741A priority patent/TWI388920B/zh
Priority to KR1020070033203A priority patent/KR20070119487A/ko
Priority to CN2007101038171A priority patent/CN101089732B/zh
Publication of JP2007333965A publication Critical patent/JP2007333965A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006164901A 2006-06-14 2006-06-14 露光用照明装置 Pending JP2007333965A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006164901A JP2007333965A (ja) 2006-06-14 2006-06-14 露光用照明装置
TW096111741A TWI388920B (zh) 2006-06-14 2007-04-03 曝光用照明裝置
KR1020070033203A KR20070119487A (ko) 2006-06-14 2007-04-04 노광용 조명장치
CN2007101038171A CN101089732B (zh) 2006-06-14 2007-05-16 曝光用照明装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006164901A JP2007333965A (ja) 2006-06-14 2006-06-14 露光用照明装置

Publications (1)

Publication Number Publication Date
JP2007333965A true JP2007333965A (ja) 2007-12-27

Family

ID=38933511

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006164901A Pending JP2007333965A (ja) 2006-06-14 2006-06-14 露光用照明装置

Country Status (4)

Country Link
JP (1) JP2007333965A (zh)
KR (1) KR20070119487A (zh)
CN (1) CN101089732B (zh)
TW (1) TWI388920B (zh)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010256428A (ja) * 2009-04-21 2010-11-11 Hitachi High-Technologies Corp 露光装置、露光光照射方法、及び表示用パネル基板の製造方法
WO2011096365A1 (ja) * 2010-02-05 2011-08-11 日本精工株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
WO2013031632A1 (ja) * 2011-09-02 2013-03-07 株式会社オーク製作所 露光用調光装置
KR101804755B1 (ko) 2015-04-13 2017-12-06 페닉스덴키가부시키가이샤 노광 장치와 그 검사 방법
KR20200046933A (ko) * 2018-10-26 2020-05-07 엘지이노텍 주식회사 노광기용 조명 장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101609264B (zh) * 2009-07-24 2011-03-30 上海微电子装备有限公司 提高调焦调平测量精度的方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62200345A (ja) * 1986-02-28 1987-09-04 Fuji Xerox Co Ltd 照明装置
JPH11273881A (ja) * 1998-03-25 1999-10-08 Toshiba Lighting & Technology Corp ランプ点灯装置
JP2001307988A (ja) * 2000-04-24 2001-11-02 Canon Inc 照明装置と照明方法、および該照明装置を備えた露光装置とこれらによるデバイス製造方法
JP2001332488A (ja) * 2000-05-25 2001-11-30 Tokyo Electron Ltd 基板処理装置
JP2005227465A (ja) * 2004-02-12 2005-08-25 Mejiro Genossen:Kk 照明光学系の使用方法及びフラットパネルディスプレイの製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1137572C (zh) * 1999-09-27 2004-02-04 虹光精密工业股份有限公司 通过控制曝光时间来调整图像感应电压的光学扫描器及其方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62200345A (ja) * 1986-02-28 1987-09-04 Fuji Xerox Co Ltd 照明装置
JPH11273881A (ja) * 1998-03-25 1999-10-08 Toshiba Lighting & Technology Corp ランプ点灯装置
JP2001307988A (ja) * 2000-04-24 2001-11-02 Canon Inc 照明装置と照明方法、および該照明装置を備えた露光装置とこれらによるデバイス製造方法
JP2001332488A (ja) * 2000-05-25 2001-11-30 Tokyo Electron Ltd 基板処理装置
JP2005227465A (ja) * 2004-02-12 2005-08-25 Mejiro Genossen:Kk 照明光学系の使用方法及びフラットパネルディスプレイの製造方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010256428A (ja) * 2009-04-21 2010-11-11 Hitachi High-Technologies Corp 露光装置、露光光照射方法、及び表示用パネル基板の製造方法
WO2011096365A1 (ja) * 2010-02-05 2011-08-11 日本精工株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
JPWO2011096365A1 (ja) * 2010-02-05 2013-06-10 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
KR101409670B1 (ko) * 2010-02-05 2014-06-18 엔에스케이 테쿠노로지 가부시키가이샤 노광 장치용 광조사 장치 및 그 점등 제어 방법, 그리고 노광 장치, 노광 방법 및 기판
JP2015172775A (ja) * 2010-02-05 2015-10-01 株式会社Ｖｎシステムズ 露光装置用光照射装置及びその点灯制御方法
WO2013031632A1 (ja) * 2011-09-02 2013-03-07 株式会社オーク製作所 露光用調光装置
KR101804755B1 (ko) 2015-04-13 2017-12-06 페닉스덴키가부시키가이샤 노광 장치와 그 검사 방법
KR20180103785A (ko) * 2015-04-13 2018-09-19 페닉스덴키가부시키가이샤 광원 장치
KR101962099B1 (ko) 2015-04-13 2019-03-27 페닉스덴키가부시키가이샤 광원 장치
KR20200046933A (ko) * 2018-10-26 2020-05-07 엘지이노텍 주식회사 노광기용 조명 장치
KR102666946B1 (ko) 2018-10-26 2024-05-17 엘지이노텍 주식회사 노광기용 조명 장치

Also Published As

Publication number Publication date
TWI388920B (zh) 2013-03-11
CN101089732B (zh) 2011-01-05
KR20070119487A (ko) 2007-12-20
TW200745729A (en) 2007-12-16
CN101089732A (zh) 2007-12-19

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